KR101921840B1 - 기판 국소의 자동 분석장치 및 분석방법 - Google Patents

기판 국소의 자동 분석장치 및 분석방법 Download PDF

Info

Publication number
KR101921840B1
KR101921840B1 KR1020177003062A KR20177003062A KR101921840B1 KR 101921840 B1 KR101921840 B1 KR 101921840B1 KR 1020177003062 A KR1020177003062 A KR 1020177003062A KR 20177003062 A KR20177003062 A KR 20177003062A KR 101921840 B1 KR101921840 B1 KR 101921840B1
Authority
KR
South Korea
Prior art keywords
analysis
nozzle
analytical
liquid
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020177003062A
Other languages
English (en)
Korean (ko)
Other versions
KR20170028403A (ko
Inventor
가츠히코 가와바타
다츠야 이치노세
도시히코 이마이
Original Assignee
가부시키가이샤 이아스
신에쯔 한도타이 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 이아스, 신에쯔 한도타이 가부시키가이샤 filed Critical 가부시키가이샤 이아스
Publication of KR20170028403A publication Critical patent/KR20170028403A/ko
Application granted granted Critical
Publication of KR101921840B1 publication Critical patent/KR101921840B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/02—Burettes; Pipettes
    • B01L3/021—Pipettes, i.e. with only one conduit for withdrawing and redistributing liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/02—Burettes; Pipettes
    • B01L3/0241—Drop counters; Drop formers
    • B01L3/0262—Drop counters; Drop formers using touch-off at substrate or container
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/02—Burettes; Pipettes
    • B01L3/0289—Apparatus for withdrawing or distributing predetermined quantities of fluid
    • B01L3/0293—Apparatus for withdrawing or distributing predetermined quantities of fluid for liquids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622—Ion mobility spectrometry
    • G01N27/623—Ion mobility spectrometry combined with mass spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1002—Reagent dispensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1009—Characterised by arrangements for controlling the aspiration or dispense of liquids
    • G01N35/1016—Control of the volume dispensed or introduced
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1095—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices for supplying the samples to flow-through analysers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/06—Fluid handling related problems
    • B01L2200/0684—Venting, avoiding backpressure, avoid gas bubbles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/08—Ergonomic or safety aspects of handling devices
    • B01L2200/082—Handling hazardous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/02—Drop detachment mechanisms of single droplets from nozzles or pins
    • B01L2400/022—Drop detachment mechanisms of single droplets from nozzles or pins droplet contacts the surface of the receptacle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/02—Burettes; Pipettes
    • B01L3/0203—Burettes, i.e. for withdrawing and redistributing liquids through different conduits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0431—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples
    • H01J49/0445—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples with means for introducing as a spray, a jet or an aerosol
    • H01J49/045—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples with means for introducing as a spray, a jet or an aerosol with means for using a nebulising gas, i.e. pneumatically assisted
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Clinical Laboratory Science (AREA)
  • Electrochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Dispersion Chemistry (AREA)
  • Molecular Biology (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020177003062A 2014-08-20 2015-07-21 기판 국소의 자동 분석장치 및 분석방법 Expired - Fee Related KR101921840B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-167171 2014-08-20
JP2014167171A JP5971289B2 (ja) 2014-08-20 2014-08-20 基板局所の自動分析装置及び分析方法
PCT/JP2015/070681 WO2016027607A1 (ja) 2014-08-20 2015-07-21 基板局所の自動分析装置及び分析方法

Publications (2)

Publication Number Publication Date
KR20170028403A KR20170028403A (ko) 2017-03-13
KR101921840B1 true KR101921840B1 (ko) 2018-11-23

Family

ID=55350553

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177003062A Expired - Fee Related KR101921840B1 (ko) 2014-08-20 2015-07-21 기판 국소의 자동 분석장치 및 분석방법

Country Status (7)

