TWI564539B - 光學系統、用於其中之照射控制之方法及非暫時性電腦可讀媒體 - Google Patents

光學系統、用於其中之照射控制之方法及非暫時性電腦可讀媒體 Download PDF

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Publication number
TWI564539B
TWI564539B TW101120937A TW101120937A TWI564539B TW I564539 B TWI564539 B TW I564539B TW 101120937 A TW101120937 A TW 101120937A TW 101120937 A TW101120937 A TW 101120937A TW I564539 B TWI564539 B TW I564539B
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TW
Taiwan
Prior art keywords
illumination
optical
array
dynamic
pupil
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TW101120937A
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English (en)
Chinese (zh)
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TW201303258A (zh
Inventor
阿農 馬那森
喬爾 色林格森
娜安 薩賓恩斯
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克萊譚克公司
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Publication of TW201303258A publication Critical patent/TW201303258A/zh
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Publication of TWI564539B publication Critical patent/TWI564539B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H10P76/2041—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW101120937A 2011-06-27 2012-06-11 光學系統、用於其中之照射控制之方法及非暫時性電腦可讀媒體 TWI564539B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/170,025 US8681413B2 (en) 2011-06-27 2011-06-27 Illumination control

Publications (2)

Publication Number Publication Date
TW201303258A TW201303258A (zh) 2013-01-16
TWI564539B true TWI564539B (zh) 2017-01-01

Family

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Family Applications (1)

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TW101120937A TWI564539B (zh) 2011-06-27 2012-06-11 光學系統、用於其中之照射控制之方法及非暫時性電腦可讀媒體

Country Status (6)

Country Link
US (1) US8681413B2 (enExample)
EP (1) EP2724361B1 (enExample)
JP (1) JP6132838B2 (enExample)
KR (1) KR101982363B1 (enExample)
TW (1) TWI564539B (enExample)
WO (1) WO2013002988A2 (enExample)

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Also Published As

Publication number Publication date
US20120327503A1 (en) 2012-12-27
TW201303258A (zh) 2013-01-16
WO2013002988A2 (en) 2013-01-03
JP6132838B2 (ja) 2017-05-24
KR101982363B1 (ko) 2019-05-27
WO2013002988A3 (en) 2013-07-11
US8681413B2 (en) 2014-03-25
EP2724361B1 (en) 2023-12-27
EP2724361A4 (en) 2015-03-18
EP2724361A2 (en) 2014-04-30
JP2014521116A (ja) 2014-08-25
KR20140053141A (ko) 2014-05-07

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