TW544758B - Lighting optical device, exposure system, and production method of micro device - Google Patents

Lighting optical device, exposure system, and production method of micro device Download PDF

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Publication number
TW544758B
TW544758B TW091110014A TW91110014A TW544758B TW 544758 B TW544758 B TW 544758B TW 091110014 A TW091110014 A TW 091110014A TW 91110014 A TW91110014 A TW 91110014A TW 544758 B TW544758 B TW 544758B
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TW
Taiwan
Prior art keywords
conversion
optical
illumination
light beam
light
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Application number
TW091110014A
Other languages
Chinese (zh)
Inventor
Osamu Tanitsu
Nobumichi Kanayamaya
Haruo Ozawa
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Nikon Corp
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Publication of TW544758B publication Critical patent/TW544758B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701Off-axis setting using an aperture
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • G03F7/70158Diffractive optical elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • G03F7/70183Zoom systems for adjusting beam diameter

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

The object of the present invention is to provide a lighting optical device and an exposure system, which reduce the number of optical members such as lenses while preventing a reduction in light quantity, can enhance a light utilization efficiency even in the case of modified lighting such as annular lighting, and can reduce the running costs. To achieve the object, revolvers (4, 5), and a zoom optical system (6) are disposed in that order on the optical path of a light flux supplied from a light source (1). The revolvers (4, 5) are provided with diffraction optical elements for converting the light flux supplied from the light source (1) into one having a specified section shape, a plurality of diffraction optical elements having different conversion characteristics for different section shapes of light fluxes to be converted being provided. The zoom optical system (6) changes the optical intensity distribution of a light flux having the section shape thereof converted by diffraction optical elements, and consists of up to five lenses (6a-6d) with a variable power ratio of up to 2.3.

Description

544758 A7 _______B7_____ 五、發明説明(彳 ) 技術領域 本發明主要係關於一種照明利用微影技術製造半導體元 件、液晶顯示元件、攝影元件、薄膜磁頭及其他微裝置之-際所用的圖案之照明光學裝置、具備該照明裝置之曝光裝 置及使用該曝光裝置的微裝置之製造方法。 背景技術 在為半導體元件、液晶顯示元件、攝影元件、薄膜磁頭 及其他微裝置製程之一的微影製程使用曝光裝置:將形成 於多像光罩或單像光罩(以下總稱這些時,總稱為光罩)的 圖案轉印於塗佈光阻等感光劑的晶圓或玻璃板等(以下總 稱這些時,稱為基板)。對於轉印形成於光罩的圖案的基板 進行顯影處理,就在基板上形成與被轉印的圖案相對應的 光阻圖案。其後,以形成於基板的光阻圖案為罩幕進行對 於基板的蝕刻處理、配線形成處理等各種處理,進行將與 光罩圖案相對應的圖案形成於基板上的處理。在形成圖案 的基板上面再度塗佈感光劑,反覆進行幾次〜幾十次程度上 述製程。 在微影製程,照明光罩的光進而照射於基板上的光強度 在光罩或基板面内具有變化的分佈,則照射於基板上的光 的光量按照強度分佈而變化,所以形成於光罩的圖案線寬 按照其變化量而變化。由於形成於基板上的圖案線寬按照 被照射的光量而變化,所以.為了形成細微圖案,在面内: 需以大致沒有光強度分佈(光強度一定)的照明光照射光罩 。因此,曝光裝置在照明光學系統内具備為了使照射於光544758 A7 _______B7_____ V. Description of the Invention (彳) Technical Field The present invention mainly relates to a lighting optical device using a lithography technology to manufacture a semiconductor element, a liquid crystal display element, a photographic element, a thin-film magnetic head, and other micro-devices. An exposure device including the illumination device and a method for manufacturing a micro device using the exposure device. 2. Description of the Related Art An exposure device is used in a lithography process for one of semiconductor device, liquid crystal display element, photographic element, thin film magnetic head, and other microdevice manufacturing processes: a multi-image mask or a single-image mask (hereinafter collectively referred to as these, collectively The pattern of the photomask is transferred to a wafer, a glass plate, or the like that is coated with a photoresist such as a photoresist (hereinafter collectively referred to as a substrate). A development process is performed on the substrate to which the pattern formed on the photomask is transferred, so that a photoresist pattern corresponding to the transferred pattern is formed on the substrate. Thereafter, various processes such as an etching process for the substrate and a wiring formation process are performed using the photoresist pattern formed on the substrate as a mask, and a process for forming a pattern corresponding to the mask pattern on the substrate is performed. A photosensitizer is applied again on the patterned substrate, and the process is repeated several times to several tens of times. In the lithography process, the light intensity of the light from the illuminating mask and then irradiated on the substrate has a varying distribution in the reticle or the substrate surface. The light amount of the light irradiating on the substrate changes according to the intensity distribution, so it is formed in the reticle. The pattern line width changes according to the amount of change. Since the line width of the pattern formed on the substrate varies according to the amount of light being irradiated, in order to form a fine pattern, in-plane: the mask needs to be illuminated with illumination light that has substantially no light intensity distribution (constant light intensity). Therefore, the exposure device is provided in the illumination optical system in order to irradiate light

544758 A7 B7 五 發明説明(2 ) 罩的光強度分佈均勻化的光學積分器(optical integrate^。 光學積分器大多使用例如複眼透鏡(fly,s eye iens)或棒形 積分器。以下,舉複眼透鏡的情況為例,說明使用光學貧 分器使照射於光罩的照明光強度分佈均勻化的理.由。 圖2 9為使用習知複眼透鏡的光學系統模式圖。在圖2 9中 ,由光源1 0 1射出的光束為光學系統102所變換成大致平行 光束後,被導入複眼透鏡103。入射到複眼透鏡丨03的光束 為複眼透鏡103具有的多數單元透鏡所波陣面分割,在各單 元透鏡的後側焦點面形成多數二次光源。在此單元透鏡的 後側焦點面位置配置孔徑光闌104,來自由複眼透鏡1〇3具 備的早元透鏡所形成的《一次光源的光束中,通過孔徑光閣 1〇4的光束透過聚光透鏡(condenser lens) 1〇5被導入嵚照射 面(在曝光裝置為光罩面)1 06。 此處’構成複眼透叙10 3的各早元透鏡的入射面和被照明 面10 6为別在光學上為共輛’所以結果入射到複眼透鏡1 〇 3 的光束以複眼透鏡1 0 3的單元透鏡單位被分割,在被照明面 106上被疊合。因此,即使在複眼透鏡103的入射面有例如 高斯(Gaussian)分佈狀的明暗差大的分佈,在複眼透鏡ι〇3 的單元透鏡單位也不太成為大的分侔,並且其互相重叠而 被平均化,在被照明面106上可得到均勻性極高的照度分佈。 以上,就使用複眼透鏡作為光學積分器的光學系統加以 說明,但以往已知一種光學裝置:藉由沿著光軸方向設置 兩個複眼透鏡,反覆兩次波陣面分割及其疊合過程。以下 ,稱只設一個複眼透鏡的光學裝置為單複眼透鏡系統,稱 -5- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐)544758 A7 B7 Fifth invention description (2) Optical integrator (optical integrate) for uniform light intensity distribution of the hood. Most optical integrators use, for example, fly (s eye iens) or rod integrators. Hereinafter, the compound eye The case of the lens is taken as an example to explain the reason for using an optical thinner to uniformize the intensity distribution of the illumination light irradiated on the photomask. Figure 29 is a schematic diagram of an optical system using a conventional fly-eye lens. In Figure 29, The light beam emitted from the light source 101 is converted into a substantially parallel light beam by the optical system 102, and then is introduced into the fly-eye lens 103. The light beam incident on the fly-eye lens 03 is divided by the wavefront of most unit lenses of the fly-eye lens 103. The rear focal plane of each unit lens forms a majority of secondary light sources. An aperture stop 104 is arranged at the rear focal plane position of this unit lens. Among the light beams, the light beam passing through the aperture lens 104 passes through a condenser lens 105 and is introduced into the irradiated surface (the mask surface in the exposure device) 1 06. Here, the compound eye is formed The incident surface and illuminated surface of each early element lens of the transparent lens 10 3 are different from each other optically. Therefore, the light beam incident on the fly-eye lens 1 0 3 is divided by the unit lens unit of the fly-eye lens 103. Are superimposed on the illuminated surface 106. Therefore, even if the incident surface of the fly-eye lens 103 has a distribution with a large difference in light and dark, such as a Gaussian distribution, the unit lens unit of the fly-eye lens ι03 is not very The large scale is overlapped with each other and averaged, and an extremely uniform illumination distribution can be obtained on the illuminated surface 106. The optical system using a fly-eye lens as an optical integrator has been described above, but it is known in the past An optical device: By setting two fly-eye lenses along the optical axis direction, the wavefront segmentation and superposition process are repeated twice. Hereinafter, an optical device with only one fly-eye lens is called a single fly-eye lens system, which is -5. -This paper size applies to China National Standard (CNS) A4 (210X 297mm)

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544758 A7 ____B7 五、發明説明^ ) ' ~ -- 設置兩個複眼透鏡的光學系統為雙複眼透鏡系統。圖30為 顯π具備使用雙複眼透鏡系統的照明光學系統的曝光裝置 一例的 >概略結構之圖。在圖3〇中,來自準分子雷射(excimef laser)等光源hi的光束為光束擴展器ιΐ2 所變換成截面形狀任意的形狀後,透過反射鏡丨丨3及為了緩 和光束偏光的水晶棱鏡丨14入射到由多數透鏡元件構成的 第-複眼透鏡11 5。入射到第一複眼透鏡丨丨5的光束為其透 鏡元件所波陣面分割,在其射出側面形成多數二次光源像。 從這些多數二次光源發散的光束為中繼透鏡(relay lens) 11 6所聚光,如圖3 1所示,重疊地均勻照明第二複眼 透鏡1 1 7的入射面。圖3 1為顯示入射到第二複眼透鏡丨丨7的 光束照射第二複眼透鏡117的情況之圖。若照明第二複眼透 鏡117,則在其射出面形成相當於第一複眼透鏡的透鏡元件 數m(m為2以上的自然數)和第二複眼透鏡的透鏡元件數n(n 為2以上的自然數)之積mXn之數的多數三次光源像。來自 此三次光源的光束利用孔徑光闌11 8限制其直徑,為透鏡群 119、12 1所聚光,重疊地均勻照明描繪被投影曝光的圖案 的光罩12 3。此處’在透鏡群11 9、12 1中配置為了決定照明 範圍的視場光闌12 0。然後’根據被均勻照明的照明光,形 成於光罩123的圖案像透過投影光學系統124投影於基板 125上。以上說明的雙複眼透鏡系統對於單複眼透鏡系統的 特徵如下: (1)關於使照明光罩的照明光照度均勻的效果,複眼透鏡 分割數(透鏡元件數)越增加,越增加其效果,但複眼透鏡 -6 - 本紙張尺度適用中國國家標準(CNS) A4规格(210X297公釐)544758 A7 ____B7 V. Description of the Invention ^) '~-The optical system with two fly-eye lenses is a double-eye lens system. Fig. 30 is a diagram showing a > schematic configuration of an example of an exposure apparatus including an illumination optical system using a binocular lens system. In FIG. 30, the light beam from the light source hi such as an excimer laser is transformed by the beam expander ιΐ2 into an arbitrary cross-sectional shape, and then transmitted through a mirror 丨 3 and a crystal prism to reduce the polarization of the beam 丨14 is incident on a first fly-eye lens 115 composed of a plurality of lens elements. The light beam incident on the first fly-eye lens 5 is divided by the wavefront of its lens element, and most secondary light source images are formed on its exit side. The light beams radiated from most of these secondary light sources are condensed by a relay lens 116, as shown in FIG. 31, which illuminate the incident surface of the second fly-eye lens 1 1 7 uniformly and overlappingly. FIG. 31 is a diagram showing a state in which a light beam incident on the second fly-eye lens 7 is irradiated to the second fly-eye lens 117. When the second fly-eye lens 117 is illuminated, the number of lens elements corresponding to the first fly-eye lens m (m is a natural number of 2 or more) and the number of lens elements n of the second fly-eye lens (n is 2 or more) are formed on its exit surface. Most natural light source images of the number mXn product. The light beam from this tertiary light source is limited in diameter by the aperture stop 118, and is condensed by the lens groups 119, 12 1 to uniformly illuminate the photomask 12 3 which depicts the pattern exposed by projection. Here, a field stop 120 is arranged in the lens groups 11 9 and 12 1 to determine the illumination range. Then, according to the uniformly illuminated illumination light, the pattern image formed on the mask 123 is projected on the substrate 125 through the projection optical system 124. The features of the double fly-eye lens system described above for the single fly-eye lens system are as follows: (1) Regarding the effect of uniformizing the illumination illuminance of the lighting mask, the more the number of fly-eye lens divisions (number of lens elements) increases, the more its effect, but the compound Lens-6-This paper size applies to China National Standard (CNS) A4 (210X297 mm)

