KR101935336B1 - 체임버를 배기시키고 상기 체임버로부터 추출된 기체를 정화하는 장치 및 방법 - Google Patents

체임버를 배기시키고 상기 체임버로부터 추출된 기체를 정화하는 장치 및 방법 Download PDF

Info

Publication number
KR101935336B1
KR101935336B1 KR1020147018745A KR20147018745A KR101935336B1 KR 101935336 B1 KR101935336 B1 KR 101935336B1 KR 1020147018745 A KR1020147018745 A KR 1020147018745A KR 20147018745 A KR20147018745 A KR 20147018745A KR 101935336 B1 KR101935336 B1 KR 101935336B1
Authority
KR
South Korea
Prior art keywords
vacuum pump
gas
chamber
outlet
inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020147018745A
Other languages
English (en)
Korean (ko)
Other versions
KR20140107397A (ko
Inventor
하이네르 쾨스터스
우베 갓슐리취
Original Assignee
스털링 인더스트리 컨설트 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스털링 인더스트리 컨설트 게엠베하 filed Critical 스털링 인더스트리 컨설트 게엠베하
Publication of KR20140107397A publication Critical patent/KR20140107397A/ko
Application granted granted Critical
Publication of KR101935336B1 publication Critical patent/KR101935336B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C19/00—Rotary-piston pumps with fluid ring or the like, specially adapted for elastic fluids
    • F04C19/004—Details concerning the operating liquid, e.g. nature, separation, cooling, cleaning, control of the supply
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
    • F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2240/00—Components
    • F04C2240/80—Other components
    • F04C2240/81—Sensor, e.g. electronic sensor for control or monitoring
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2280/00—Arrangements for preventing or removing deposits or corrosion
    • F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Treating Waste Gases (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Gas Separation By Absorption (AREA)
KR1020147018745A 2011-12-14 2012-12-12 체임버를 배기시키고 상기 체임버로부터 추출된 기체를 정화하는 장치 및 방법 Active KR101935336B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP11193573.0 2011-12-14
EP11193573 2011-12-14
PCT/EP2012/075262 WO2013087713A2 (de) 2011-12-14 2012-12-12 Vorrichtung und verfahren zum evakuieren eines raums und zum reinigen des aus dem raum abgesaugten gases

Publications (2)

Publication Number Publication Date
KR20140107397A KR20140107397A (ko) 2014-09-04
KR101935336B1 true KR101935336B1 (ko) 2019-01-04

Family

ID=47326206

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147018745A Active KR101935336B1 (ko) 2011-12-14 2012-12-12 체임버를 배기시키고 상기 체임버로부터 추출된 기체를 정화하는 장치 및 방법

Country Status (6)

Country Link
US (2) US20150068399A1 (enExample)
EP (1) EP2791508B1 (enExample)
JP (1) JP6138144B2 (enExample)
KR (1) KR101935336B1 (enExample)
CN (1) CN104066989B (enExample)
WO (1) WO2013087713A2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2540582A (en) * 2015-07-22 2017-01-25 Edwards Ltd Apparatus for evacuating a corrosive effluent gas stream from a processing chamber
CN108344221B (zh) * 2017-12-22 2024-05-28 佛山精迅能冷链科技有限公司 一种可调控压力的真空预冷机
GB2596366B (en) * 2020-06-26 2022-11-09 Edwards Tech Vacuum Engineering Qingdao Co Ltd Liquid ring pump control
FR3112086B1 (fr) * 2020-07-09 2022-07-08 Pfeiffer Vacuum Dispositif de traitement des gaz et ligne de vide
FR3112177B1 (fr) * 2020-07-09 2022-07-08 Pfeiffer Vacuum Ligne de vide et procédé de contrôle d’une ligne de vide
CN112011785A (zh) * 2020-10-10 2020-12-01 常州艾恩希纳米镀膜科技有限公司 一种用于cvd涂层设备的废气中和系统
FR3129851A1 (fr) * 2021-12-08 2023-06-09 Pfeiffer Vacuum Ligne de vide et installation comportant la ligne de vide
US20250207256A1 (en) * 2022-02-24 2025-06-26 Ihi Bernex Ag Chemical vapor deposition apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2527137B2 (ja) * 1992-03-13 1996-08-21 リーター・アウトマーティク・ゲゼルシャフト・ミット ベシュレンクテル・ハフツング 特に真空熱分解装置からの排気ガスを浄化するためのプロセス

