KR101946646B1 - 경화성 수지 조성물 - Google Patents

경화성 수지 조성물 Download PDF

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Publication number
KR101946646B1
KR101946646B1 KR1020120054871A KR20120054871A KR101946646B1 KR 101946646 B1 KR101946646 B1 KR 101946646B1 KR 1020120054871 A KR1020120054871 A KR 1020120054871A KR 20120054871 A KR20120054871 A KR 20120054871A KR 101946646 B1 KR101946646 B1 KR 101946646B1
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KR
South Korea
Prior art keywords
meth
group
formula
copolymer
acrylic acid
Prior art date
Application number
KR1020120054871A
Other languages
English (en)
Korean (ko)
Other versions
KR20120134024A (ko
Inventor
마사카즈 시라카와
Original Assignee
스미또모 가가꾸 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 스미또모 가가꾸 가부시끼가이샤 filed Critical 스미또모 가가꾸 가부시끼가이샤
Publication of KR20120134024A publication Critical patent/KR20120134024A/ko
Application granted granted Critical
Publication of KR101946646B1 publication Critical patent/KR101946646B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3445—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Liquid Crystal (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020120054871A 2011-05-30 2012-05-23 경화성 수지 조성물 KR101946646B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011119912 2011-05-30
JPJP-P-2011-119912 2011-05-30

Publications (2)

Publication Number Publication Date
KR20120134024A KR20120134024A (ko) 2012-12-11
KR101946646B1 true KR101946646B1 (ko) 2019-02-11

Family

ID=47233628

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120054871A KR101946646B1 (ko) 2011-05-30 2012-05-23 경화성 수지 조성물

Country Status (4)

Country Link
JP (1) JP6192898B2 (zh)
KR (1) KR101946646B1 (zh)
CN (1) CN102809897B (zh)
TW (1) TWI541600B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101359470B1 (ko) * 2013-03-08 2014-02-12 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 제조된 스페이서
CN104865794A (zh) * 2014-02-20 2015-08-26 上海飞凯光电材料股份有限公司 一种光刻胶
JP6695369B2 (ja) * 2017-02-16 2020-05-20 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
CN116814179B (zh) * 2023-01-31 2024-02-27 江苏穿越光电科技有限公司 一种uv光固化型光学胶膜

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007182539A (ja) * 2005-12-06 2007-07-19 Jsr Corp 樹脂組成物、カラーフィルタの保護膜の形成方法、およびカラーフィルタの保護膜

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2715792B2 (ja) * 1992-02-13 1998-02-18 信越化学工業株式会社 光透過性エポキシ樹脂組成物及び光半導体装置
JP3586933B2 (ja) * 1995-08-09 2004-11-10 Ｊｓｒ株式会社 硬化性組成物および保護膜並びに保護膜の製造方法
EP1276011B1 (en) * 2000-03-29 2004-05-26 Kanagawa University Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same
KR20030085031A (ko) * 2001-03-23 2003-11-01 다이요 잉키 세이조 가부시키가이샤 활성 에너지선 경화성 수지, 이것을 함유하는광경화성ㆍ열경화성 수지 조성물 및 그의 경화물
AU2003244280A1 (en) * 2002-06-20 2004-01-06 Hiromitsu Kuramoto Transparent composite composition
JP3937996B2 (ja) * 2002-10-08 2007-06-27 Ｊｓｒ株式会社 感放射性樹脂組成物
KR100845657B1 (ko) * 2004-07-07 2008-07-10 다이요 잉키 세이조 가부시키가이샤 광 경화성·열 경화성 수지 조성물과 그것을 사용한 건식필름, 및 그의 경화물
JP5224030B2 (ja) * 2007-03-22 2013-07-03 Ｊｓｒ株式会社 熱硬化性樹脂組成物、保護膜および保護膜の形成方法
JP4877388B2 (ja) * 2007-03-28 2012-02-15 Ｊｓｒ株式会社 ポジ型感放射線性組成物およびそれを用いたレジストパターン形成方法
EP2147937A4 (en) * 2007-05-11 2010-08-25 Daicel Chem LIGHT AND / OR HEAT-CURABLE COPOLYMER, HARDENABLE RESIN COMPOSITIONS AND HARDENED OBJECTS
TWI422601B (zh) * 2007-11-29 2014-01-11 Sumitomo Chemical Co Thermosetting resin composition
TWI521300B (zh) * 2008-11-18 2016-02-11 Sumitomo Chemical Co Photosensitive resin composition and display device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007182539A (ja) * 2005-12-06 2007-07-19 Jsr Corp 樹脂組成物、カラーフィルタの保護膜の形成方法、およびカラーフィルタの保護膜

Also Published As

Publication number Publication date
KR20120134024A (ko) 2012-12-11
TW201312270A (zh) 2013-03-16
CN102809897A (zh) 2012-12-05
CN102809897B (zh) 2017-03-01
TWI541600B (zh) 2016-07-11
JP6192898B2 (ja) 2017-09-06
JP2013010938A (ja) 2013-01-17

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