TWI667146B - 壓印方法 - Google Patents
壓印方法 Download PDFInfo
- Publication number
- TWI667146B TWI667146B TW107118753A TW107118753A TWI667146B TW I667146 B TWI667146 B TW I667146B TW 107118753 A TW107118753 A TW 107118753A TW 107118753 A TW107118753 A TW 107118753A TW I667146 B TWI667146 B TW I667146B
- Authority
- TW
- Taiwan
- Prior art keywords
- transfer
- photocurable resin
- dust
- template
- transferred
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 78
- 229920005989 resin Polymers 0.000 claims abstract description 173
- 239000011347 resin Substances 0.000 claims abstract description 173
- 239000000758 substrate Substances 0.000 claims abstract description 107
- 238000004049 embossing Methods 0.000 claims abstract description 17
- 238000007639 printing Methods 0.000 claims description 4
- 230000003749 cleanliness Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 109
- 238000007664 blowing Methods 0.000 description 43
- 239000011248 coating agent Substances 0.000 description 30
- 238000000576 coating method Methods 0.000 description 30
- 230000008859 change Effects 0.000 description 13
- 239000000428 dust Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- 238000005192 partition Methods 0.000 description 6
- MSSNHSVIGIHOJA-UHFFFAOYSA-N pentafluoropropane Chemical compound FC(F)CC(F)(F)F MSSNHSVIGIHOJA-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000001127 nanoimprint lithography Methods 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002920 hazardous waste Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/002—Component parts, details or accessories; Auxiliary operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012221893 | 2012-10-04 | ||
| JP2012-221893 | 2012-10-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201836861A TW201836861A (zh) | 2018-10-16 |
| TWI667146B true TWI667146B (zh) | 2019-08-01 |
Family
ID=50435068
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102135954A TWI609763B (zh) | 2012-10-04 | 2013-10-03 | 壓印方法及壓印裝置 |
| TW107118753A TWI667146B (zh) | 2012-10-04 | 2013-10-03 | 壓印方法 |
| TW106111722A TWI628081B (zh) | 2012-10-04 | 2013-10-03 | 壓印方法及壓印裝置 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102135954A TWI609763B (zh) | 2012-10-04 | 2013-10-03 | 壓印方法及壓印裝置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106111722A TWI628081B (zh) | 2012-10-04 | 2013-10-03 | 壓印方法及壓印裝置 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US10279538B2 (enExample) |
| JP (2) | JP5716876B2 (enExample) |
| KR (2) | KR101808474B1 (enExample) |
| TW (3) | TWI609763B (enExample) |
| WO (1) | WO2014054749A1 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI609763B (zh) * | 2012-10-04 | 2018-01-01 | 大日本印刷股份有限公司 | 壓印方法及壓印裝置 |
| JP5804160B2 (ja) * | 2013-09-19 | 2015-11-04 | 大日本印刷株式会社 | インプリント方法およびインプリントモールドの製造方法 |
| JP6391709B2 (ja) | 2014-04-22 | 2018-09-19 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | ナノ構造を型押しする方法及び装置 |
| JP6420571B2 (ja) * | 2014-06-13 | 2018-11-07 | キヤノン株式会社 | インプリント装置、インプリント方法及び物品の製造方法 |
| WO2016052345A1 (ja) * | 2014-10-01 | 2016-04-07 | 大日本印刷株式会社 | インプリント装置、インプリント方法およびインプリント装置の制御方法 |
| JP5954644B2 (ja) * | 2014-10-01 | 2016-07-20 | 大日本印刷株式会社 | インプリント装置、インプリント方法およびインプリント装置の制御方法 |
| JP6025079B2 (ja) * | 2014-10-07 | 2016-11-16 | 大日本印刷株式会社 | インプリント装置およびその制御方法 |
| JP6525572B2 (ja) * | 2014-12-05 | 2019-06-05 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
| JP6628491B2 (ja) * | 2015-04-13 | 2020-01-08 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品の製造方法 |
| JP6768368B2 (ja) * | 2015-09-08 | 2020-10-14 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
| JP6566843B2 (ja) * | 2015-11-12 | 2019-08-28 | キヤノン株式会社 | パターン形成方法、インプリントシステムおよび物品製造方法 |
| US11104057B2 (en) * | 2015-12-11 | 2021-08-31 | Canon Kabushiki Kaisha | Imprint apparatus and method of imprinting a partial field |
| JP6700771B2 (ja) * | 2015-12-16 | 2020-05-27 | キヤノン株式会社 | インプリント装置、及び物品の製造方法 |
| JP6655988B2 (ja) * | 2015-12-25 | 2020-03-04 | キヤノン株式会社 | インプリント装置の調整方法、インプリント方法および物品製造方法 |
| JP6702753B2 (ja) * | 2016-02-17 | 2020-06-03 | キヤノン株式会社 | リソグラフィ装置、及び物品の製造方法 |
| JP6643135B2 (ja) * | 2016-02-17 | 2020-02-12 | キヤノン株式会社 | リソグラフィ装置および物品製造方法 |
| JP6808386B2 (ja) * | 2016-07-12 | 2021-01-06 | キヤノン株式会社 | インプリント装置および物品製造方法 |
| JP6742189B2 (ja) * | 2016-08-04 | 2020-08-19 | キヤノン株式会社 | インプリント装置、及び物品製造方法 |
| JP2018163946A (ja) * | 2017-03-24 | 2018-10-18 | 東芝メモリ株式会社 | インプリント装置およびインプリント方法 |
