KR101967135B1 - 이동체 장치, 노광 장치, 및 디바이스 제조 방법 - Google Patents

이동체 장치, 노광 장치, 및 디바이스 제조 방법 Download PDF

Info

Publication number
KR101967135B1
KR101967135B1 KR1020177001942A KR20177001942A KR101967135B1 KR 101967135 B1 KR101967135 B1 KR 101967135B1 KR 1020177001942 A KR1020177001942 A KR 1020177001942A KR 20177001942 A KR20177001942 A KR 20177001942A KR 101967135 B1 KR101967135 B1 KR 101967135B1
Authority
KR
South Korea
Prior art keywords
stage
substrate
self
step board
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020177001942A
Other languages
English (en)
Korean (ko)
Other versions
KR20170012584A (ko
Inventor
야스오 아오키
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20170012584A publication Critical patent/KR20170012584A/ko
Application granted granted Critical
Publication of KR101967135B1 publication Critical patent/KR101967135B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • H01L21/6831—
    • H01L21/6838—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020177001942A 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법 Active KR101967135B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US15741509P 2009-03-04 2009-03-04
US61/157,415 2009-03-04
US12/714,733 US8659746B2 (en) 2009-03-04 2010-03-01 Movable body apparatus, exposure apparatus and device manufacturing method
US12/714,733 2010-03-01
PCT/JP2010/053715 WO2010101267A1 (en) 2009-03-04 2010-03-02 Movable body apparatus, exposure apparatus and device manufacturing method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020117022426A Division KR101700929B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020197009500A Division KR102108997B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20170012584A KR20170012584A (ko) 2017-02-02
KR101967135B1 true KR101967135B1 (ko) 2019-04-09

Family

ID=42678581

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020177001942A Active KR101967135B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법
KR1020207012812A Ceased KR20200051842A (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법
KR1020197009500A Active KR102108997B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법
KR1020117022426A Active KR101700929B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020207012812A Ceased KR20200051842A (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법
KR1020197009500A Active KR102108997B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법
KR1020117022426A Active KR101700929B1 (ko) 2009-03-04 2010-03-02 이동체 장치, 노광 장치, 및 디바이스 제조 방법

Country Status (5)

Country Link
US (6) US8659746B2 (https=)
JP (2) JP5636696B2 (https=)
KR (4) KR101967135B1 (https=)
TW (5) TWI633397B (https=)
WO (1) WO2010101267A1 (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8659746B2 (en) 2009-03-04 2014-02-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP2012089537A (ja) * 2010-10-15 2012-05-10 Nikon Corp ステージ装置、基板貼り合せ装置、積層半導体装置の製造方法及び積層半導体装置
JP5958692B2 (ja) * 2012-04-04 2016-08-02 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法並びに露光方法
JP5910992B2 (ja) * 2012-04-04 2016-04-27 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
NL2010679A (en) * 2012-05-23 2013-11-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN103472678B (zh) * 2012-06-08 2015-07-22 上海微电子装备有限公司 光刻机及应用于光刻机中的工件台系统
JP6086299B2 (ja) * 2012-11-13 2017-03-01 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
DE102013011873B4 (de) * 2013-07-17 2015-10-08 Mecatronix Ag Positioniervorrichtung und Verfahren zum Bewegen eines Substrats
JP6299993B2 (ja) * 2014-03-28 2018-03-28 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体駆動方法
KR101715785B1 (ko) * 2014-12-05 2017-03-13 프로미스 주식회사 Ｆｐｄ용 노광장치
CN104483815B (zh) * 2014-12-08 2016-05-11 上海核电装备焊接及检测工程技术研究中心（筹） 一种射线源对中支撑装置及其固定射线源装置的方法
JP6606479B2 (ja) * 2016-08-08 2019-11-13 株式会社ブイ・テクノロジー マスク保持装置
NL2020346A (en) * 2017-02-27 2018-09-03 Asml Netherlands Bv Lithographic apparatus, lithographic projection apparatus and device manufacturing method
JP6999155B2 (ja) * 2017-08-29 2022-01-18 株式会社ナチュラレーザ・ワン 原稿圧着板開閉装置およびこれを備えた事務機器
JP6917848B2 (ja) * 2017-09-26 2021-08-11 株式会社Ｓｃｒｅｅｎホールディングス ステージ駆動装置および描画装置
CN108161728A (zh) * 2017-12-26 2018-06-15 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 抛光回转工作台及抛光装置
CN109765753B (zh) * 2019-01-30 2024-07-12 广东华恒智能科技有限公司 一种全自动油墨曝光机
KR102936533B1 (ko) * 2020-06-15 2026-03-09 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
CN119658401B (zh) * 2025-01-10 2025-10-28 哈尔滨工业大学 一种垂向运动的短行程超精密定位平台