Country Link
US (1) US10151727B2 (enExample)
EP (1) EP3184985B1 (enExample)
JP (1) JP5971289B2 (enExample)
KR (1) KR101921840B1 (enExample)
CN (1) CN106662507B (enExample)
TW (1) TWI677681B (enExample)
WO (1) WO2016027607A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6108367B1 (ja) * 2015-12-22 2017-04-05 株式会社 イアス シリコン基板用分析装置
US10998179B2 (en) * 2016-10-14 2021-05-04 Dh Technologies Development Pte. Ltd. Methods and systems for increasing sensitivity of direct sampling interfaces for mass spectrometric analysis
CN109791097B (zh) * 2017-07-18 2022-01-04 埃耶士株式会社 基板分析用管嘴及基板分析方法
CN107505382A (zh) * 2017-09-19 2017-12-22 同方威视技术股份有限公司 自动标定装置和离子迁移谱仪
US11244841B2 (en) 2017-12-01 2022-02-08 Elemental Scientific, Inc. Systems for integrated decomposition and scanning of a semiconducting wafer
CN108181374A (zh) * 2018-02-08 2018-06-19 聚光科技(杭州)股份有限公司 等离子体-质谱分析系统的工作方法
CN111954801B (zh) * 2018-05-04 2023-12-01 应用材料公司 用于处理腔室的纳米颗粒测量
US11211272B2 (en) 2019-09-25 2021-12-28 Micron Technology, Inc. Contaminant detection tools and related methods
CN115398615B (zh) 2020-04-16 2026-07-17 基础科学公司 用于半导体晶圆的集成分解和扫描的系统
US12531225B2 (en) 2020-05-22 2026-01-20 Dh Technologies Development Pte. Ltd. Overflow sensor for open port sampling probe
CN115668441A (zh) 2020-05-22 2023-01-31 Dh科技发展私人贸易有限公司 用于开放端口采样探头的高流速冲洗
KR102223660B1 (ko) * 2020-10-06 2021-03-05 주식회사 위드텍 웨이퍼 표면의 오염물 샘플링 노즐 및 샘플링 방법.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011128033A (ja) * 2009-12-18 2011-06-30 Ias Inc 基板分析用ノズル及び基板分析方法
JP2011232182A (ja) 2010-04-28 2011-11-17 Ias Inc 基板分析装置及び基板分析方法
JP2012519847A (ja) 2009-03-05 2012-08-30 ユーティバトル・エルエルシイ 試料を形成して被分析面から吸引する方法及びそのためのシステム

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283498A (ja) * 1991-11-12 1993-10-29 Matsushita Electric Ind Co Ltd 半導体基板表面不純物回収装置およびその使用方法
JP3179175B2 (ja) * 1992-03-12 2001-06-25 株式会社ピュアレックス 分析前処理方法
US5783939A (en) * 1996-07-26 1998-07-21 Delco Electronics Corporation Stepper motor gauge calibration by AC feedback
US5783938A (en) * 1997-02-24 1998-07-21 Contamination Studies Laboratories, Inc. Method and apparatus for the quantitative measurement of the corrosivity effect of residues present on the surface of electronic circuit assemblies
US6420275B1 (en) * 1999-08-30 2002-07-16 Micron Technology, Inc. System and method for analyzing a semiconductor surface
JP2002039927A (ja) 2000-07-19 2002-02-06 Toshiba Ceramics Co Ltd シリコンウェーハ表層の部分分析方法
GB0104675D0 (en) * 2001-02-24 2001-04-11 Dyson Ltd A tool for a vacuum cleaner
JP3800996B2 (ja) 2001-06-29 2006-07-26 株式会社三井化学分析センター 基板表面の局所分析方法
US6803566B2 (en) 2002-04-16 2004-10-12 Ut-Battelle, Llc Sampling probe for microarray read out using electrospray mass spectrometry
CN1278403C (zh) * 2003-04-08 2006-10-04 力晶半导体股份有限公司 晶圆表面离子取样系统及方法
JP4496202B2 (ja) 2006-11-27 2010-07-07 株式会社 イアス ノズルおよび液体回収方法
TWI529833B (zh) * 2009-12-18 2016-04-11 埃耶士股份有限公司 基板分析裝置及基板分析方法
WO2011140492A2 (en) * 2010-05-07 2011-11-10 Ut-Battelle, Llc System and method for extracting a sample from a surface
US8486703B2 (en) * 2010-09-30 2013-07-16 Ut-Battelle, Llc Surface sampling concentration and reaction probe
US8519330B2 (en) * 2010-10-01 2013-08-27 Ut-Battelle, Llc Systems and methods for laser assisted sample transfer to solution for chemical analysis
JP5442589B2 (ja) 2010-12-22 2014-03-12 ジルトロニック アクチエンゲゼルシャフト シリコンウェハの金属不純物分析方法
CN102194726A (zh) * 2011-05-23 2011-09-21 叶伟清 晶圆表面局部定位采样方法
JP5881166B2 (ja) * 2012-06-14 2016-03-09 株式会社 イアス 基板分析用ノズル
US9176028B2 (en) * 2012-10-04 2015-11-03 Ut-Battelle, Llc Ball assisted device for analytical surface sampling

