KR102126591B1 - 기판 세정 장치, 기판 세정 방법 및 비일시적인 기억 매체 - Google Patents

기판 세정 장치, 기판 세정 방법 및 비일시적인 기억 매체 Download PDF

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KR102126591B1
KR102126591B1 KR1020140062387A KR20140062387A KR102126591B1 KR 102126591 B1 KR102126591 B1 KR 102126591B1 KR 1020140062387 A KR1020140062387 A KR 1020140062387A KR 20140062387 A KR20140062387 A KR 20140062387A KR 102126591 B1 KR102126591 B1 KR 102126591B1
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South Korea
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nozzle
substrate
cleaning liquid
gas
cleaning
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Korean (ko)
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KR20140139969A (ko
Inventor
아츠시 오오코우치
고우스케 요시하라
히로시 이치노미야
히로시 니시하타
료우이치로우 나이토우
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도쿄엘렉트론가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020140062387A 2013-05-28 2014-05-23 기판 세정 장치, 기판 세정 방법 및 비일시적인 기억 매체 Active KR102126591B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2013112395 2013-05-28
JPJP-P-2013-112395 2013-05-28
JPJP-P-2014-014864 2014-01-29
JP2014014864A JP6007925B2 (ja) 2013-05-28 2014-01-29 基板洗浄装置、基板洗浄方法及び記憶媒体
JP2014058221A JP6102807B2 (ja) 2013-05-28 2014-03-20 基板洗浄装置、基板洗浄方法及び記憶媒体
JPJP-P-2014-058221 2014-03-20

Publications (2)

Publication Number Publication Date
KR20140139969A KR20140139969A (ko) 2014-12-08
KR102126591B1 true KR102126591B1 (ko) 2020-06-24

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KR1020140062387A Active KR102126591B1 (ko) 2013-05-28 2014-05-23 기판 세정 장치, 기판 세정 방법 및 비일시적인 기억 매체

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JP (2) JP6007925B2 (https=)
KR (1) KR102126591B1 (https=)
TW (1) TWI568507B (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622091B (zh) 2015-06-18 2018-04-21 思可林集團股份有限公司 基板處理裝置
JP6613206B2 (ja) * 2015-06-18 2019-11-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6960489B2 (ja) * 2016-03-31 2021-11-05 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
JP6807162B2 (ja) * 2016-04-13 2021-01-06 東京エレクトロン株式会社 基板洗浄方法、基板洗浄装置及びコンピュータ読み取り可能な記録媒体
CN107470225A (zh) * 2017-08-28 2017-12-15 广州沃安实业有限公司 一种清洗机
JP7034634B2 (ja) 2017-08-31 2022-03-14 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
TWI643683B (zh) * 2017-10-19 2018-12-11 Scientech Corporation 流體供應裝置
JP2019169624A (ja) * 2018-03-23 2019-10-03 株式会社Ｓｃｒｅｅｎホールディングス 現像方法
JP7536583B2 (ja) * 2020-04-28 2024-08-20 東京エレクトロン株式会社 ノズルユニット、液処理装置及び液処理方法
JP7594903B2 (ja) * 2020-12-23 2024-12-05 東京エレクトロン株式会社 現像装置及び現像方法
CN116092967B (zh) * 2021-11-08 2025-08-29 长鑫存储技术有限公司 半导体清洗装置及方法
CN114927441B (zh) * 2022-05-31 2026-04-21 北京北方华创微电子装备有限公司 半导体清洗设备
CN115069639B (zh) * 2022-05-31 2023-11-14 江苏卓玉智能科技有限公司 半导体晶圆的清洗装置
CN119487617A (zh) 2022-07-14 2025-02-18 东京毅力科创株式会社 基片处理装置、基片处理方法和基片处理程序
CN120311276A (zh) * 2024-01-12 2025-07-15 盛美半导体设备(上海)股份有限公司 电镀装置及基板清洁方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100846690B1 (ko) 2004-06-04 2008-07-16 도쿄엘렉트론가부시키가이샤 기판 세정 방법 및 컴퓨터로 판독 가능한 기억 매체
KR100970060B1 (ko) 2006-10-19 2010-07-16 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법
KR101198496B1 (ko) 2009-02-03 2012-11-06 도쿄엘렉트론가부시키가이샤 현상 처리 방법 및 현상 처리 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7927429B2 (en) * 2003-11-18 2011-04-19 Tokyo Electron Limited Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium
US7837804B2 (en) * 2004-04-23 2010-11-23 Tokyo Electron Limited Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium
JP4324527B2 (ja) * 2004-09-09 2009-09-02 東京エレクトロン株式会社 基板洗浄方法及び現像装置
KR100940136B1 (ko) * 2006-08-29 2010-02-03 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리방법 및 기판처리장치
WO2008041211A2 (en) * 2006-10-02 2008-04-10 Sez Ag Device and method for removing liquid from a surface of a disc-like article
JP5151629B2 (ja) * 2008-04-03 2013-02-27 東京エレクトロン株式会社 基板洗浄方法、基板洗浄装置、現像方法、現像装置及び記憶媒体
JP5538102B2 (ja) * 2010-07-07 2014-07-02 株式会社Ｓｏｋｕｄｏ 基板洗浄方法および基板洗浄装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100846690B1 (ko) 2004-06-04 2008-07-16 도쿄엘렉트론가부시키가이샤 기판 세정 방법 및 컴퓨터로 판독 가능한 기억 매체
KR100970060B1 (ko) 2006-10-19 2010-07-16 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법
KR101198496B1 (ko) 2009-02-03 2012-11-06 도쿄엘렉트론가부시키가이샤 현상 처리 방법 및 현상 처리 장치

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Publication number Publication date
KR20140139969A (ko) 2014-12-08
JP2015008267A (ja) 2015-01-15
JP2015008273A (ja) 2015-01-15
JP6102807B2 (ja) 2017-03-29
TW201519966A (zh) 2015-06-01
JP6007925B2 (ja) 2016-10-19
TWI568507B (zh) 2017-02-01

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