KR102097436B1 - 표면파 플라즈마 장치 - Google Patents

표면파 플라즈마 장치 Download PDF

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Publication number
KR102097436B1
KR102097436B1 KR1020187028111A KR20187028111A KR102097436B1 KR 102097436 B1 KR102097436 B1 KR 102097436B1 KR 1020187028111 A KR1020187028111 A KR 1020187028111A KR 20187028111 A KR20187028111 A KR 20187028111A KR 102097436 B1 KR102097436 B1 KR 102097436B1
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KR
South Korea
Prior art keywords
probe
dielectric member
resonant cavity
dielectric
vacuum chamber
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KR1020187028111A
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English (en)
Korean (ko)
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KR20180117680A (ko
Inventor
시쟝 창
츙룽 취
강 웨이
야후이 황
진즈 바이
Original Assignee
베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디.
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Application filed by 베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디. filed Critical 베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디.
Publication of KR20180117680A publication Critical patent/KR20180117680A/ko
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32238—Windows
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4615—Microwave discharges using surface waves

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
KR1020187028111A 2016-03-03 2016-12-28 표면파 플라즈마 장치 KR102097436B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201610121051.9 2016-03-03
CN201610121051.9A CN107155256A (zh) 2016-03-03 2016-03-03 一种表面波等离子体装置
PCT/CN2016/112597 WO2017148208A1 (zh) 2016-03-03 2016-12-28 表面波等离子体设备

Publications (2)

Publication Number Publication Date
KR20180117680A KR20180117680A (ko) 2018-10-29
KR102097436B1 true KR102097436B1 (ko) 2020-05-26

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KR1020187028111A KR102097436B1 (ko) 2016-03-03 2016-12-28 표면파 플라즈마 장치

Country Status (5)

Country Link
JP (1) JP6718972B2 (ja)
KR (1) KR102097436B1 (ja)
CN (2) CN117794040A (ja)
SG (1) SG11201807555UA (ja)
WO (1) WO2017148208A1 (ja)

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* Cited by examiner, † Cited by third party
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CN109698107B (zh) * 2017-10-24 2021-04-09 北京北方华创微电子装备有限公司 表面波等离子体设备
CN109755088B (zh) * 2017-11-06 2021-04-09 北京北方华创微电子装备有限公司 表面波等离子体设备
CN110769585B (zh) * 2018-07-27 2023-08-18 北京北方华创微电子装备有限公司 表面波等离子体装置
CN110797250B (zh) * 2018-08-03 2022-12-09 北京北方华创微电子装备有限公司 表面波等离子体加工设备
CN110911260B (zh) * 2018-09-14 2023-04-14 北京北方华创微电子装备有限公司 表面波等离子体加工设备
CN109195299B (zh) * 2018-10-31 2020-09-11 上海工程技术大学 一种圆柱表面波等离子体产生装置
CN111128664B (zh) * 2018-11-01 2022-05-27 北京北方华创微电子装备有限公司 谐振腔结构和半导体处理设备
JP7184254B2 (ja) * 2018-12-06 2022-12-06 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
CN111755308B (zh) * 2019-03-27 2022-07-22 北京北方华创微电子装备有限公司 工艺腔室和半导体处理设备
CN110234195A (zh) * 2019-07-18 2019-09-13 中国科学技术大学 谐振腔式ecr等离子体源装置以及方法
CN110993479B (zh) * 2019-12-04 2022-07-19 北京北方华创微电子装备有限公司 远程等离子体源产生装置及半导体加工设备
JP7360934B2 (ja) * 2019-12-25 2023-10-13 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
CN114871574B (zh) * 2022-05-27 2023-07-04 华中科技大学 一种微波辅助去除激光切割件表面毛刺的装置
CN115354311A (zh) * 2022-07-15 2022-11-18 杭州电子科技大学 复合左右手波导的缝隙阵列天线表面波等离子沉积装置

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Also Published As

Publication number Publication date
KR20180117680A (ko) 2018-10-29
JP2019508855A (ja) 2019-03-28
JP6718972B2 (ja) 2020-07-08
CN107155256A (zh) 2017-09-12
SG11201807555UA (en) 2018-10-30
CN117794040A (zh) 2024-03-29
WO2017148208A1 (zh) 2017-09-08

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