KR101863987B1 - 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법 및 물품의 제조 방법 Download PDF

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KR101863987B1
KR101863987B1 KR1020140069912A KR20140069912A KR101863987B1 KR 101863987 B1 KR101863987 B1 KR 101863987B1 KR 1020140069912 A KR1020140069912 A KR 1020140069912A KR 20140069912 A KR20140069912 A KR 20140069912A KR 101863987 B1 KR101863987 B1 KR 101863987B1
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South Korea
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mold
substrate
contact
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target area
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Korean (ko)
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KR20140147015A (ko
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겐지 야마모토
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캐논 가부시끼가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020140069912A 2013-06-18 2014-06-10 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 Active KR101863987B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013127986A JP6271875B2 (ja) 2013-06-18 2013-06-18 インプリント装置、インプリント方法および物品の製造方法
JPJP-P-2013-127986 2013-06-18

Related Child Applications (1)

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KR1020180060464A Division KR101981006B1 (ko) 2013-06-18 2018-05-28 임프린트 장치, 임프린트 방법 및 물품의 제조 방법

Publications (2)

Publication Number Publication Date
KR20140147015A KR20140147015A (ko) 2014-12-29
KR101863987B1 true KR101863987B1 (ko) 2018-07-04

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KR1020140069912A Active KR101863987B1 (ko) 2013-06-18 2014-06-10 임프린트 장치, 임프린트 방법 및 물품의 제조 방법
KR1020180060464A Active KR101981006B1 (ko) 2013-06-18 2018-05-28 임프린트 장치, 임프린트 방법 및 물품의 제조 방법

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KR1020180060464A Active KR101981006B1 (ko) 2013-06-18 2018-05-28 임프린트 장치, 임프린트 방법 및 물품의 제조 방법

Country Status (4)

Country Link
US (1) US9971256B2 (https=)
JP (1) JP6271875B2 (https=)
KR (2) KR101863987B1 (https=)
CN (2) CN109062004B (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6333039B2 (ja) 2013-05-16 2018-05-30 キヤノン株式会社 インプリント装置、デバイス製造方法およびインプリント方法
JP6315904B2 (ja) * 2013-06-28 2018-04-25 キヤノン株式会社 インプリント方法、インプリント装置及びデバイスの製造方法
JP6138189B2 (ja) 2015-04-08 2017-05-31 キヤノン株式会社 インプリント装置および物品の製造方法
JP6726987B2 (ja) * 2016-03-17 2020-07-22 キヤノン株式会社 インプリント装置および物品製造方法
JP7060961B2 (ja) * 2018-01-05 2022-04-27 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
JP7116552B2 (ja) * 2018-02-13 2022-08-10 キヤノン株式会社 インプリント装置、および、物品製造方法
JP7134717B2 (ja) * 2018-05-31 2022-09-12 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
JP7278135B2 (ja) * 2019-04-02 2023-05-19 キヤノン株式会社 インプリント装置および物品製造方法
JP7433861B2 (ja) * 2019-11-27 2024-02-20 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、基板、および、型
WO2022027925A1 (zh) * 2020-08-05 2022-02-10 上海鲲游光电科技有限公司 一体成型的树脂匀光元件和doe及其制造方法
US12124165B2 (en) * 2021-10-25 2024-10-22 Canon Kabushiki Kaisha Apparatus and method for optimizing actuator forces
JP7759276B2 (ja) * 2022-02-16 2025-10-23 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2024011582A (ja) * 2022-07-15 2024-01-25 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP2024087500A (ja) 2022-12-19 2024-07-01 キオクシア株式会社 インプリント装置、パターン形成方法、及び半導体装置の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101087365B1 (ko) * 2009-06-05 2011-11-25 가부시끼가이샤 도시바 패턴 형성 장치 및 패턴 형성 방법
US20120091611A1 (en) * 2010-10-13 2012-04-19 Canon Kabushiki Kaisha Imprint method and apparatus
JP2012178470A (ja) * 2011-02-25 2012-09-13 Canon Inc インプリント装置及びデバイスの製造方法
KR101511411B1 (ko) * 2011-07-12 2015-04-17 캐논 가부시끼가이샤 임프린트 장치 및 물품 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006165371A (ja) 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
JP5662741B2 (ja) * 2009-09-30 2015-02-04 キヤノン株式会社 インプリント装置および物品の製造方法
EP2583813B1 (en) * 2010-06-16 2020-07-01 Asahi Kasei Kabushiki Kaisha Roller mold manufacturing device and manufacturing method
JP5864929B2 (ja) * 2011-07-15 2016-02-17 キヤノン株式会社 インプリント装置および物品の製造方法
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6140966B2 (ja) * 2011-10-14 2017-06-07 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6159072B2 (ja) * 2011-11-30 2017-07-05 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101087365B1 (ko) * 2009-06-05 2011-11-25 가부시끼가이샤 도시바 패턴 형성 장치 및 패턴 형성 방법
US20120091611A1 (en) * 2010-10-13 2012-04-19 Canon Kabushiki Kaisha Imprint method and apparatus
JP2012178470A (ja) * 2011-02-25 2012-09-13 Canon Inc インプリント装置及びデバイスの製造方法
KR101511411B1 (ko) * 2011-07-12 2015-04-17 캐논 가부시끼가이샤 임프린트 장치 및 물품 제조 방법

Also Published As

Publication number Publication date
KR20140147015A (ko) 2014-12-29
JP2015002344A (ja) 2015-01-05
CN104238263B (zh) 2018-09-14
CN104238263A (zh) 2014-12-24
KR101981006B1 (ko) 2019-05-21
US20140367874A1 (en) 2014-12-18
US9971256B2 (en) 2018-05-15
JP6271875B2 (ja) 2018-01-31
CN109062004A (zh) 2018-12-21
KR20180062449A (ko) 2018-06-08
CN109062004B (zh) 2022-03-29

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