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1129872A (fr) * 1954-08-21 1957-01-28 Heraeus Gmbh W C Pompe mécanique à vide poussé du type roots
US3922110A (en) * 1974-01-28 1975-11-25 Henry Huse Multi-stage vacuum pump
DE2430314C3 (de) * 1974-06-24 1982-11-25 Siemens AG, 1000 Berlin und 8000 München Flüssigkeitsring-Vakuumpumpe mit vorgeschaltetem Verdichter
US3956072A (en) * 1975-08-21 1976-05-11 Atlantic Fluidics, Inc. Vapor distillation apparatus with two disparate compressors
DE3425616A1 (de) * 1984-07-12 1986-01-23 Loewe Pumpenfabrik GmbH, 2120 Lüneburg Anordnung zur minimierung des kuehlfluessigkeitsverbrauches insbes. bei fluessigkeitsring-vakuumpumpen o.dgl.
US4699570A (en) * 1986-03-07 1987-10-13 Itt Industries, Inc Vacuum pump system
DE8807065U1 (de) * 1988-05-30 1989-09-28 Siemens AG, 1000 Berlin und 8000 München Auf einem transportablen Traggestell angeordnetes Vakuumpumpenaggregat
JPH0726623B2 (ja) * 1990-03-28 1995-03-29 日本碍子株式会社 真空ユニット
EP0524228A4 (en) 1990-04-10 1993-03-24 Spoutvac Manufacturing Pty. Ltd. Suction cleaning systems
JP2527137Y2 (ja) 1991-11-22 1997-02-26 株式会社トーツー創研 電話機用キャビネット
DE4234169A1 (de) 1992-10-12 1994-04-14 Leybold Ag Verfahren zum Betrieb einer trockenverdichteten Vakuumpumpe sowie für dieses Betriebsverfahren geeignete Vakuumpumpe
JP3941147B2 (ja) * 1997-02-27 2007-07-04 富士通株式会社 真空排気装置及びそのメンテナンス方法
JP2001207984A (ja) 1999-11-17 2001-08-03 Teijin Seiki Co Ltd 真空排気装置
DE10048439C2 (de) * 2000-09-29 2002-09-19 Siemens Ag Dampfturbinenanlage und Verfahren zum Betreiben einer Dampfturbinenanlage
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique
US6558131B1 (en) * 2001-06-29 2003-05-06 nash-elmo industries, l.l.c. Liquid ring pumps with automatic control of seal liquid injection
KR100876318B1 (ko) * 2001-09-06 2008-12-31 가부시키가이샤 아루박 진공배기장치 및 진공배기장치의 운전방법
DE10214331A1 (de) * 2002-03-28 2003-10-23 Nash Elmo Ind Gmbh Pumpeinrichtung, Verfahren zum Betreiben einer Pumpeinrichtung und dessen Verwendung bei einer Dampfturbinenanlage
JP2006507941A (ja) * 2002-11-13 2006-03-09 デカ プロダックツ リミテッド パートナーシップ 蒸気圧縮を用いた蒸留法
GB2407132A (en) * 2003-10-14 2005-04-20 Boc Group Plc Multiple vacuum pump system with additional pump for exhaust flow
GB0505852D0 (en) * 2005-03-22 2005-04-27 Boc Group Plc Method of treating a gas stream
JP2008088879A (ja) * 2006-09-29 2008-04-17 Anest Iwata Corp 真空排気装置
CN201193610Y (zh) * 2008-04-29 2009-02-11 无锡市四方真空设备有限公司 闭式循环罗茨泵水环泵真空机组
BRPI0822994A2 (pt) * 2008-08-11 2015-06-23 Metso Power Ab Método e sistema para tratamento de odores fétidos provenientes de uma instalação de polpa

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2527137B2 (ja) * 1992-03-13 1996-08-21 リーター・アウトマーティク・ゲゼルシャフト・ミット ベシュレンクテル・ハフツング 特に真空熱分解装置からの排気ガスを浄化するためのプロセス

Also Published As

Publication number Publication date
US11802562B2 (en) 2023-10-31
CN104066989B (zh) 2017-03-01
EP2791508B1 (de) 2019-03-06
KR20140107397A (ko) 2014-09-04
JP2015500944A (ja) 2015-01-08
US20150068399A1 (en) 2015-03-12
EP2791508A2 (de) 2014-10-22
JP6138144B2 (ja) 2017-05-31
US20200408211A1 (en) 2020-12-31
WO2013087713A3 (de) 2013-12-27
WO2013087713A2 (de) 2013-06-20
CN104066989A (zh) 2014-09-24

Similar Documents

Publication Publication Date Title
KR101935336B1 (ko) 체임버를 배기시키고 상기 체임버로부터 추출된 기체를 정화하는 장치 및 방법
EP2601413B1 (en) Exhaust system
KR101099854B1 (ko) 처리 진공 챔버로부터 가스를 배기하는 방법 및 진공 배기 장치
CN110709974B (zh) 用于将液体和固体流出物收集并随后反应成气体流出物的设备
TWI388729B (zh) 用於真空泵浦之前級預處理
US4655800A (en) Waste gas exhaust system for vacuum process apparatus
TW201833978A (zh) 用於前級固體形成量化的石英晶體微量天平的利用
JP2003062403A (ja) 膜脱気装置の運転方法
KR100821263B1 (ko) 수분리 냉각 장치를 구비한 플라즈마 스크러버 시스템 및이를 이용한 유해가스 처리방법
KR0160391B1 (ko) 반도체 제조설비의 폐가스 처리장치
CN110453199B (zh) 一种原子层沉积设备用工艺残余气体的过滤装置
GB2382788A (en) Process for preventing or removing deposits in the exhaust gas region of a vacuum installation
WO2022214154A1 (fr) Dispositif et procédé d'élimination des poussières, des fumées, des gaz et des vapeurs évacués dans l'environnement.
CN202387305U (zh) 尾气处理器循环水系统
CN216946610U (zh) 一种利用合成氨工艺冷凝液处理水环真空泵水垢的系统
JPH0650855A (ja) 排ガス除害装置の破過検知方法及び装置
US20250114740A1 (en) Compact scrubber for plasma abatement gas stream
CN107670337B (zh) 液体分离器及液体分离器的回抽控制方法
KR20000051830A (ko) 반도체 장비의 파우더 포집장치
KR20020044187A (ko) 반도체 제조장비의 이물질 제거장치
CN202387358U (zh) 尾气处理系统的循环水浴室
CN114929358A (zh) 废气中水分的处理系统
JPH09317645A (ja) 真空排気システム
KR20150094534A (ko) 보조진공수단이 구비된 공정설비용 배기라인

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

PX0701 Decision of registration after re-examination

St.27 status event code: A-3-4-F10-F13-rex-PX0701

X701 Decision to grant (after re-examination)
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 8