KR102081862B1 - 극자외선 광원용 뷰포트 보호기 - Google Patents

극자외선 광원용 뷰포트 보호기 Download PDF

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Publication number
KR102081862B1
KR102081862B1 KR1020157011977A KR20157011977A KR102081862B1 KR 102081862 B1 KR102081862 B1 KR 102081862B1 KR 1020157011977 A KR1020157011977 A KR 1020157011977A KR 20157011977 A KR20157011977 A KR 20157011977A KR 102081862 B1 KR102081862 B1 KR 102081862B1
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KR
South Korea
Prior art keywords
viewport
assembly
light
wavelength
protector
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Expired - Fee Related
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KR1020157011977A
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English (en)
Korean (ko)
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KR20150082296A (ko
Inventor
바한 세네케리미안
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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Publication of KR20150082296A publication Critical patent/KR20150082296A/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/007—Pressure-resistant sight glasses
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/02—Sealings between relatively-stationary surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16B—DEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B2200/00—Constructional details of connections not covered for in other groups of this subclass
    • F16B2200/60—Coupler sealing means

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
  • High Energy & Nuclear Physics (AREA)
KR1020157011977A 2012-11-07 2013-10-22 극자외선 광원용 뷰포트 보호기 Expired - Fee Related KR102081862B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/671,378 2012-11-07
US13/671,378 US9341752B2 (en) 2012-11-07 2012-11-07 Viewport protector for an extreme ultraviolet light source
PCT/US2013/066239 WO2014074302A1 (en) 2012-11-07 2013-10-22 Viewport protector for an extreme ultraviolet light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020207005022A Division KR102159046B1 (ko) 2012-11-07 2013-10-22 극자외선 광원용 뷰포트 보호기

Publications (2)

Publication Number Publication Date
KR20150082296A KR20150082296A (ko) 2015-07-15
KR102081862B1 true KR102081862B1 (ko) 2020-02-26

Family

ID=50622109

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020157011977A Expired - Fee Related KR102081862B1 (ko) 2012-11-07 2013-10-22 극자외선 광원용 뷰포트 보호기
KR1020207005022A Expired - Fee Related KR102159046B1 (ko) 2012-11-07 2013-10-22 극자외선 광원용 뷰포트 보호기

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020207005022A Expired - Fee Related KR102159046B1 (ko) 2012-11-07 2013-10-22 극자외선 광원용 뷰포트 보호기

Country Status (6)

Country Link
US (1) US9341752B2 (https=)
JP (1) JP6388869B2 (https=)
KR (2) KR102081862B1 (https=)
CN (1) CN104781705B (https=)
TW (1) TWI612849B (https=)
WO (1) WO2014074302A1 (https=)

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US9341951B2 (en) * 2012-12-21 2016-05-17 Ultratech, Inc. Wynn-dyson imaging system with reduced thermal distortion
US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
US9497840B2 (en) * 2013-09-26 2016-11-15 Asml Netherlands B.V. System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
JP2017520010A (ja) * 2014-05-01 2017-07-20 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング装置及び関連する低圧チャンバ装置
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
EP3457430B1 (en) 2014-05-15 2023-10-25 Excelitas Technologies Corp. Laser driven sealed beam lamp with dual focus regions
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
US10057973B2 (en) * 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10429314B2 (en) * 2017-07-31 2019-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. EUV vessel inspection method and related system
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US11466228B1 (en) * 2018-11-02 2022-10-11 Endress+Hauser Optical Analysis, Inc. Friction control and captive sealant for pressed windows
RU188876U1 (ru) * 2018-12-25 2019-04-25 Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр Институт прикладной физики Российской академии наук" (ИПФ РАН) Пространственный фильтр для мощных многокаскадных лазерных усилителей
EP4081863B1 (en) * 2019-12-23 2024-11-27 ASML Netherlands B.V. Collector flow ring
CN115735163A (zh) * 2020-07-01 2023-03-03 Asml荷兰有限公司 用于快速量测恢复的精确真空窗视口和表膜
KR102476767B1 (ko) 2021-03-17 2022-12-09 피에스케이홀딩스 (주) 플라즈마 감지 장치
US11647578B2 (en) 2021-08-31 2023-05-09 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography thermal control
CN119301528A (zh) * 2022-06-13 2025-01-10 Asml荷兰有限公司 用于极紫外光源的视窗组件

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US5933273A (en) * 1997-06-11 1999-08-03 Mcdonnell Douglas Corporation Ultraviolet blocking coating and associated coated optical element
JP2008532231A (ja) 2005-02-25 2008-08-14 サイマー インコーポレイテッド Ｅｕｖ光源の内部構成要素をプラズマ生成デブリから保護するためのシステム
US20100085547A1 (en) * 2008-09-25 2010-04-08 Asml Netherlands B.V. Source module, radiation source and lithographic apparatus
US20120228523A1 (en) * 2009-11-09 2012-09-13 Tata Institute Of Fundamental Research Biological laser plasma x-ray point source

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JPS5922927B2 (ja) 1977-02-04 1984-05-30 キヤノン株式会社 カメラの附属品の装着装置
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
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US5898522A (en) * 1995-10-06 1999-04-27 Herpst; Robert D. Protective window assembly and method of using the same for a laser beam generating apparatus
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US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
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JP2005268035A (ja) 2004-03-18 2005-09-29 Canon Inc Ｅｕｖ光源の評価用評価装置、およびそれを用いた評価方法
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JP2006259162A (ja) 2005-03-16 2006-09-28 Olympus Imaging Corp 防塵機能付き光学装置
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JP5534910B2 (ja) * 2009-04-23 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
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US8173985B2 (en) 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5933273A (en) * 1997-06-11 1999-08-03 Mcdonnell Douglas Corporation Ultraviolet blocking coating and associated coated optical element
JP2008532231A (ja) 2005-02-25 2008-08-14 サイマー インコーポレイテッド Ｅｕｖ光源の内部構成要素をプラズマ生成デブリから保護するためのシステム
US20100085547A1 (en) * 2008-09-25 2010-04-08 Asml Netherlands B.V. Source module, radiation source and lithographic apparatus
US20120228523A1 (en) * 2009-11-09 2012-09-13 Tata Institute Of Fundamental Research Biological laser plasma x-ray point source

Also Published As

Publication number Publication date
KR20200021002A (ko) 2020-02-26
KR102159046B1 (ko) 2020-09-24
TWI612849B (zh) 2018-01-21
CN104781705B (zh) 2017-12-15
US9341752B2 (en) 2016-05-17
WO2014074302A1 (en) 2014-05-15
US20140126043A1 (en) 2014-05-08
JP2016505863A (ja) 2016-02-25
CN104781705A (zh) 2015-07-15
JP6388869B2 (ja) 2018-09-12
TW201433215A (zh) 2014-08-16
KR20150082296A (ko) 2015-07-15

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