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544758 五、發明説明(5 «明系㈣察此事’必需至少照明“的數值孔和為 :二圖3〇:示Γ複眼透鏡系統方面,為了以數:孔 :::二:? 閣118直徑如照相機的光閑,為可- 可:換光闌對應。但是’只是切換孔徑光闌118 :闌直徑在將光闌直徑變更成小的時,遮蔽光束 :大=降低。這種曝光裝置的照度降低會引起產能降 低:結果使製造的微裝置製造成本上升。為微裝置一種的 +導體7L件中’特別是關於RAM(隨機存取記憶體)等記憶 體’製品每個的利益幅度非常少,所以製造成本是特別重 要的項目。因此’在曝光裝置的各種規格中「照度」也成 為重要項目之一,照度降低需要盡量避免。 參考圖30說明的雙複眼透鏡系統為了防止照度降被,提 出種方去·按照孔徑光闌11 8的光闌直徑大小可變第二複 眼透鏡117的入射面的照射面積。此方法係以圖3〇中的中繼 透鏡116為焦點距離可變的可變焦距透鏡(z〇〇m卜…)。而且 例如縮小孔徑光闌11 8的光闌直徑時,縮短可變焦距透鏡 的焦點距離,反之增大孔徑光闌118的光闌直徑時,加長可 變焦距透鏡的焦點距離。如此一來,光束集中於第二複眼 透鈿117的入射面的中央附近,所以即使孔徑光闌丨丨8的光 闌直徑小,也大致沒有以孔徑光闌丨18遮蔽的光束,照度幾 乎不會降低。 此外’近幾年有時使用具‘有圓形以外形狀的孔徑的孔徑 光襴作為孔徑光闌1 1 7。圖32A為顯示形成環帶狀孔徑的孔 徑光闌1 1 8a作為具有圓形以外的孔徑的習知孔徑光闌一例 ____ -8- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 裝 訂 544758 A7 B7 五、發明説明(6 ) 又圖,圖32B為顯示形成多數孔徑的孔徑光闌11 8b作為具有 圓形以外的孔徑的習知孔徑光闌一例之圖。以下,就圖3 2 A 、圖32B所示的孔徑光闌118a、118b加以簡單解說。若形成 於光罩的圖案變成細微,在裝置的解析極限附近進行曝光 ’則從照明系統的孔徑光闌發出的光束中,有助於解析的 只是從孔徑光闌周邊部發出的光,從孔徑中央部發出的光 只具有只是降低像對比度的作用。 換言之’將光罩資訊傳達到基板時給與資訊傳達能量的 只是從孔徑光闌周邊部發出的光,從孔徑中央部發出的光 說起來只是產生雜訊。因此,可以說從孔徑光闌中央部最 好不發出光。從這種構思想出形成圖32A所示的環帶狀孔 徑的孔徑光闌11 8a。圖32B所示的孔徑光闌11 8b係將吏進一 步解析的圖案只限於縱向的線及橫向的線時的光闌。這種 情泥,從孔徑光闌上下、左右發出的光也只再成為雜訊, 所以孔徑光闌上下、左右也更進一步遮光。 使用不是以上說明的圓形的孔徑光闌11 8a、1 1 8b時,也 按照形成於孔徑光闌11 8a、11 8b的孔徑形狀(大小)可變可 變焦距透鏡的焦點距離。然而,只是使可變焦距透鏡的焦 點距離可變,不能使光束只是不到達這些光闌遮光的中央 部。例如若利用圖3 0所示的習知第一複眼透鏡1 1 5,則如圖 33所示,在第二複眼透鏡1 1 8的射出配置環帶孔徑光闌1 1 8a 時,會全面地照射第二複眼透鏡118,所以有光量損失變大 的問題。圖33為顯示入射到第二複眼透鏡118的光束截面形 狀和孔徑光闌118a形狀的關係之圖。又,特開平5-206007 -9 - 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) 裝 訂544758 V. Description of the invention (5 The numerical aperture of the «Ming Department's observation of the matter 'must be at least illuminated" is as follows: Figure 2 30: Shown in terms of the compound eye lens system, in order to count: Hole ::: 二:? Ge 118 The diameter is as light as the camera ’s light, and it ’s OK-OK: It ’s possible to change the diaphragm. But 'only the aperture diaphragm 118 is changed: When the diaphragm diameter is changed to a small diameter, the beam is shielded: large = reduced. This exposure device Decreased illuminance will reduce production capacity: as a result, the manufacturing cost of manufactured microdevices will increase. Among the 7L + conductors of microdevices, 'especially about the benefits of each of memory' products such as RAM (random access memory) Very few, so the manufacturing cost is a particularly important item. Therefore, "illumination" has become one of the important items in the various specifications of the exposure device, and the reduction of the illumination needs to be avoided as much as possible. In order to prevent the reduction of the illumination, the double-eye lens system described with reference to Fig. 30 Therefore, it is proposed to formulate an irradiation area of the incident surface of the second fly-eye lens 117 that is variable in accordance with the aperture diameter of the aperture stop 118. This method uses the relay lens 116 in FIG. 3 as the focal distance. Variable variable focal length lens (z00m) ... For example, when reducing the diameter of the aperture stop 118, shorten the focal length of the variable focal length lens, and conversely increase the diameter of the aperture stop 118 In this case, the focal length of the variable focal length lens is increased. In this way, the light beam is concentrated near the center of the incident surface of the second fly-eye lens 117, so even if the aperture diameter of the aperture stop is small, it is almost The illuminance of the light beam blocked by the diaphragm 18 will hardly decrease. In addition, in recent years, an aperture diaphragm having an aperture shape other than a circle has been used as the aperture diaphragm 1 1 7. Fig. 32A shows the formation of an annular zone Aperture diaphragm 1 1 8a as an example of a conventional aperture diaphragm with an aperture other than a circle ____ -8- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) binding 544758 A7 B7 V. Description of the invention (6) Fig. 32B is a diagram showing an example of an aperture stop 11 8b having a plurality of apertures as a conventional aperture stop having an aperture other than a circular shape. Below, referring to Fig. 3 2A, Fig. Aperture stop 118a shown in 32B 118b is briefly explained. If the pattern formed on the mask becomes subtle, and exposure is performed near the analysis limit of the device, then only the light emitted from the aperture stop of the lighting system is helpful for analysis. The light emitted from the central portion of the aperture only has the effect of reducing the contrast of the image. In other words, when the information of the mask is transmitted to the substrate, only the light emitted from the periphery of the aperture stop is emitted from the central portion of the aperture. Speaking of light only generates noise. Therefore, it can be said that it is best not to emit light from the central portion of the aperture stop. From this configuration, an aperture stop 11 8a having an annular band-shaped aperture as shown in FIG. 32A is formed. The aperture stop 11 8b shown in Fig. 32B is a diaphragm when the pattern to be further analyzed is limited to the vertical line and the horizontal line. In this case, the light emitted from the top and bottom and left and right of the aperture stop will only become noise again, so the top and bottom, left and right of the aperture stop will further block light. When a circular aperture stop 11 8a, 1 8b other than the above-mentioned one is used, the focal length of the variable focal length lens is also variable according to the shape (size) of the aperture formed in the aperture stop 11 8a, 11 8b. However, the focal point distance of the variable focal length lens is made variable, and the light beam cannot be prevented from reaching the central part of these diaphragms. For example, if the conventional first fly-eye lens 1 1 5 shown in FIG. 30 is used, as shown in FIG. 33, when the second fly-eye lens 1 1 8 is disposed with the annular aperture stop 1 1 8a, it will be comprehensive. Since the second fly-eye lens 118 is irradiated, there is a problem that the light amount loss becomes large. Fig. 33 is a diagram showing the relationship between the cross-sectional shape of a light beam incident on the second fly-eye lens 118 and the shape of the aperture stop 118a. In addition, JP-A-Heisei 5-206007 -9-This paper size applies to China National Standard (CNS) A4 (210X297)

