KR102072956B1 - 주사 노광 장치 - Google Patents

주사 노광 장치 Download PDF

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Publication number
KR102072956B1
KR102072956B1 KR1020197016086A KR20197016086A KR102072956B1 KR 102072956 B1 KR102072956 B1 KR 102072956B1 KR 1020197016086 A KR1020197016086 A KR 1020197016086A KR 20197016086 A KR20197016086 A KR 20197016086A KR 102072956 B1 KR102072956 B1 KR 102072956B1
Authority
KR
South Korea
Prior art keywords
substrate
projection
mask
exposure
illumination
Prior art date
Application number
KR1020197016086A
Other languages
English (en)
Korean (ko)
Other versions
KR20190067257A (ko
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20190067257A publication Critical patent/KR20190067257A/ko
Application granted granted Critical
Publication of KR102072956B1 publication Critical patent/KR102072956B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Liquid Crystal (AREA)
KR1020197016086A 2013-06-14 2014-05-02 주사 노광 장치 KR102072956B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2013-126150 2013-06-14
JP2013126150 2013-06-14
PCT/JP2014/062180 WO2014199744A1 (ja) 2013-06-14 2014-05-02 基板処理装置、デバイス製造方法及び露光方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020187034098A Division KR101988818B1 (ko) 2013-06-14 2014-05-02 기판 처리 장치, 디바이스 제조 방법 및 노광 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020207002516A Division KR102178173B1 (ko) 2013-06-14 2014-05-02 주사 노광 방법 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20190067257A KR20190067257A (ko) 2019-06-14
KR102072956B1 true KR102072956B1 (ko) 2020-02-03

Family

ID=52022046

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020197016086A KR102072956B1 (ko) 2013-06-14 2014-05-02 주사 노광 장치
KR1020207002516A KR102178173B1 (ko) 2013-06-14 2014-05-02 주사 노광 방법 및 디바이스 제조 방법
KR1020187034098A KR101988818B1 (ko) 2013-06-14 2014-05-02 기판 처리 장치, 디바이스 제조 방법 및 노광 방법
KR1020167000474A KR101924270B1 (ko) 2013-06-14 2014-05-02 기판 처리 장치, 디바이스 제조 방법 및 노광 방법

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020207002516A KR102178173B1 (ko) 2013-06-14 2014-05-02 주사 노광 방법 및 디바이스 제조 방법
KR1020187034098A KR101988818B1 (ko) 2013-06-14 2014-05-02 기판 처리 장치, 디바이스 제조 방법 및 노광 방법
KR1020167000474A KR101924270B1 (ko) 2013-06-14 2014-05-02 기판 처리 장치, 디바이스 제조 방법 및 노광 방법

Country Status (6)

Country Link
JP (4) JP6344387B2 (ja)
KR (4) KR102072956B1 (ja)
CN (4) CN105308507B (ja)
HK (2) HK1257717A1 (ja)
TW (4) TWI646408B (ja)
WO (1) WO2014199744A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108885289B (zh) * 2016-03-04 2021-09-03 应用材料公司 线栅偏振器制造方法
JP7232586B2 (ja) * 2018-07-31 2023-03-03 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
KR20220046598A (ko) * 2019-08-16 2022-04-14 도쿄엘렉트론가부시키가이샤 확률 중심 결함 교정을 위한 방법 및 공정

Citations (5)

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JP2006235533A (ja) 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2009037026A (ja) 2007-08-02 2009-02-19 Ushio Inc 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法
JP2011221538A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
JP2012032837A (ja) 2006-09-08 2012-02-16 Nikon Corp マスク、露光装置、及びデバイス製造方法
WO2013035661A1 (ja) * 2011-09-07 2013-03-14 株式会社ニコン 基板処理装置

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JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
JPH08288203A (ja) * 1995-04-11 1996-11-01 Nikon Corp 走査型露光装置
JPH08293461A (ja) * 1995-04-21 1996-11-05 Nikon Corp 照明装置および該装置を備えた投影露光装置
SG93267A1 (en) * 1996-11-28 2002-12-17 Nikon Corp An exposure apparatus and an exposure method
JPH10256476A (ja) * 1997-03-12 1998-09-25 Canon Inc 柱状デバイス及び露光装置及びデバイス製造方法
US6416908B1 (en) * 2000-06-29 2002-07-09 Anvik Corporation Projection lithography on curved substrates
JP2003178954A (ja) * 2001-12-12 2003-06-27 Canon Inc 露光装置及びデバイスの製造方法
KR101209539B1 (ko) * 2003-07-09 2012-12-07 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US20070084368A1 (en) * 2005-10-13 2007-04-19 Ryan Vest Dynamic UV-exposure and thermal development of relief image printing elements
JP2007227438A (ja) * 2006-02-21 2007-09-06 Nikon Corp 露光装置及び方法並びに光露光用マスク
JP2007227703A (ja) * 2006-02-24 2007-09-06 Seiko Epson Corp 基板分割方法、基板分割装置、電気光学装置、電子機器
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
EP2048543B1 (en) * 2007-10-09 2013-12-04 ASML Netherlands B.V. An optical focus sensor, an inspection apparatus and a lithographic apparatus
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
US8625076B2 (en) * 2010-02-09 2014-01-07 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer edge exposure module
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
KR20130041785A (ko) * 2010-04-13 2013-04-25 가부시키가이샤 니콘 노광 장치, 기판 처리 장치 및 디바이스 제조 방법
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Publication number Priority date Publication date Assignee Title
JP2006235533A (ja) 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2012032837A (ja) 2006-09-08 2012-02-16 Nikon Corp マスク、露光装置、及びデバイス製造方法
JP2009037026A (ja) 2007-08-02 2009-02-19 Ushio Inc 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法
JP2011221538A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
WO2013035661A1 (ja) * 2011-09-07 2013-03-14 株式会社ニコン 基板処理装置

Also Published As

Publication number Publication date
TW201502716A (zh) 2015-01-16
JPWO2014199744A1 (ja) 2017-02-23
TW201809916A (zh) 2018-03-16
JP2019045874A (ja) 2019-03-22
KR101988818B1 (ko) 2019-06-12
CN105308507A (zh) 2016-02-03
CN105308507B (zh) 2018-12-25
TWI752469B (zh) 2022-01-11
JP6690695B2 (ja) 2020-04-28
KR101924270B1 (ko) 2018-11-30
HK1257717A1 (zh) 2019-10-25
TW202032294A (zh) 2020-09-01
KR20160021191A (ko) 2016-02-24
JP6344387B2 (ja) 2018-06-20
CN110045580B (zh) 2021-07-23
TWI693480B (zh) 2020-05-11
CN106896651A (zh) 2017-06-27
KR20200012040A (ko) 2020-02-04
JP2018077507A (ja) 2018-05-17
TW201908877A (zh) 2019-03-01
JP7070598B2 (ja) 2022-05-18
CN108873613A (zh) 2018-11-23
CN106896651B (zh) 2018-06-12
CN108873613B (zh) 2020-11-13
KR20190067257A (ko) 2019-06-14
CN110045580A (zh) 2019-07-23
TWI646408B (zh) 2019-01-01
KR102178173B1 (ko) 2020-11-12
JP6451826B2 (ja) 2019-01-16
JP2020170162A (ja) 2020-10-15
WO2014199744A1 (ja) 2014-12-18
HK1220513A1 (zh) 2017-05-05
KR20180128522A (ko) 2018-12-03
TWI604275B (zh) 2017-11-01

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