KR101790830B1 - 간섭계, 리소그래피 장치, 및 물품 제조 방법 - Google Patents

간섭계, 리소그래피 장치, 및 물품 제조 방법 Download PDF

Info

Publication number
KR101790830B1
KR101790830B1 KR1020140088285A KR20140088285A KR101790830B1 KR 101790830 B1 KR101790830 B1 KR 101790830B1 KR 1020140088285 A KR1020140088285 A KR 1020140088285A KR 20140088285 A KR20140088285 A KR 20140088285A KR 101790830 B1 KR101790830 B1 KR 101790830B1
Authority
KR
South Korea
Prior art keywords
light
interference
incident
substrate
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020140088285A
Other languages
English (en)
Korean (ko)
Other versions
KR20150011313A (ko
Inventor
와타루 야마구치
다카히로 마츠모토
히데키 이나
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20150011313A publication Critical patent/KR20150011313A/ko
Application granted granted Critical
Publication of KR101790830B1 publication Critical patent/KR101790830B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
KR1020140088285A 2013-07-22 2014-07-14 간섭계, 리소그래피 장치, 및 물품 제조 방법 Active KR101790830B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013152096A JP6271896B2 (ja) 2013-07-22 2013-07-22 干渉計測装置、リソグラフィ装置および物品の製造方法
JPJP-P-2013-152096 2013-07-22

Publications (2)

Publication Number Publication Date
KR20150011313A KR20150011313A (ko) 2015-01-30
KR101790830B1 true KR101790830B1 (ko) 2017-10-26

Family

ID=52343344

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140088285A Active KR101790830B1 (ko) 2013-07-22 2014-07-14 간섭계, 리소그래피 장치, 및 물품 제조 방법

Country Status (4)

Country Link
US (1) US9625836B2 (enExample)
JP (1) JP6271896B2 (enExample)
KR (1) KR101790830B1 (enExample)
TW (1) TWI579652B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10437033B2 (en) 2014-01-18 2019-10-08 Daylight Solutions, Inc. Modulating spectroscopic imaging system using substantially coherent illumination
JP6449310B2 (ja) 2014-01-18 2019-01-09 デイライト ソリューションズ、インコーポレイテッド 低ノイズ分光画像化システム
US11803044B2 (en) 2014-01-18 2023-10-31 Daylight Solutions, Inc. Low-noise spectroscopic imaging system with steerable substantially coherent illumination
EP2966489A1 (de) * 2014-06-30 2016-01-13 Carl Zeiss SMT GmbH Beleuchtungsoptik sowie abbildende optik für ein metrologiesystem für die untersuchung eines objekts mit euv-beleuchtungs- und abbildungslicht sowie metrologiesystem mit einer derartigen beleuchtungsoptik bzw. einer derartigen abbildungsoptik
CN111158220A (zh) 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
TWI693477B (zh) * 2015-02-23 2020-05-11 日商尼康股份有限公司 測量裝置、微影系統及曝光裝置、以及元件製造方法
CN107278279B (zh) 2015-02-23 2020-07-03 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
EP3309616A1 (en) 2016-10-14 2018-04-18 ASML Netherlands B.V. Method of inspecting a substrate, metrology apparatus, and lithographic system
JP6818501B2 (ja) * 2016-10-19 2021-01-20 キヤノン株式会社 リソグラフィ装置、および物品製造方法
JP2020060690A (ja) * 2018-10-10 2020-04-16 ウシオ電機株式会社 光照射方法、機能素子の製造方法および光照射装置
US11162897B2 (en) * 2019-05-15 2021-11-02 Onto Innovation Inc. Optical metrology device using numerical aperture reduction
US11841548B2 (en) * 2020-08-18 2023-12-12 Zygo Corporation Variable-zoom imaging apparatus
JP7743209B2 (ja) * 2021-06-08 2025-09-24 キヤノン株式会社 成形装置、成形方法及び物品の製造方法
KR102492803B1 (ko) 2022-04-19 2023-01-31 (주)오로스테크놀로지 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법
CN118565358B (zh) * 2024-07-31 2024-11-22 合肥合视科达智能科技有限公司 一种厚度及双侧面形同步检测系统及方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070086013A1 (en) * 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
US20090225327A1 (en) * 2008-03-05 2009-09-10 Canon Kabushiki Kaisha Position measurement apparatus, position measurement method, and exposure apparatus
US20120307258A1 (en) * 2010-01-22 2012-12-06 Universitaet Stuttgart Method and arrangement for robust interferometry