線 J^/58 A7Line J ^ / 58 A7

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544758 A7 B7 五、發明説明(8 若使光源的輸出功率上升,則光源的壽命降低。若使光 源的輸出功率上升時可得到更多的光量,則光源的壽命即 使變短’也有使光源的輸出功率上升的意義。然而,若即· 使使光源的輸出功率上升,所得到的光量也是相.同程度, 則沒有使光源的輸出功率上升的意義,反而產生使維修等 所需的運轉費用上升的缺點。 在圖30中,雖然以中繼透鏡116(可變焦距透鏡)為一個構 件而圖示,但實際的可變焦距透鏡考慮在大的可變倍率比 下的焦點距離可變範圍及像差等以丨〇片程度的透鏡構成。 訂 此外’配置於視場光闌12〇和光罩123之間的透鏡群1 19、121 也以1 0片程度的透鏡構成,特別是透鏡群12丨係只是為了以 視場光闌120和光罩123為光學上的共軛關係所設。透鏡等 光學構件的片數越增加,根據前述理由,全體的透過率越 降低。因此,為了盡量防止透過率降低而使效率上升,必 需減低透鏡等光學構件數。 發明之揭示 ^ 本發明係鑑於上述問題所完成的,其目的在於提供一種 減低透鏡等光學構件數而防止光量降低,同時進行環帶照 明等變形照明時亦可使光的利用效率上升,並可謀求運轉 費用減低之照明光學裝置、具備該照明光學裝置之曝光裝 置及使用該曝光裝置的微裝置之製造方法。 為了解決上述課題,根據·本發明第一觀點之照明光學裝 置係照明被照射面(R、W),其特徵在於:包含光源部(丨): 供應光束;光束變換機構(4、4 a〜4m、5、5a-5m' 11、12 "11 - 544758 A7 ________ B7 五、發明説明(9 ) 、15、20、20a、20b、2卜22、40):將來自前述光源部⑴的 光束變換成預定截面形狀的光束;及,可變倍率光學系統(6 、30):為了變更以前述光束變換機構(4、4a〜4m、5、5&〜5爪· 、1卜 12、15、20、20a、20b、21、22、40)變換的光束的 光強度分体,可變倍率在2.3倍以下可變焦點距離,前述光 束變換機橋(4、4a〜4m、5、5a〜5m、ll、12、15、20、20a 、20b、21、22、40)包含多數變換光學元件(4a〜4m、5、5a〜5m 、20a、2 0b、40):各被變換的光束截面形狀的種類變換特 性不同;及,設定部(4、5、11、12、15、20、21、22): 將前述變換光學元件(4a〜4m、5a〜5m、20a、20b、40)之一 設定於光路内者。 根據本發明,將由光源供應的光束利用變換光學先件變 換成預定截面形狀的光束後’以可變倍率光學系統變更其 強度分怖。此處,變換光學元件設有多數具有各截面形狀 的種類不同的變換測量者,可利用變換光學元件得到具有 成為必要的粗略強度分佈的光束。因此,必須以可變倍率 光學系統變更的強度分佈的可變範圍在比以往窄的範圍即 可’所以可變倍率光學系統的焦點距離的可變範圍在比以 往窄的範圍即可。其結果,可簡化可變倍率光學系統的結 構,所以可防止透過可變倍率光學系統的光束的光量降低。 此外’變換光學元件可變換成為了進行環帶照明等變形 照明的光束,所以進行環帶.照明等變形照明時亦可使光的 利用效率上升。 再者’簡化可變倍率光學系統的結構並且有效利用由光 -12 _ 本紙乐尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) ' --- 544758 A7 ______B7 五、發明説明(1〇 ) 源供應的光束的結果,羔了说#丄,, ^ 衣為了確保成為必要的光量,亦益需 使光源的輸出功率上升,所以可比以往長期間地使用光源 此外簡化可支倍率光學系統的結構,在構成可變倍率· 光學系統的光學構件表面光化學反應發生的機率降低,所 以可抑制光帛構件的劣化,而也可比往長期間地使用構成 可變倍率光學系統的光學構件。其結果,可謀求運轉結果 的減低。 為了解決上述課題·,根據本發明第二觀點之照明光學裝 置係照明被照射面(R、W),其特徵在於:包含光源部(丨): 供應光束;光束變換機構(4、4a〜4m、5、5a_5m、u、12 、15、20、2 0a、20b、2卜22、4〇):將來自前述光源部⑴的 光束變換成預定截面形狀的光束;及,可變倍率光學系統(6 、3〇) ·為了變更以前述光束變換機構(4、4a〜4m、5、5a〜5m 、11、12、15、20、20a、20b、21、22、40)變換的光束的 光強度分佈’以5片以下的光學構件構成,前述光束變換機 構(4、4a〜4m、5、5a〜5m、11、12、15、20、20a、20b、 21、22、40)包含多數變換光學元件(4 a〜4m、5、5a〜5m、20a 、20b、40):各被變換的光束截面形狀的種類變換特性不 同;及,設定部(4、5、1 1、12、15、20、21、22):將前 述變換光學元件(4a〜4m、5a〜5m、20a、20b、40)之一設定 於光路内者。 根據本發明’和根據本發·明第一觀點之照明光學裝置同 樣’將由光源供應的光束利用變換光學元件變換成預定截 面形狀的光束後,以可變倍率光學系統變更其強度分佈。 _ -13- 本紙浪尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)544758 A7 B7 V. Description of the invention (8 If the output power of the light source is increased, the life of the light source will be reduced. If the output power of the light source is increased, more light can be obtained, then the life of the light source will be shortened. Significance of increase in output power. However, even if the output power of the light source is increased, the amount of light obtained is also the same. There is no meaning to increase the output power of the light source, and the operating costs required for maintenance and the like are incurred. Disadvantages of rising. Although the relay lens 116 (variable focal length lens) is illustrated as a component in FIG. 30, the actual variable focal length lens considers a variable focal length range with a large variable magnification ratio. And aberrations are constituted by lenses of about 0. In addition, the lens groups 1 19 and 121 arranged between the field diaphragm 12 and the mask 123 are also constituted by 10 lenses, especially the lens group. The 12 series is provided for the optical conjugate relationship between the field diaphragm 120 and the mask 123. As the number of optical members such as a lens increases, the overall transmittance decreases due to the foregoing reasons. Therefore, it is necessary to reduce the number of optical members such as lenses in order to prevent the transmittance from decreasing and increase the efficiency as much as possible. DISCLOSURE OF THE INVENTION The present invention has been made in view of the above problems, and an object thereof is to provide a reduction in the number of optical members such as lenses and prevent a decrease in light quantity. At the same time, when deformed lighting such as annular lighting is performed, the light utilization efficiency can be increased, and a lighting optical device capable of reducing operating costs, an exposure device including the lighting optical device, and a manufacturing method of a micro device using the exposure device can be achieved. In order to solve the above problems, the illumination optical device according to the first aspect of the present invention illuminates the illuminated surface (R, W), which is characterized by including a light source section (丨): a supply beam; a beam conversion mechanism (4, 4 a ~ 4m, 5, 5a-5m '11, 12 " 11-544758 A7 ________ B7 V. Description of the invention (9), 15, 20, 20a, 20b, 2b 22, 40): the light beam from the aforementioned light source section ⑴ A light beam converted into a predetermined cross-sectional shape; and a variable magnification optical system (6, 30): In order to change the aforementioned light beam conversion mechanism (4, 4a to 4m, 5, 5 & ~ 5 claws, etc.) (1, 12, 15, 20, 20a, 20b, 21, 22, 40) The light intensity of the converted beam is split, and the variable focal length is less than 2.3 times the variable focal distance. The aforementioned beam converter bridge (4, 4a ~ 4m) , 5,5a ~ 5m, 11,12,15,20,20a, 20b, 21,22,40) including most conversion optical elements (4a ~ 4m, 5,5a ~ 5m, 20a, 20b, 40): each The types of beam cross-sections to be converted have different conversion characteristics; and the setting section (4, 5, 11, 12, 15, 20, 21, 22): the conversion optical elements (4a to 4m, 5a to 5m, 20a, 20b, 40) is set in the light path. According to the present invention, after the light beam supplied from the light source is converted into a light beam having a predetermined cross-sectional shape using a conversion optical element, its intensity distribution is changed by a variable magnification optical system. Here, the conversion optical element is provided with many types of conversion surveyors having different cross-sectional shapes, and the conversion optical element can be used to obtain a light beam having a rough intensity distribution necessary. Therefore, it is necessary to change the variable range of the intensity distribution of the variable magnification optical system to be narrower than before. Therefore, the variable range of the focal distance of the variable magnification optical system may be narrower than ever. As a result, the structure of the variable magnification optical system can be simplified, so that it is possible to prevent a reduction in the amount of light of the light beam passing through the variable magnification optical system. In addition, the conversion optical element can be converted into a light beam that is deformed for illumination such as endless belt lighting. Therefore, the efficiency of light utilization can be improved when deformed illumination such as endless belt and lighting is performed. Furthermore, 'simplify the structure of the variable magnification optical system and effectively use the light -12 _ This paper scale is applicable to China National Standard (CNS) A4 specifications (210 X 297 mm)' --- 544758 A7 ______B7 V. Description of the invention ( 1〇) As a result of the beam supplied by the source, # 丄 ,, ^ In order to ensure the necessary amount of light, the output power of the light source must also be increased, so the light source can be used for a longer period of time than in the past. In addition, the optical power can be simplified. The structure of the system reduces the chance of photochemical reactions occurring on the surfaces of the optical components constituting the variable magnification and optical system, so that the deterioration of the photocathode component can be suppressed, and the optical components constituting the variable magnification optical system can be used longer. As a result, the operation result can be reduced. In order to solve the above problems, the illumination optical device according to the second aspect of the present invention illuminates the illuminated surface (R, W), which includes a light source unit (丨): a supply beam; a beam conversion mechanism (4, 4a to 4m); , 5, 5a-5m, u, 12, 15, 20, 20a, 20b, 2b, 22, 4)): converts the light beam from the light source unit 成 into a light beam with a predetermined cross-sectional shape; and a variable magnification optical system ( (6, 3〇) In order to change the light intensity of the light beam converted by the aforementioned beam conversion mechanism (4, 4a to 4m, 5, 5a to 5m, 11, 12, 15, 20, 20a, 20b, 21, 22, 40) The distribution 'is composed of 5 or less optical members, and the aforementioned beam conversion mechanism (4, 4a to 4m, 5, 5a to 5m, 11, 12, 15, 20, 20a, 20b, 21, 22, 40) includes most conversion optics Element (4a ~ 4m, 5, 5a ~ 5m, 20a, 20b, 40): each kind of beam cross-section shape to be converted has different conversion characteristics; and the setting section (4, 5, 1 1, 12, 15, 20 , 21, 22): One of the conversion optical elements (4a to 4m, 5a to 5m, 20a, 20b, 40) is set in the optical path. According to the present invention, the same as the illumination optical device according to the first aspect of the present invention, the light beam supplied from the light source is converted into a light beam having a predetermined cross-sectional shape by a conversion optical element, and then its intensity distribution is changed by a variable magnification optical system. _ -13- The size of this paper is in accordance with China National Standard (CNS) A4 (210 X 297 mm)

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線 544758 A7 _____B7 五、發明説明(11 )Line 544758 A7 _____B7 V. Description of Invention (11)

此處,變換光學元件設有多數具有各截面形狀的種類不同 的變換測量者,可利用變換光學元件得到具有成為必要的 粗略強度分佈的光束。因此,必須以可變倍率光學系統變 更的強度分佈的可變範圍在比以往窄的範圍即可,所以構 成可變倍率光學系統的光學構件片數比以往少的片數即可 。其結果,可簡化可變倍率光學系統的結構,所以可防止 透過可變倍率光學系統的光束的光量降低。 此外,變換光學元件可變換成為了進行環帶照明等變形 照明的光束,所以進行環帶照明等變形照明時亦可使光的 利用效率上升。 訂Here, the conversion optical element is provided with a large number of conversion surveyors having different kinds of cross-sectional shapes, and the conversion optical element can be used to obtain a light beam having a rough intensity distribution necessary. Therefore, the variable range of the intensity distribution that needs to be changed by the variable magnification optical system may be a narrower range than before. Therefore, the number of optical members constituting the variable magnification optical system may be smaller than the conventional number. As a result, the configuration of the variable magnification optical system can be simplified, so that it is possible to prevent a reduction in the amount of light of the light beam transmitted through the variable magnification optical system. In addition, the conversion optical element can be converted into a light beam that is subjected to deformed illumination such as ring-shaped illumination. Therefore, it is also possible to improve light utilization efficiency when deformed illumination such as annular lighting is performed. Order

再者,簡化可變倍率光學系統的結構並且有效利用由光 源供應的光束的結果,為了確保成為必要的光量,亦無需 使光源的輸出功率上升,所以可比以往長期間地使用光源 。此外,減低構成可變倍率光學系統的光學構件片數,在 構成可變倍率光學系統的光學構件表面光化學反應發生的 機率降低’所以可抑制光學構件的劣化,而也可比以往長 期間地使用構成可變倍率光學系統的光學構件。其結果, 可謀求運轉結果的減低。Furthermore, as a result of simplifying the structure of the variable magnification optical system and effectively utilizing the light beam supplied from the light source, in order to ensure the necessary amount of light and increase the output power of the light source, the light source can be used for a longer period of time than before. In addition, the number of optical components constituting the variable magnification optical system is reduced, and the probability of photochemical reactions occurring on the surfaces of the optical components constituting the variable magnification optical system is reduced. Therefore, the deterioration of the optical components can be suppressed, and the structure can be used for a longer period of time than before. Optical component of a variable magnification optical system. As a result, it is possible to reduce the operation result.

此外’根據本發明第一觀點及第二觀點之照明光學裝置 ’其特徵在於:更包含光學積分器(7、31):配置於前述可 變倍率光學系統(6、30)和前述被照射面(R、w)之間,均勻 照明前述被照射面(R、W) 及,聚光光學系統(1〇、32): 配置於前述光學積分器(7、31)和前述被照射面(R、W)之間 ’將來自前述光學積分器(7、3 1)的光導入前述被照射面(R ______^ -14- 本紙張尺度適用中國國家A4規格(21〇X 297公釐)~" ' 544758 A7 B7In addition, the 'illuminating optical device according to the first aspect and the second aspect of the present invention' further includes an optical integrator (7, 31), which is disposed on the variable magnification optical system (6, 30) and the illuminated surface. (R, w) uniformly illuminates the illuminated surface (R, W) and the condensing optical system (10, 32): disposed on the optical integrator (7, 31) and the illuminated surface (R , W) ”to direct the light from the aforementioned optical integrator (7, 3 1) to the aforementioned illuminated surface (R ______ ^ -14- This paper size applies to China's national A4 specification (21〇X 297 mm) ~ " '544758 A7 B7

