KR101809464B1 - Polyhydroxy resin, epoxy resin, method for manufacturing the same, epoxy resin composition and cured product using the same - Google Patents

Polyhydroxy resin, epoxy resin, method for manufacturing the same, epoxy resin composition and cured product using the same Download PDF

Info

Publication number
KR101809464B1
KR101809464B1 KR1020110027550A KR20110027550A KR101809464B1 KR 101809464 B1 KR101809464 B1 KR 101809464B1 KR 1020110027550 A KR1020110027550 A KR 1020110027550A KR 20110027550 A KR20110027550 A KR 20110027550A KR 101809464 B1 KR101809464 B1 KR 101809464B1
Authority
KR
South Korea
Prior art keywords
epoxy resin
resin
polyhydric hydroxy
naphthol
naphthalene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020110027550A
Other languages
Korean (ko)
Other versions
KR20110109939A (en
Inventor
카즈히코 나카하라
마사시 카지
Original Assignee
신닛테츠 수미킨 가가쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신닛테츠 수미킨 가가쿠 가부시키가이샤 filed Critical 신닛테츠 수미킨 가가쿠 가부시키가이샤
Publication of KR20110109939A publication Critical patent/KR20110109939A/en
Application granted granted Critical
Publication of KR101809464B1 publication Critical patent/KR101809464B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C33/00Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C33/26Polyhydroxylic alcohols containing only six-membered aromatic rings as cyclic part
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/14Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with at least one hydroxy group on a condensed ring system containing two rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/852Encapsulations
    • H10H20/854Encapsulations characterised by their material, e.g. epoxy or silicone resins

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Epoxy Resins (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)

Abstract

내습성, 내열성이 뛰어나면서, 내충격성 등의 기계적 특성이 뛰어난 성능을 가지고, 적층, 성형, 주형, 접착 등의 용도에 적합한 에폭시수지 조성물, 그것에 사용되는 에폭시수지 및 그 중간체를 제공한다.
하기 일반식(1)로 표시되는 다가 히드록시수지, 하기 일반식(2)로 표시되는 에폭시수지, 또는 상기 다가 히드록시수지와 에폭시수지의 어느 한쪽 또는 양자를 필수 성분으로 하는 에폭시수지 조성물이다. 식 중 A는 탄소수 1~6의 알킬기로 치환되어 있어도 되는 벤젠환 또는 나프탈렌환을 나타내고, G는 글리시딜기를 나타낸다. 또한 n은 1~15의 수를 나타낸다.
[화학식 1]

Figure 112011022420859-pat00009
An epoxy resin composition which is excellent in moisture resistance and heat resistance and excellent in mechanical properties such as impact resistance and is suitable for applications such as lamination, molding, casting, and bonding, and an epoxy resin and an intermediate thereof are provided.
Is an epoxy resin composition comprising a polyhydric hydroxy resin represented by the following general formula (1), an epoxy resin represented by the following general formula (2), or one or both of the polyhydric hydroxy resin and an epoxy resin as essential components. Wherein A represents a benzene ring or a naphthalene ring which may be substituted with an alkyl group having 1 to 6 carbon atoms, and G represents a glycidyl group. And n represents a number of 1 to 15.
[Chemical Formula 1]
Figure 112011022420859-pat00009

Description

다가 히드록시수지, 에폭시수지, 그들의 제조법, 그들을 사용한 에폭시수지 조성물 및 경화물{POLYHYDROXY RESIN, EPOXY RESIN, METHOD FOR MANUFACTURING THE SAME, EPOXY RESIN COMPOSITION AND CURED PRODUCT USING THE SAME}TECHNICAL FIELD The present invention relates to a polyhydroxy resin, an epoxy resin, a method for producing the same, an epoxy resin composition using the epoxy resin, and a cured product thereof. TECHNICAL FIELD [0001]

본 발명은 난연성이 뛰어난 동시에, 내습성, 내열성, 금속 기재와의 접착성 등도 뛰어난 경화물을 부여하는 에폭시수지, 그 중간체, 경화제 및 그들을 사용한 에폭시수지 조성물 및 그 경화물에 관한 것이다.The present invention relates to an epoxy resin, an intermediate thereof, a curing agent, an epoxy resin composition using the epoxy resin, and a cured product thereof, which are excellent in flame retardancy and impart a cured product excellent in moisture resistance, heat resistance and adhesion to a metal substrate.

최근, 특히 첨단 재료 분야의 진보에 수반하여, 보다 고성능의 베이스 수지의 개발이 요구되고 있다. 예를 들면, 반도체 봉지(封止)의 분야에 있어서는, 최근의 고밀도 실장화에 대응한 패키지의 박형화, 대면적화, 나아가 표면 실장 방식의 보급에 의해, 패키지 크랙의 문제가 심각화하고 있고, 이들의 베이스 수지로서는 내습성, 내열성, 금속 기재와의 접착성 등의 향상이 강력하게 요구되고 있다. 또한 최근에는, 환경 부하 저감의 관점에서, 할로겐계 난연제 배제의 움직임이 있고, 보다 난연성이 뛰어난 베이스 수지가 요망되고 있다.In recent years, development of a higher-performance base resin has been required, particularly with advances in the advanced materials field. For example, in the field of semiconductor encapsulation, the problem of package cracks becomes serious due to the thinning of the package corresponding to the recent high-density packaging, the enlargement of the package, and the spread of the surface mounting method. As the base resin, improvement in moisture resistance, heat resistance, adhesion to a metal base, and the like are strongly demanded. Further, in recent years, from the viewpoint of environmental load reduction, there has been a demand for a halogen-based flame retardant excluding agent, and a base resin having an excellent flame retardancy has been demanded.

그러나 종래부터 알려져 있는 에폭시수지에는, 이들 요구를 만족하는 것은 아직 알려져 있지 않다. 예를 들면, 주지의 비스페놀형 에폭시수지는 상온에서 액상이며, 작업성이 뛰어나고, 경화제, 첨가제 등과의 혼합이 용이하기 때문에 널리 사용되고 있지만, 내열성, 내습성 면에서 문제가 있다. 또한 내열성을 개량한 것으로서, 페놀노볼락형 에폭시수지가 알려져 있지만, 내습성이나 내충격성에 문제가 있다. 또한 특허문헌 1에는 내습성, 내충격성의 향상을 목적으로, 페놀아랄킬수지의 에폭시화합물이 제안되어 있지만 내열성이나 난연성 면에서 충분하지 않다.However, it is not yet known that satisfying these demands is known to epoxy resins known from the prior art. For example, a well-known bisphenol-type epoxy resin is in a liquid phase at room temperature, is excellent in workability, and is widely used because it is easily mixed with a curing agent, an additive, etc., but has problems in terms of heat resistance and moisture resistance. A phenol novolak type epoxy resin which is an improvement of heat resistance is known, but there is a problem in moisture resistance and impact resistance. Patent Document 1 proposes an epoxy compound of a phenol aralkyl resin for the purpose of improving moisture resistance and impact resistance but is not sufficient in terms of heat resistance and flame retardancy.

또한 특허문헌 2에는, 나프톨을 p-크실릴렌기로 연결한 구조를 가지는 나프톨아랄킬형 에폭시수지가 제안되어 있지만, 여전히 내열성, 난연성 면에서 충분하지 않다. 또한 특허문헌 3에는, 나프톨을 나프틸렌기로 연결한 구조를 가지는 나프톨아랄킬형 에폭시수지가 제안되어 있지만, 모든 방향족 구조가 나프탈렌환이기 때문에, 점도, 연화점이 높아져 취급성 및 성형성을 저하시키는 문제가 있었다.In Patent Document 2, a naphthol aralkyl type epoxy resin having a structure in which naphthol is linked with a p-xylylene group has been proposed, but it is still insufficient in heat resistance and flame retardancy. Patent Document 3 proposes a naphthol aralkyl type epoxy resin having a structure in which naphthol is linked with a naphthylene group. However, since all of the aromatic structures are naphthalene rings, there is a problem that the viscosity and softening point increase, there was.

일본국 공개특허공보 소63-238122호Japanese Patent Application Laid-Open No. 63-238122 일본국 공개특허공보 평3-90075호JP-A-3-90075 일본국 공개특허공보 2004-59792호Japanese Patent Application Laid-Open No. 2004-59792

따라서, 본 발명의 목적은 성형성이 뛰어난 동시에, 내습성, 내열성, 난연성 등도 뛰어난 성능을 가지고, 적층, 성형, 주형, 접착 등의 용도에 유용한 에폭시수지 및 에폭시수지 경화제로서 유용한 다가 히드록시수지, 또한 그들의 제조법 및 그들을 사용한 에폭시수지 조성물, 또한 그 경화물을 제공하는 데 있다.Accordingly, an object of the present invention is to provide a polyfunctional epoxy resin useful as an epoxy resin and an epoxy resin curing agent which is excellent in moldability, has excellent performance in moisture resistance, heat resistance and flame retardancy, and is useful for applications such as lamination, molding, An epoxy resin composition using the same, and a cured product thereof.

즉, 본 발명은 하기 일반식(1),That is, the present invention provides a compound represented by any one of the following formulas (1),

Figure 112011022420859-pat00001
Figure 112011022420859-pat00001

(단, A는 나프탈렌환(N) 또는 벤젠환(B)을 나타내고, n은 1~15의 수를 나타낸다.)로 표시되면서, N/(N+B)가 0.2~0.7(몰비)인 동시에 연화점이 70~120℃, 150℃에서의 용융 점도가 2~10Pa·s이다.(N + B) is 0.2 to 0.7 (molar ratio), wherein A represents a naphthalene ring (N) or a benzene ring (B) and n represents a number of 1 to 15 A softening point of 70 to 120 ° C, and a melt viscosity of 2 to 10 Pa · s at 150 ° C.

또한 본 발명은 페놀류와 나프톨류의 합계량 1몰에 대하여, 0.10~0.40몰의 나프톨류를 사용하여, 하기 일반식(2),Further, the present invention relates to a process for producing a naphthol compound represented by any of the following general formulas (2), (3) and (4), using 0.10 to 0.40 mol of naphthol per mol of the total amount of phenols and naphthols

Figure 112011022420859-pat00002
Figure 112011022420859-pat00002

(단, X는 수산기, 할로겐원자 또는 탄소수 1~6의 알콕시기를 나타낸다)로 표시되는 나프탈렌계 축합제 0.05~0.35몰을 반응시키는 것을 특징으로 하는 다가 히드록시수지의 제조방법이다.(Wherein X represents a hydroxyl group, a halogen atom or an alkoxy group having 1 to 6 carbon atoms).

