KR101992864B1 - 착색 경화성 수지 조성물 - Google Patents

착색 경화성 수지 조성물 Download PDF

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Publication number
KR101992864B1
KR101992864B1 KR1020130014371A KR20130014371A KR101992864B1 KR 101992864 B1 KR101992864 B1 KR 101992864B1 KR 1020130014371 A KR1020130014371 A KR 1020130014371A KR 20130014371 A KR20130014371 A KR 20130014371A KR 101992864 B1 KR101992864 B1 KR 101992864B1
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KR
South Korea
Prior art keywords
group
pigment
atom
monomer
acid
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KR1020130014371A
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English (en)
Korean (ko)
Other versions
KR20130093030A (ko
Inventor
가츠나리 오다
타쿠마 후지타
히로유키 미우라
토루 아시다
Original Assignee
스미또모 가가꾸 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20130093030A publication Critical patent/KR20130093030A/ko
Application granted granted Critical
Publication of KR101992864B1 publication Critical patent/KR101992864B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
KR1020130014371A 2012-02-13 2013-02-08 착색 경화성 수지 조성물 KR101992864B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012028112 2012-02-13
JPJP-P-2012-028112 2012-02-13
JP2012174711 2012-08-07
JPJP-P-2012-174711 2012-08-07

Publications (2)

Publication Number Publication Date
KR20130093030A KR20130093030A (ko) 2013-08-21
KR101992864B1 true KR101992864B1 (ko) 2019-06-25

Family

ID=48925768

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130014371A KR101992864B1 (ko) 2012-02-13 2013-02-08 착색 경화성 수지 조성물

Country Status (4)

Country Link
JP (1) JP6194588B2 (zh)
KR (1) KR101992864B1 (zh)
CN (1) CN103246163B (zh)
TW (1) TWI570190B (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105683298B (zh) * 2013-06-26 2017-07-11 东友精细化工有限公司 着色固化性树脂组合物
KR102012524B1 (ko) * 2013-08-22 2019-08-20 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이를 포함하는 컬러필터 및 표시장치
KR102031127B1 (ko) * 2013-10-03 2019-10-11 동우 화인켐 주식회사 염료 분산액
WO2015147312A1 (ja) * 2014-03-26 2015-10-01 住友化学株式会社 液晶表示装置
CN105319846A (zh) * 2014-06-05 2016-02-10 东友精细化工有限公司 着色固化性树脂组合物
JP6480728B2 (ja) * 2014-12-26 2019-03-13 住友化学株式会社 化合物
KR102425914B1 (ko) * 2016-01-12 2022-07-27 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 색변환층 및 화상표시장치
TWI761260B (zh) * 2016-09-02 2022-04-11 日商住友化學股份有限公司 著色組成物及化合物
TWI745756B (zh) * 2019-07-10 2021-11-11 住華科技股份有限公司 著色樹脂組成物、由前述著色樹脂組成物所形成的濾光片、以及包含前述濾光片的顯示裝置
TWI760793B (zh) * 2020-07-22 2022-04-11 住華科技股份有限公司 著色樹脂組成物、所形成之彩色濾光片、以及含有所述彩色濾光片的顯示裝置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU78311A1 (de) * 1977-10-13 1979-06-01 Ciba Geigy Ag Neue cumarinfarbstoffe,deren herstellung und verwendung
JP2659076B2 (ja) * 1990-12-26 1997-09-30 三井東圧化学株式会社 感光体
JPH0559111A (ja) * 1991-09-03 1993-03-09 Mitsui Toatsu Chem Inc 光重合性樹脂組成物
CN1091131C (zh) * 1996-02-09 2002-09-18 出光兴产株式会社 荧光增红膜和使用其的红光发射装置
DE59710483D1 (de) * 1996-09-05 2003-08-28 Bayer Ag Verbrückte Perinone, Chinophthalone und Perinon-Chinophthalone
JP2000212554A (ja) * 1998-11-20 2000-08-02 Idemitsu Kosan Co Ltd 蛍光変換媒体及びそれを用いた表示装置
DE10158137A1 (de) * 2001-11-27 2003-05-28 Bayer Ag Verbrückte Perinone/Chinophthalone
US20050260126A1 (en) * 2002-08-30 2005-11-24 Yukitsuka Kudo Diagnostic probes and remedies for diseases with accumulation of prion protein, and stains for prion protein
JP5221859B2 (ja) * 2006-03-09 2013-06-26 株式会社Ａｄｅｋａ クマリン化合物を含有してなるフィルム、クマリン化合物とマトリクスを含む色変換層、該色変換層を含む色変換フィルタ、補色層、補色フィルタならびに多色発光デバイス
TWI403840B (zh) * 2006-04-26 2013-08-01 Fujifilm Corp 含染料之負型硬化性組成物、彩色濾光片及其製法
KR20070113757A (ko) * 2006-05-26 2007-11-29 동우 화인켐 주식회사 착색감광성 수지 조성물, 이를 이용한 칼라필터 및 이를포함하는 상보성 금속 산화막 반도체
TWI456345B (zh) * 2008-06-03 2014-10-11 Sumitomo Chemical Co 著色硬化性組成物
TW201035677A (en) * 2008-12-09 2010-10-01 Sumitomo Chemical Co Colored photosensitive resin composition
JP2010145858A (ja) * 2008-12-19 2010-07-01 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
TWI554509B (zh) * 2011-12-26 2016-10-21 住友化學股份有限公司 染料用化合物
JP2013173726A (ja) * 2012-01-24 2013-09-05 Harima Chemicals Inc クマリン誘導体

Also Published As

Publication number Publication date
TW201341477A (zh) 2013-10-16
JP2014051641A (ja) 2014-03-20
CN103246163B (zh) 2018-06-12
JP6194588B2 (ja) 2017-09-13
TWI570190B (zh) 2017-02-11
CN103246163A (zh) 2013-08-14
KR20130093030A (ko) 2013-08-21

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