五、發明説明(12 、W)者 〇 此外’根據本發明第一觀點及第二觀點之照明光學裝置 ’包含於前述可變倍率光學系統(6、3〇)的光學構件(6a〜6d 、3〇a〜3〇d)和包含於前述聚光光學系統(10、32)妁光學構 #(6a〜6d、3〇a〜30d)的總數為1〇以下適當。 此外’根據本發明第一觀點及第二觀點之照明光學裝置 ’最好前述可變倍率光學系統(6、30)包含至少一個有非球 面的光學元件。 _ 再者’根據本發明第一觀點及第二觀點之照明光學裝置 ’其特徵在於:前述光束變換機構(4、4a〜4in、5、5a〜5m 、11、12、15、20、20a、20b、21、22、40)根據來自前述 光原部(1)的光束,變換成具有圓形截面形狀的光束、具有 % π截面形狀的光束或對於基準光軸偏心的多數光束中的 至少兩種光束者。 此外,根據本發明第一觀點及第二觀點之照明光學裝置 ,其特徵在於:前述設定部(4、5、η、12、15、2〇、2ι、 22)包含保持構件(4、5、22):保持前述多數變換光學元 件如〜4m、5a〜5〇1、遍、2〇1}、4〇);及,驅動部(11、12 、21):使前述保持構件(4、5、22)旋轉或移動者。 此外,根據本發明第一觀點及第二觀 ,其特徵在於:前述設定部(4、5、"、12、75月:: 22)包含第一保持構件(4):保持前述多數變換光學元 件(4\〜4m)—部分;第二保持構件(5):保持前述多數變換 光學兀件(5a〜5m)_部分的剩餘;及,驅動部⑴、12广使 -15- 544758 A7 B7 五、發明説明(13 ) 前述第-及第二保持構件(4、5)旋轉或移動者。 此外,根據本發明第一觀點及第二觀點纟照明光學裝置 ,其特徵在於··以前述可變倍率光學系統(6、3〇)的可變倍 率比為Z時,滿足•拉认8者。 ° 此外,根據本發明第一觀點及第二觀點之照明光學裝置 ,其特徵在於··前述光束變換機構作為根據來自前述光源 部的光束交換成對於前述基準光軸偏^的多數光束的變換 光學元件,包含如各光束與前述基準光軸正交的第一方向 的偏心量和與前述基準光軸及前述第一方向正交的第二方 向的偏心量不同般地變換的交換光學元件者。 為了解決上述課題,根據本發明第三觀點之照明光學裝 置係照明被照射面(R、w),其特徵在於:包含光源部⑴·· 供應光束,及’光束變換機構··如在照明光瞳面成為對於 基準光軸(AX)偏心的多數光束般地變換來自前述光源部的 光束則述光束變換機構包含變換光學元件:如在沿著各 光束與則述基準光軸正交的第一方向的前述照明光瞳面的 偏量和在沿著與前述基準光軸及前述第一方向正交的第 一方向的如述照明光瞳面的偏心量不同般地變換者。 根據本發明,由於將由光源供應的光東利用變換光學元 件在照明光瞳面變換成對於基準光軸偏心的多數光束,所 以可極為減少光路上的光學構件數,其結果可防止照明光 子系統的光量降低。 此外’根據本發明第三觀點之照明光學裝置,其特徵在 於·有配置於前述光束變換機構和前述照明光瞳面之間的5. Description of the invention (12, W) 〇 In addition, the "illuminating optical device according to the first and second aspects of the present invention" includes the optical components (6a to 6d) of the variable magnification optical system (6, 30), The total number of 30a to 30d) and the above-mentioned condensing optical system (10, 32) and optical structure # (6a to 6d, 30a to 30d) is preferably 10 or less. In addition, according to the "illuminating optical device according to the first aspect and the second aspect of the present invention", it is preferable that the variable magnification optical system (6, 30) includes at least one optical element having an aspherical surface. _ Furthermore, the 'illuminating optical device according to the first aspect and the second aspect of the present invention' is characterized in that the aforementioned beam conversion mechanism (4, 4a to 4in, 5, 5a to 5m, 11, 12, 15, 20, 20a, 20b, 21, 22, 40) At least two of the beams having a circular cross-sectional shape, a beam having a% π cross-sectional shape, or a majority of the beams eccentric to the reference optical axis are converted from the light beams from the aforementioned light source (1). Kind of beamer. The illumination optical device according to the first aspect and the second aspect of the present invention is characterized in that the setting section (4, 5, η, 12, 15, 20, 2m, 22) includes a holding member (4, 5, 22): holding the majority of the aforementioned conversion optical elements such as ~ 4m, 5a ~ 5101, pass, 201}, 4〇); and the driving part (11, 12, 21): the holding member (4, 5 , 22) Rotate or move. In addition, according to the first aspect and the second aspect of the present invention, the setting unit (4, 5, ", December, July: 22) includes a first holding member (4): holding the majority of the conversion optics Element (4 \ ~ 4m) —part; second holding member (5): holding the remainder of most of the aforementioned conversion optical element (5a ~ 5m) _; and the driving part 12, 12 广 使 -15- 544758 A7 B7 5. Description of the invention (13) The aforementioned first and second holding members (4, 5) are rotated or moved. In addition, according to the first aspect and the second aspect of the present invention, the illumination optical device is characterized in that when the variable magnification ratio of the aforementioned variable magnification optical system (6, 30) is Z, 8 persons are satisfied . ° In addition, the illumination optical device according to the first aspect and the second aspect of the present invention is characterized in that the beam conversion mechanism is a conversion optical that converts a beam from the light source unit into a plurality of beams that are deviated from the reference optical axis. The element includes an interchangeable optical element that is changed as the amount of eccentricity of each light beam in a first direction orthogonal to the reference optical axis and the amount of eccentricity in a second direction orthogonal to the reference optical axis and the first direction are different. In order to solve the above problems, the illumination optical device according to the third aspect of the present invention illuminates the irradiated surface (R, w), which is characterized by including a light source unit 供应 ·· supplying a light beam and a 'beam conversion mechanism ····· such as the illumination light The pupil plane becomes a majority of the beams decentered with respect to the reference optical axis (AX), and the beam from the light source unit is converted as described above. The beam conversion mechanism includes a conversion optical element. The amount of deflection of the illumination pupil plane in the direction is different from the amount of decentering of the illumination pupil plane in a first direction that is orthogonal to the reference optical axis and the first direction. According to the present invention, since the light source supplied by the light source is converted into a majority of light beams eccentric to the reference optical axis by the conversion optical element on the illumination pupil surface, the number of optical components on the optical path can be extremely reduced, and as a result, the illumination photo-system can be prevented. The amount of light is reduced. In addition, according to a third aspect of the present invention, there is provided an illumination optical device, characterized in that: an illumination optical device disposed between the beam conversion mechanism and the illumination pupil surface

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544758 A7 B7 五、發明説明(14 ) 光學系統者。此處,該光學系統最好有預定的固定倍率或 有為了變更以前述光束變換機構變換的光束的光強度分佈 的可變倍率光學系統。 - 此外,根據本發明第一觀點至第三觀點之照明光學裝置 ,其特徵在於:前述光束變換機構包含由多數變換光學元 件構成的變換光學元件群,該多數變換光學元件係為了不 改變前述第一方向的前述光束偏心量而階段地切換前述第 二方向的前述光束偏心量,將前述第二方向的變換特性設 定成不同的特性者。 此外,根據本發明第一觀點至第三觀點之照明光學裝置 ,其特徵在於··前述光束變換機構包含由多數變換光學元 件構成的變換光學元件群,該多數變換光學元件係在維持 前述第一方向的前述光束偏心量和前述第二方向的前述光 束偏心量之比的狀態下,為了階段地切換對於前述基準光 軸的偏心量,將前述第一方向及前述第二方向的變換特性 設定成不同的特性者。 此外,根據本發明第一觀點至第三觀點之照明光學裝置 ,其特徵在於:前述光束變換機構包含由多數變換光學元 件構成的變換光學元件群,該多數變換光學元件係在維持 前述光束對於前述基準光軸的偏心量的狀態下,為了階段 地切換前述第一方向的偏心量及前述第二方向的偏心量, 將前述第一方向及前述第二方向的變換特性設定成不同的 特性者。 本發明之曝光裝置,其特徵在於:包含上述照明光學裝 -17- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 訂544758 A7 B7 V. Description of the invention (14) Optical system. Here, it is preferable that the optical system has a predetermined fixed magnification or a variable magnification optical system for changing the light intensity distribution of a light beam converted by the light beam conversion mechanism. -In addition, the illumination optical device according to the first to third aspects of the present invention is characterized in that the light beam conversion mechanism includes a conversion optical element group composed of a plurality of conversion optical elements, and the plurality of conversion optical elements are not to change the first The beam eccentricity in one direction switches the beam eccentricity in the second direction in stages, and sets the conversion characteristics in the second direction to different characteristics. In addition, the illumination optical device according to the first to third aspects of the present invention is characterized in that the beam conversion mechanism includes a group of conversion optical elements composed of a plurality of conversion optical elements, and the plurality of conversion optical elements maintain the first In a state of a ratio of the beam eccentricity in the direction and the beam eccentricity in the second direction, in order to gradually switch the eccentricity with respect to the reference optical axis, the conversion characteristics of the first direction and the second direction are set to People with different characteristics. The illumination optical device according to the first aspect to the third aspect of the present invention is characterized in that the light beam conversion mechanism includes a conversion optical element group composed of a plurality of conversion optical elements, and the plurality of conversion optical elements maintain the light beam with respect to the foregoing In the state of the eccentricity amount of the reference optical axis, in order to switch the eccentricity amount in the first direction and the eccentricity amount in the second direction in stages, the conversion characteristics of the first direction and the second direction are set to different characteristics. The exposure device of the present invention is characterized by including the above-mentioned illumination optical device. -17- The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm).

線 544758 A7 B7 五、發明説明( 15 置’及’投影光學系統(PL);將形成於配置於前述被照射 面的光·罩(R)的圖案投影於感光性基板(w)者。 本發明之微裝置之製造方法,其特徵在於:包含曝光製_ 程(S 14):使用上述曝光裝置使形成於前述光罩(R),的圖案曝 光於感光性基板(W);及,顯影製程(S16):使被曝光的前 述感光性基板(W)顯影者。 圖式之簡單說明 圖1為顯示本發明第一實施形態的照明光學裝置及具備 本發明第一實施形態的照明光學裝置的曝光裝置概略結構 之圖。 圖2為顯示轉換器4、5 —例的透視圖。 圖3 A為顯示轉換器5 —例的正面圖。 - 圖3 B為顯示轉換器4 一例的正面圖。 圖4A為顯示從X方向看衍射光學元件4a〜41及衍射光學 元件5a〜51的截面形狀之圖。 圖4B為顯示使入射於衍射光學元件4&〜41及衍射光學元 件5a〜51的光束衍射的情況之圖。 圖4C為顯示衍射於衍射光學元件43〜41及衍射光學元件 5 a〜51的光的运场圖(far field pat tern)—例之圖。 圖5 A為顯示作為一例光束入射於衍射光學元件4a的情況 的透視圖。 圖5B為作為一例從X方向、看光束入射於衍射光學元件乜 的情況的截面圖。 圖5C為作為一例從z方向看光束入射於衍射光學元件4a -18- 本紙痕尺度適用中國国家標準(CNS) A4規格(210X297公爱)Line 544758 A7 B7 V. Description of the invention (15 sets) and 'projection optical system (PL); those that project the pattern of the light and cover (R) arranged on the illuminated surface onto the photosensitive substrate (w). The method for manufacturing an inventive microdevice is characterized by comprising an exposure process (S 14): exposing a pattern formed on the aforementioned photomask (R) to a photosensitive substrate (W) using the above-mentioned exposure device; and, developing Manufacturing process (S16): The exposed photosensitive substrate (W) is developed. Brief Description of Drawings Fig. 1 shows an illumination optical device according to a first embodiment of the present invention and an illumination optical device including the first embodiment of the present invention. Figure 2 shows the schematic structure of the exposure device. Figure 2 is a perspective view showing an example of converter 4, 5. Figure 3 A is a front view showing an example of converter 5--Figure 3 B is a front view showing an example of converter 4 Fig. 4A is a view showing cross-sectional shapes of the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 as viewed from the X direction. Fig. 4B is a view showing the incidence of the diffractive optical elements 4 & ~ 41 and the diffractive optical elements 5a to 51. A graph of beam diffraction. Figure 4C Far field pat terns-examples of light diffracted by diffractive optical elements 43 to 41 and diffractive optical elements 5 a to 51 are shown. Fig. 5A is a view showing a case where a light beam is incident on the diffractive optical element 4a as an example. Fig. 5B is a cross-sectional view of the case where the light beam is incident on the diffractive optical element 乜 from the X direction as an example. Fig. 5C is an example of the light beam being incident on the diffractive optical element z from the z direction as an example. China National Standard (CNS) A4 Specification (210X297 Public Love)

