JP6132838B2 - 照明制御 - Google Patents

照明制御 Download PDF

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Publication number
JP6132838B2
JP6132838B2 JP2014518591A JP2014518591A JP6132838B2 JP 6132838 B2 JP6132838 B2 JP 6132838B2 JP 2014518591 A JP2014518591 A JP 2014518591A JP 2014518591 A JP2014518591 A JP 2014518591A JP 6132838 B2 JP6132838 B2 JP 6132838B2
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JP
Japan
Prior art keywords
illumination
optical
conjugate plane
objective lens
pupil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014518591A
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English (en)
Japanese (ja)
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JP2014521116A (ja
JP2014521116A5 (enExample
Inventor
アモン マナッセン
アモン マナッセン
ジョエル セリグソン
ジョエル セリグソン
ノーム サピエンス
ノーム サピエンス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Corp filed Critical KLA Corp
Publication of JP2014521116A publication Critical patent/JP2014521116A/ja
Publication of JP2014521116A5 publication Critical patent/JP2014521116A5/ja
Application granted granted Critical
Publication of JP6132838B2 publication Critical patent/JP6132838B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H10P76/2041—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2014518591A 2011-06-27 2012-06-07 照明制御 Active JP6132838B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/170,025 US8681413B2 (en) 2011-06-27 2011-06-27 Illumination control
US13/170,025 2011-06-27
PCT/US2012/041273 WO2013002988A2 (en) 2011-06-27 2012-06-07 Illumination control

Publications (3)

Publication Number Publication Date
JP2014521116A JP2014521116A (ja) 2014-08-25
JP2014521116A5 JP2014521116A5 (enExample) 2015-07-09
JP6132838B2 true JP6132838B2 (ja) 2017-05-24

Family

ID=47361608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014518591A Active JP6132838B2 (ja) 2011-06-27 2012-06-07 照明制御

Country Status (6)

Country Link
US (1) US8681413B2 (enExample)
EP (1) EP2724361B1 (enExample)
JP (1) JP6132838B2 (enExample)
KR (1) KR101982363B1 (enExample)
TW (1) TWI564539B (enExample)
WO (1) WO2013002988A2 (enExample)

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KR102648880B1 (ko) * 2017-11-07 2024-03-15 에이에스엠엘 네델란즈 비.브이. 관심 특성을 결정하는 계측 장치 및 방법
CN108279553B (zh) * 2018-01-30 2019-06-21 中国科学院上海光学精密机械研究所 一种光刻机照明控制测试系统及方法
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CN113260924B (zh) * 2018-12-31 2025-02-18 Asml荷兰有限公司 用于重叠量测的方法及其设备
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JP7589188B2 (ja) 2022-02-28 2024-11-25 キヤノン株式会社 計測装置、計測方法、リソグラフィ装置及び物品の製造方法
JP2025530963A (ja) * 2022-09-26 2025-09-19 エーエスエムエル ネザーランズ ビー．ブイ． チューナブル光学系
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Also Published As

Publication number Publication date
US20120327503A1 (en) 2012-12-27
TWI564539B (zh) 2017-01-01
EP2724361A4 (en) 2015-03-18
WO2013002988A3 (en) 2013-07-11
JP2014521116A (ja) 2014-08-25
EP2724361A2 (en) 2014-04-30
US8681413B2 (en) 2014-03-25
TW201303258A (zh) 2013-01-16
WO2013002988A2 (en) 2013-01-03
EP2724361B1 (en) 2023-12-27
KR101982363B1 (ko) 2019-05-27
KR20140053141A (ko) 2014-05-07

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