JP6216032B2 - 高解像度ディスプレイのためのｍｅｍｓシャッターアセンブリ - Google Patents

高解像度ディスプレイのためのｍｅｍｓシャッターアセンブリ Download PDF

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Publication number
JP6216032B2
JP6216032B2 JP2016500670A JP2016500670A JP6216032B2 JP 6216032 B2 JP6216032 B2 JP 6216032B2 JP 2016500670 A JP2016500670 A JP 2016500670A JP 2016500670 A JP2016500670 A JP 2016500670A JP 6216032 B2 JP6216032 B2 JP 6216032B2
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Prior art keywords
shutter
layer
shutter assembly
implementations
substrate
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Japanese (ja)
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JP2016516215A5 (enExample
JP2016516215A (ja
Inventor
ティモシー・ジェイ・ブロスニハン
ハヴィエル・ヴィラレアル
マーク・ビー・アンダーソン
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スナップトラック・インコーポレーテッド
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0083—Optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0086—Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/04—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light by periodically varying the intensity of light, e.g. using choppers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/02—Diaphragms

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Micromachines (AREA)
JP2016500670A 2013-03-13 2014-03-05 高解像度ディスプレイのためのｍｅｍｓシャッターアセンブリ Expired - Fee Related JP6216032B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/800,459 2013-03-13
US13/800,459 US9632307B2 (en) 2013-03-13 2013-03-13 MEMS shutter assemblies for high-resolution displays
PCT/US2014/020796 WO2014164140A1 (en) 2013-03-13 2014-03-05 Mems shutter assemblies for high-resolution displays

Publications (3)

Publication Number Publication Date
JP2016516215A JP2016516215A (ja) 2016-06-02
JP2016516215A5 JP2016516215A5 (enExample) 2017-09-07
JP6216032B2 true JP6216032B2 (ja) 2017-10-18

Family

ID=50390230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016500670A Expired - Fee Related JP6216032B2 (ja) 2013-03-13 2014-03-05 高解像度ディスプレイのためのｍｅｍｓシャッターアセンブリ

Country Status (7)

Country Link
US (1) US9632307B2 (enExample)
EP (1) EP2972553A1 (enExample)
JP (1) JP6216032B2 (enExample)
KR (1) KR101822099B1 (enExample)
CN (1) CN105122115B (enExample)
TW (1) TWI518366B (enExample)
WO (1) WO2014164140A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
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US9134532B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. MEMS shutter assemblies for high-resolution displays
CN105467579B (zh) * 2016-02-03 2017-03-22 京东方科技集团股份有限公司 一种mems光阀、显示装置
US11460688B2 (en) * 2019-08-23 2022-10-04 Tohoku University Mirror device, scanning laser device and scanning laser display including same mirror device, and method for manufacturing mirror device
CN114690398A (zh) * 2020-12-30 2022-07-01 无锡华润上华科技有限公司 一种静电驱动式mems显示屏及其制备方法
US11659759B2 (en) * 2021-01-06 2023-05-23 Applied Materials, Inc. Method of making high resolution OLED fabricated with overlapped masks
CN116184741A (zh) * 2023-02-28 2023-05-30 维沃移动通信有限公司 可变光圈模组、摄像装置以及电子设备

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US5062689A (en) 1990-08-21 1991-11-05 Koehler Dale R Electrostatically actuatable light modulating device
JPH09218360A (ja) 1996-02-08 1997-08-19 Ricoh Co Ltd メカニカル光シャッタ
WO1999010775A1 (en) 1997-08-28 1999-03-04 Mems Optical Inc. System for controlling light including a micromachined foucault shutter array and a method of manufacturing the same
US6288824B1 (en) * 1998-11-03 2001-09-11 Alex Kastalsky Display device based on grating electromechanical shutter
JP2002040337A (ja) 2000-07-24 2002-02-06 Fuji Photo Film Co Ltd 光変調素子及びそれを用いた露光装置並びに平面表示装置
JP4383145B2 (ja) * 2003-10-31 2009-12-16 オプトレックス株式会社 ライトユニット
JP2005221917A (ja) 2004-02-09 2005-08-18 Fuji Photo Film Co Ltd 電気機械式光シャッター素子及び光シャッターアレイ
US7944599B2 (en) * 2004-09-27 2011-05-17 Qualcomm Mems Technologies, Inc. Electromechanical device with optical function separated from mechanical and electrical function
US20080158635A1 (en) * 2005-02-23 2008-07-03 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US7271945B2 (en) * 2005-02-23 2007-09-18 Pixtronix, Inc. Methods and apparatus for actuating displays
US7616368B2 (en) 2005-02-23 2009-11-10 Pixtronix, Inc. Light concentrating reflective display methods and apparatus
US7999994B2 (en) * 2005-02-23 2011-08-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US8159428B2 (en) * 2005-02-23 2012-04-17 Pixtronix, Inc. Display methods and apparatus
KR100762627B1 (ko) 2005-11-17 2007-10-01 삼성전자주식회사 카메라 모듈의 셔터 구동 장치
JP2007179751A (ja) * 2005-12-26 2007-07-12 Matsushita Electric Works Ltd 平面発光装置、及び平面発光装置を備えた液晶表示装置
US8526096B2 (en) * 2006-02-23 2013-09-03 Pixtronix, Inc. Mechanical light modulators with stressed beams
KR20080029552A (ko) * 2006-09-29 2008-04-03 삼성전자주식회사 액정표시장치
US8169679B2 (en) * 2008-10-27 2012-05-01 Pixtronix, Inc. MEMS anchors
JP2010181495A (ja) 2009-02-03 2010-08-19 Seiko Epson Corp 光制御装置
JP2010210813A (ja) 2009-03-09 2010-09-24 Seiko Epson Corp アクチュエーター、光制御装置、電気光学装置、及び電子機器
KR20110133250A (ko) 2010-06-04 2011-12-12 삼성전자주식회사 입체 영상 표시 장치용 셔터 안경 및 이를 포함하는 입체 영상 표시 시스템, 그리고 입체 영상 표시 시스템의 제조 방법
KR20120102387A (ko) * 2011-03-08 2012-09-18 삼성전자주식회사 표시 장치와 이의 제조 방법
US8780104B2 (en) 2011-03-15 2014-07-15 Qualcomm Mems Technologies, Inc. System and method of updating drive scheme voltages
KR20120111809A (ko) * 2011-04-01 2012-10-11 삼성디스플레이 주식회사 표시장치
CN102279463B (zh) * 2011-04-18 2013-10-23 上海丽恒光微电子科技有限公司 具有mems光阀的显示装置及其形成方法
KR20120129256A (ko) 2011-05-19 2012-11-28 삼성디스플레이 주식회사 표시 기판, 이의 제조 방법 및 이를 포함하는 표시 패널
JP5856758B2 (ja) 2011-05-23 2016-02-10 ピクストロニクス，インコーポレイテッド 表示装置及びその製造方法
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JP5856759B2 (ja) 2011-06-03 2016-02-10 ピクストロニクス，インコーポレイテッド 表示装置
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KR20130021104A (ko) * 2011-08-22 2013-03-05 삼성디스플레이 주식회사 표시 기판 및 이의 제조 방법
US9809445B2 (en) 2011-08-26 2017-11-07 Qualcomm Incorporated Electromechanical system structures with ribs having gaps
KR20130072847A (ko) * 2011-12-22 2013-07-02 삼성디스플레이 주식회사 표시 장치와 이의 제조 방법
US9235046B2 (en) 2013-01-30 2016-01-12 Pixtronix, Inc. Low-voltage MEMS shutter assemblies
US20140225904A1 (en) * 2013-02-13 2014-08-14 Pixtronix, Inc. Shutter assemblies fabricated on multi-height molds
US9134552B2 (en) * 2013-03-13 2015-09-15 Pixtronix, Inc. Display apparatus with narrow gap electrostatic actuators
US9134532B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. MEMS shutter assemblies for high-resolution displays
US9134530B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. Display apparatus incorporating dual-level shutters
US9176317B2 (en) 2013-03-13 2015-11-03 Pixtronix, Inc. Display apparatus incorporating dual-level shutters
US9195051B2 (en) 2013-03-15 2015-11-24 Pixtronix, Inc. Multi-state shutter assembly for use in an electronic display
US20140327948A1 (en) 2013-05-06 2014-11-06 Pixtronix, Inc. Display elements incorporating asymmetric apertures

Also Published As

Publication number Publication date
WO2014164140A1 (en) 2014-10-09
EP2972553A1 (en) 2016-01-20
KR20150128878A (ko) 2015-11-18
CN105122115B (zh) 2018-02-09
CN105122115A (zh) 2015-12-02
US9632307B2 (en) 2017-04-25
TWI518366B (zh) 2016-01-21
JP2016516215A (ja) 2016-06-02
TW201502574A (zh) 2015-01-16
US20140268272A1 (en) 2014-09-18
KR101822099B1 (ko) 2018-01-25

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