Order

線 544758 A7 B7 五、發明説明(16 ) 的情況的截面圖。 圖6為說明衍射光學元件4a形成於複眼透鏡7入射面的照 明區域之圖。 . 圖7A、圖7B為顯示衍射光學元件5a〜51形成於複眼透鏡7 入射面的照明區域一例之圖。 圖8A〜圖8E為顯示使用衍射光學元件5a〜5 1變換成對於 光軸AX偏心的多數光束時的光束截面形狀他例之圖。 圖9為顯示通過孔徑-斗爪、5m的光束形成於複眼透鏡7入射 面的照明區域一例之圖。 圖1 0 A、圖10 B為顯示可變焦距光學系統6具體結構的側 面圖。 圖11A、圖11B為顯示利用驅動裝置13調整可變焦跬光學 系統6焦點距離或焦點位置時的在複眼透鏡7入射面側的照 射區域變化之圖。 圖12A〜圖12C為顯示利用驅動裝置13調整可變焦距光學 系統6焦點距離或焦點位置時的在複眼透鏡7入射面側的照 射區域變化之圖。 圖1 3為顯示本發明第二實施形態的照明光學裝置及本發 明第二實施形態的曝光裝置結構之圖。 圖14為顯示本發明第三實施形態的照明光學裝置及本發 明第三實施形態的曝光裝置結構之圖。 圖15為顯示可取代衍射光、學元件4a〜41或5 a〜5卜衍射光學 元件20a、2 0b、...使用的折射光學元件的透視圖。 圖16為顯示衍射光學元件交換機構第一變形例的正面圖。 ______-19- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)Line 544758 A7 B7 V. Sectional view of the case of the invention description (16). FIG. 6 is a diagram illustrating the illuminating area of the diffractive optical element 4a formed on the incident surface of the fly-eye lens 7. As shown in FIG. FIGS. 7A and 7B are diagrams showing an example of an illumination area formed on the incident surface of the fly-eye lens 7 by the diffractive optical elements 5 a to 51. Figs. 8A to 8E are diagrams showing other examples of the shape of the cross section of the light beam when the light beams are decentered with respect to the optical axis AX by using the diffractive optical elements 5a to 51. FIG. 9 is a diagram showing an example of an illumination area where a 5 m beam of light passing through the aperture-claw is formed on the incident surface of the fly-eye lens 7. FIG. 10A and 10B are side views showing a specific structure of the variable focal length optical system 6. As shown in FIG. 11A and 11B are diagrams showing changes in the irradiation area on the incidence surface side of the fly-eye lens 7 when the focus distance or focus position of the variable focus optical system 6 is adjusted by the driving device 13. 12A to 12C are diagrams showing changes in the irradiation area on the incident surface side of the fly-eye lens 7 when the focus distance or focus position of the variable focus optical system 6 is adjusted by the driving device 13. Fig. 13 is a diagram showing the configuration of an illumination optical device according to a second embodiment of the present invention and an exposure apparatus according to the second embodiment of the present invention. Fig. 14 is a diagram showing the configuration of an illumination optical device according to a third embodiment of the present invention and an exposure apparatus according to the third embodiment of the present invention. Fig. 15 is a perspective view showing a refractive optical element that can be used instead of diffractive light, and the optical elements 4a to 41 or 5a to 5b are diffractive optical elements 20a, 20b, .... FIG. 16 is a front view showing a first modification of the diffractive optical element exchange mechanism. ______- 19- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

圖17為 及上面圖 圖18為 及上面圖 圖19為 及上面圖 圖20為 圖21為 圖22為 的照明區 圖23為 衍射光學 圖24為 衍射光學 圖25為 衍射光學 圖26為 本發明第 <圖0 顯示衍射光學元件交換機構第二變形例的正面圖 顯示衍射光學元件交換機構第 〇 顯示衍射光學元件交換機構第 三變形例的正面圖 ^ 四變形例的正面圖FIG. 17 is a top view, FIG. 18 is a top view, FIG. 19 is a top view, FIG. 20 is a top view, FIG. 20 is an illumination area of FIG. 22, FIG. 23 is a diffractive optical view, FIG. 24 is a diffractive optical view, and FIG. Fig. 0 shows a front view of a second modification example of the diffractive optical element exchange mechanism. Fig. 0 shows a front view of a third modification example of the diffractive optical element exchange mechanism. ^ Front view of four modification examples.

顯示衍射光學元件交換機構第五變形例的正面圖。 顯示衍射光學元件交換機構第六變形例的正面圖。 顯示按照轉印於晶圓_圖案形 域IA配置之例之圖。 … 說明本發明第四實施形態的照明光學系統具備的 元件變換特性之圖。 . 訂A front view showing a fifth modification of the diffractive optical element exchange mechanism. A front view showing a sixth modification of the diffractive optical element exchange mechanism. This figure shows an example of the layout according to the transfer pattern on the wafer_pattern IA. … A diagram illustrating element conversion characteristics provided in the illumination optical system according to the fourth embodiment of the present invention. Order

說明本發明第四實施形態的照明光學系統具備的 元件交換特性之圖。 說明本發明第四實施形態的照明光學系統具備的 元件變換特性之圖。 顯不本發明第五實施形態的照明光學裝置及具備 五實施形態的照明光學裝置的曝光裝置概略結構 圖27為得到作為微裝置的半導體裝置時的手法的流程圖。 圖28為使用本實施形態的曝光裝置在板上形成預定圖案 藉此彳于到作為微裝置的液晶顯示元件時的手法的流程圖。 圖29為使用習知複眼透鏡的光學系統模式圖。 圖3 0為顯示具備使用雙複眼透鏡系統的照明光學系統的 ____ -20- &張尺_中關家標準(CNS·) A4規格_ χ 297公爱) 544758 A7 _B7 五、發明説明(18 ) 曝光裝置一例的概略結構。 圖3 1為顯示入射於第二複眼透鏡丨17的光束照射第—複 眼透鏡11 7的情況之圖。 _ ? 圖32A為顯示形成環帶狀孔徑的孔徑光闌118&作為具有 圓形以外的孔徑的習知孔徑光闌一例之圖。 圖32B為顯示形成多數孔徑的孔徑光闌118b作為具有圓 形以外的孔徑的習知孔徑光闌一例之圖。 圖33為顯示入射於第一複眼透鏡118的光束截面形狀和 孔徑光闌1 1 8a形狀的關係之圖。 實施發明之形態 以下,參考圖面就根據本發明實施形態的照明光學裝置 、曝光裝置及微裝置之製造方法加以詳細說明。又Γ在以 下說明,圖中顯示ΧΥΖ正交座標系時,一面參考其ΧγΖ正 X座標系,一面就各圖面間的各構件位置關係加以說明。 附加於圖面的ΧΥΖ正交座標系將Χ軸及γ軸設定成對於作 為感光性基板的晶圓W成為平行,將ζ軸設定在對於晶圓w 正叉的方向。圖中的ΧΥΖ座標系實際上將χγ平面設定在與 水平面平行的面,將Ζ軸設定在垂直上方向。 [第一實施形態] 圖1為顯示本發明第一實施形態的照明光學裝置及具備 本發明第一實施形態的照明光學裝置的曝光裝置概略結構 之圖。首先’參考圖1就本發明第一實施形態的照明光學裝 置及本發明第一實施形態的曝光裝置全體結構加以說明, 其次就本發明特徵部分的實施形態加以詳細說明。在圖1 —_ -21- 本纸蒗尺度適用中~ 544758A diagram illustrating element exchange characteristics provided in an illumination optical system according to a fourth embodiment of the present invention. A diagram illustrating element conversion characteristics provided in an illumination optical system according to a fourth embodiment of the present invention. Fig. 27 shows a schematic configuration of an illumination optical device according to a fifth embodiment of the present invention and an exposure apparatus including the illumination optical device according to the fifth embodiment. Fig. 27 is a flowchart showing a method for obtaining a semiconductor device as a microdevice. FIG. 28 is a flowchart of a method for forming a predetermined pattern on a board by using the exposure apparatus of this embodiment to get a liquid crystal display element as a microdevice. FIG. 29 is a schematic diagram of an optical system using a conventional fly-eye lens. Figure 3 0 shows the ____ -20- & Zhang Ruler_Zhongguanjia Standard (CNS ·) A4 Specification _ χ 297 public love) equipped with an illuminating optical system using a binocular lens system 544758 A7 _B7 V. Description of the invention ( 18) A schematic configuration of an example of an exposure device. Fig. 31 is a diagram showing a state in which a light beam incident on the second fly-eye lens 17 is irradiated to the first fly-eye lens 114. Fig. 32A is a view showing an example of an aperture stop 118 & having a circular band-shaped aperture as a conventional aperture stop having an aperture other than a circular shape. Fig. 32B is a view showing an example of an aperture stop 118b having a plurality of apertures as a conventional aperture stop having an aperture other than a circular shape. Fig. 33 is a diagram showing the relationship between the cross-sectional shape of a light beam incident on the first fly-eye lens 118 and the shape of the aperture stop 118a. Embodiments of the Invention Hereinafter, a manufacturing method of an illumination optical device, an exposure device, and a micro device according to embodiments of the present invention will be described in detail with reference to the drawings. Also, Γ is explained below. When the XYZ orthogonal coordinate system is shown in the figure, the positional relationship of each member between the drawings will be described with reference to the XYZ positive X coordinate system. The XYZ orthogonal coordinate system added to the drawing sets the X-axis and the γ-axis so as to be parallel to the wafer W as the photosensitive substrate, and sets the z-axis to the direction of the fork with respect to the wafer w. The XYZ coordinate system in the figure actually sets the χγ plane on a plane parallel to the horizontal plane, and sets the Z axis in the vertical direction. [First embodiment] Fig. 1 is a diagram showing a schematic configuration of an illumination optical device according to a first embodiment of the present invention and an exposure apparatus provided with the illumination optical device according to the first embodiment of the present invention. First, referring to Fig. 1, the entire configuration of the illumination optical device according to the first embodiment of the present invention and the exposure apparatus according to the first embodiment of the present invention will be described, and then the embodiment of the characteristic part of the present invention will be described in detail. In Figure 1 —_ -21- The paper size is applicable ~ 544758

中/為射ttW皮長248 _雷射光的氟化氮準分子雷射等光源 ,相當於供應本發明所謂的光束的光源部。 由光源1沿著z方向射出的大致平行的光束具有沿著技 ::長,伸的矩形截面入射於由一對柱面透鏡構成的光 、展益2。設於光束擴展器2的成對的柱面透鏡在圖^的紙 面内(YZ平面内)分別具有負折射率及正折射率,包含光軸 AX在和紙面正交的面内(χζ平面内)起作用作為平行平面 板因此,入射於光束擴展器2的光束在圖丨的紙面内被擴 大,被整形成有預定形狀截面的光束,例如有正方形截面 的光束。 透過作為整形光學系統的光束擴展器2的光束以折彎反 射鏡3向Υ方向偏轉後,依次入射於設於轉換器4的衍射光 學凡件(DOE: Diffractive Optical Element)或設於轉換器 5 的衍射光學元件。這些衍射光學元件將入射的光束變換成 預定截面形狀,例如具有圓形截面形狀的光束、具有環帶 狀截面形狀的光束及對於作為基準光軸的光軸Αχ偏心的 多數光束的至少兩種光束,相當於形成本發明所謂的光束 變換機構一部分的變換光學元件。 又,就在本實施形態具備將入射的光東都可變換成有上 过一種截面形狀的光束之任一的衍射光學元件的情況加以 說明。此外,在圖1圖示變換成具有環帶狀截面形狀的光束 的衍射光學元件配置於光軸ΑΧ上的情況。此外,轉換器4 、5相當於本發明所謂的第一保持構件及第二保持構件,本 發明所謂的保持構件是總稱這些轉換器4及轉換器5的。轉 -22- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) m 訂The medium / light source is a light source such as a nitrogen fluoride excimer laser that emits ttW skin length 248 _ laser light, which corresponds to a light source unit that supplies the so-called light beam of the present invention. A substantially parallel light beam emitted from the light source 1 in the z direction has a rectangular cross-section extending along the length of the beam, and is incident on the light composed of a pair of cylindrical lenses. The paired cylindrical lenses provided in the beam expander 2 have a negative refractive index and a positive refractive index in the paper plane (in the YZ plane) of FIG. ^, And include the optical axis AX in a plane orthogonal to the paper plane (in the χζ plane). ) Acts as a parallel plane plate. Therefore, the light beam incident on the beam expander 2 is enlarged in the paper surface of FIG. 1 and formed into a light beam with a predetermined cross section, for example, a light beam with a square cross section. The light beam that has passed through the beam expander 2 as the shaping optical system is deflected in the Υ direction by the bending mirror 3 and then incident on the diffractive optical element (DOE: Diffractive Optical Element) provided on the converter 4 or the converter 5 Diffractive optical element. These diffractive optical elements convert an incident light beam into a predetermined cross-sectional shape, for example, a light beam having a circular cross-sectional shape, a light beam having a ring-shaped cross-sectional shape, and at least two types of light beams eccentric to the optical axis Aχ which is a reference optical axis. Is equivalent to a conversion optical element forming part of the so-called beam conversion mechanism of the present invention. Further, a case will be described in which the present embodiment is provided with a diffractive optical element capable of converting incident light to any one of light beams having a cross-sectional shape. In addition, FIG. 1 illustrates a case where a diffractive optical element converted into a light beam having an endless cross-sectional shape is disposed on the optical axis AX. The converters 4 and 5 correspond to the so-called first and second holding members of the present invention, and the so-called holding members of the present invention are collectively referred to as these converters 4 and 5. Rpm -22- This paper size applies to China National Standard (CNS) A4 (210X 297 mm) m order

