KR101758958B1 - 마이크로리소그래피 투영 노광 장치의 조명 시스템 - Google Patents

마이크로리소그래피 투영 노광 장치의 조명 시스템 Download PDF

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Publication number
KR101758958B1
KR101758958B1 KR1020137022790A KR20137022790A KR101758958B1 KR 101758958 B1 KR101758958 B1 KR 101758958B1 KR 1020137022790 A KR1020137022790 A KR 1020137022790A KR 20137022790 A KR20137022790 A KR 20137022790A KR 101758958 B1 KR101758958 B1 KR 101758958B1
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South Korea
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imaging system
light
optical element
optical imaging
diffractive optical
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Korean (ko)
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KR20140021549A (ko
Inventor
미카엘 파트라
마르쿠스 데귄테르
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
KR1020137022790A 2011-02-28 2011-02-28 마이크로리소그래피 투영 노광 장치의 조명 시스템 Active KR101758958B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2011/000960 WO2012116710A1 (en) 2011-02-28 2011-02-28 Illumination system of a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
KR20140021549A KR20140021549A (ko) 2014-02-20
KR101758958B1 true KR101758958B1 (ko) 2017-07-17

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Family Applications (1)

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KR1020137022790A Active KR101758958B1 (ko) 2011-02-28 2011-02-28 마이크로리소그래피 투영 노광 장치의 조명 시스템

Country Status (5)

Country Link
US (1) US9280055B2 (enExample)
JP (1) JP5787382B2 (enExample)
KR (1) KR101758958B1 (enExample)
TW (1) TWI502285B (enExample)
WO (1) WO2012116710A1 (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080259450A1 (en) * 2007-04-20 2008-10-23 Canon Kabushiki Kaisha Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method
WO2011012148A1 (en) * 2009-07-31 2011-02-03 Carl Zeiss Smt Gmbh Optical beam deflecting element and method of adjustment

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JP2540744B2 (ja) * 1987-10-08 1996-10-09 株式会社ニコン レ―ザを用いた露光用照明装置
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
JP3532742B2 (ja) * 1997-08-29 2004-05-31 株式会社東芝 Ｘ線リソグラフィ装置およびｘ線露光方法
US7009140B2 (en) 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
TW544758B (en) * 2001-05-23 2003-08-01 Nikon Corp Lighting optical device, exposure system, and production method of micro device
JP4401060B2 (ja) 2001-06-01 2010-01-20 エーエスエムエル ネザーランズ ビー．ブイ． リトグラフ装置、およびデバイス製造方法
KR100480620B1 (ko) 2002-09-19 2005-03-31 삼성전자주식회사 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법
EP1469347A1 (en) * 2003-04-17 2004-10-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4717813B2 (ja) 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
JP2005150541A (ja) * 2003-11-18 2005-06-09 Nikon Corp 照明光学装置、露光装置および露光方法
JP2005183736A (ja) * 2003-12-19 2005-07-07 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
WO2005076083A1 (en) * 2004-02-07 2005-08-18 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP4497949B2 (ja) * 2004-02-12 2010-07-07 キヤノン株式会社 露光装置
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
US7851725B2 (en) 2004-11-17 2010-12-14 Metal Improvement Company Llc Active beam delivery system with image relay
JP5030944B2 (ja) * 2005-04-26 2012-09-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のための照明システム
JP4701030B2 (ja) * 2005-07-22 2011-06-15 キヤノン株式会社 露光装置、露光パラメータを設定する設定方法、露光方法、デバイス製造方法及びプログラム
US7352789B2 (en) 2006-01-12 2008-04-01 Semiconductor Energy Laboratory Co., Ltd. Laser light irradiation apparatus and laser light irradiation method
TWI444779B (zh) * 2007-01-30 2014-07-11 Zeiss Carl Smt Gmbh 微影蝕刻的投影曝光儀器之照明系統
JP4950795B2 (ja) * 2007-07-30 2012-06-13 キヤノン株式会社 露光装置、デバイス製造方法及び補正方法
EP2146248B1 (en) 2008-07-16 2012-08-29 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
KR101528397B1 (ko) * 2010-12-28 2015-06-11 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080259450A1 (en) * 2007-04-20 2008-10-23 Canon Kabushiki Kaisha Illumination optical apparatus, relay optical system, exposure apparatus, and device manufacturing method
WO2011012148A1 (en) * 2009-07-31 2011-02-03 Carl Zeiss Smt Gmbh Optical beam deflecting element and method of adjustment

Also Published As

Publication number Publication date
WO2012116710A1 (en) 2012-09-07
US20130308115A1 (en) 2013-11-21
JP5787382B2 (ja) 2015-09-30
US9280055B2 (en) 2016-03-08
TW201248335A (en) 2012-12-01
JP2014511574A (ja) 2014-05-15
TWI502285B (zh) 2015-10-01
KR20140021549A (ko) 2014-02-20

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