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012519847A (ja) 2009-03-05 2012-08-30 ユーティバトル・エルエルシイ 試料を形成して被分析面から吸引する方法及びそのためのシステム
JP2011128033A (ja) * 2009-12-18 2011-06-30 Ias Inc 基板分析用ノズル及び基板分析方法
JP2011232182A (ja) 2010-04-28 2011-11-17 Ias Inc 基板分析装置及び基板分析方法

Also Published As

Publication number Publication date
CN106662507A (zh) 2017-05-10
JP2016044988A (ja) 2016-04-04
WO2016027607A1 (ja) 2016-02-25
EP3184985A4 (en) 2018-04-25
TW201614234A (en) 2016-04-16
KR20170028403A (ko) 2017-03-13
US10151727B2 (en) 2018-12-11
TWI677681B (zh) 2019-11-21
US20170160233A1 (en) 2017-06-08
EP3184985B1 (en) 2023-04-12
EP3184985A1 (en) 2017-06-28
JP5971289B2 (ja) 2016-08-17
CN106662507B (zh) 2019-09-13

Similar Documents

Publication Publication Date Title
KR20170028403A (ko) 기판 국소의 자동 분석장치 및 분석방법
TWI919483B (zh) 用於傳輸樣品之系統
KR102608219B1 (ko) 액체 샘플 수집을 위한 시스템
KR102626747B1 (ko) Icpms 매트릭스 오프셋 캘리브레이션을 위한 시스템 및 방법
US10921295B2 (en) Automated system for detection of silicon species in phosphoric acid
JP6418586B1 (ja) 基板分析用ノズル及び基板分析方法
US6749715B2 (en) System and method for analyzing a semiconductor surface
US20240136168A1 (en) Methods and Apparatus for Washing Sampling Probe for Use in Mass Spectrometry Systems
CN1675530A (zh) 抽吸和稀释样本的方法和设备
KR20130140560A (ko) 기판 분석용 노즐
CN100394181C (zh) 分离设备
CN1675534A (zh) 使用气溶胶样品输运的远程分析
KR101368485B1 (ko) 초순수용액 온라인 모니터링 시스템
KR101547167B1 (ko) 가스 시료의 메탈에 대한 온라인 모니터링 시스템
KR20170011805A (ko) 반도체 제조를 위한 입자 분석 시스템 및 이를 이용하는 방법
KR20050018649A (ko) 에어로졸 샘플 운반을 이용한 원격 분석
KR20040031099A (ko) 액체 유량 측정 방법 및 장치

Legal Events

Date Code Title Description
A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20241120

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

H13 Ip right lapsed

Free format text: ST27 STATUS EVENT CODE: N-4-6-H10-H13-OTH-PC1903 (AS PROVIDED BY THE NATIONAL OFFICE); TERMINATION CATEGORY : DEFAULT_OF_REGISTRATION_FEE

Effective date: 20241120

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20241120