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5398113A (en) 1993-02-08 1995-03-14 Zygo Corporation Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms
JP3685667B2 (ja) * 1999-10-27 2005-08-24 株式会社日立製作所 立体形状検出方法及び装置、並びに検査方法及び装置
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
JP5084558B2 (ja) 2008-02-28 2012-11-28 キヤノン株式会社 表面形状計測装置、露光装置及びデバイス製造方法
JP5787483B2 (ja) * 2010-01-16 2015-09-30 キヤノン株式会社 計測装置及び露光装置
JP2013024747A (ja) * 2011-07-21 2013-02-04 Canon Inc 計測装置、露光装置およびデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070086013A1 (en) * 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
US20090225327A1 (en) * 2008-03-05 2009-09-10 Canon Kabushiki Kaisha Position measurement apparatus, position measurement method, and exposure apparatus
US20120307258A1 (en) * 2010-01-22 2012-12-06 Universitaet Stuttgart Method and arrangement for robust interferometry

Also Published As

Publication number Publication date
TW201504771A (zh) 2015-02-01
KR20150011313A (ko) 2015-01-30
TWI579652B (zh) 2017-04-21
US20150022796A1 (en) 2015-01-22
JP6271896B2 (ja) 2018-01-31
US9625836B2 (en) 2017-04-18
JP2015021904A (ja) 2015-02-02

Similar Documents

Publication Publication Date Title
KR101790830B1 (ko) 간섭계, 리소그래피 장치, 및 물품 제조 방법
JP4153304B2 (ja) オーバーレイの測定方法
KR100697277B1 (ko) 각도-분해 분광 리소그래피 특성화를 위한 방법 및 장치
JP5787483B2 (ja) 計測装置及び露光装置
JP4512627B2 (ja) 測定装置、露光装置及びデバイス製造方法
TWI636280B (zh) 物鏡系統
KR102340495B1 (ko) 스펙트럼 분석을 사용하는 간섭측정식 인코더
JP6006919B2 (ja) メトロロジ用の反射屈折照明システム
KR20060014063A (ko) 위치 정보 계측 방법 및 장치, 그리고 노광 방법 및 장치
US20090262323A1 (en) Measurement apparatus, exposure apparatus, and device manufacturing method
TW201333433A (zh) 編碼器裝置、移動量測量方法、光學裝置、曝光裝置、曝光方法及元件製造方法
JP2009210466A (ja) 位置測定装置、位置測定方法及び露光装置
US20130021588A1 (en) Measurement apparatus, exposure apparatus, and method of manufacturing device
JPH05343291A (ja) 位置合わせ方法及びそれを用いた投影露光装置
JP2007234685A (ja) 測定装置、当該測定装置を有する露光装置及びデバイス製造方法
KR102227293B1 (ko) 리소그라피 마스크의 초점 위치를 결정하기 위한 방법 및 그 방법을 실행하기 위한 계측 시스템
TWI487001B (zh) A surface position detecting device, a surface position detecting method, an exposure apparatus, and an element manufacturing method
US7684050B2 (en) Shape measuring apparatus, shape measuring method, and exposure apparatus
JP2010272655A (ja) 表面位置の測定装置、露光装置及びデバイス製造方法
JP2006017485A (ja) 面形状測定装置および測定方法、並びに、投影光学系の製造方法、投影光学系及び投影露光装置
US20160025480A1 (en) Interferometric level sensor
JP2004273748A (ja) 収差測定装置
JP2006053056A (ja) 位置計測方法、位置計測装置、露光装置、及びデバイス製造方法
JP2004281904A (ja) 位置計測装置、露光装置、及びデバイス製造方法
JP2015220343A (ja) 検出装置、リソグラフィ装置、および物品の製造方法

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20140714

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20150714

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20140714

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20170119

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20170921

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20171020

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20171020

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20201015

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20210927

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 20230921

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee