KR102082039B1 - 감압 용기, 처리 장치, 처리 시스템 및 플랫 패널 디스플레이의 제조 방법 - Google Patents
감압 용기, 처리 장치, 처리 시스템 및 플랫 패널 디스플레이의 제조 방법 Download PDFInfo
- Publication number
- KR102082039B1 KR102082039B1 KR1020180006337A KR20180006337A KR102082039B1 KR 102082039 B1 KR102082039 B1 KR 102082039B1 KR 1020180006337 A KR1020180006337 A KR 1020180006337A KR 20180006337 A KR20180006337 A KR 20180006337A KR 102082039 B1 KR102082039 B1 KR 102082039B1
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- Prior art keywords
- rib
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- container
- pressure reduction
- corners
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000012545 processing Methods 0.000 title claims description 38
- 230000006837 decompression Effects 0.000 title claims description 17
- 238000000034 method Methods 0.000 title claims description 13
- 230000009467 reduction Effects 0.000 claims abstract description 113
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 239000000463 material Substances 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 230000000052 comparative effect Effects 0.000 description 17
- 238000010586 diagram Methods 0.000 description 11
- 238000012986 modification Methods 0.000 description 10
- 230000004048 modification Effects 0.000 description 10
- 230000008021 deposition Effects 0.000 description 9
- 238000004088 simulation Methods 0.000 description 9
- 238000006073 displacement reaction Methods 0.000 description 8
- 238000003466 welding Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 230000003014 reinforcing effect Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000005394 sealing glass Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 230000002787 reinforcement Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/0017—Casings, cabinets or drawers for electric apparatus with operator interface units
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H01L51/56—
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/06—Hermetically-sealed casings
- H05K5/068—Hermetically-sealed casings having a pressure compensation device, e.g. membrane
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Pressure Vessels And Lids Thereof (AREA)
- Packaging Frangible Articles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2017-009001 | 2017-01-20 | ||
| JP2017009001 | 2017-01-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20180086142A KR20180086142A (ko) | 2018-07-30 |
| KR102082039B1 true KR102082039B1 (ko) | 2020-02-26 |
Family
ID=62907398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020180006337A Active KR102082039B1 (ko) | 2017-01-20 | 2018-01-18 | 감압 용기, 처리 장치, 처리 시스템 및 플랫 패널 디스플레이의 제조 방법 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20180213656A1 (enExample) |
| JP (1) | JP7133928B2 (enExample) |
| KR (1) | KR102082039B1 (enExample) |
| CN (2) | CN108330448B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20180213656A1 (en) * | 2017-01-20 | 2018-07-26 | Canon Kabushiki Kaisha | Decompression container, processing apparatus, processing system, and method of producing flat panel display |
| JP7567850B2 (ja) * | 2021-12-15 | 2024-10-16 | カシオ計算機株式会社 | 電子機器 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008139417A (ja) * | 2006-11-30 | 2008-06-19 | Shin Etsu Chem Co Ltd | ペリクル収納容器 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6486444B1 (en) * | 1999-06-03 | 2002-11-26 | Applied Materials, Inc. | Load-lock with external staging area |
| JP5232801B2 (ja) * | 2007-12-14 | 2013-07-10 | 株式会社アルバック | チャンバ及び成膜装置 |
| JP2010243015A (ja) * | 2009-04-03 | 2010-10-28 | Hitachi Appliances Inc | 減圧貯蔵容器及びこれを備えた冷蔵庫 |
| KR101274130B1 (ko) * | 2011-08-22 | 2013-06-13 | 주식회사 테라세미콘 | Cigs층 형성장치 |
| KR101396603B1 (ko) * | 2013-02-26 | 2014-05-20 | 주식회사 테라세미콘 | 기판 처리 장치 |
| US20180213656A1 (en) * | 2017-01-20 | 2018-07-26 | Canon Kabushiki Kaisha | Decompression container, processing apparatus, processing system, and method of producing flat panel display |
-
2018
- 2018-01-16 US US15/872,269 patent/US20180213656A1/en not_active Abandoned
- 2018-01-17 JP JP2018005991A patent/JP7133928B2/ja active Active
- 2018-01-18 KR KR1020180006337A patent/KR102082039B1/ko active Active
- 2018-01-19 CN CN201810051045.XA patent/CN108330448B/zh active Active
- 2018-01-19 CN CN201820090183.4U patent/CN208055449U/zh active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008139417A (ja) * | 2006-11-30 | 2008-06-19 | Shin Etsu Chem Co Ltd | ペリクル収納容器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7133928B2 (ja) | 2022-09-09 |
| US20180213656A1 (en) | 2018-07-26 |
| KR20180086142A (ko) | 2018-07-30 |
| CN108330448B (zh) | 2020-08-11 |
| CN108330448A (zh) | 2018-07-27 |
| CN208055449U (zh) | 2018-11-06 |
| JP2018119210A (ja) | 2018-08-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20180118 |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20190625 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20191216 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20200220 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20200220 End annual number: 3 Start annual number: 1 |
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| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20240130 Start annual number: 5 End annual number: 5 |
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