k 544758 五、發明説明(20 A7 B7k 544758 V. Description of the invention (20 A7 B7

換器4、5為旋轉驅動裝置11、12所分別驅動,在主控制系 統1 5的控制下設定其旋轉角。又,旋轉驅動裝置丨丨、丨2相 當於本發明所謂的驅動部,此旋轉驅動裝置n、12及主# 制系統15相當於本發明所謂的設定部。 &quot; 藉由通過設於轉換器4、5的衍射光學元件變換成截面形 狀預定形狀的光束入射於為本發明最特徵部分的可變焦距 光學系統6。此可變焦距光學系統6相當於本發明所謂^可 變倍率光學系統’係為了變更以衍射光學元件變換截面形 狀的光束的光強度所設。此可變焦距光學系統6以5片以下 的光學構件構成’在可變倍率比2·3倍以下將焦點距離設定 成可變。又,可變倍率光學系統的可變倍率比以可變倍率 光學系統的最長焦點距離&amp;除以可變倍率光學系統的最短 焦點距離fW之值(fT/fw)決定。 《所以以可變焦距光學系統6具備的光學構件為5片以_ ’主要是為了伴隨由光源出的光波長短波長化,防止; 變焦距光學系統6的透過光量降低。此外,是為了藉由減,丨 表面數’使在光學構件表面光化學反應發生的* 率盡I降低,抑制光學構件劣化而謀求性能維持,同時拿 求交換光學構件所需的運轉#用減低。㈣,是為 將細微圖案形成於晶圓〜上得到較佳的照明條件,在可§ 倍率3倍以下《下確保焦點距離的可變範圍(2.3倍g 下)。 此外’之所以以可變倍車 由。即,以往μ 為·3倍以下,是根據以下g 叹置幾個何射特性不同的衍射光學元件,#The switches 4, 5 are driven by the rotary driving devices 11, 12, respectively, and their rotation angles are set under the control of the main control system 15. The rotary driving devices 丨 丨, 丨 2 correspond to the so-called driving section of the present invention, and the rotary driving apparatuses n and 12 and the main control system 15 correspond to the so-called setting section of the present invention. &quot; A light beam transformed into a predetermined shape by a diffractive optical element provided in the converters 4, 5 is incident on a variable focal length optical system 6 which is the most characteristic part of the present invention. This variable focal length optical system 6 corresponds to the so-called "variable magnification optical system" of the present invention, and is provided for changing the light intensity of a light beam whose cross-sectional shape is changed by a diffractive optical element. This variable focal length optical system 6 is composed of 5 or less optical members' and the focal length is set to be variable at a variable magnification ratio of 2 · 3 or less. The variable magnification ratio of the variable magnification optical system is determined by dividing the longest focal distance &amp; of the variable magnification optical system by the value (fT / fw) of the shortest focal distance fW of the variable magnification optical system. << Therefore, five optical components included in the variable focal length optical system 6 are used to prevent the reduction of the wavelength of light emitted from the light source; the amount of transmitted light of the variable focal length optical system 6 is reduced. In addition, it is to reduce the number of surfaces to reduce the occurrence rate of photochemical reactions on the surface of the optical component, reduce the degradation of the optical component, and maintain performance while reducing the number of operations required to exchange the optical component. ㈣ It is to form fine patterns on the wafer to obtain better lighting conditions. The variable range of the focal distance can be ensured under the magnification of 3 times or less (under 2.3 times g). In addition, the reason why the car is variable. That is, in the past, μ is less than or equal to 3 times, and the number of diffractive optical elements with different emission characteristics is described by the following g. #

裝 訂Binding

線 544758 A7 _B7五、發明説明(21 ) 了變更以此衍射光學元件之任一變換截面形狀的光束的光 強度分佈,使用在寬廣可變範圍焦點距離可變的可變焦距 光學系統。即,以往為了變更光束的光強度,使用少數種-類的衍射光學元件和可變範圍寬廣的可變焦距光,學系統。 然而’可變焦距光學系統的焦點距離的可變範圍寬廣,則 其光譜學構件片數變多,並且需要為了盡量減少符合各焦 點距離的像差的光學元件而結構成為複雜,最後包含於可 變焦距光學系統的光學構件數變多了。 於是,在本實施形態將各變換的光束截面形狀的種類變 換特性不同的多數衍射光學元件設於轉換器4、5,以結構 簡單的可變焦距光學系統6微調利用此衍射光學元件之任 一變換截面形狀的光束的光強度分佈。此處,本實施形態 在包含於可變焦距光學系統6的透鏡6a〜6d的製造誤差及位 置調整誤差少時,可變焦距光學系統6的可變倍率比被設計 在2以下即可。 因此,本發明為了更簡化可變焦距光學系統6等可變倍率 光學系統的結構,最好是以此可變倍率光學系統的可變倍 率比為2以下,為了更進一步簡化可變倍率光學系統的結構 ’更好是以可變倍率光學系統的可變倍率比為1·8以下。 又’此時為了 一面進行可變倍率光學系統的結構簡化到 界限,一面抑制光束變換元件的個數,最好可變倍率光學 系統的可變倍率比下限定為丨.2以上。此處,若考慮可變倍 率光學系統的可變倍率比下限而以可變倍率光學系統的可 變倍率比為Ζ,則以可變倍率光學系統的可變倍率比為2以 -24 - ϋ張尺度適用中國國家標準(〇Ν8)Αθλ^^〇Χ297公釐)----Line 544758 A7 _B7 V. Description of the Invention (21) The light intensity distribution of a beam that changes the cross-sectional shape of any of the diffractive optical elements is changed by using a variable focal length optical system with a variable focal distance in a wide variable range. That is, in the past, in order to change the light intensity of a light beam, a few types of diffractive optical elements and a wide variable range of variable focal length light were used to study the system. However, the variable range of the focal length of the variable focal length optical system has a wide variable range, the number of spectroscopic components will increase, and the structure will need to be complicated in order to minimize the aberrations that match the focal distances. The number of optical components of the zoom optical system has increased. Therefore, in this embodiment, a plurality of diffractive optical elements having different types of converted beam cross-sectional shapes and different conversion characteristics are provided in the converters 4 and 5, and one of the diffractive optical elements is fine-tuned using a simple variable focal length optical system 6. The light intensity distribution of a light beam whose cross-sectional shape is transformed. Here, when the manufacturing errors and position adjustment errors of the lenses 6a to 6d included in the variable focal length optical system 6 are small, the variable magnification ratio of the variable focal length optical system 6 may be designed to be 2 or less. Therefore, in order to simplify the structure of the variable magnification optical system such as the variable focal length optical system 6, it is preferable that the variable magnification ratio of the variable magnification optical system is 2 or less. In order to further simplify the variable magnification optical system, The structure 'is preferably such that the variable magnification ratio of the variable magnification optical system is 1.8 or less. At this time, in order to simplify the structure of the variable magnification optical system to the limit while suppressing the number of beam conversion elements, it is preferable that the variable magnification ratio of the variable magnification optical system is limited to 丨. 2 or more. Here, if the lower limit of the variable magnification ratio of the variable magnification optical system is taken into consideration and the variable magnification ratio of the variable magnification optical system is Z, then the variable magnification ratio of the variable magnification optical system is 2 to -24-ϋ Zhang scale applies Chinese National Standard (〇Ν8) Αθλ ^^ 〇 × 297mm) ----

裝 訂 m 線 544758 A7 —.__ _B7 五、發明説明(22 ) 下時’最好是滿足1.22$2的範圍,以可變倍率光學系統的 可變倍率比為1·8以下時,更好是滿足12£2^18的範圍。 此外,包含於可變焦距光學系統6的透鏡6a〜6d的至少一-個透鏡面為了盡量縮小剩餘像差,最好形成非球,面。又, 關於此可變焦距光學系統6的結構及動作詳細,後述之。設 於可交焦距光學系統6内的透鏡6b〜6 d為驅動裝置13所驅動 ’在主控制系統15的控制下調整γ軸方向的位置而設定光 學上的焦點距離。 - 通過可變焦距光學系統6的光束重疊地均勾照明作為均 勻照明設於單像光罩(reticle)R的單像光罩面(形成圖案的 面)進而晶圓W上面(晶圓面)的光學積分器的複眼透鏡7的 入射面。又’上述單像光罩面及晶圓面相當於本發钥所謂 的被照射面。複眼透鏡7係由沿著光軸八又縱橫排列有正折 射率的多數單元透鏡所構成。此外,構成複眼透鏡7的各單 元透鏡入射側的面形成使凸面向入射側的球面狀,射出側 的面形成使凸面向射出側的球面狀。 因此’入射於複眼透鏡7的光束為多數單元透鏡所二維分 割,在光束入射的各單元透鏡的後側焦點面分別形成多數 光源像。如此一來,在複眼透鏡7的後側焦點面形成和入射 於複眼透鏡7入射面的光束截面形狀相同截面形狀的二次 光源。來自形成於複眼透鏡7後側焦點面的環帶狀二次光源 的光束入射於配置於其附近的孔徑光闌8。此孔徑光闌8支 持於可在與光軸AX平行的預定軸線周圍旋轉的旋轉板(在 圖1不圖示)上。又,孔徑光闌8的形狀係按照為設於轉換器 _____ - 25 - 本紙張尺度適用中S时標準(CNS) A4規格(210 X 297公爱) --- 544758 A7 B7 五 、發明説明(23Binding m-line 544758 A7 —.__ _B7 5. In the description of the invention (22), it is better to satisfy the range of 1.22 $ 2, and when the variable magnification ratio of the variable magnification optical system is less than 1.8, it is better to satisfy 12 £ 2 ^ 18 range. In addition, at least one lens surface of the lenses 6 a to 6 d included in the variable focal length optical system 6 is preferably formed as an aspheric surface to minimize the remaining aberration. The structure and operation of the variable focal length optical system 6 will be described in detail later. The lenses 6b to 6d provided in the cross-focus optical system 6 are driven by the driving device 13 'to adjust the position in the γ-axis direction under the control of the main control system 15 to set the optical focal distance. -Uniform illumination by overlapping the light beams of the variable focal length optical system 6 as uniform illumination provided on the single-image mask surface (pattern-forming surface) of the single-image mask (reticle) R and then on the wafer W (wafer surface) Incidence surface of the fly-eye lens 7 of the optical integrator. Also, the single image mask surface and the wafer surface correspond to the irradiated surface referred to in the present key. The fly-eye lens 7 is composed of a plurality of unit lenses having positive refractive power arranged vertically and horizontally along the optical axis. In addition, the surface on the incident side of each unit lens constituting the fly-eye lens 7 has a spherical shape with the convex surface facing the incident side, and the surface on the exit side has a spherical shape with the convex surface facing the exit side. Therefore, the light beam incident on the fly-eye lens 7 is two-dimensionally divided by a plurality of unit lenses, and a plurality of light source images are respectively formed on the rear focal planes of the unit lenses incident on the light beam. In this way, a secondary light source having the same cross-sectional shape as the cross-sectional shape of the light beam incident on the incident surface of the fly-eye lens 7 is formed on the rear focal plane of the fly-eye lens 7. A light beam from an endless belt-shaped secondary light source formed on the focal surface on the rear side of the fly-eye lens 7 is incident on an aperture stop 8 arranged in the vicinity thereof. This aperture stop 8 is supported on a rotating plate (not shown in Fig. 1) rotatable around a predetermined axis parallel to the optical axis AX. In addition, the shape of the aperture stop 8 is set at the converter _____-25-This paper size is applicable to the S standard (CNS) A4 specification (210 X 297 public love) --- 544758 A7 B7 V. Description of the invention (twenty three

4、5的衍射光學元件所變換的光束截面形狀所選擇。 發出複眼透鏡7出射側的面光源的光束 :则光束的形狀後,以反射鏡9向一 z方向偏 水先光學系統10。透過聚光光學系統1〇的光束重疊地 照明形成圖案的單像光罩R。此處’在圖15隹然簡化聚光光 學系統10而表現作為一片透鏡,但包含於前述可變焦距光 學系統6和聚光光學系統1〇的光學構件總數被設定在以 下0 — .The cross-sectional shape of the beam transformed by the diffractive optical elements of 4, 5 is selected. The light beam from the surface light source on the exit side of the fly-eye lens 7 is emitted: after the shape of the light beam, it is deflected by the mirror 9 in a z-direction and the optical system 10 is first. The light beam transmitted through the condensing optical system 10 overlaps and illuminates the patterned single-image mask R. Here, in FIG. 15, the condensing optical system 10 is simplified as a lens, but the total number of optical components included in the aforementioned variable focal length optical system 6 and the condensing optical system 10 is set to 0 or less.