또한 본 발명은 하기 일반식(3),The present invention also relates to a compound represented by the following general formula (3),

Figure 112011022420859-pat00003
Figure 112011022420859-pat00003

(단, A는 나프탈렌환(N) 또는 벤젠환(B), G는 글리시딜기를 나타내고, n은 1~15의 수를 나타낸다.)로 표시되면서, N/(N+B)가 0.2~0.7인 동시에 연화점이 60~100℃, 150℃에서의 용융 점도가 0.2~1.0Pa·s인 에폭시수지이다.(Wherein N represents a naphthalene ring (N) or a benzene ring (B), G represents a glycidyl group, and n represents a number of 1 to 15) 0.7, a softening point of 60 to 100 캜, and a melt viscosity of 0.2 to 1.0 Pa · s at 150 캜.

또한 본 발명은 상기 일반식(1)로 표시되는 다가 히드록시수지를 에피클로로히드린과 반응시키는 것을 특징으로 하는 상기 일반식(3)으로 표시되는 에폭시수지의 제조법이다.The present invention also relates to a process for producing an epoxy resin represented by the general formula (3), wherein the polyhydric hydroxy resin represented by the general formula (1) is reacted with epichlorohydrin.

나아가 또한 본 발명은, 상기의 에폭시수지 또는 다가 히드록시수지의 적어도 어느 한쪽을, 에폭시수지 성분 또는 경화제 성분의 필수 성분으로서 배합하여 이루어지는 에폭시수지 조성물이고, 또한 이 에폭시수지 조성물을 경화하여 이루어지는 경화물이다.Furthermore, the present invention also provides an epoxy resin composition comprising at least one of the above-mentioned epoxy resin or polyhydric hydroxy resin as an essential component of an epoxy resin component or a curing agent component, and the cured product of the epoxy resin composition to be.

본 발명의 에폭시수지 또는 다가 히드록시수지로부터 얻어지는 에폭시수지 조성물을 경화하여 얻어지는 경화물은 내습성, 내열성이 뛰어나면서, 내충격성 등의 기계적 특성이 뛰어난 성능을 가지고, 적층, 성형, 주형, 접착 등의 용도에 적합하게 사용할 수 있다.The cured product obtained by curing the epoxy resin composition obtained from the epoxy resin or the polyhydric hydroxy resin of the present invention is excellent in moisture resistance and heat resistance and is excellent in mechanical properties such as impact resistance and has excellent properties such as lamination, It can be suitably used for the purpose of

도 1은 다가 히드록시수지 A의 GPC 차트이다.
도 2는 다가 히드록시수지 B의 GPC 차트이다.
도 3은 다가 히드록시수지 C의 GPC 차트이다.
도 4는 다가 히드록시수지 D의 GPC 차트이다.
도 5는 다가 히드록시수지 E의 GPC 차트이다.
도 6은 다가 히드록시수지 F의 GPC 차트이다.
도 7은 다가 히드록시수지 G의 GPC 차트이다.
도 8은 다가 히드록시수지 H의 GPC 차트이다.
도 9는 에폭시수지 A의 GPC 차트이다.
도 10은 에폭시수지 B의 GPC 차트이다.
도 11은 에폭시수지 C의 GPC 차트이다.
도 12는 에폭시수지 D의 GPC 차트이다.
도 13은 에폭시수지 E의 GPC 차트이다.
1 is a GPC chart of a polyhydric hydroxy resin A. Fig.
2 is a GPC chart of the polyhydric hydroxy resin B. Fig.
3 is a GPC chart of the polyhydric hydroxy resin C. Fig.
4 is a GPC chart of the polyhydric hydroxy resin D. Fig.
FIG. 5 is a GPC chart of the polyhydric hydroxy resin E. FIG.
6 is a GPC chart of the polyhydric hydroxy resin F. Fig.
Fig. 7 is a GPC chart of a polyhydric hydroxy resin G. Fig.
8 is a GPC chart of a polyhydric hydroxy resin H. Fig.
9 is a GPC chart of the epoxy resin A. Fig.
10 is a GPC chart of the epoxy resin B. Fig.
11 is a GPC chart of the epoxy resin C;
12 is a GPC chart of the epoxy resin D. Fig.
13 is a GPC chart of the epoxy resin E. Fig.

이하, 본 발명을 상세하게 설명한다.Hereinafter, the present invention will be described in detail.

본 발명의 다가 히드록시수지는 상기 일반식(1)로 표시된다. 여기서, A는 나프탈렌환 또는 벤젠환을 나타내는데, 나프탈렌환(N)과 벤젠환(B)이 공존한 구조를 가지고 있고, A에 차지하는 나프탈렌환(N)의 비율(몰비)이 N/(N+B)로서 0.2~0.7의 범위의 것이다. 이보다 작으면 나프탈렌 구조에 근거하는 내열성, 내습성 등의 향상 효과가 작고, 이보다 많으면 연화점, 점도가 높아져 성형성이 저하한다. 여기서, 상기 몰비는 다가 히드록시수지 중의 나프탈렌환과 벤젠환의 평균 몰비이다.The polyhydric hydroxy resin of the present invention is represented by the above general formula (1). A represents a naphthalene ring or a benzene ring and has a structure in which a naphthalene ring (N) and a benzene ring (B) coexist and a ratio (molar ratio) of naphthalene ring (N) B) is in the range of 0.2 to 0.7. If it is smaller, the effect of improving the heat resistance and moisture resistance based on the naphthalene structure is small, and if it is larger than the above range, the softening point and the viscosity are increased, and the moldability is lowered. Here, the molar ratio is the average molar ratio of the naphthalene ring to the benzene ring in the polyhydric hydroxy resin.

상기 나프탈렌환 및 벤젠환은 탄소수 1~6의 알킬기로 치환되어 있어도 되는데, 바람직하게는 무치환 혹은 메틸기로 치환된 것이다. n은 평균의 반복수(수 평균)를 나타내고, 1~15인데, 바람직하게는 1.1~5이다. n이 이보다 작은 것은 내열성 면에서 바람직하지 않다. 또한 이보다 큰 것은 연화점, 점도가 높아져 성형성이 저하한다. 본 발명의 다가 히드록시수지의 연화점은 75~125℃의 범위이며, 바람직하게는 80~120℃의 범위이다. 또한 150℃에서의 용융 점도는 2~10Pa·s의 범위이며, 바람직하게는 3~8Pa·s의 범위이다.The naphthalene ring and the benzene ring may be substituted with an alkyl group having 1 to 6 carbon atoms, preferably unsubstituted or substituted with a methyl group. n represents the number of repetitions of the average (number average), is 1 to 15, preferably 1.1 to 5. [ It is not preferable that n is smaller than this in terms of heat resistance. Also, in the case where the amount is larger than the above range, the softening point and the viscosity increase and the moldability decreases. The softening point of the polyhydric hydroxy resin of the present invention is in the range of 75 to 125 캜, preferably 80 to 120 캜. The melt viscosity at 150 ° C is in the range of 2 to 10 Pa · s, preferably in the range of 3 to 8 Pa · s.

이러한 다가 히드록시수지는 페놀류 및 나프톨류와 일반식(2)로 표시되는 축합제를 반응시킴으로써 얻어진다.Such a polyhydric hydroxy resin is obtained by reacting a phenol and a naphthol with a condensing agent represented by the general formula (2).

여기서 페놀류란, 탄소수 1~6의 알킬기 치환 또는 미치환의 페놀이며, 구체적으로는 페놀, o-크레졸, m-크레졸, p-크레졸, 에틸페놀류, 이소프로필페놀류, 터셔리부틸페놀류, o-페닐페놀, p-페닐페놀, 2,6-크실레놀, 2,6-디에틸페놀 등이 예시되는데, 얻어진 수지의 저점도성 및 고반응성 등의 관점에서, 바람직하게는 무치환의 페놀이다. 또한 나프톨류란, 탄소수 1~6의 알킬기 치환 또는 미치환의 나프톨인데, 바람직하게는 무치환의 나프톨이며, 구체적으로는 1-나프톨, 2-나프톨이다. 상기의 페놀류 또는 나프톨류는 단독으로 사용해도 되고, 2종 이상을 병용해도 된다.Here, the phenol is an alkyl group-substituted or unsubstituted phenol having 1 to 6 carbon atoms, and specific examples thereof include phenol, o-cresol, m-cresol, p-cresol, ethyl phenol, isopropyl phenol, tertiary butyl phenol, Phenol, p-phenylphenol, 2,6-xylenol, 2,6-diethylphenol and the like are exemplified. In view of low viscosity and high reactivity of the resulting resin, it is preferably an unsubstituted phenol. The naphthols are alkyl group-substituted or unsubstituted naphthols having 1 to 6 carbon atoms, preferably unsubstituted naphthols, specifically 1-naphthol and 2-naphthol. The above phenols or naphthols may be used alone or in combination of two or more.

반응시의 페놀류와 나프톨류의 사용 비율은, 양자의 합계량 1몰에 대하여, 이론량적으로는 0.2~0.7몰의 나프톨류를 사용하는 것이 좋은데, 반응성의 상이 등을 고려하면 0.10~0.40몰의 나프톨류를 사용하는 것이 좋다.The use ratio of the phenols and naphthols in the reaction is preferably 0.2 to 0.7 moles of the naphthol theoretical amount per mol of the total amount of both the phenols and the naphthols. When considering the difference in reactivity and the like, 0.10 to 0.40 moles of naphthol It is better to use a flow.

또한 일반식(2)의 나프탈렌계 축합제에 있어서, X는 수산기, 할로겐원자 또는 탄소수 1~6의 알콕시기이다. 페놀성 화합물과의 반응성의 관점에서는, 수산기 또는 할로겐원자가 바람직하다. 할로겐원자로서는 염소원자가 바람직하고, 알콕시기로서는 메톡시기가 바람직하다. 나프탈렌환에 대한 2개의 CH2X기의 치환 위치는, 같은 벤젠환상이어도, 각각 다른 벤젠환상이어도 되는데, 바람직한 치환 위치는 1,4-위치, 1,5-위치, 1,6-위치, 2,6-위치, 2,7-위치이다. 내열성, 기계적 강도 및 인성(靭性) 등의 물성의 관점에서는 1,4-위치 및 1,5-위치가 보다 바람직하다. 나프탈렌계 축합제는 이들의 혼합물이어도 되지만, 나프탈렌계 축합제 중의 1,4-디치환체와 1,5-디치환체의 합계 함유율이 90중량%이상인 것이 바람직하다.In the naphthalene-based condensing agent of the general formula (2), X is a hydroxyl group, a halogen atom or an alkoxy group having 1 to 6 carbon atoms. From the viewpoint of reactivity with a phenolic compound, a hydroxyl group or a halogen atom is preferable. The halogen atom is preferably a chlorine atom, and the alkoxy group is preferably a methoxy group. The substitution positions of the two CH 2 X groups for the naphthalene ring may be the same benzene ring or different benzene ring positions. Preferred substitution positions are 1,4-position, 1,5-position, 1,6-position, 2 , 6-position, and 2,7-position. The 1,4-position and the 1,5-position are more preferable from the viewpoints of physical properties such as heat resistance, mechanical strength and toughness. The naphthalene-based condensing agent may be a mixture thereof, but it is preferable that the total content of the 1,4-di-substituted compound and the 1,5-disubstituted compound in the naphthalene-based condensing agent is 90% by weight or more.

