KR101822099B1 - 고해상도 디스플레이들에 대한 ｍｅｍｓ 셔터 어셈블리들 - Google Patents

고해상도 디스플레이들에 대한 ｍｅｍｓ 셔터 어셈블리들 Download PDF

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Publication number
KR101822099B1
KR101822099B1 KR1020157027975A KR20157027975A KR101822099B1 KR 101822099 B1 KR101822099 B1 KR 101822099B1 KR 1020157027975 A KR1020157027975 A KR 1020157027975A KR 20157027975 A KR20157027975 A KR 20157027975A KR 101822099 B1 KR101822099 B1 KR 101822099B1
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South Korea
Prior art keywords
shutter
layer
implementations
substrate
anchor
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Korean (ko)
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KR20150128878A (ko
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티모시 제이. 브로스니한
자비어 빌라레알
마크 비. 안데르슨
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스냅트랙, 인코포레이티드
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0083—Optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0086—Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/04—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light by periodically varying the intensity of light, e.g. using choppers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/02—Diaphragms

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Micromachines (AREA)
KR1020157027975A 2013-03-13 2014-03-05 고해상도 디스플레이들에 대한 ｍｅｍｓ 셔터 어셈블리들 Expired - Fee Related KR101822099B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/800,459 2013-03-13
US13/800,459 US9632307B2 (en) 2013-03-13 2013-03-13 MEMS shutter assemblies for high-resolution displays
PCT/US2014/020796 WO2014164140A1 (en) 2013-03-13 2014-03-05 Mems shutter assemblies for high-resolution displays

Publications (2)

Publication Number Publication Date
KR20150128878A KR20150128878A (ko) 2015-11-18
KR101822099B1 true KR101822099B1 (ko) 2018-01-25

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157027975A Expired - Fee Related KR101822099B1 (ko) 2013-03-13 2014-03-05 고해상도 디스플레이들에 대한 ｍｅｍｓ 셔터 어셈블리들

Country Status (7)

Country Link
US (1) US9632307B2 (enExample)
EP (1) EP2972553A1 (enExample)
JP (1) JP6216032B2 (enExample)
KR (1) KR101822099B1 (enExample)
CN (1) CN105122115B (enExample)
TW (1) TWI518366B (enExample)
WO (1) WO2014164140A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
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US9134532B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. MEMS shutter assemblies for high-resolution displays
CN105467579B (zh) * 2016-02-03 2017-03-22 京东方科技集团股份有限公司 一种mems光阀、显示装置
US11460688B2 (en) * 2019-08-23 2022-10-04 Tohoku University Mirror device, scanning laser device and scanning laser display including same mirror device, and method for manufacturing mirror device
CN114690398A (zh) * 2020-12-30 2022-07-01 无锡华润上华科技有限公司 一种静电驱动式mems显示屏及其制备方法
US11659759B2 (en) * 2021-01-06 2023-05-23 Applied Materials, Inc. Method of making high resolution OLED fabricated with overlapped masks
CN116184741A (zh) * 2023-02-28 2023-05-30 维沃移动通信有限公司 可变光圈模组、摄像装置以及电子设备

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WO2012142849A1 (zh) 2011-04-18 2012-10-26 上海丽恒光微电子科技有限公司 具有mems光阀的显示装置及其形成方法

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JPH09218360A (ja) 1996-02-08 1997-08-19 Ricoh Co Ltd メカニカル光シャッタ
WO1999010775A1 (en) 1997-08-28 1999-03-04 Mems Optical Inc. System for controlling light including a micromachined foucault shutter array and a method of manufacturing the same
US6288824B1 (en) * 1998-11-03 2001-09-11 Alex Kastalsky Display device based on grating electromechanical shutter
JP2002040337A (ja) 2000-07-24 2002-02-06 Fuji Photo Film Co Ltd 光変調素子及びそれを用いた露光装置並びに平面表示装置
JP4383145B2 (ja) * 2003-10-31 2009-12-16 オプトレックス株式会社 ライトユニット
JP2005221917A (ja) 2004-02-09 2005-08-18 Fuji Photo Film Co Ltd 電気機械式光シャッター素子及び光シャッターアレイ
US7944599B2 (en) * 2004-09-27 2011-05-17 Qualcomm Mems Technologies, Inc. Electromechanical device with optical function separated from mechanical and electrical function
US20080158635A1 (en) * 2005-02-23 2008-07-03 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
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JP2010181495A (ja) 2009-02-03 2010-08-19 Seiko Epson Corp 光制御装置
WO2012142849A1 (zh) 2011-04-18 2012-10-26 上海丽恒光微电子科技有限公司 具有mems光阀的显示装置及其形成方法

Also Published As

Publication number Publication date
WO2014164140A1 (en) 2014-10-09
EP2972553A1 (en) 2016-01-20
KR20150128878A (ko) 2015-11-18
CN105122115B (zh) 2018-02-09
CN105122115A (zh) 2015-12-02
US9632307B2 (en) 2017-04-25
TWI518366B (zh) 2016-01-21
JP2016516215A (ja) 2016-06-02
TW201502574A (zh) 2015-01-16
JP6216032B2 (ja) 2017-10-18
US20140268272A1 (en) 2014-09-18

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