KR102022125B1 - 폴리싱 패드 컨디셔너를 위한 댐퍼 - Google Patents

폴리싱 패드 컨디셔너를 위한 댐퍼 Download PDF

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Publication number
KR102022125B1
KR102022125B1 KR1020130124503A KR20130124503A KR102022125B1 KR 102022125 B1 KR102022125 B1 KR 102022125B1 KR 1020130124503 A KR1020130124503 A KR 1020130124503A KR 20130124503 A KR20130124503 A KR 20130124503A KR 102022125 B1 KR102022125 B1 KR 102022125B1
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South Korea
Prior art keywords
arm
conditioner
polishing
polishing pad
base
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KR1020130124503A
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English (en)
Korean (ko)
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KR20140049951A (ko
Inventor
제이슨 가르청 펑
폴 디. 버터필드
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20140049951A publication Critical patent/KR20140049951A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/007—Weight compensation; Temperature compensation; Vibration damping

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
KR1020130124503A 2012-10-18 2013-10-18 폴리싱 패드 컨디셔너를 위한 댐퍼 Active KR102022125B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261715750P 2012-10-18 2012-10-18
US61/715,750 2012-10-18

Publications (2)

Publication Number Publication Date
KR20140049951A KR20140049951A (ko) 2014-04-28
KR102022125B1 true KR102022125B1 (ko) 2019-09-17

Family

ID=50485754

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130124503A Active KR102022125B1 (ko) 2012-10-18 2013-10-18 폴리싱 패드 컨디셔너를 위한 댐퍼

Country Status (4)

Country Link
US (1) US20140113533A1 (enExample)
JP (1) JP6282437B2 (enExample)
KR (1) KR102022125B1 (enExample)
TW (1) TWI597129B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9375825B2 (en) 2014-04-30 2016-06-28 Applied Materials, Inc. Polishing pad conditioning system including suction
US9662762B2 (en) 2014-07-18 2017-05-30 Applied Materials, Inc. Modifying substrate thickness profiles
KR102376928B1 (ko) * 2014-07-18 2022-03-18 어플라이드 머티어리얼스, 인코포레이티드 기판 두께 프로파일들의 수정
US10199242B2 (en) 2014-12-31 2019-02-05 Osaka University Planarizing processing method and planarizing processing device
JP6187948B1 (ja) 2016-03-11 2017-08-30 東邦エンジニアリング株式会社 平坦加工装置、その動作方法および加工物の製造方法
KR102561647B1 (ko) * 2018-05-28 2023-07-31 삼성전자주식회사 컨디셔너 및 이를 포함하는 화학 기계적 연마 장치
KR102300359B1 (ko) * 2019-08-07 2021-09-08 세메스 주식회사 기판 처리 장치 및 그 구동 방법
US20220379433A1 (en) * 2021-05-28 2022-12-01 Ta Liang Technology Co., Ltd. Polishing system and dressing device thereof
TWI765726B (zh) * 2021-05-28 2022-05-21 大量科技股份有限公司 拋光系統及其修整裝置
WO2023239421A1 (en) * 2022-06-06 2023-12-14 Applied Materials, Inc. In-situ conditioner disk cleaning during cmp
US12337439B2 (en) * 2022-08-15 2025-06-24 Applied Materials, Inc. Multiple disk pad conditioner

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003048147A (ja) 2001-07-31 2003-02-18 Applied Materials Inc 研磨パッドのコンディショニング装置及びこれを用いた研磨装置
JP2011148046A (ja) * 2010-01-22 2011-08-04 Ebara Corp 研磨装置及び方法、並びに、ドレッシングユニットの性能試験方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3669089A (en) * 1970-12-16 1972-06-13 Henry F Swenson Swing arm for holding a dressing device
JP2627862B2 (ja) * 1994-02-03 1997-07-09 株式会社鴻池組 構造物の制振装置
US5904609A (en) * 1995-04-26 1999-05-18 Fujitsu Limited Polishing apparatus and polishing method
US5938507A (en) * 1995-10-27 1999-08-17 Applied Materials, Inc. Linear conditioner apparatus for a chemical mechanical polishing system
US5904615A (en) * 1997-07-18 1999-05-18 Hankook Machine Tools Co., Ltd. Pad conditioner for chemical mechanical polishing apparatus
US6102777A (en) * 1998-03-06 2000-08-15 Keltech Engineering Lapping apparatus and method for high speed lapping with a rotatable abrasive platen
US6263605B1 (en) * 1998-12-21 2001-07-24 Motorola, Inc. Pad conditioner coupling and end effector for a chemical mechanical planarization system and method therefor
US6553807B2 (en) * 1999-02-22 2003-04-29 Seagate Technology Llc Disc drive component level shock tester

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003048147A (ja) 2001-07-31 2003-02-18 Applied Materials Inc 研磨パッドのコンディショニング装置及びこれを用いた研磨装置
JP2011148046A (ja) * 2010-01-22 2011-08-04 Ebara Corp 研磨装置及び方法、並びに、ドレッシングユニットの性能試験方法

Also Published As

Publication number Publication date
JP6282437B2 (ja) 2018-02-21
JP2014099598A (ja) 2014-05-29
TWI597129B (zh) 2017-09-01
TW201420270A (zh) 2014-06-01
KR20140049951A (ko) 2014-04-28
US20140113533A1 (en) 2014-04-24

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