| US11681216B2 (en) * | 2017-08-25 | 2023-06-20 | Canon Kabushiki Kaisha | Imprint apparatus, imprint method, article manufacturing method, molding apparatus, and molding method |
| US10895806B2 (en) * | 2017-09-29 | 2021-01-19 | Canon Kabushiki Kaisha | Imprinting method and apparatus |
| US11203154B2 (en) * | 2018-12-11 | 2021-12-21 | Io Tech Group Ltd. | Systems and methods for preventing oxygen inhibition of a light-initiated polymerization reaction in a 3D printing system using inert gas |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090267267A1 (en) * | 2008-04-21 | 2009-10-29 | Ikuo Yoneda | Imprint method |
| US20110038977A1 (en) * | 2009-08-13 | 2011-02-17 | Yong Zheng | Vertical Molding Machine |
| US20120228789A1 (en) * | 2011-03-07 | 2012-09-13 | Canon Kabushiki Kaisha | Imprint apparatus and article manufacturing method |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020057749A (ko) * | 2001-01-06 | 2002-07-12 | 윤종용 | 필터 미디엄과 필터 그리고 필터를 갖는 공기 제공 장치및 케미컬 제공 장치 |
| JP2002359180A (ja) * | 2001-06-01 | 2002-12-13 | Toshiba Corp | ガス循環システム |
| US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
| JP2006013401A (ja) | 2004-06-29 | 2006-01-12 | Canon Inc | 微細加工装置 |
| US7418902B2 (en) * | 2005-05-31 | 2008-09-02 | Asml Netherlands B.V. | Imprint lithography including alignment |
| US7377764B2 (en) | 2005-06-13 | 2008-05-27 | Asml Netherlands B.V. | Imprint lithography |
| US8105522B2 (en) * | 2008-10-29 | 2012-01-31 | Eaton Corporation | Compression mold and molding process |
| NL2004685A (en) | 2009-07-27 | 2011-01-31 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| NL2004932A (en) * | 2009-07-27 | 2011-01-31 | Asml Netherlands Bv | Imprint lithography template. |
| JP5364533B2 (ja) | 2009-10-28 | 2013-12-11 | 株式会社東芝 | インプリントシステムおよびインプリント方法 |
| JP5189114B2 (ja) * | 2010-01-29 | 2013-04-24 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
| US20110272838A1 (en) | 2010-05-06 | 2011-11-10 | Matt Malloy | Apparatus, System, and Method for Nanoimprint Template with a Backside Recess Having Tapered Sidewalls |
| JP5489887B2 (ja) * | 2010-06-30 | 2014-05-14 | 富士フイルム株式会社 | 液体塗布装置及び液体塗布方法並びにナノインプリントシステム |
| JP5539113B2 (ja) | 2010-08-30 | 2014-07-02 | キヤノン株式会社 | インプリント装置及び物品の製造方法 |
| JP5657998B2 (ja) | 2010-10-29 | 2015-01-21 | 芝浦メカトロニクス株式会社 | 液滴塗布装置及び液滴塗布方法 |
| JP2012099729A (ja) * | 2010-11-04 | 2012-05-24 | Toshiba Corp | テンプレート、テンプレートの形成方法及び半導体装置の製造方法 |
| JP2013251462A (ja) * | 2012-06-01 | 2013-12-12 | Canon Inc | インプリント装置、および、物品の製造方法 |
| TWI609763B (zh) * | 2012-10-04 | 2018-01-01 | 大日本印刷股份有限公司 | 壓印方法及壓印裝置 |
| JP2015179771A (ja) * | 2014-03-19 | 2015-10-08 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
-
2013
- 2013-10-03 TW TW102135954A patent/TWI609763B/zh active
- 2013-10-03 KR KR1020167017546A patent/KR101808474B1/ko active Active
- 2013-10-03 US US14/431,592 patent/US10279538B2/en active Active
- 2013-10-03 KR KR1020157007709A patent/KR101911588B1/ko active Active
- 2013-10-03 TW TW107118753A patent/TWI667146B/zh active
- 2013-10-03 JP JP2014539825A patent/JP5716876B2/ja active Active
- 2013-10-03 TW TW106111722A patent/TWI628081B/zh active
- 2013-10-03 WO PCT/JP2013/076973 patent/WO2014054749A1/ja not_active Ceased
-
2014
- 2014-09-30 JP JP2014199671A patent/JP6115538B2/ja active Active
-
2019
- 2019-03-18 US US16/356,710 patent/US10960598B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090267267A1 (en) * | 2008-04-21 | 2009-10-29 | Ikuo Yoneda | Imprint method |
| US20110038977A1 (en) * | 2009-08-13 | 2011-02-17 | Yong Zheng | Vertical Molding Machine |
| US20120228789A1 (en) * | 2011-03-07 | 2012-09-13 | Canon Kabushiki Kaisha | Imprint apparatus and article manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| US20190210269A1 (en) | 2019-07-11 |
| TW201726430A (zh) | 2017-08-01 |
| KR20160084483A (ko) | 2016-07-13 |
| TWI628081B (zh) | 2018-07-01 |
| WO2014054749A1 (ja) | 2014-04-10 |
| JP2015046605A (ja) | 2015-03-12 |
| TW201420363A (zh) | 2014-06-01 |
| KR101911588B1 (ko) | 2018-10-24 |
| US10279538B2 (en) | 2019-05-07 |
| US20150224703A1 (en) | 2015-08-13 |
| KR20150065685A (ko) | 2015-06-15 |
| TW201836861A (zh) | 2018-10-16 |
| JPWO2014054749A1 (ja) | 2016-08-25 |
| KR101808474B1 (ko) | 2017-12-12 |
| JP6115538B2 (ja) | 2017-04-19 |
| JP5716876B2 (ja) | 2015-05-13 |
| TWI609763B (zh) | 2018-01-01 |
| US10960598B2 (en) | 2021-03-30 |
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