KR101911588B1 - 임프린트 방법 및 임프린트 장치 - Google Patents

임프린트 방법 및 임프린트 장치 Download PDF

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KR101911588B1
KR101911588B1 KR1020157007709A KR20157007709A KR101911588B1 KR 101911588 B1 KR101911588 B1 KR 101911588B1 KR 1020157007709 A KR1020157007709 A KR 1020157007709A KR 20157007709 A KR20157007709 A KR 20157007709A KR 101911588 B1 KR101911588 B1 KR 101911588B1
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South Korea
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template
clean air
sent
space portion
photocurable resin
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KR20150065685A (ko
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히로카즈 오다
다카하루 나가이
사부로 하라다
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다이니폰 인사츠 가부시키가이샤
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020157007709A 2012-10-04 2013-10-03 임프린트 방법 및 임프린트 장치 Active KR101911588B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012221893 2012-10-04
JPJP-P-2012-221893 2012-10-04
PCT/JP2013/076973 WO2014054749A1 (ja) 2012-10-04 2013-10-03 インプリント方法およびインプリント装置

Related Child Applications (1)

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KR1020167017546A Division KR101808474B1 (ko) 2012-10-04 2013-10-03 임프린트 방법

Publications (2)

Publication Number Publication Date
KR20150065685A KR20150065685A (ko) 2015-06-15
KR101911588B1 true KR101911588B1 (ko) 2018-10-24

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KR1020157007709A Active KR101911588B1 (ko) 2012-10-04 2013-10-03 임프린트 방법 및 임프린트 장치
KR1020167017546A Active KR101808474B1 (ko) 2012-10-04 2013-10-03 임프린트 방법

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KR1020167017546A Active KR101808474B1 (ko) 2012-10-04 2013-10-03 임프린트 방법

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US (2) US10279538B2 (enExample)
JP (2) JP5716876B2 (enExample)
KR (2) KR101911588B1 (enExample)
TW (3) TWI667146B (enExample)
WO (1) WO2014054749A1 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI667146B (zh) * 2012-10-04 2019-08-01 日商大日本印刷股份有限公司 壓印方法
JP5804160B2 (ja) * 2013-09-19 2015-11-04 大日本印刷株式会社 インプリント方法およびインプリントモールドの製造方法
KR102545684B1 (ko) 2014-04-22 2023-06-20 에베 그룹 에. 탈너 게엠베하 나노구조를 엠보싱하기 위한 방법 및 장치
JP6420571B2 (ja) * 2014-06-13 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP5954644B2 (ja) * 2014-10-01 2016-07-20 大日本印刷株式会社 インプリント装置、インプリント方法およびインプリント装置の制御方法
WO2016052345A1 (ja) * 2014-10-01 2016-04-07 大日本印刷株式会社 インプリント装置、インプリント方法およびインプリント装置の制御方法
JP6025079B2 (ja) * 2014-10-07 2016-11-16 大日本印刷株式会社 インプリント装置およびその制御方法
JP6525572B2 (ja) * 2014-12-05 2019-06-05 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6628491B2 (ja) 2015-04-13 2020-01-08 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6768368B2 (ja) * 2015-09-08 2020-10-14 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6566843B2 (ja) * 2015-11-12 2019-08-28 キヤノン株式会社 パターン形成方法、インプリントシステムおよび物品製造方法
US11104057B2 (en) * 2015-12-11 2021-08-31 Canon Kabushiki Kaisha Imprint apparatus and method of imprinting a partial field
JP6700771B2 (ja) * 2015-12-16 2020-05-27 キヤノン株式会社 インプリント装置、及び物品の製造方法
JP6655988B2 (ja) * 2015-12-25 2020-03-04 キヤノン株式会社 インプリント装置の調整方法、インプリント方法および物品製造方法
JP6702753B2 (ja) * 2016-02-17 2020-06-03 キヤノン株式会社 リソグラフィ装置、及び物品の製造方法
JP6643135B2 (ja) * 2016-02-17 2020-02-12 キヤノン株式会社 リソグラフィ装置および物品製造方法
JP6808386B2 (ja) * 2016-07-12 2021-01-06 キヤノン株式会社 インプリント装置および物品製造方法
JP6742189B2 (ja) * 2016-08-04 2020-08-19 キヤノン株式会社 インプリント装置、及び物品製造方法
JP2018163946A (ja) * 2017-03-24 2018-10-18 東芝メモリ株式会社 インプリント装置およびインプリント方法
US11681216B2 (en) * 2017-08-25 2023-06-20 Canon Kabushiki Kaisha Imprint apparatus, imprint method, article manufacturing method, molding apparatus, and molding method
US10895806B2 (en) * 2017-09-29 2021-01-19 Canon Kabushiki Kaisha Imprinting method and apparatus
EP4183554B1 (en) * 2018-12-11 2024-10-02 IO Tech Group, Ltd. Method for preventing oxygen inhibition of a light-initiated polymerization reaction in a 3d printing system using inert gas