圖30所示的習知雙複眼透鏡系統在聚光光學系統i 19和 光罩123之間配置為了決定單像光罩R照明範圍的視場光闌 120’為了使此視場光闌12〇和單像光罩R的單像光罩面在光 學上成為共軛,需要在視場光闌i 2〇和單像光罩R間的光路 中汉置中繼光學系統12 1。因此,在複眼透鏡7和單像光罩R 之間設有許多光學構件,所以從透過光量降低的觀點是不 理想的狀況。 對此,本實施形態在單像光罩R的上面附近配置作為視場 光闌的單像光罩擔板RB,藉此可省略中繼光學系統,其結 果可簡化複眼透鏡7和單像光罩R之間的結構。其結果可使 來自形成於複眼透鏡7後側焦點面的二次光源的光束透過 光量提高。又,單像光罩擋板RB為驅動裝置14所驅動,在 主控制系統1 5的控制下設定單像光罩r的照明區域。 重疊地均勻照明單像光罩卫,就將形成於單像光罩r的圖 案像透過投影光學系統PL投影於晶圓w,藉此將單像光罩R 的圖案轉印於晶圓W。又,投影光學系統pl的光瞳和照明 -26- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)The conventional double-eye lens system shown in FIG. 30 is disposed between the condenser optical system i 19 and the mask 123 to determine a field diaphragm 120 ′ for determining the illumination range of the single-image mask R. In order to make this field diaphragm 12 and The single-image mask surface of the single-image mask R is optically conjugated, and a relay optical system 12 1 needs to be installed in the optical path between the field diaphragm i 20 and the single-image mask R. Therefore, since many optical members are provided between the fly-eye lens 7 and the single-image mask R, it is not desirable from the viewpoint of a reduction in the amount of transmitted light. On the other hand, in the present embodiment, a single-image mask stretch plate RB serving as a field stop is arranged near the upper surface of the single-image mask R, thereby eliminating the relay optical system, and as a result, the fly-eye lens 7 and the single-image light can be simplified. Structure between hoods R. As a result, the amount of transmitted light from the secondary light source formed on the focal plane on the rear side of the fly-eye lens 7 can be increased. The single-image mask baffle RB is driven by the driving device 14 and the illumination area of the single-image mask r is set under the control of the main control system 15. The single-image mask guard is uniformly illuminated in an overlapping manner, and the pattern image formed on the single-image mask r is projected onto the wafer w through the projection optical system PL, thereby transferring the pattern of the single-image mask R to the wafer W. In addition, the pupils and illumination of the projection optical system pl -26- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

線 544758 A7 ___ B7 五、發明説明(24 ) 光學裝置的光瞳面,即配置孔徑光闡8的面在光學上被設定 成共軛。如此一來,在和投影光學系統pL的光軸Αχ正交的 平面(ΧΥ平面)内一面二維驅動控制晶圓w,一面進行一次 曝光或掃描曝光,藉此在晶圓w的各曝光區域使單像光罩R 的圖案逐步曝光。 又’一次曝光係按照所謂步進重複(step and repeat)方式 ’對於晶圓W的各曝光區域使光罩圖案一次曝米。這種情 況’在單像光罩R上的照明區域形狀為接近正方形的矩形, 複眼透鏡7的各單元透鏡截面形狀也成為接近正方形的矩 形。另一方面,掃描曝光係按照所謂步進掃描(step and scan)方式,一面使單像光罩r及晶圓w對於投影光學系統 PL相對移動,一面對於晶圓w的各曝光區域使形成於單像 光罩R的圖案掃描曝光。這種情況,在單像光罩R上的照明 區域形狀為短邊和長邊之比例如1 : 3的矩形,複眼透鏡7 的各單元透鏡截面形狀也成為和此相似的矩形。 又,以上說明的光源1,光束擴展器2、折彎反射鏡3、有 多數衍射光學元件的轉換器4、5、可變焦距光學系統6、複 眼透鏡7、孔徑光闌8、反射鏡9、聚光透鏡1 〇、單像光罩擋 板RB及旋轉驅動裝置11、12構成本發明之照明光學裝置, 此照明光學裝置、載置單像光罩R的單像光罩台(圖示省 略)、投影光學系統PL及載置晶圓W的晶圓台(圖示省略)構 成本發明之曝光裝置。 以上,就本發明第一實施形態的照明光學裝置及本發明 第-實施形態的曝光裝置全體結構的概要加以說明,其次 _ 27 - 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) &quot; &quot; * &quot; 544758 A7 ______B7五、發明説明(25~) &quot; 將就具備多數衍射光學元件的轉換器4、5結構及可變焦距 光學系統6結構的詳細加以說明。圖2為顯示轉換器4、5 一 例的透視圖,圖3為其正面圖。如圖2所示,轉換器4、5構~ 成如下:配置成其旋轉軸對於光軸AX成為平行且從光軸 AX偏心的狀態,設於轉換器4的多數衍射光學元件及孔徑 的任何一個和設於轉換器5的多數衍射光學元件及孔徑的 任何一個配置於光軸上。 圖3 A為顯示轉換器5—例的正面圖,圖3B為顯示轉換器4 一例的正面圖。如圖3 A所示,在轉換器5沿著其圓周方向 ’衍射光學元件5a〜51及孔徑5m排列於圓周方向。衍射光學 元件5a〜51衍射入射的光束而變換成對於光軸αχ偏心的多 數光束’設定成各個的衍射特性(例如衍射角)不同。-同樣 地’在轉換器4沿著其圓周方向,衍射光學元件4 a〜41及孔 徑4m排列於圓周方向,這些衍射光學元件4a〜4i衍射入射的 光束而變換成具有環帶狀截面形狀的光束,設定成各個的 衍射特性(例如衍射角)不同。 孔徑4m、5m係為了不使入射的光束截面形狀變化而只使 其透過所設。將光束截面形狀變換成具有圓形截面形狀的 光束時,孔徑4m及孔徑5m均配置於光軸AX上。此外,變 換成對於光軸AX偏心的多數光束時,孔徑4m及衍射光學元 件5a〜51的任何一個配置於光軸AX上。再者,變換成具有環 帶狀截面形狀的光束時,衍射光學元件4a〜41的任何一個及 孔徑5m配置於光軸AX上。 衍射光學元件4a〜41及衍射光學元件5a〜51為相位型衍射 -28- 本紙浪尺度適用中國國家標準(CNS) A4規格(210X297公釐) ' -----—Line 544758 A7 ___ B7 V. Description of the Invention (24) The pupil surface of the optical device, that is, the surface on which the aperture light beam 8 is arranged is optically set to be conjugated. In this way, the wafer w is driven and controlled two-dimensionally in a plane (χΥ plane) orthogonal to the optical axis Ax of the projection optical system pL, and one exposure or scanning exposure is performed, thereby exposing each exposed area of the wafer w. The pattern of the single image mask R is gradually exposed. Another 'exposure is based on the so-called step and repeat method', which exposes the mask pattern to each exposure region of the wafer W once. In this case, the shape of the illumination region on the single-image mask R is a rectangle close to a square, and the cross-sectional shape of each unit lens of the fly-eye lens 7 also becomes a rectangle close to a square. On the other hand, the scanning exposure is based on a so-called step and scan method. While the single image mask r and the wafer w are relatively moved with respect to the projection optical system PL, the exposure areas of the wafer w are formed on The pattern scanning exposure of the single image mask R. In this case, the shape of the illumination region on the single-image mask R is a rectangle having a short side to long side ratio of, for example, 1: 3, and the cross-sectional shape of each unit lens of the fly-eye lens 7 also becomes a rectangle similar to this. In addition, the light source 1 described above, the beam expander 2, the bending mirror 3, the converters 4, 5 with a plurality of diffractive optical elements, the variable focal length optical system 6, the fly-eye lens 7, the aperture stop 8, and the mirror 9 The condenser lens 10, the single-image mask baffle RB, and the rotation driving devices 11, 12 constitute the illumination optical device of the present invention. This illumination optical device and a single-image mask stage on which the single-image mask R is placed (illustrated) (Omitted), the projection optical system PL, and the wafer stage (not shown) on which the wafer W is placed constitute the exposure apparatus of the present invention. In the above, the outline of the overall structure of the illumination optical device according to the first embodiment of the present invention and the exposure apparatus according to the first embodiment of the present invention has been described, and then _ 27-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ) &quot; &quot; * &quot; 544758 A7 ______B7 V. Description of the Invention (25 ~) &quot; The structure of the converters 4, 5 and the variable focal length optical system 6 with most diffractive optical elements will be explained in detail. Fig. 2 is a perspective view showing an example of the converters 4, 5 and Fig. 3 is a front view thereof. As shown in FIG. 2, the converters 4 and 5 are configured as follows: the rotation axis is arranged parallel to the optical axis AX and eccentric from the optical axis AX, and most of the diffractive optical elements and apertures provided in the converter 4 are arranged. One of the plurality of diffractive optical elements and the aperture provided in the converter 5 is arranged on the optical axis. FIG. 3A is a front view showing an example of the converter 5, and FIG. 3B is a front view showing an example of the converter 4. As shown in Fig. 3A, the converters 5 are arranged along the circumferential direction 'of the diffractive optical elements 5a to 51 and the aperture 5m in the circumferential direction. The diffractive optical elements 5a to 51 diffract the incident light beam and convert it into a plurality of light beams eccentric with respect to the optical axis αx so that each diffraction characteristic (for example, a diffraction angle) is different. -Similarly, in the converter 4 along the circumferential direction, the diffractive optical elements 4 a to 41 and the aperture 4 m are arranged in the circumferential direction. These diffractive optical elements 4 a to 4 i diffract the incident light beam and transform it into a ring-shaped cross-sectional shape. The light beam is set to have different diffraction characteristics (for example, a diffraction angle). The apertures 4m and 5m are provided so as not to change the cross-sectional shape of the incident light beam and only transmit it. When the beam cross-sectional shape is converted into a beam having a circular cross-sectional shape, both the aperture 4m and the aperture 5m are arranged on the optical axis AX. In addition, when the majority of the beams are decentered with respect to the optical axis AX, any one of the aperture 4m and the diffractive optical elements 5a to 51 is arranged on the optical axis AX. In addition, when converted into a light beam having a ring-shaped cross-sectional shape, any of the diffractive optical elements 4a to 41 and the aperture 5m are arranged on the optical axis AX. The diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 are phase-type diffraction -28- The paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) '------

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線 544758 A7 __B7 五、發明説明(26 ) 光學元件,配設多數微小相位圖案及透過率圖案所構成。 圖4A為顯不從X方向看衍射先學元件4a〜41及衍射光學元件 5a〜51的截面形狀之圖,圖4B為顯示衍射入射於衍射光學元-件4a〜41及衍射光學元件5a〜51的光束的情況之圖‘,圖化為 顯示衍射於衍射光學元件4a〜41及衍射光學元件5a〜51的光 的遠场圖(far fieldp at tern)—例之圖。 入射於衍射光學元件4a〜41及衍射光學元件5a〜51的任一 元件的光中,透過以A所示的部分的光相位為零,透過以b 所示的部分的光對於透過A的光,相位只慢π。因此,波 動光學上來看,兩個光互相消除,如圖4B所示,沒有零次 光(直接透過光)。因此,透過衍射光學元件4a〜41及衍射光 學元件5 a〜51的任一元件的光被衍射作為土 一次光(或土二 次光),入射於可變焦距光學系統6。而且,如圖4C所示, 在預定照射面P内的某直線上成為有5函數狀強度分佈I的 照明。利用此現象,使用加上各種變化的相位圖案或透過 率圖案的衍射光學元件,則可在照射面p,即複眼透鏡7的 入射面上彳于到希望的光強度分佈。又,上述衍射光學元件 係指包含藉由相位、透過率、折射率等的不同使光衍射的 全部元件者。 圖5 A為顯示作為一例光束入射於衍射光學元件4a的情況 的透視圖’圖5B為作為一例從X方向看光束入射於衍射光 學元件4a的情況的截面圖,·圖5C為作為一例從z方向看光 束入射於衍射光學元件4a的情況的截面圖。此處,以在YZ 面内和光軸AX形成的角為0y,以在χγ面内和光軸αχ形成 -29- 本紙痕尺度適用中國國家標準(CNS) A4規格(210X297公爱)Line 544758 A7 __B7 V. Description of the invention (26) The optical element is composed of a plurality of minute phase patterns and transmittance patterns. 4A is a view showing cross-sectional shapes of the diffraction prior elements 4a to 41 and the diffractive optical elements 5a to 51 as viewed from the X direction, and FIG. 4B is a view showing diffraction incident on the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to The diagram of the case of the 51 beam 'is a far fieldp at tern showing light diffracted by the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51-an example. Of the light incident on any of the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51, the phase of the light transmitted through the portion indicated by A is zero, and the light transmitted through the portion indicated by b is opposite to the light transmitted through A. , The phase is only π slower. Therefore, in wave optics, the two lights cancel each other out, as shown in Figure 4B, there is no zero-order light (directly transmitted light). Therefore, the light transmitted through any of the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 is diffracted as a tertiary light (or a tertiary light) and is incident on the variable focal length optical system 6. Further, as shown in FIG. 4C, the illumination having a function-like intensity distribution I on a certain straight line in the predetermined irradiation surface P becomes illumination. By utilizing this phenomenon, a diffractive optical element added with variously changing phase patterns or transmittance patterns can achieve a desired light intensity distribution on the irradiation surface p, that is, the incident surface of the fly-eye lens 7. The above-mentioned diffractive optical element refers to all elements that diffract light by differences in phase, transmittance, refractive index, and the like. FIG. 5A is a perspective view showing a case where a light beam is incident on the diffractive optical element 4a as an example. FIG. 5B is a sectional view when a light beam is incident on the diffractive optical element 4a as an example when viewed from the X direction. FIG. 5C is a view from z as an example. A cross-sectional view of a case where a light beam is incident on the diffractive optical element 4 a when viewed in a direction. Here, the angle formed in the YZ plane and the optical axis AX is 0y, and the angle formed in the χγ plane and the optical axis αχ. -29- The paper mark scale applies the Chinese National Standard (CNS) A4 specification (210X297 public love)

