KR101762368B1 - 얇은 n-형 영역을 갖는 ⅲ-v족 발광 디바이스 - Google Patents

얇은 n-형 영역을 갖는 ⅲ-v족 발광 디바이스 Download PDF

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KR101762368B1
KR101762368B1 KR1020127016290A KR20127016290A KR101762368B1 KR 101762368 B1 KR101762368 B1 KR 101762368B1 KR 1020127016290 A KR1020127016290 A KR 1020127016290A KR 20127016290 A KR20127016290 A KR 20127016290A KR 101762368 B1 KR101762368 B1 KR 101762368B1
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iii nitride
transparent conductive
layer
nitride material
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KR20120094502A (ko
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프레데릭 듀퐁
존 이. 에플러
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코닌클리케 필립스 엔.브이.
루미레즈 엘엘씨
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Assigned to 루미리즈 홀딩 비.브이. reassignment 루미리즈 홀딩 비.브이. 권리의 전부이전등록 Assignors: 루미레즈 엘엘씨, 코닌클리케 필립스 엔.브이.
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/833Transparent materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018Bonding of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/032Manufacture or treatment of electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/814Bodies having reflecting means, e.g. semiconductor Bragg reflectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • H10H20/8514Wavelength conversion means characterised by their shape, e.g. plate or foil

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KR1020127016290A 2009-11-23 2010-11-12 얇은 n-형 영역을 갖는 ⅲ-v족 발광 디바이스 Active KR101762368B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/624,268 US8581229B2 (en) 2009-11-23 2009-11-23 III-V light emitting device with thin n-type region
US12/624,268 2009-11-23
PCT/IB2010/055147 WO2011061664A1 (en) 2009-11-23 2010-11-12 Iii-v light emitting device with thin n-type region

Related Child Applications (1)

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KR1020177020575A Division KR101905590B1 (ko) 2009-11-23 2010-11-12 얇은 n-형 영역을 갖는 ⅲ-v족 발광 디바이스

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KR20120094502A KR20120094502A (ko) 2012-08-24
KR101762368B1 true KR101762368B1 (ko) 2017-07-27

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KR1020177020575A Active KR101905590B1 (ko) 2009-11-23 2010-11-12 얇은 n-형 영역을 갖는 ⅲ-v족 발광 디바이스

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Country Link
US (2) US8581229B2 (https=)
EP (1) EP2504868B1 (https=)
JP (1) JP5674806B2 (https=)
KR (2) KR101762368B1 (https=)
CN (1) CN102714255B (https=)
TW (1) TWI523258B (https=)
WO (1) WO2011061664A1 (https=)

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DE102011012298A1 (de) 2010-12-28 2012-06-28 Osram Opto Semiconductors Gmbh Verbundsubstrat, Halbleiterchip mit Verbundsubstrat und Verfahren zur Herstellung von Verbundsubstraten und Halbleiterchips
KR20120099318A (ko) * 2011-01-26 2012-09-10 엘지이노텍 주식회사 발광 소자 및 그 제조방법
KR102082499B1 (ko) 2011-08-26 2020-02-27 루미리즈 홀딩 비.브이. 반도체 구조를 프로세싱하는 방법
JP2014027092A (ja) * 2012-07-26 2014-02-06 Sharp Corp 半導体発光素子
US9728458B2 (en) 2012-07-31 2017-08-08 Soitec Methods for fabrication of semiconductor structures using laser lift-off process, and related semiconductor structures
US9653647B2 (en) 2013-06-14 2017-05-16 Micron Technology, Inc. Ultrathin solid state dies and methods of manufacturing the same
EP3127143A4 (en) * 2014-03-31 2017-11-29 Nanyang Technological University Methods of recycling substrates and carrier substrates
DE102016124646A1 (de) * 2016-12-16 2018-06-21 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterbauelements
CN111933765B (zh) * 2020-07-03 2022-04-26 厦门士兰明镓化合物半导体有限公司 微型发光二极管及制作方法,微型led显示模块及制作方法

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JP2008053425A (ja) * 2006-08-24 2008-03-06 Matsushita Electric Ind Co Ltd 半導体発光装置

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JP3757544B2 (ja) * 1997-05-21 2006-03-22 昭和電工株式会社 Iii族窒化物半導体発光素子
WO2002056394A1 (en) 2001-01-09 2002-07-18 Emcore Corporation Electrode structures for p-type nitride semiconductores and mehtods of making same
JP3896027B2 (ja) 2002-04-17 2007-03-22 シャープ株式会社 窒化物系半導体発光素子およびその製造方法
US7880182B2 (en) * 2002-07-15 2011-02-01 Epistar Corporation Light-emitting element array
TWI249148B (en) * 2004-04-13 2006-02-11 Epistar Corp Light-emitting device array having binding layer
JP4135567B2 (ja) * 2003-06-10 2008-08-20 松下電器産業株式会社 キャップ取り外し装置
US20050173724A1 (en) 2004-02-11 2005-08-11 Heng Liu Group III-nitride based LED having a transparent current spreading layer
JP2005268581A (ja) * 2004-03-19 2005-09-29 Matsushita Electric Ind Co Ltd 窒化ガリウム系化合物半導体発光素子
TWM255518U (en) * 2004-04-23 2005-01-11 Super Nova Optoelectronics Cor Vertical electrode structure of Gallium Nitride based LED
US7361938B2 (en) * 2004-06-03 2008-04-22 Philips Lumileds Lighting Company Llc Luminescent ceramic for a light emitting device
TWI299914B (en) * 2004-07-12 2008-08-11 Epistar Corp Light emitting diode with transparent electrically conductive layer and omni directional reflector
US8334155B2 (en) 2005-09-27 2012-12-18 Philips Lumileds Lighting Company Llc Substrate for growing a III-V light emitting device
JP5232970B2 (ja) * 2006-04-13 2013-07-10 豊田合成株式会社 半導体発光素子の製造方法及び半導体発光素子とそれを備えたランプ
JP4929924B2 (ja) * 2006-08-25 2012-05-09 サンケン電気株式会社 半導体発光素子、その製造方法、及び複合半導体装置
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JP2008053425A (ja) * 2006-08-24 2008-03-06 Matsushita Electric Ind Co Ltd 半導体発光装置

Also Published As

Publication number Publication date
KR101905590B1 (ko) 2018-10-10
KR20120094502A (ko) 2012-08-24
JP5674806B2 (ja) 2015-02-25
US8878160B2 (en) 2014-11-04
EP2504868B1 (en) 2018-05-16
TW201125161A (en) 2011-07-16
WO2011061664A1 (en) 2011-05-26
US8581229B2 (en) 2013-11-12
TWI523258B (zh) 2016-02-21
CN102714255B (zh) 2015-10-21
CN102714255A (zh) 2012-10-03
EP2504868A1 (en) 2012-10-03
US20140034990A1 (en) 2014-02-06
JP2013511853A (ja) 2013-04-04
US20110121332A1 (en) 2011-05-26
KR20170098304A (ko) 2017-08-29

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