일반식(2)로 표시되는 나프탈렌계 축합제는, 특별히 한정하는 것은 아니지만, 통상은 나프탈렌의 클로로메틸화 반응, 또는 디메틸나프탈렌류의 메틸기의 클로로화 반응을 경유하여 제조할 수 있다. 축합제 중에는 나프탈렌환에 하나의 CH2X기만이 치환한 모노 치환 나프탈렌류가 함유되어 있어도 되는데, 모노체의 함유량은 10wt%이하, 바람직하게는 5wt%이하, 더욱 바람직하게는 3wt%이하이다. 이보다 모노체의 함유량이 많으면 수지를 경화시켰을 경우의 가교 밀도가 저하하여, 내열성의 저하를 초래할 경우가 있다.The naphthalene-based condensation agent represented by the general formula (2) is not particularly limited, but it can be produced usually through a chloromethylation reaction of naphthalene or a chlorination reaction of a methyl group of dimethylnaphthalenes. The condensing agent may contain mono-substituted naphthalenes substituted with only one CH 2 X group in the naphthalene ring. The content of the mono-isomer is 10 wt% or less, preferably 5 wt% or less, more preferably 3 wt% or less. If the content of the monocomponent is larger than the above value, the crosslinking density in the case of curing the resin is lowered, and the heat resistance may be lowered.

페놀성 화합물과 나프탈렌계 축합제의 반응에 있어서는, 나프탈렌계 축합제에 대하여 과잉량의 페놀류 및 나프톨류가 사용된다. 나프탈렌계 축합제의 사용량은, 페놀류와 나프톨류의 합계량 1몰에 대하여 0.05~0.35몰의 범위인데, 바람직하게는 0.1~0.3몰의 범위이다. 이보다 많으면 수지의 연화점이 높아져 성형 작업성에 지장을 초래한다. 또한 이보다 적으면 반응 종료 후, 과잉하게 사용한 페놀류 및 나프톨류의 제거할 양이 많아져 공업적으로 바람직하지 않다. 나프탈렌계 축합제는, 이론량보다 소량 사용되기 때문에, 실질적으로 전량의 나프탈렌계 축합제가 반응하는 시점에서 반응을 종료시키는 것이 좋다.In the reaction of the phenolic compound and the naphthalene-based condensing agent, an excessive amount of phenols and naphthol are used for the naphthalene-based condensing agent. The amount of the naphthalene-based condensing agent to be used is in the range of 0.05 to 0.35 mol, preferably 0.1 to 0.3 mol, per 1 mol of the total amount of phenols and naphthols. If it is larger than the above range, the softening point of the resin tends to increase, which may hinder the molding workability. When the amount is less than this range, the amount of excess phenol and naphthol to be removed after the completion of the reaction is increased, which is industrially undesirable. Since the naphthalene-based condensing agent is used in a smaller amount than the theoretical amount, it is preferable to terminate the reaction at the time when substantially all of the naphthalene-based condensing agent is reacted.

이 반응은 산 촉매의 존재하에 행하는 것이 좋고, 이 산 촉매로서는 주지의 무기산, 유기산에서 적절히 선택할 수 있다. 이러한 산 촉매로서는, 예를 들면 염산, 황산, 인산 등의 광산(鑛酸)이나, 포름산, 옥살산, 트리플루오로아세트산, p-톨루엔술폰산, 디에틸황산 등의 유기산이나, 염화아연, 염화알루미늄, 염화철, 3불화붕소 등의 루이스산 혹은 활성 백토, 실리카-알루미나, 제올라이트 등의 고체산 등을 들 수 있다. 또한 일반식(2)로 표시되는 축합제로서 비스클로로메틸나프탈렌을 사용할 경우는 무촉매하에서 반응시킬 수 있다.This reaction is preferably carried out in the presence of an acid catalyst, and the acid catalyst can be appropriately selected from well-known inorganic acids and organic acids. Examples of such an acid catalyst include organic acids such as hydrochloric acid, sulfuric acid and phosphoric acid, organic acids such as formic acid, oxalic acid, trifluoroacetic acid, p-toluenesulfonic acid and diethylsulfuric acid, Lewis acids such as iron chloride and boron trichloride, and activated clays, and solid acids such as silica-alumina and zeolite. When bischloromethylnaphthalene is used as the condensing agent represented by the general formula (2), the reaction can be carried out in the absence of a catalyst.

통상, 이 반응은 10~250℃에서 1~20시간 행한다. 또한 반응 용매로서 메탄올, 에탄올, 프로판올, 부탄올, 에틸렌글리콜, 메틸셀로솔브, 에틸셀로솔브 등의 알코올류나, 벤젠, 톨루엔, 클로로벤젠, 디클로로벤젠 등을 사용할 수 있다.Usually, this reaction is carried out at 10 to 250 ° C for 1 to 20 hours. As the reaction solvent, alcohols such as methanol, ethanol, propanol, butanol, ethylene glycol, methyl cellosolve and ethyl cellosolve, benzene, toluene, chlorobenzene and dichlorobenzene can be used.

반응 종료 후, 경우에 따라, 중화, 수세 등의 방법에 의해, 촉매를 제거하고, 필요에 따라 잔존하는 용매 및 미반응 페놀성 화합물을 감압 증류 제거 등의 방법에 의해 계외로 제거하여, 다가 히드록시수지로 한다. 미반응 페놀성 화합물은 통상 3%이하, 바람직하게는 1%이하로 한다. 이보다 많으면 경화물로 했을 경우의 내열성이 저하한다. 단, 반응에 2가 이상의 페놀성 화합물을 사용할 경우는 반응 후 잔존하는 페놀성 화합물을 제거하지 않아도 된다.After completion of the reaction, the catalyst is removed by neutralization, water washing or the like as the case may be, and if necessary, the remaining solvent and unreacted phenolic compound are removed from the system by vacuum distillation or the like, Roxy resin. The unreacted phenolic compound is usually 3% or less, preferably 1% or less. If it is larger than the above range, the heat resistance in the case of using a cured product decreases. However, when a phenol compound having a valence of 2 or more is used in the reaction, the remaining phenolic compound may not be removed after the reaction.

본 발명에는, 상기 일반식(1)로 표시되는 다가 히드록시수지에 나프틸메탄기가 결합한 것이 함유되어 있어도 된다. 예를 들면, 페놀성 화합물과 반응시키는 나프탈렌계 축합제 중에 모노클로로메틸나프탈렌, 모노히드록시나프탈렌 또는 모노알콕시메틸나프탈렌이 함유되어 있었을 경우, 일반식(1)의 다가 히드록시수지와, 일반식(1)의 다가 히드록시수지의 방향족환에 나프틸메탄기가 1개 또는 그 이상 부가한 화합물의 혼합물이 된다. 이들은 혼합물이어도, 본 발명의 효과를 발휘하는 데 지장은 없고, 이들을 에폭시수지 경화제로서 사용할 수 있으며, 또한 본 발명의 에폭시수지의 원료로서 사용할 수 있다.In the present invention, a polyhydric hydroxy resin represented by the above general formula (1) may contain a naphthyl methane group bonded thereto. For example, when monochloromethylnaphthalene, monohydroxynaphthalene or monoalkoxymethylnaphthalene is contained in the naphthalene-based condensing agent to be reacted with the phenolic compound, the polyhydric hydroxy resin of the formula (1) 1) or a compound in which one or more naphthylmethane groups are added to the aromatic ring of the polyhydric hydroxy resin of 1). These compounds can be used as an epoxy resin curing agent and can be used as a raw material for the epoxy resin of the present invention.

본 발명의 에폭시수지는 상기 일반식(3)으로 표시된다. 여기서, A 및 n은 일반식(1)의 다가 히드록시수지의 설명과 같다. 본 발명의 에폭시수지의 연화점은 60~100℃의 범위이며, 보다 바람직하게는 75~95℃의 범위이다. 또한 150℃에서의 용융 점도는 0.1~1.0Pa·s의 범위이고, 보다 바람직하게는 0.2~0.8Pa·s의 범위이다.The epoxy resin of the present invention is represented by the above general formula (3). Here, A and n are the same as those of the polyhydric hydroxy resin of the general formula (1). The softening point of the epoxy resin of the present invention is in the range of 60 to 100 占 폚, more preferably in the range of 75 to 95 占 폚. The melt viscosity at 150 ° C is in the range of 0.1 to 1.0 Pa · s, and more preferably in the range of 0.2 to 0.8 Pa · s.

본 발명의 에폭시수지는, 상기 일반식(1)로 표시되는 다가 히드록시수지를 에피클로로히드린과 반응시킴으로써 얻어진다. 이 반응은 통상의 에폭시화 반응과 동일하게 행할 수 있다.The epoxy resin of the present invention is obtained by reacting the polyhydric hydroxy resin represented by the above general formula (1) with epichlorohydrin. This reaction can be carried out in the same manner as in the ordinary epoxidation reaction.

예를 들면, 상기 일반식(1)로 표시되는 다가 히드록시수지를 과잉의 에피클로로히드린에 용해한 후, 수산화나트륨, 수산화칼륨 등의 알칼리 금속 수산화물의 존재하에, 50~150℃, 바람직하게는 60~120℃의 범위에서 1~10시간 반응시키는 방법을 들 수 있다. 이때, 알칼리 금속 수산화물의 사용량은, 다가 히드록시수지 중의 수산기 1몰에 대하여 0.8~2몰, 바람직하게는 0.9~1.2몰의 범위이다. 또한 에피클로로히드린은 다가 히드록시수지 중의 수산기에 대하여 과잉하게 사용되는데, 통상 다가 히드록시수지 중의 수산기 1몰에 대하여, 1.5~15몰, 바람직하게는 2~8몰의 범위이다. 또한 반응시, 4급 암모늄염 등을 첨가할 수 있다. 4급 암모늄염으로서는, 예를 들면 테트라메틸암모늄클로라이드, 테트라부틸암모늄클로라이드, 벤질트리에틸암모늄클로라이드 등이 있고, 그 첨가량으로서는 다가 히드록시수지에 대하여, 0.1~2.0wt%의 범위가 바람직하다. 이보다 적으면 4급 암모늄염 첨가의 효과가 작고, 이보다 많으면 난가수분해성 염소의 생성이 많아져 고순도화가 곤란해진다. 또한 디메틸술폭시드, 디글라임 등의 극성 용매를 사용해도 되고, 그 첨가량은 다가 히드록시수지에 대하여, 10~200wt%의 범위가 바람직하다. 이보다 적으면 첨가의 효과가 작고, 이보다 많으면 용적 효율이 저하하여 경제상 바람직하지 않다. 반응 종료 후, 과잉의 에피클로로히드린을 증류 제거하여, 잔류물을 톨루엔, 메틸이소부틸케톤 등의 용제에 용해, 여과한 후, 수세하여 무기염을 제거하고, 이어서 용제를 증류 제거함으로써 목적의 에폭시수지를 얻을 수 있다. 이 에폭시수지는 일반식(3)으로 표시되는 것을 주성분으로 하는데, 일반식(1)의 다가 히드록시수지의 방향족 환에 나프틸메탄기가 1개 또는 그 이상 부가한 화합물의 글리시딜에테르화물이 포함되어 있어도 된다. 또한 본 발명의 에폭시수지 중의 에폭시기가 에테르 결합으로서 올리고머화한 것이 포함되어 있어도 된다.For example, the polyhydric hydroxy resin represented by the above-mentioned general formula (1) is dissolved in excess epichlorohydrin, and then heated in the presence of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide at 50 to 150 ° C, And the reaction is carried out at 60 to 120 ° C for 1 to 10 hours. At this time, the amount of the alkali metal hydroxide to be used is in the range of 0.8 to 2 moles, preferably 0.9 to 1.2 moles, per 1 mole of the hydroxyl groups in the polyhydric hydroxy resin. Epichlorohydrin is used excessively with respect to the hydroxyl group in the polyhydric hydroxy resin, and is usually in the range of 1.5 to 15 mol, preferably 2 to 8 mol, per 1 mol of the hydroxyl group in the polyhydric hydroxy resin. In the reaction, a quaternary ammonium salt or the like may be added. Examples of the quaternary ammonium salt include tetramethylammonium chloride, tetrabutylammonium chloride and benzyltriethylammonium chloride. The amount of the quaternary ammonium salt to be added is preferably in the range of 0.1 to 2.0 wt% with respect to the polyhydric hydroxy resin. If the amount is less, the effect of addition of the quaternary ammonium salt is small, and if it is more than that, the amount of hydrolysable chlorine to be produced is increased, which makes it difficult to obtain high purity. A polar solvent such as dimethyl sulfoxide or diglyme may also be used, and the amount thereof to be added is preferably in the range of 10 to 200 wt% with respect to the polyhydric hydroxy resin. If it is less, the effect of addition is small, and if it is more than this amount, the volume efficiency decreases, which is not economically preferable. After completion of the reaction, the excess epichlorohydrin is removed by distillation, the residue is dissolved in a solvent such as toluene or methyl isobutyl ketone, filtered, and then washed with water to remove inorganic salts. Subsequently, the solvent is distilled off, An epoxy resin can be obtained. This epoxy resin is mainly composed of one represented by the general formula (3), and the glycidyl ether compound of the compound in which one or more naphthylmethane groups are added to the aromatic ring of the polyhydric hydroxy resin of the general formula (1) May be included. The epoxy resin of the present invention may contain an oligomerized epoxy group as an ether bond.

본 발명의 에폭시수지 조성물은 에폭시수지 및 경화제로 이루어지고, 에폭시수지 성분으로서 일반식(3)으로 표시되는 에폭시수지 또는 경화제 성분으로서 상기 일반식(1)로 표시되는 다가 히드록시수지의 적어도 어느 한쪽을 필수 성분으로서 배합한 것이다. 특히, 에폭시수지 성분으로서 일반식(3)으로 표시되는 에폭시수지를 배합하고, 경화제 성분으로서 일반식(1)로 표시되는 다가 히드록시수지를 배합한 것은 고도의 난연성, 물성 밸런스를 구비하여 바람직하다.The epoxy resin composition of the present invention comprises an epoxy resin and a curing agent, wherein at least either one of the epoxy resins represented by the general formula (3) or the polyhydric hydroxy resin represented by the general formula (1) As an essential component. Particularly, it is preferable that an epoxy resin represented by the general formula (3) is blended as the epoxy resin component and a polyhydric hydroxy resin represented by the general formula (1) is blended as the curing agent component, since it has a high flame retardance and balance of physical properties .

일반식(3)으로 표시되는 에폭시수지를 필수 성분으로 할 경우의 경화제로서는, 일반적으로 에폭시수지의 경화제로서 알려져 있는 것은 모두 사용할 수 있다. 예를 들면 디시안디아미드, 다가 페놀류, 산 무수물류, 방향족 및 지방족 아민류 등이 있다. 구체적으로 예시하면, 다가 페놀류로서는, 예를 들면 비스페놀 A, 비스페놀 F, 비스페놀 S, 플루오렌비스페놀, 4,4'-비페놀, 2,2'-비페놀, 하이드로퀴논, 레조르신, 나프탈렌디올 등의 2가의 페놀류, 혹은 트리스-(4-히드록시페닐)메탄, 1,1,2,2-테트라키스(4-히드록시페닐)에탄, 페놀노볼락, o-크레졸노볼락, 나프톨노볼락, 폴리비닐페놀 등으로 대표되는 3가 이상의 페놀류, 또한 페놀류, 나프톨류 또는 비스페놀 A, 비스페놀 F, 비스페놀 S, 플루오렌비스페놀, 4,4'-비페놀, 2,2'-비페놀, 하이드로퀴논, 레조르신, 나프탈렌디올 등의 2가의 페놀류의 포름알데히드, 아세트알데히드, 벤즈알데히드, p-히드록시벤즈알데히드, p-크실릴렌글리콜 등의 축합제에 의해 합성되는 다가 페놀성 화합물 등이 있고, 산 무수물로서는 무수 프탈산, 테트라히드로 무수 프탈산, 메틸테트라히드로 무수 프탈산, 헥사히드로 무수 프탈산, 메틸헥사히드로 무수 프탈산, 메틸 무수 하이믹산, 무수 나딕산, 무수 트리멜리트산 등이 있다. 또한 아민류로서는 4,4'-디아미노디페닐메탄, 4,4'-디아미노디페닐프로판, 4,4'-디아미노디페닐술폰, m-페닐렌디아민, p-크실릴렌디아민 등의 방향족 아민류, 에틸렌디아민, 헥사메틸렌디아민, 디에틸렌트리아민, 트리에틸렌테트라민 등의 지방족 아민류, 혹은 일반식(1)로 표시되는 다가 히드록시수지가 있다. 본 발명의 수지 조성물에는, 이들 경화제의 1종 또는 2종 이상을 혼합하여 사용할 수 있는데, 본 발명에 따른 에폭시수지의 배합량은 에폭시수지 전체 중 5~100%의 범위이다.As the curing agent when an epoxy resin represented by the general formula (3) is used as an essential component, any one generally known as a curing agent for an epoxy resin can be used. For example, dicyandiamide, polyhydric phenols, acid anhydrides, aromatic and aliphatic amines, and the like. Specific examples of the polyhydric phenols include bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, resorcin, naphthalene diol (4-hydroxyphenyl) ethane, phenol novolak, o-cresol novolak, naphthol novolak, Phenol, naphthol or bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, A polyhydric phenol compound synthesized by a condensation agent such as formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, p-xylylene glycol and the like of divalent phenols such as resorcin and naphthalenediol, Phthalic anhydride, tetrahydrophthalic anhydride, methylterephthalic anhydride, La dihydro include phthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl anhydride high acid anhydride, Nadic acid anhydride, trimellitic acid. Examples of the amines include 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylsulfone, m-phenylenediamine and p-xylylenediamine. Aromatic amines, aliphatic amines such as ethylenediamine, hexamethylenediamine, diethylenetriamine and triethylenetetramine, and polyhydric hydroxy resins represented by the general formula (1). In the resin composition of the present invention, one or more of these curing agents may be used in combination. The amount of the epoxy resin to be blended according to the present invention is in the range of 5 to 100% of the total epoxy resin.

일반식(1)로 표시되는 다가 히드록시수지를 경화제 성분의 필수 성분으로 할 경우의 에폭시수지로서는, 분자 중에 에폭시기를 2개 이상 가지는 통상의 에폭시수지는 모두 사용할 수 있다. 예를 들면 비스페놀 A, 비스페놀 S, 플루오렌비스페놀, 4,4'-비페놀, 2,2'-비페놀, 하이드로퀴논, 레조르신 등의 2가의 페놀류, 혹은 트리스-(4-히드록시페닐)메탄, 1,1,2,2-테트라키스(4-히드록시페닐)에탄, 페놀노볼락, o-크레졸노볼락 등의 3가 이상의 페놀류, 또는 테트라브로모비스페놀 A 등의 할로겐화비스페놀류로부터 유도되는 글리시딜에테르화물, 혹은 상기 일반식(1)로 표시되는 다관능 에폭시수지 등이 있다. 이들 에폭시수지는 1종 또는 2종 이상을 혼합하여 사용할 수 있는데, 본 발명에 따른 다가 히드록시수지의 배합량은 에폭시수지 전체 중 5~100%의 범위이다.As the epoxy resin when the polyhydric hydroxy resin represented by the general formula (1) is used as an essential component of the curing agent component, any conventional epoxy resin having two or more epoxy groups in the molecule can be used. For example, divalent phenols such as bisphenol A, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone and resorcin, and tris- (4-hydroxyphenyl) Methane, 1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, phenol novolak, and o-cresol novolac, or halogenated bisphenols such as tetrabromobisphenol A , Or a polyfunctional epoxy resin represented by the above general formula (1). These epoxy resins may be used alone or in combination of two or more. The blending amount of the polyhydric hydroxy resin according to the present invention is in the range of 5 to 100% of the total epoxy resin.

또한 일반식(3)으로 표시되는 에폭시수지 또는 일반식(1)로 표시되는 다가 히드록시수지 또는 양자를 필수 성분으로 하는 본 발명의 에폭시수지 조성물 중에는, 폴리에스테르, 폴리아미드, 폴리이미드, 폴리에테르, 폴리우레탄, 석유 수지, 인덴쿠마론수지, 페녹시수지 등의 올리고머 또는 고분자 화합물을 적절히 배합해도 되고, 무기 충전제, 안료, 난연제, 요변성(搖變性) 부여제, 커플링제, 유동성 향상제 등의 첨가제를 배합해도 된다. 무기 충전제로서는, 예를 들면 구상 혹은 파쇄상의 용융 실리카, 결정 실리카 등의 실리카 분말, 알루미나 분말, 유리 분말 또는 마이카, 탤크, 탄산칼슘, 알루미나, 수화(水和)알루미나 등을 들 수 있고, 안료로서는 유기계 또는 무기계의 체질 안료, 인편상(鱗片狀) 안료 등이 있다. 요변성 부여제로서는 실리콘계, 피마자유계, 지방족 아마이드 왁스, 산화폴리에틸렌 왁스, 유기 벤토나이트계 등을 들 수 있다. 또한 필요에 따라, 종래부터 공지의 경화 촉진제를 사용할 수 있다. 예를 들면 아민류, 이미다졸류, 유기 포스핀류, 루이스산 등이 있다. 첨가량으로서는, 통상 에폭시수지 100중량부에 대하여 0.2~5중량부의 범위이다. 또한 필요에 따라, 본 발명의 수지 조성물에는 카르나우바 왁스, OP 왁스 등의 이형제, γ-글리시독시프로필트리메톡시실란 등의 커플링제, 카본블랙 등의 착색제, 3산화안티몬 등의 난연제, 실리콘 오일 등의 저응력화제, 스테아린산칼슘 등의 활제(滑劑) 등을 사용할 수 있다.In the epoxy resin composition of the present invention comprising an epoxy resin represented by the general formula (3) or a polyhydric hydroxy resin represented by the general formula (1) or both as essential components, a polyester, a polyamide, a polyimide, An oligomer or a polymer compound such as a polyurethane, a petroleum resin, an indenkumarone resin, or a phenoxy resin may be appropriately blended, and an inorganic filler, a pigment, a flame retardant, a thixotropic agent, a coupling agent, Additives may be added. Examples of the inorganic filler include silica powder such as spherical or crushed fused silica and crystalline silica, alumina powder, glass powder or mica, talc, calcium carbonate, alumina, hydrated alumina and the like. Organic or inorganic extender pigments, scaly pigments, and the like. Examples of the thixotropic agent include a silicone type, a castor oil type, an aliphatic amide wax, an oxidized polyethylene wax, and an organic bentonite type. If necessary, conventionally known curing accelerators can be used. For example, amines, imidazoles, organic phosphines, and Lewis acids. The addition amount is usually in the range of 0.2 to 5 parts by weight based on 100 parts by weight of the epoxy resin. If necessary, the resin composition of the present invention may contain a releasing agent such as carnauba wax and OP wax, a coupling agent such as? -Glycidoxypropyltrimethoxysilane, a coloring agent such as carbon black, a flame retardant such as antimony trioxide, Low-stressing agents such as silicone oil, lubricants such as calcium stearate, and the like.

본 발명의 경화물은 상기 에폭시수지 조성물을 주형, 압축 성형, 트랜스퍼 성형 등의 방법에 의해 성형 가공할 수 있다. 생성할 때의 온도는 통상 120~220℃의 범위이다.The cured product of the present invention can be molded by the above-mentioned epoxy resin composition by a method such as a mold, compression molding, or transfer molding. The temperature at the time of production is usually in the range of 120 to 220 占 폚.

<실시예><Examples>

이하, 실시예 및 비교예에 근거하여 본 발명을 구체적으로 설명한다.Hereinafter, the present invention will be described in detail based on examples and comparative examples.

(실시예 1)(다가 히드록시수지의 제조)(Example 1) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 1-나프톨 96g, 페놀 251g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 150g 및 클로로벤젠 450g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 80℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 235g을 얻었다(다가 히드록시수지 A). 얻어진 다가 히드록시수지의 수산기 당량은 230g/eq.이고, 연화점은 123℃, 150℃에서의 용융 점도는 9.5Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 1-나프톨(N)과 페놀(B)의 비율(몰비)은 N/(N+B)=0.57이었다. GPC 차트를 도 1에 나타낸다. 여기서 용융 점도는 BROOKFIELD사 제품 CAP2000H를 사용하고, GPC 측정은 장치: MODEL151(Waters(주) 제품) 및 컬럼: TSK-GEL2000H×3개 및 TSK-GEL4000H×1개(모두 토소(주) 제품)를 사용하여, 용매: 테트라히드로푸란, 유속: 1.0ml/분, 온도: 38℃, 검출기: RI의 조건으로 행하였다.To a 1 L four-necked separable flask was added a mixture of 96 g of 1-naphthol, 251 g of phenol, 150 g of dichloromethylnaphthalene (1, 4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, other dichloromethyl compound 1.2% And 450 g of chlorobenzene were measured. The temperature was slowly elevated while stirring in a nitrogen gas stream, and the mixture was allowed to react at 80 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and the unreacted monomer were removed by distillation under reduced pressure to obtain 235 g of a brown resin (polyhydric hydroxy resin A). The obtained polyhydric hydroxy resin had a hydroxyl group equivalent of 230 g / eq., A softening point of 123 ° C and a melt viscosity of 9.5 Pa · s at 150 ° C. From the analysis of the recovered unreacted monomer, the ratio (molar ratio) of 1-naphthol (N) to phenol (B) absorbed in the resin was N / (N + B) = 0.57. A GPC chart is shown in Fig. Here, the melt viscosity was measured by CAP2000H manufactured by BROOKFIELD Co., Ltd., and the GPC measurement was carried out using a device: MODEL 151 (manufactured by Waters Corporation), 3 columns of TSK-GEL2000H and 1 piece of TSK-GEL4000H Using a solvent: tetrahydrofuran, flow rate: 1.0 ml / min, temperature: 38 DEG C, and detector: RI.

(실시예 2)(다가 히드록시수지의 제조)(Example 2) (Preparation of polyhydric hydroxy resin)

1-나프톨 대신에 2-나프톨을 사용하여, 실시예 1과 동일하게 반응시켜 갈색의 수지 237g을 얻었다(다가 히드록시수지 B). 얻어진 다가 히드록시수지의 수산기 당량은 217g/eq.이고, 연화점은 121℃, 150℃에서의 용융 점도는 6.2Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 1-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=0.50이었다. GPC 차트를 도 2에 나타낸다.2-naphthol was used instead of 1-naphthol, and the reaction was conducted in the same manner as in Example 1 to obtain 237 g of a brown resin (polyhydric hydroxy resin B). The hydroxyl group equivalent of the obtained polyhydric hydroxy resin was 217 g / eq., And the softening point was 121 占 폚 and the melt viscosity at 150 占 폚 was 6.2 Pa · s. From the analysis of the recovered unreacted monomer, the ratio of 1-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 0.50. A GPC chart is shown in Fig.

(실시예 3)(다가 히드록시수지의 제조)(Example 3) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 1-나프톨 100g, 페놀 437g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 180g 및 클로로벤젠 200g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 80℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 275g을 얻었다(다가 히드록시수지 C). 얻어진 다가 히드록시수지의 수산기 당량은 206g/eq.이고, 연화점은 105℃, 150℃에서의 용융 점도는 3.4Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 1-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=0.29였다. GPC 차트를 도 3에 나타낸다.100 g of 1-naphthol, 437 g of phenol, 180 g of dichloromethylnaphthalene (1,4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, and other dichloromethyl compound 1.2%) were added to a 1 L four- And 200 g of chlorobenzene were measured. The temperature was slowly elevated while stirring in a nitrogen gas stream, and the mixture was allowed to react at 80 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and unreacted monomer were removed by distillation under reduced pressure to obtain 275 g of a brown resin (polyhydric hydroxy resin C). The hydroxyl group equivalent of the obtained polyhydric hydroxy resin was 206 g / eq., And the softening point was 105 占 폚 and the melt viscosity at 150 占 폚 was 3.4 Pa 占 퐏. From the analysis of the recovered unreacted monomer, the ratio of 1-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 0.29. A GPC chart is shown in Fig.

(실시예 4)(다가 히드록시수지의 제조)(Example 4) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 2-나프톨 46g, 페놀 271g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 215g 및 클로로벤젠 300g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 80℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 306g을 얻었다(다가 히드록시수지 D). 얻어진 다가 히드록시수지의 수산기 당량은 213g/eq.이고, 연화점은 115℃, 150℃에서의 용융 점도는 4.9Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 2-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=0.23이었다. GPC 차트를 도 4에 나타낸다.To a 1 L four-neck separable flask was added a mixture of 46 g of 2-naphthol, 271 g of phenol, 215 g of dichloromethylnaphthalene (1,4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, and other dichloromethyl compound 1.2% And 300 g of chlorobenzene were measured. The temperature was gradually elevated while stirring in a nitrogen stream, and the mixture was allowed to react at 80 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and unreacted monomer were removed by distillation under reduced pressure to obtain 306 g of a brown resin (polyhydric hydroxy resin D). The obtained polyhydric hydroxy resin had a hydroxyl group equivalent of 213 g / eq., A softening point of 115 ° C and a melt viscosity of 4.9 Pa · s at 150 ° C. From the analysis of the recovered unreacted monomer, the ratio of 2-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 0.23. A GPC chart is shown in Fig.

(실시예 5)(다가 히드록시수지의 제조)(Example 5) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 2-나프톨 224g, 페놀 272g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 100g 및 클로로벤젠 300g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 80℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 207g을 얻었다(다가 히드록시수지 E). 얻어진 다가 히드록시수지의 수산기 당량은 220g/eq.이고, 연화점은 120℃, 150℃에서의 용융 점도는 6.2Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 1-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=0.70이었다. GPC 차트를 도 5에 나타낸다.In a 1 L four-neck separable flask, 224 g of 2-naphthol, 272 g of phenol, 100 g of dichloromethylnaphthalene (1,4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, and other dichloromethyl compound 1.2% And 300 g of chlorobenzene were measured. The temperature was gradually elevated while stirring in a nitrogen stream, and the mixture was allowed to react at 80 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and unreacted monomer were removed by distillation under reduced pressure to obtain 207 g of a brown resin (polyhydric hydroxy resin E). The obtained polyhydric hydroxy resin had a hydroxyl group equivalent of 220 g / eq. And a softening point of 120 占 폚 and a melt viscosity of 6.2 Pa 占 퐏 at 150 占 폚. From the analysis of the recovered unreacted monomer, the ratio of 1-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 0.70. A GPC chart is shown in Fig.

