KR101982363B1 - 조명 제어 - Google Patents

조명 제어 Download PDF

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Publication number
KR101982363B1
KR101982363B1 KR1020147002337A KR20147002337A KR101982363B1 KR 101982363 B1 KR101982363 B1 KR 101982363B1 KR 1020147002337 A KR1020147002337 A KR 1020147002337A KR 20147002337 A KR20147002337 A KR 20147002337A KR 101982363 B1 KR101982363 B1 KR 101982363B1
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KR
South Korea
Prior art keywords
illumination
pupil
dynamic optical
conjugate plane
objective lens
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KR1020147002337A
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English (en)
Korean (ko)
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KR20140053141A (ko
Inventor
암논 마나쎈
조엘 셀리그손
노암 사피엔스
Original Assignee
케이엘에이-텐코 코포레이션
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Publication of KR20140053141A publication Critical patent/KR20140053141A/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020147002337A 2011-06-27 2012-06-07 조명 제어 Active KR101982363B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/170,025 2011-06-27
US13/170,025 US8681413B2 (en) 2011-06-27 2011-06-27 Illumination control
PCT/US2012/041273 WO2013002988A2 (en) 2011-06-27 2012-06-07 Illumination control

Publications (2)

Publication Number Publication Date
KR20140053141A KR20140053141A (ko) 2014-05-07
KR101982363B1 true KR101982363B1 (ko) 2019-05-27

Family

ID=47361608

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147002337A Active KR101982363B1 (ko) 2011-06-27 2012-06-07 조명 제어

Country Status (6)

Country Link
US (1) US8681413B2 (enExample)
EP (1) EP2724361B1 (enExample)
JP (1) JP6132838B2 (enExample)
KR (1) KR101982363B1 (enExample)
TW (1) TWI564539B (enExample)
WO (1) WO2013002988A2 (enExample)

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CN107078074B (zh) 2014-11-25 2021-05-25 科磊股份有限公司 分析及利用景观
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CN106933049B (zh) * 2015-12-30 2020-06-16 上海微电子装备（集团）股份有限公司 一种用于半导体光刻的曝光系统与曝光方法
US9846128B2 (en) * 2016-01-19 2017-12-19 Applied Materials Israel Ltd. Inspection system and a method for evaluating an exit pupil of an inspection system
JP6731490B2 (ja) 2016-03-07 2020-07-29 エーエスエムエル ネザーランズ ビー．ブイ． 照明システムおよびメトロロジシステム
US10438339B1 (en) * 2016-09-12 2019-10-08 Apple Inc. Optical verification system and methods of verifying micro device transfer
US10732516B2 (en) * 2017-03-01 2020-08-04 Kla Tencor Corporation Process robust overlay metrology based on optical scatterometry
KR102695660B1 (ko) 2017-11-07 2024-08-14 에이에스엠엘 네델란즈 비.브이. 관심 특성을 결정하는 계측 장치 및 방법
CN108279553B (zh) * 2018-01-30 2019-06-21 中国科学院上海光学精密机械研究所 一种光刻机照明控制测试系统及方法
EP3528047A1 (en) * 2018-02-14 2019-08-21 ASML Netherlands B.V. Method and apparatus for measuring a parameter of interest using image plane detection techniques
US10761031B1 (en) * 2018-03-20 2020-09-01 Kla-Tencor Corporation Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging system
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US11359916B2 (en) * 2019-09-09 2022-06-14 Kla Corporation Darkfield imaging of grating target structures for overlay measurement
CN113048895B (zh) * 2021-03-04 2022-08-16 上海精测半导体技术有限公司 探测反射光变化的装置、方法及膜厚测量装置
JP7589188B2 (ja) * 2022-02-28 2024-11-25 キヤノン株式会社 計測装置、計測方法、リソグラフィ装置及び物品の製造方法
WO2024068297A1 (en) * 2022-09-26 2024-04-04 Asml Netherlands B.V. Tunable optical system
KR102519813B1 (ko) 2022-10-17 2023-04-11 (주)오로스테크놀로지 오버레이 계측 장치 및 방법과 이를 위한 시스템 및 프로그램
KR102546552B1 (ko) 2022-11-14 2023-06-22 (주)오로스테크놀로지 오버레이 계측 장치의 동작을 제어하는 데이터를 저장하기 위한 데이터 구조를 기록한 컴퓨터 판독 가능 저장 매체 및 이를 위한 오버레이 계측 장치
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Also Published As

Publication number Publication date
US20120327503A1 (en) 2012-12-27
TWI564539B (zh) 2017-01-01
WO2013002988A3 (en) 2013-07-11
WO2013002988A2 (en) 2013-01-03
US8681413B2 (en) 2014-03-25
TW201303258A (zh) 2013-01-16
EP2724361A4 (en) 2015-03-18
JP6132838B2 (ja) 2017-05-24
KR20140053141A (ko) 2014-05-07
EP2724361A2 (en) 2014-04-30
EP2724361B1 (en) 2023-12-27
JP2014521116A (ja) 2014-08-25

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