KR101982363B1 - 조명 제어 - Google Patents

조명 제어 Download PDF

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Publication number
KR101982363B1
KR101982363B1 KR1020147002337A KR20147002337A KR101982363B1 KR 101982363 B1 KR101982363 B1 KR 101982363B1 KR 1020147002337 A KR1020147002337 A KR 1020147002337A KR 20147002337 A KR20147002337 A KR 20147002337A KR 101982363 B1 KR101982363 B1 KR 101982363B1
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KR
South Korea
Prior art keywords
illumination
pupil
dynamic optical
conjugate plane
objective lens
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KR1020147002337A
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English (en)
Korean (ko)
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KR20140053141A (ko
Inventor
암논 마나쎈
조엘 셀리그손
노암 사피엔스
Original Assignee
케이엘에이-텐코 코포레이션
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Publication of KR20140053141A publication Critical patent/KR20140053141A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Multimedia (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020147002337A 2011-06-27 2012-06-07 조명 제어 Active KR101982363B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/170,025 US8681413B2 (en) 2011-06-27 2011-06-27 Illumination control
US13/170,025 2011-06-27
PCT/US2012/041273 WO2013002988A2 (en) 2011-06-27 2012-06-07 Illumination control

Publications (2)

Publication Number Publication Date
KR20140053141A KR20140053141A (ko) 2014-05-07
KR101982363B1 true KR101982363B1 (ko) 2019-05-27

Family

ID=47361608

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147002337A Active KR101982363B1 (ko) 2011-06-27 2012-06-07 조명 제어

Country Status (6)

Country Link
US (1) US8681413B2 (enExample)
EP (1) EP2724361B1 (enExample)
JP (1) JP6132838B2 (enExample)
KR (1) KR101982363B1 (enExample)
TW (1) TWI564539B (enExample)
WO (1) WO2013002988A2 (enExample)

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US10438339B1 (en) 2016-09-12 2019-10-08 Apple Inc. Optical verification system and methods of verifying micro device transfer
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Also Published As

Publication number Publication date
WO2013002988A3 (en) 2013-07-11
WO2013002988A2 (en) 2013-01-03
EP2724361A4 (en) 2015-03-18
TWI564539B (zh) 2017-01-01
JP2014521116A (ja) 2014-08-25
EP2724361A2 (en) 2014-04-30
EP2724361B1 (en) 2023-12-27
KR20140053141A (ko) 2014-05-07
JP6132838B2 (ja) 2017-05-24
US8681413B2 (en) 2014-03-25
TW201303258A (zh) 2013-01-16
US20120327503A1 (en) 2012-12-27

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