(비교예 1)(다가 히드록시수지의 제조)(Comparative Example 1) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 1-나프톨 251g, 페놀 200g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 131g 및 클로로벤젠 300g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 80℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 255g을 얻었다(다가 히드록시수지 F). 얻어진 다가 히드록시수지의 수산기 당량은 231g/eq.이고, 연화점은 130℃, 150℃에서의 용융 점도는 10.5Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 1-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=0.74였다. GPC 차트를 도 6에 나타낸다.In a 1 L four-neck separable flask, 131 g of 1-naphthol, 25 g of 1-naphthol, 200 g of phenol, 131 g of dichloromethylnaphthalene (1,4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, and other dichloromethyl compound 1.2% And 300 g of chlorobenzene were measured. The temperature was gradually elevated while stirring in a nitrogen stream, and the mixture was allowed to react at 80 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and the unreacted monomer were removed by distillation under reduced pressure to obtain 255 g of a brown resin (polyhydric hydroxy resin F). The hydroxyl group equivalent of the obtained polyhydric hydroxy resin was 231 g / eq., And the softening point was 130 ° C and the melt viscosity at 150 ° C was 10.5 Pa · s. From the analysis of the recovered unreacted monomer, the ratio of 1-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 0.74. A GPC chart is shown in Fig.

(비교예 2)(다가 히드록시수지의 제조)(Comparative Example 2) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 2-나프톨 57g, 페놀 150g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 180g 및 클로로벤젠 400g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 80℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 261g을 얻었다(다가 히드록시수지 G). 얻어진 다가 히드록시수지의 수산기 당량은 234g/eq.이고, 연화점은 135℃, 150℃에서의 용융 점도는 14.8Pa·s였다. 회수한 미반응 모노머의 분석으로부터, 수지 중에 흡수된 2-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=0.29였다. GPC 차트를 도 7에 나타낸다.In a 1 L four-neck separable flask, 57 g of 2-naphthol, 150 g of phenol, 180 g of dichloromethylnaphthalene (1,4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, and other dichloromethyl compound 1.2% And 400 g of chlorobenzene were measured. The temperature was slowly elevated while stirring in a nitrogen gas stream, and the mixture was allowed to react at 80 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and unreacted monomer were removed by distillation under reduced pressure to obtain 261 g of a brown resin (polyhydric hydroxy resin G). The obtained polyhydric hydroxy resin had a hydroxyl group equivalent of 234 g / eq., A softening point of 135 ° C and a melt viscosity of 14.8 Pa · s at 150 ° C. From the analysis of the recovered unreacted monomer, the ratio of 2-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 0.29. A GPC chart is shown in Fig.

(비교예 3)(다가 히드록시수지의 제조)(Comparative Example 3) (Preparation of polyhydric hydroxy resin)

1L의 4구 분리 가능 플라스크에, 2-나프톨 320g, 디클로로메틸나프탈렌(1,4-디클로로메틸체 43.5%, 1,5-디클로로메틸체 55.3%, 그 밖의 디클로로메틸체 1.2%) 100g 및 클로로벤젠 420g을 측정하고, 질소 기류하, 교반하면서 서서히 승온 용해시켜 약 95℃에서 그대로 2시간 반응시켰다. 그 후, 클로로벤젠을 증류 제거하면서 180℃까지 승온하고, 그대로 1시간 반응시켰다. 반응 후, 감압 증류 제거에 의해 용매와 미반응 모노머를 제거한 후 갈색의 수지 171g을 얻었다(다가 히드록시수지 H). 얻어진 다가 히드록시수지의 수산기 당량은 253g/eq.이고, 연화점은 174℃, 150℃에서의 용융 점도는 50Pa·s이상이었다. 수지 중에 흡수된 1-나프톨(N)과 페놀(B)의 비율은 N/(N+B)=1.00이었다. GPC 차트를 도 8에 나타낸다.In a 1 L four-neck separable flask, 320 g of 2-naphthol, 100 g of dichloromethylnaphthalene (1,4-dichloromethyl compound 43.5%, 1,5-dichloromethyl compound 55.3%, other dichloromethyl compound 1.2% And the temperature was gradually elevated while stirring in a nitrogen stream, and the mixture was allowed to react at 95 DEG C for 2 hours. Thereafter, the temperature was raised to 180 ° C while distilling off chlorobenzene, and the reaction was continued for 1 hour. After the reaction, the solvent and unreacted monomer were removed by distillation under reduced pressure to obtain 171 g of a brown resin (polyhydric hydroxy resin H). The obtained polyhydric hydroxy resin had a hydroxyl group equivalent of 253 g / eq., A softening point of 174 캜, and a melt viscosity of 150 Pa · s or more at 150 캜. The ratio of 1-naphthol (N) and phenol (B) absorbed in the resin was N / (N + B) = 1.00. A GPC chart is shown in Fig.

(실시예 6)(Example 6)

실시예 2에서 얻은 다가 히드록시수지 B 100g을 에피클로로히드린 298g 및 디글라임 45g에 용해하고, 감압하(약 120mmHg), 60℃에서 48% 수산화나트륨 수용액 38g을 4시간 동안 적하하였다. 그동안 생성되는 물은 에피클로로히드린과의 공비(共沸)에 의해 계외로 제거하고, 유출(留出)한 에피클로로히드린은 계내로 되돌렸다. 적하 종료 후 1시간 더 반응을 계속하였다. 그 후, 에피클로로히드린 및 디글라임을 감압 증류 제거하고, 메틸이소부틸케톤 295g에 용해한 후 수세에 의해 생성한 염을 제거하였다. 그 후, 48% 수산화나트륨 수용액 9g을 첨가하여, 80℃에서 2시간 반응시켰다. 반응 후, 수세를 행한 후, 용매인 메틸이소부틸케톤을 감압 증류 제거하여 갈색의 에폭시수지 121g을 얻었다(에폭시수지 A). 얻어진 에폭시수지 A의 에폭시 당량은 268g/eq.이고, 연화점은 87℃, 가수분해성 염소는 120ppm, 150℃에서의 용융 점도는 0.40Pa·s였다. GPC 차트를 도 9에 나타낸다. 또한 여기서 가수분해성 염소는, 수지 시료 0.5g을 1,4-디옥산 30ml에 용해시킨 것을 1N-KOH/메탄올 용액 5ml로 30분간 자비 환류한 것을 질산은 용액으로 전위차 적정을 행함으로써 구하였다.100 g of the polyhydric hydroxy resin B obtained in Example 2 was dissolved in 298 g of epichlorohydrin and 45 g of diglyme, and 38 g of a 48% aqueous solution of sodium hydroxide was added dropwise under reduced pressure (about 120 mmHg) at 60 캜 over 4 hours. The water thus produced was removed from the system by azeotropy with epichlorohydrin, and the epichlorohydrin distilled out was returned to the system. After completion of the dropwise addition, the reaction was further continued for 1 hour. Then, epichlorohydrin and diglyme were distilled off under reduced pressure, dissolved in 295 g of methyl isobutyl ketone, and then the salt formed by washing with water was removed. Thereafter, 9 g of a 48% sodium hydroxide aqueous solution was added, and the reaction was carried out at 80 DEG C for 2 hours. After the reaction, the reaction product was washed with water and then methyl isobutyl ketone as a solvent was distilled off under reduced pressure to obtain 121 g of a brown epoxy resin (epoxy resin A). The obtained epoxy resin A had an epoxy equivalent of 268 g / eq., A softening point of 87 캜, a hydrolyzable chlorine of 120 ppm, and a melt viscosity at 150 캜 of 0.40 Pa · s. A GPC chart is shown in Fig. Here, the hydrolyzable chlorine was obtained by subjecting 0.5 g of the resin sample to 30 ml of 1N-KOH / methanol solution in which 30 ml of 1N-KOH / methanol solution was refluxed by potentiometric titration with silver nitrate solution.

(실시예 7)(Example 7)

실시예 4에서 얻은 다가 히드록시수지 D 100g을 에피클로로히드린 307g 및 디글라임 48g에 용해하고, 48% 수산화나트륨 수용액 40g을 사용하여 실시예 6과 동일하게 반응을 행하여 갈색의 에폭시수지 114g을 얻었다(에폭시수지 B). 얻어진 에폭시수지 B의 에폭시 당량은 261g/eq.이고, 연화점은 84℃, 가수분해성 염소는 200ppm, 150℃에서의 용융 점도는 0.4Pa·s였다. GPC 차트를 도 10에 나타낸다.100 g of the polyhydric hydroxy resin D obtained in Example 4 was dissolved in 307 g of epichlorohydrin and 48 g of diglyme and reacted in the same manner as in Example 6 using 40 g of a 48% aqueous solution of sodium hydroxide to obtain 114 g of a brown epoxy resin (Epoxy resin B). The obtained epoxy resin B had an epoxy equivalent of 261 g / eq., A softening point of 84 캜, a hydrolyzable chlorine of 200 ppm and a melt viscosity at 150 캜 of 0.4 Pa · s. A GPC chart is shown in Fig.

(실시예 8)(Example 8)

실시예 5에서 얻은 다가 히드록시수지 E 100g을 에피클로로히드린 300g 및 디글라임 45g에 용해하고, 48% 수산화나트륨 수용액 38.5g을 사용하여 실시예 4와 동일하게 반응을 행하여 갈색의 에폭시수지 111g을 얻었다(에폭시수지 C). 얻어진 에폭시수지 C의 에폭시 당량은 262g/eq.이고, 연화점은 93℃, 가수분해성 염소는 180ppm, 150℃에서의 용융 점도는 0.6Pa·s였다. GPC 차트를 도 11에 나타낸다.100 g of the polyhydric hydroxy resin E obtained in Example 5 was dissolved in 300 g of epichlorohydrin and 45 g of diglyme and reacted in the same manner as in Example 4 using 38.5 g of 48% aqueous sodium hydroxide solution to obtain 111 g of a brown epoxy resin (Epoxy resin C). The obtained epoxy resin C had an epoxy equivalent of 262 g / eq., A softening point of 93 캜, a hydrolyzable chlorine of 180 ppm, and a melt viscosity at 150 캜 of 0.6 Pa · s. A GPC chart is shown in Fig.