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408045B1 (en) 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JP2004260116A (ja) 2003-02-27 2004-09-16 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
JP2006012911A (ja) * 2004-06-22 2006-01-12 Dainippon Printing Co Ltd Ｘｙステージ装置
JP2006086442A (ja) * 2004-09-17 2006-03-30 Nikon Corp ステージ装置及び露光装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
JPH05329727A (ja) 1992-05-26 1993-12-14 Nikon Corp ステージ装置
JP3548353B2 (ja) * 1996-10-15 2004-07-28 キヤノン株式会社 ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP3745167B2 (ja) * 1998-07-29 2006-02-15 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法
US6296734B1 (en) * 1999-07-08 2001-10-02 International Business Machines Corporation Concentrated UV light curing of adhesive for pivot applications
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
US20020075467A1 (en) 2000-12-20 2002-06-20 Nikon Corporation Exposure apparatus and method
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
WO2003026838A1 (en) * 2001-09-24 2003-04-03 Agency For Science, Technology And Research Decoupled planar positioning system
CN101872135B (zh) * 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
TWI338323B (en) * 2003-02-17 2011-03-01 Nikon Corp Stage device, exposure device and manufacguring method of devices
JP2005203567A (ja) * 2004-01-15 2005-07-28 Canon Inc 駆動装置、露光装置及びデバイス製造方法
US7221433B2 (en) * 2004-01-28 2007-05-22 Nikon Corporation Stage assembly including a reaction assembly having a connector assembly
WO2005122242A1 (ja) * 2004-06-07 2005-12-22 Nikon Corporation ステージ装置、露光装置及び露光方法
JP2006253572A (ja) * 2005-03-14 2006-09-21 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
WO2006098194A1 (ja) 2005-03-15 2006-09-21 Sharp Kabushiki Kaisha 表示装置の駆動方法、表示装置の駆動装置、そのプログラムおよび記録媒体、並びに、それを備える表示装置
TWI408506B (zh) * 2005-03-29 2013-09-11 尼康股份有限公司 曝光裝置、曝光裝置的製造方法以及微元件的製造方法
JP2007073688A (ja) * 2005-09-06 2007-03-22 Shinko Electric Co Ltd Ｘｙステージ装置及びその製造方法
KR101547784B1 (ko) 2007-03-05 2015-08-26 가부시키가이샤 니콘 이동체 장치, 패턴 형성 장치 및 패턴 형성 방법, 디바이스 제조 방법, 이동체 장치의 제조 방법, 및 이동체 구동 방법
JP5505871B2 (ja) * 2008-03-07 2014-05-28 株式会社ニコン 移動体装置及び露光装置
US20100030384A1 (en) * 2008-07-29 2010-02-04 Technical Manufacturing Corporation Vibration Isolation System With Design For Offloading Payload Forces Acting on Actuator
US8659746B2 (en) * 2009-03-04 2014-02-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408045B1 (en) 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JP2004260116A (ja) 2003-02-27 2004-09-16 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
JP2006012911A (ja) * 2004-06-22 2006-01-12 Dainippon Printing Co Ltd Ｘｙステージ装置
JP2006086442A (ja) * 2004-09-17 2006-03-30 Nikon Corp ステージ装置及び露光装置

Also Published As

Publication number Publication date
US20170045829A1 (en) 2017-02-16
TWI694314B (zh) 2020-05-21
US9500963B2 (en) 2016-11-22
US20180239264A1 (en) 2018-08-23
JP5636696B2 (ja) 2014-12-10
KR101700929B1 (ko) 2017-02-13
US10514616B2 (en) 2019-12-24
TWI501044B (zh) 2015-09-21
TW201600938A (zh) 2016-01-01
KR20190038956A (ko) 2019-04-09
US9170504B2 (en) 2015-10-27
TWI633397B (zh) 2018-08-21
TW201727389A (zh) 2017-08-01
JP2010206205A (ja) 2010-09-16
US8659746B2 (en) 2014-02-25
TW201841076A (zh) 2018-11-16
JP2014112247A (ja) 2014-06-19
US20200096878A1 (en) 2020-03-26
KR102108997B1 (ko) 2020-05-11
KR20110133570A (ko) 2011-12-13
US9977345B2 (en) 2018-05-22
TWI584079B (zh) 2017-05-21
US20140125961A1 (en) 2014-05-08
JP6016198B2 (ja) 2016-10-26
TW202028889A (zh) 2020-08-01
TW201102764A (en) 2011-01-16
WO2010101267A1 (en) 2010-09-10
KR20200051842A (ko) 2020-05-13
US20100227277A1 (en) 2010-09-09
KR20170012584A (ko) 2017-02-02
US20160011524A1 (en) 2016-01-14

Similar Documents

Publication Publication Date Title
KR101967135B1 (ko) 이동체 장치, 노광 장치, 및 디바이스 제조 방법
KR101547784B1 (ko) 이동체 장치, 패턴 형성 장치 및 패턴 형성 방법, 디바이스 제조 방법, 이동체 장치의 제조 방법, 및 이동체 구동 방법
KR102072076B1 (ko) 이동체 장치, 물체 처리 디바이스, 노광 장치, 플랫 패널 디스플레이 제조 방법, 및 디바이스 제조 방법
KR20120023597A (ko) 이동체 장치, 노광 장치, 노광 방법, 및 디바이스 제조 방법
KR102228708B1 (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
JP2011244608A (ja) リニアモータ、移動体装置、露光装置、デバイス製造方法、及びフラットパネルディスプレイの製造方法
HK1136388B (en) Moving body apparatus, apparatus for forming pattern, method of forming pattern, method of producing device, method of producing moving body apparatus, and method of driving moving body

Legal Events

Date Code Title Description
A107 Divisional application of patent
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R15-X000 Change to inventor requested

St.27 status event code: A-3-3-R10-R15-oth-X000

R16-X000 Change to inventor recorded

St.27 status event code: A-3-3-R10-R16-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

A107 Divisional application of patent
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20220323

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000