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006013401A (ja) 2004-06-29 2006-01-12 Canon Inc 微細加工装置
JP2007509769A (ja) 2003-10-02 2007-04-19 モレキュラー・インプリンツ・インコーポレーテッド 単一位相流体インプリント・リソグラフィ法
US20110038977A1 (en) * 2009-08-13 2011-02-17 Yong Zheng Vertical Molding Machine
JP2012049471A (ja) * 2010-08-30 2012-03-08 Canon Inc インプリント装置及び物品の製造方法
JP2012186390A (ja) 2011-03-07 2012-09-27 Canon Inc インプリント装置および物品の製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020057749A (ko) * 2001-01-06 2002-07-12 윤종용 필터 미디엄과 필터 그리고 필터를 갖는 공기 제공 장치및 케미컬 제공 장치
JP2002359180A (ja) * 2001-06-01 2002-12-13 Toshiba Corp ガス循環システム
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
JP5121549B2 (ja) * 2008-04-21 2013-01-16 株式会社東芝 ナノインプリント方法
US8105522B2 (en) * 2008-10-29 2012-01-31 Eaton Corporation Compression mold and molding process
NL2004932A (en) * 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography template.
NL2004685A (en) 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography apparatus and method.
JP5364533B2 (ja) 2009-10-28 2013-12-11 株式会社東芝 インプリントシステムおよびインプリント方法
JP5189114B2 (ja) * 2010-01-29 2013-04-24 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US20110272838A1 (en) * 2010-05-06 2011-11-10 Matt Malloy Apparatus, System, and Method for Nanoimprint Template with a Backside Recess Having Tapered Sidewalls
JP5489887B2 (ja) * 2010-06-30 2014-05-14 富士フイルム株式会社 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
JP5657998B2 (ja) * 2010-10-29 2015-01-21 芝浦メカトロニクス株式会社 液滴塗布装置及び液滴塗布方法
JP2012099729A (ja) * 2010-11-04 2012-05-24 Toshiba Corp テンプレート、テンプレートの形成方法及び半導体装置の製造方法
JP2013251462A (ja) * 2012-06-01 2013-12-12 Canon Inc インプリント装置、および、物品の製造方法
TWI667146B (zh) * 2012-10-04 2019-08-01 日商大日本印刷股份有限公司 壓印方法
JP2015179771A (ja) * 2014-03-19 2015-10-08 キヤノン株式会社 インプリント装置、および物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007509769A (ja) 2003-10-02 2007-04-19 モレキュラー・インプリンツ・インコーポレーテッド 単一位相流体インプリント・リソグラフィ法
JP2006013401A (ja) 2004-06-29 2006-01-12 Canon Inc 微細加工装置
US20110038977A1 (en) * 2009-08-13 2011-02-17 Yong Zheng Vertical Molding Machine
JP2012049471A (ja) * 2010-08-30 2012-03-08 Canon Inc インプリント装置及び物品の製造方法
JP2012186390A (ja) 2011-03-07 2012-09-27 Canon Inc インプリント装置および物品の製造方法

Also Published As

Publication number Publication date
JPWO2014054749A1 (ja) 2016-08-25
TW201420363A (zh) 2014-06-01
TWI667146B (zh) 2019-08-01
JP5716876B2 (ja) 2015-05-13
WO2014054749A1 (ja) 2014-04-10
US20190210269A1 (en) 2019-07-11
US10279538B2 (en) 2019-05-07
TWI609763B (zh) 2018-01-01
JP2015046605A (ja) 2015-03-12
TW201836861A (zh) 2018-10-16
US20150224703A1 (en) 2015-08-13
TWI628081B (zh) 2018-07-01
KR101808474B1 (ko) 2017-12-12
US10960598B2 (en) 2021-03-30
KR20160084483A (ko) 2016-07-13
JP6115538B2 (ja) 2017-04-19
KR20150065685A (ko) 2015-06-15
TW201726430A (zh) 2017-08-01

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