(비교예 4)(Comparative Example 4)

비교예 1에서 얻은 다가 히드록시수지 F 100g을 에피클로로히드린 280g 및 디글라임 42g에 용해하고, 48% 수산화나트륨 수용액 36.1g을 사용하여 실시예 3과 동일하게 반응을 행하여 갈색의 에폭시수지 107g을 얻었다(에폭시수지 D). 얻어진 에폭시수지의 에폭시 당량은 282g/eq.이고, 연화점은 102℃, 가수분해성 염소는 320ppm, 150℃에서의 용융 점도는 1.2Pa·s였다. GPC 차트를 도 12에 나타낸다.100 g of the polyhydric hydroxy resin F obtained in Comparative Example 1 was dissolved in 280 g of epichlorohydrin and 42 g of diglyme and the reaction was carried out in the same manner as in Example 3 using 36.1 g of a 48% aqueous solution of sodium hydroxide to obtain 107 g of a brown epoxy resin (Epoxy resin D). The obtained epoxy resin had an epoxy equivalent of 282 g / eq., A softening point of 102 DEG C, a hydrolyzable chlorine of 320 ppm, and a melt viscosity at 150 DEG C of 1.2 Pa · s. A GPC chart is shown in Fig.

(비교예 5)(Comparative Example 5)

비교예 2에서 얻은 다가 히드록시수지 G 100g을 에피클로로히드린 277g 및 디글라임 42g에 용해하고, 48% 수산화나트륨 수용액 35.6g을 사용하여 실시예 3과 동일하게 반응을 행하여 갈색의 에폭시수지 110g을 얻었다(에폭시수지 E). 얻어진 에폭시수지의 에폭시 당량은 285g/eq.이고, 연화점은 120℃, 가수분해성 염소는 290ppm, 150℃에서의 용융 점도는 2.5Pa·s였다. GPC 차트를 도 13에 나타낸다.100 g of the polyhydric hydroxy resin G obtained in Comparative Example 2 was dissolved in 277 g of epichlorohydrin and 42 g of diglyme and reacted in the same manner as in Example 3 using 35.6 g of 48% sodium hydroxide aqueous solution to obtain 110 g of a brown epoxy resin (Epoxy resin E). The obtained epoxy resin had an epoxy equivalent of 285 g / eq., A softening point of 120 캜, a hydrolyzable chlorine of 290 ppm, and a melt viscosity at 150 캜 of 2.5 Pa · s. A GPC chart is shown in Fig.

(실시예 9~16 및 비교예 5~9)(Examples 9 to 16 and Comparative Examples 5 to 9)

실시예 1~8, 비교예 1~5에서 합성한 다가 히드록시수지 및 에폭시수지, 2-나프톨아랄킬형 에폭시수지(에폭시 당량 280, 연화점 84℃, 150℃에서의 용융 점도 0.38Pa·s; ESN-185, 신닛테츠가가쿠 제품; 에폭시수지 F), 3,3',5,5'-테트라메틸-4,4'-디히드록시비페닐의 에폭시화물(에폭시 당량 195, 가수분해성 염소 450ppm, 융점 105℃, 150℃에서의 용융 점도 11mPa·s; YX-4000HK, 재팬 에폭시레진 제품; 에폭시수지 G), 페놀아랄킬수지(OH 당량 162, 연화점 50℃, 150℃에서의 용융 점도 30mPa·s; MEH-7800-4L, 메이와 카세이 제품; 페놀수지 A), 1-나프톨아랄킬수지(OH 당량 208, 연화점 74℃, 150℃에서의 용융 점도 35mPa·s; SN-475, 신닛테츠가가쿠 제품; 다가 히드록시수지 I)를 사용하고, 경화 촉진제로서 트리페닐포스핀, 실란 커플링제로서 γ-글리시독시프로필트리메톡시실란을 사용하여, 표 1에 나타내는 배합으로 수지 조성물로 하였다.(Having an epoxy equivalent of 280, a softening point of 84 占 폚, a melt viscosity of 0.38 Pa 占 퐏 at 150 占 폚, and an ESN (epoxy equivalent) of 150 占 폚) synthesized in Examples 1 to 8 and Comparative Examples 1 to 5 and an epoxy resin and a 2-naphthol aralkyl type epoxy resin Epoxy resin F), 3,3 ', 5,5'-tetramethyl-4,4'-dihydroxybiphenyl epoxy resin (epoxy equivalent 195, 450 ppm hydrolyzable chlorine, Epoxy resin G), phenol aralkyl resin (OH equivalent: 162, softening point: 50 占 폚, melt viscosity: 30 mPa 占 퐏 at 150 占 폚, melting point: 11 mPa 占 퐏 at 150 占 폚; YX-4000HK, Japan Epoxy Resin; Phenol resin A), 1-naphthol aralkyl resin (OH equivalent: 208, softening point: 74 占 폚; melt viscosity: 35 mPa 占 퐏 at 150 占 폚; SN-475; Shinnetsettsu Kagaku Co., Product, polyhydric hydroxy resin I) was used, triphenylphosphine as a curing accelerator, and? -Glycidoxypropyltrimethoxysilane as a silane coupling agent were used, Indicating the formulation to produce a resin composition.

수지 조성물의 물성 측정으로서, 스파이럴 플로우는 규격(EMMI-1-66)에 준거한 스파이럴 플로우 측정용 금형으로 에폭시수지 조성물을 스파이럴 플로우의 주입 압력(150kgf/cm2), 경화 온도 175℃, 경화 시간 3분의 조건으로 성형하여 유동장을 조사하였다. 겔 타임은 미리 175℃로 가열해 둔 겔화 시험기(닛신 가가쿠(주) 제품)의 오목부에 에폭시수지 조성물을 부어 넣고, PTFE제의 교반봉을 사용하여 1초간에 2회전의 속도로 교반하여, 에폭시수지 조성물이 경화할 때까지 요한 겔화 시간을 조사하였다. 경화물의 물성은, 이 에폭시수지 조성물을 사용하여 175℃로 성형하고, 175℃에서 12시간 포스트 큐어를 행하여 경화물 시험편을 얻은 후, 각종 물성 측정에 제공하였다. 유리 전이점 및 열팽창 계수의 측정은, 열기계 측정장치에 의해 승온 속도 7℃/분의 조건으로 구하였다. 구부림 시험은 240℃에서의 고온 구부림 강도, 구부림 탄성율을 3점 구부림법에 의해 행하였다. 접착 강도는 42얼로이(alloy)판 2장 사이에 25mm×12.5mm×0.5mm의 성형물을 압축 성형기에 의해 175℃에서 성형하고, 175℃, 12시간 포스트 큐어를 행한 후 인장 전단(剪斷) 강도를 구함으로써 평가하였다. 흡수율은 본 에폭시수지 조성물을 사용하여, 지름 50mm, 두께 3mm의 원반을 성형하고, 포스트 큐어 후 85℃, 85% RH의 조건으로 100시간 흡습시켰을 때의 것이다. 난연성은 두께 1/16인치의 시험편을 성형하고, UL94V-0 규격에 의해 평가하여, n=5의 시험에서의 합계 연소 시간으로 나타내었다. 결과를 정리하여 표 2에 나타낸다.As a property measurement of the resin composition, the spiral flow was a mold for spiral flow measurement conforming to the standard (EMMI-1-66). The epoxy resin composition was injected at a spiral flow injection pressure (150 kgf / cm 2 ) 3 minutes, and the flow field was investigated. The gel time was such that the epoxy resin composition was poured into a recess of a gelation tester (manufactured by Nisshin Kagaku Co., Ltd.) preliminarily heated to 175 ° C and stirred at a speed of two revolutions per second using a PTFE stirring rod , And the gelation time required until the epoxy resin composition hardened was investigated. The physical properties of the cured product were molded at 175 ° C using the epoxy resin composition, post cured at 175 ° C for 12 hours to obtain a cured product test piece, and then subjected to various physical property measurements. The glass transition point and the coefficient of thermal expansion were measured by a thermomechanical measuring apparatus at a heating rate of 7 캜 / min. In the bending test, the high-temperature bending strength at 240 ° C and the bending elastic modulus were measured by the three-point bending method. The adhesive strength was evaluated by forming a molded article of 25 mm x 12.5 mm x 0.5 mm between two 42 alloy plates at 175 deg. C by a compression molding machine, post curing at 175 deg. C for 12 hours, And the strength was evaluated. The water absorption rate is obtained by forming an original disk having a diameter of 50 mm and a thickness of 3 mm by using the present epoxy resin composition, and then post-curing and moisture-absorbing for 100 hours at 85 캜 and 85% RH. The flame retardancy was expressed by the total combustion time in the test of n = 5 by molding a test piece having a thickness of 1/16 inch and evaluating it according to the UL94V-0 standard. The results are summarized in Table 2.

Figure 112011022420859-pat00004
Figure 112011022420859-pat00004

Figure 112011022420859-pat00005
Figure 112011022420859-pat00005

Claims (7)

페놀과, 1-나프톨 및 2-나프톨에서 선택되는 나프톨류와, 하기 일반식(2)
Figure 112017094767588-pat00024

(단, X는 수산기, 할로겐원자 또는 탄소수 1~6의 알콕시기를 나타낸다.)
로 표시되는 나프탈렌계 축합제를 반응시켜 얻어지고, 하기 일반식(1),
Figure 112017094767588-pat00025

(단, A는 나프탈렌환(N) 또는 벤젠환(B)을 나타내고, n은 1.1~5의 수를 나타낸다.)로 표시되고, N/(N+B)로 계산되는 몰비가 0.2~0.7이면서, 연화점이 105~125℃, 150℃에서의 용융 점도가 3~10Pa·s인 것을 특징으로 하는 다가 히드록시수지.
Phenol, naphthols selected from 1-naphthol and 2-naphthol,
Figure 112017094767588-pat00024

(Wherein X represents a hydroxyl group, a halogen atom or an alkoxy group having 1 to 6 carbon atoms).
Based condensing agent represented by the following general formula (1),
Figure 112017094767588-pat00025

(Wherein A represents a naphthalene ring (N) or a benzene ring (B) and n represents a number of 1.1 to 5), and the molar ratio calculated by N / (N + B) is 0.2 to 0.7 , A softening point of 105 to 125 占 폚, and a melt viscosity at 150 占 폚 of 3 to 10 Pa 占 퐏.
페놀류와 나프톨류의 합계량 1몰에 대하여, 0.10~0.40몰의 나프톨류를 사용하고, 하기 일반식(2),
Figure 112017017750204-pat00007

(단, X는 수산기, 할로겐원자 또는 탄소수 1~6의 알콕시기를 나타낸다.)로 표시되는 나프탈렌계 축합제를 0.05~0.35몰을 사용하여 반응시키는 것을 특징으로 하는 제1항에 기재된 다가 히드록시수지의 제조방법.
Wherein 0.10 to 0.40 mol of naphthol is used per 1 mol of the total amount of phenols and naphthols,
Figure 112017017750204-pat00007

(Wherein X represents a hydroxyl group, a halogen atom or an alkoxy group having 1 to 6 carbon atoms), in the presence of 0.05 to 0.35 mol of a naphthalene-based condensing agent. &Lt; / RTI &gt;
제2항에 있어서,
나프탈렌계 축합제 중의 1,4-디치환체와 1,5-디치환체의 합계 함유율이 90중량%이상인 것을 특징으로 하는 다가 히드록시수지의 제조방법.
3. The method of claim 2,
Wherein the total content of 1,4-di-substituent and 1,5-di-substituent in the naphthalene-based condensing agent is 90% by weight or more.
제1항에 기재된 다가 히드록시수지와 에피클로로히드린을 반응시켜 제조되고,
하기 일반식(3),
Figure 112017094767588-pat00026

(단, A는 나프탈렌환(N) 또는 벤젠환(B), G는 글리시딜기를 나타내고, n은 1.1~5의 수를 나타낸다.)으로 표시되고, N/(N+B)로 계산되는 몰비가 0.2~0.7이면서, 연화점이 80~100℃, 150℃에서의 용융 점도가 0.4~1.0Pa·s인 것을 특징으로 하는 에폭시수지.
A polyurethane resin prepared by reacting the polyhydric hydroxy resin according to claim 1 with epichlorohydrin,
(3),
Figure 112017094767588-pat00026

(Wherein A represents a naphthalene ring (N) or a benzene ring (B) and G represents a glycidyl group and n represents a number of 1.1 to 5), and is calculated as N / (N + B) Wherein the molar ratio is 0.2 to 0.7, the softening point is 80 to 100 占 폚, and the melt viscosity at 150 占 폚 is 0.4 to 1.0 Pa · s.
제1항에 기재된 다가 히드록시수지와 에피클로로히드린을 반응시키는 것을 특징으로 하는 제4항에 기재된 에폭시수지의 제조법.A process for producing an epoxy resin according to claim 4, wherein the polyhydric hydroxy resin according to claim 1 is reacted with epichlorohydrin. 에폭시수지와 경화제를 포함하는 에폭시수지 조성물에 있어서, 제1항에 기재된 다가 히드록시수지 또는 제4항에 기재된 에폭시수지의 적어도 어느 한쪽을 필수 성분으로서 배합하여 이루어지는 것을 특징으로 하는 에폭시수지 조성물.An epoxy resin composition comprising an epoxy resin and a curing agent, the epoxy resin composition comprising at least one of the polyhydric hydroxy resin according to claim 1 or the epoxy resin according to claim 4 as an essential component. 제6항에 기재된 에폭시수지 조성물을 경화하여 이루어지는 것을 특징으로 하는 경화물.A cured product obtained by curing the epoxy resin composition according to claim 6.
KR1020110027550A 2010-03-29 2011-03-28 Polyhydroxy resin, epoxy resin, method for manufacturing the same, epoxy resin composition and cured product using the same Active KR101809464B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2010-075682 2010-03-29
JP2010075682A JP5209660B2 (en) 2010-03-29 2010-03-29 Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them

Publications (2)

Publication Number Publication Date
KR20110109939A KR20110109939A (en) 2011-10-06
KR101809464B1 true KR101809464B1 (en) 2017-12-15

Family

ID=44695411

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110027550A Active KR101809464B1 (en) 2010-03-29 2011-03-28 Polyhydroxy resin, epoxy resin, method for manufacturing the same, epoxy resin composition and cured product using the same

Country Status (4)

Country Link
JP (1) JP5209660B2 (en)
KR (1) KR101809464B1 (en)
CN (1) CN102206326B (en)
TW (1) TW201211097A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5672947B2 (en) * 2010-10-25 2015-02-18 住友ベークライト株式会社 Resin composition for sealing and electronic component device
SG11201405075SA (en) * 2012-02-23 2014-10-30 Nippon Steel & Sumikin Chem Co Polyvalent hydroxy resin, epoxy resin, method for producing same, epoxy resin composition and cured product thereof
CN103724999A (en) * 2013-05-30 2014-04-16 广东生益科技股份有限公司 A kind of cyanate ester resin composition and its application
CN103724998A (en) * 2013-05-30 2014-04-16 广东生益科技股份有限公司 A kind of cyanate ester resin composition and its application
US20160115313A1 (en) * 2013-05-30 2016-04-28 Shengyi Technology Co., Ltd. Cyanate resin composition and use thereof
JP6406847B2 (en) * 2014-03-26 2018-10-17 新日鉄住金化学株式会社 Modified polyvalent hydroxy resin, epoxy resin, epoxy resin composition and cured product thereof
JP7277136B2 (en) * 2018-12-28 2023-05-18 日鉄ケミカル&マテリアル株式会社 Epoxy resin, epoxy resin composition, and cured product thereof
CN113614140B (en) * 2019-03-27 2024-07-09 日铁化学材料株式会社 Naphthol resin, epoxy resin composition and cured product thereof
CN112920378B (en) * 2021-01-28 2023-06-13 深圳市宝安区新材料研究院 Hydroxy resin and preparation method and application thereof
JP2023019801A (en) * 2021-07-29 2023-02-09 日鉄ケミカル&マテリアル株式会社 Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004059792A (en) * 2002-07-30 2004-02-26 Nippon Steel Chem Co Ltd Polyhydric hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3132795B2 (en) * 1994-01-11 2001-02-05 三井化学株式会社 Epoxy resin composition, cured product thereof, and semiconductor device
JP2004123859A (en) * 2002-10-01 2004-04-22 Nippon Steel Chem Co Ltd Polyhydric hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them
JP2006056969A (en) * 2004-08-19 2006-03-02 Nippon Steel Chem Co Ltd Epoxy resin composition and cured product thereof
WO2006025429A1 (en) * 2004-09-01 2006-03-09 Dainippon Ink And Chemicals, Inc. Epoxy resin composition, products of curing thereof, material for the encapsulation of semiconductors, novel phenol resin, novel epoxy resin, process for production of novel phenol resin and process for production of novel epoxy resin
JP5504550B2 (en) * 2006-01-23 2014-05-28 日立化成株式会社 Epoxy resin molding material for sealing and electronic component device
CN101522792B (en) * 2006-10-02 2013-01-09 日立化成工业株式会社 Epoxy resin molding material for sealing and electronic component device
JP5139914B2 (en) * 2008-08-04 2013-02-06 新日鉄住金化学株式会社 Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004059792A (en) * 2002-07-30 2004-02-26 Nippon Steel Chem Co Ltd Polyhydric hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them

Also Published As

Publication number Publication date
TWI561550B (en) 2016-12-11
KR20110109939A (en) 2011-10-06
CN102206326B (en) 2014-11-12
JP5209660B2 (en) 2013-06-12
CN102206326A (en) 2011-10-05
TW201211097A (en) 2012-03-16
JP2011207966A (en) 2011-10-20

Similar Documents

Publication Publication Date Title
KR101809464B1 (en) Polyhydroxy resin, epoxy resin, method for manufacturing the same, epoxy resin composition and cured product using the same
JPWO2014065152A1 (en) Epoxy resin composition, method for producing cured epoxy resin, and semiconductor device
KR101410919B1 (en) Polyhydric hydroxy resin, epoxy resin, production method therefor, epoxy resin composition and cured product thereof
JP5457304B2 (en) Phenolic resin, epoxy resin, production method thereof, epoxy resin composition and cured product
JPWO2008050879A1 (en) Epoxy resin composition and cured product
JP5734603B2 (en) Phenolic resin, epoxy resin, production method thereof, epoxy resin composition and cured product
WO2021201046A1 (en) Polyhydric hydroxy resin, epoxy resin, method for producing same, epoxy resin composition using same and cured product
JP6139997B2 (en) Epoxy resin, epoxy resin composition, and cured product thereof
JP5139914B2 (en) Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them
TWI548681B (en) A polyvalent hydroxyl resin, an epoxy resin, a manufacturing method thereof, an epoxy resin composition and a hardened product thereof
JP4465257B2 (en) Naphthol resin, epoxy resin, production method thereof, epoxy resin composition using the same, and cured product thereof
JP4188022B2 (en) Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them
JP4088525B2 (en) Epoxy resin, production method thereof, epoxy resin composition and cured product
WO2003068837A1 (en) Indole resins, epoxy resins and resin compositions containing the same
JP2004123859A (en) Polyhydric hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them
TWI521009B (en) The epoxy resin composition and cured
JP4493748B2 (en) Epoxy resin, method for producing the same, epoxy resin composition and cured product thereof
JPH11158255A (en) Novel polyhydric hydroxy compound, new epoxy resin, production method thereof, epoxy resin composition using them and cured product thereof
JP3806217B2 (en) Novel polyvalent hydroxy compound, novel epoxy resin, production method thereof, epoxy resin composition using them, and cured product thereof
JP4408978B2 (en) Production method of polyvalent hydroxy resin and epoxy resin
JP2006348064A (en) Epoxy resin, process for producing the same, epoxy resin composition using the same, and cured product thereof
JPH09255758A (en) Novel epoxy resin, intermediate thereof, production method thereof, epoxy resin composition using them, and cured product thereof
JPH11255688A (en) Novel polyhydric hydroxy compound, new epoxy resin, production method thereof, epoxy resin composition using them and cured product thereof
JP2012046615A (en) Epoxy resin, production method of the same, epoxy resin composition and cured product
JP2004010724A (en) Epoxy resin, production method thereof, epoxy resin composition and cured product

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20110328

PG1501 Laying open of application
AMND Amendment
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20151229

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20110328

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20161221

Patent event code: PE09021S01D

AMND Amendment
E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20170629

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20161221

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

AMND Amendment
PX0901 Re-examination

Patent event code: PX09011S01I

Patent event date: 20170629

Comment text: Decision to Refuse Application

Patent event code: PX09012R01I

Patent event date: 20170221

Comment text: Amendment to Specification, etc.

Patent event code: PX09012R01I

Patent event date: 20151229

Comment text: Amendment to Specification, etc.

PX0701 Decision of registration after re-examination

Patent event date: 20171113

Comment text: Decision to Grant Registration

Patent event code: PX07013S01D

Patent event date: 20170927

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

Patent event date: 20170629

Comment text: Decision to Refuse Application

Patent event code: PX07011S01I

Patent event date: 20170221

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

Patent event date: 20151229

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

X701 Decision to grant (after re-examination)
GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20171211

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20171212

End annual number: 3

Start annual number: 1

PG1601 Publication of registration