A7 B7 五、發明説明( 27 ) 的角為0 X。入射光因衍射光學元件4a的衍射特性而衍射角 Q ^ X〇 X 1、0 Μ〜Θ y 1的範圍被衍射的結果,衍射光的截面 ^狀成為略環帶形狀。而且,透過可變焦距光學系統6在複· 眼透‘ 7的入射面上形成環帶形狀的光強度分佈。 圖6為說明衍射光學元件4a形成於複眼透鏡7入射面的照 區或之圖。如圖6所示’使用衍射光學元件4 a,則衍射後 的光束截面形狀成為略環帶形狀。而且,通過可變焦距光 學系統6的光束在複眼_透鏡7的入射面上,只在以斜線所示 的路壤帶狀照明區域IA形成大致均勻的光強度分佈。此處 ’以點線所示的環帶顯示與衍射光學元件4a對應配置的孔 授光闌8所形成的開口區域aa。如從圖6亦明白,由於利用 由何射光學元件4a及可變焦距光學系統6形成的環帶-光束 可只照明與孔徑光闌8開口形狀對應複眼透鏡7的單元透鏡 7a ’所以可極高效率地使用來自光源1的光量。 此外,為了更進一步提高照明效率,也可以沿著只是有 助於通過環帶狀孔徑光闌8的光束的單元透鏡以的輪廓使 照明進行。這種情況,設置將衍射角0 χ、0 y設定成只照 明有助於通過環帶狀孔徑光闌8的光束的單元透鏡7a的衍 射光學元件作為例如衍射光學元件4b,同時微調可變焦距 光學系統6的倍率即可。 以上’就變換成有環帶狀截面形狀的光束的情況加以說 明,其次就變換成對於光軸Αχ偏心的多數光束的情況加以 說明。這種情況,藉由主控制系統丨5控制旋轉驅動裝置Η 而使轉換器4旋轉,將孔徑4m (參考圖3Β)配置於光軸上, -___________~ 30 - 本紙浪尺度適用中國國豕標準(CNS) Α4規格(2ι〇Χ297公嫠) 544758 A7 ________B7 五、發明説明(28~~&quot; 同時藉由控制旋轉驅動裝置12而使轉換器5旋轉,將衍射光 學元件5a〜51的任何一個配置於光軸αχ上。又,變換成對 於光軸AX偏心的多數光束的情況,換成配合變換孔徑光閣_ 8的光束形狀者。 工 衍射光學兀件5a〜51將衍射後的光束截面形狀變換成向 四方向分離的形狀。而且,透過可變焦距光學系統6後,在 複眼透鏡7的入射面上如圖7所示,形成為四極狀光強度分 佈的照明區域IA。圖-7A、圖7B為顯示衍射光學元件5二51 形成於複眼透鏡7入射面的照明區域一例之圖。使用有這種 衍射特性的衍射光學元件5a〜51時,如圖7A所示,不會無用 地照明通過複眼透鏡7中心的十字狀區域,可非常提高照度 效率。更好疋若使用四極形狀中的一個截面形狀呈多角形 ,特別是如圖7B所示,呈五角形形狀者,則成為最適於構 成複眼透知7的卓元透鏡7 a大小的照明,所以可^一面維持照 度均勻性,一面更加提高照度效率。 此外,特別是在步進掃描方式的曝光裝置,構成作為波 陣面分割型光學積分器的複眼透鏡7的多數單元透鏡以各 個形狀成為長方形狀。這種情況’若形成於複眼透鏡7上的 照明區域的邊緣方向在多數單元透鏡7a與和掃描方向對應 的方向(典型的是沿著單元透鏡7a短邊的方向)平行,則在 晶圓W上的照度分佈在掃描正交方向有不成為希望分佈之 虞。於是,特別是進行四極照明時,最好利用衍射光學元 件5 a〜5 1及可變焦距光學系統6使形成於複眼透鏡7入射面 上的四個照明區域的邊緣方向對於與構成複眼透鏡7的多 - 31- 本紙浪尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) ' &quot;~ 544758A7 B7 5. The angle of the invention description (27) is 0X. The incident light is diffracted by the diffraction angle Q ^ X0 X 1, 0 M to Θ y 1 due to the diffraction characteristics of the diffractive optical element 4a, and the cross-sectional shape of the diffracted light becomes a slightly annular shape. Further, an optical intensity distribution in the shape of an annular band is formed on the incident surface of the complex eye opening ′ 7 through the variable focal length optical system 6. FIG. 6 is a diagram illustrating an irradiated area of the diffractive optical element 4a formed on the incident surface of the fly-eye lens 7. FIG. As shown in FIG. 6 ', when the diffractive optical element 4a is used, the cross-sectional shape of the diffracted light beam becomes a slightly annular shape. Further, the light beam passing through the variable focal length optical system 6 forms a substantially uniform light intensity distribution on the incident surface of the fly-eye lens 7 only in the road-strip-shaped illumination area IA indicated by the diagonal line. Here, 'an opening area aa formed by the aperture stop 8 arranged corresponding to the diffractive optical element 4a is shown by a circled line indicated by a dotted line. As is also clear from FIG. 6, since the endless belt-beam formed by the optical element 4 a and the variable focal length optical system 6 can be used to illuminate only the unit lens 7 a ′ corresponding to the shape of the aperture stop 8 and the fly eye lens 7, it can be extremely polarized. The amount of light from the light source 1 is used efficiently. In addition, in order to further improve the lighting efficiency, the lighting may be performed along the contour of the unit lens that only contributes to the light beam passing through the annular aperture stop 8. In this case, a diffractive optical element that sets the diffraction angles 0 χ, 0 y to illuminate only the unit lens 7a that helps to pass the light beam passing through the annular aperture stop 8 is set as, for example, the diffractive optical element 4b, while finely adjusting the variable zoom The magnification of the optical system 6 is sufficient. In the above, the case of converting into a light beam having an endless belt-shaped cross-sectional shape has been described, and the case of converting into a plurality of light beams eccentric to the optical axis Ax has been described next. In this case, the main control system 5 controls the rotary driving device Η to rotate the converter 4 and arrange the aperture 4m (refer to Figure 3B) on the optical axis. -___________ ~ 30-The standard of this paper is applicable to the Chinese national standard (CNS) A4 specification (2ι〇 × 297) 嫠 544758 A7 ________B7 V. Description of the invention (28 ~~ &quot; At the same time, the converter 5 is rotated by controlling the rotation driving device 12, and any one of the diffractive optical elements 5a ~ 51 is rotated. It is arranged on the optical axis αχ. In addition, in the case of converting most of the beams eccentric to the optical axis AX, it is replaced with a beam shape adapted to the conversion aperture optical frame_ 8. The diffractive optical elements 5a to 51 will diffract the beam cross section. The shape is transformed into a shape separated in four directions. Furthermore, after passing through the variable focal length optical system 6, the incident surface of the fly-eye lens 7 is formed into an illumination area IA having a quadrupole light intensity distribution as shown in FIG. 7. FIG.-7A 7B is a diagram showing an example of an illumination area formed on the incident surface of the fly-eye lens 7 by the diffractive optical element 52-51. When the diffractive optical elements 5a to 51 having such diffraction characteristics are used, as shown in FIG. 7A, it is not useless. illumination The cross-shaped area in the center of the fly-eye lens 7 can greatly improve the illuminance efficiency. It is better to use one of the quadrupole shapes in a polygonal shape, especially the pentagonal shape as shown in FIG. 7B. The 7-inch size of the Zhuoyuan lens of the compound eye transparent lens 7 can maintain the uniformity of the illuminance and improve the illuminance efficiency. In addition, the exposure device, especially in the step-scan method, is configured as a wavefront split-type optical Most unit lenses of the fly-eye lens 7 of the integrator are rectangular in various shapes. In this case, 'if the edge direction of the illumination area formed on the fly-eye lens 7 is in the direction corresponding to the scanning direction of the majority unit lens 7a (typically, Along the direction along the short side of the unit lens 7a), the illuminance distribution on the wafer W may not be a desired distribution in the scanning orthogonal direction. Therefore, it is best to use the diffractive optical element 5 when performing quadrupole illumination. a to 5 1 and the variable focal length optical system 6 make the edge directions of the four illumination areas formed on the incident surface of the fly-eye lens 7 correspond to and constitute Fly-eye lens 7 is more-31- The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) '&quot; ~ 544758

數單元透鏡7a的掃描方向對應的方向,即單元透鏡的短 邊方向傾斜。 圖8A〜圖8E為顯示使用衍射光學元件5a〜5][變換成對於光, 軸AX偏心的多數光束時的光束截面形狀他例之圖。圖8a 顯示以形成於複眼透鏡7入射面上的四個照明區域认形狀 為橢圓形之例。而且,圖8B為顯示這些多數照明區域认和 構成複眼透鏡7的多數單元透鏡7&amp;入射面的關係之圖。這種 情沉,照明區域IA的邊緣對於與單元透鏡以的掃描方向對 應的方向成為連續傾斜的方向。如從圖8B也明白,橢圓形 照明區域IA的邊緣對於多數單元透鏡7a未分別在相同位置 父又,所以可減低在被照射面上的照度分佈不均勻性(從希 望分佈的偏倚),特別是掃描正交方向的不均勻性。- 又,這種情況,即使不利用複眼透鏡7射出側的孔徑光闌 8遮蔽多數單元透鏡7a中照明區域的邊緣交叉的單元透鏡 ’亦可得到照度不均勾減低的效果。進而即使是不用孔徑 光闌8的情況(或最大孔徑的情況),亦可得到照度不均勻減 低的效果。因此,即使以中繼透鏡8為可變焦距光學系統而 使多數照明區域IA的位置連續變化的情況,亦無需與這些 照明區域IA對應使孔徑光闌8的孔徑部位置連續變化。 此外,也可以如圖8C所示,以四個照明區域〗八的形狀為 圓形。又,若站在提高成像性能的觀點,則如圖8a以多數 照明區域IA的形狀為橢圓形·比如圖8C為圓形,可使為複眼 透鏡7射出侧的二次光源的光量分佈離開光軸,較佳。在步 進掃描方式的曝光裝置’即使多數照明區域以的邊緣方向 -32- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱)The direction corresponding to the scanning direction of the digital unit lens 7a, that is, the short-side direction of the unit lens is inclined. 8A to 8E are diagrams showing other examples of beam cross-sectional shapes when the diffractive optical elements 5a to 5] are used to convert a majority of the beams decentered with respect to the axis AX. Fig. 8a shows an example in which the four illumination areas formed on the incident surface of the fly-eye lens 7 are considered to be oval. Fig. 8B is a diagram showing the relationship between the recognition of these majority illumination areas and the incidence plane of the majority unit lens 7 constituting the fly-eye lens 7. In this mood, the edge of the illumination area IA becomes a continuously inclined direction with respect to the direction corresponding to the scanning direction of the unit lens. As can also be seen from FIG. 8B, the edges of the elliptical illumination area IA are not at the same position for most of the unit lenses 7a, so the unevenness of the illuminance distribution on the illuminated surface can be reduced (the bias from the desired distribution). It is the non-uniformity of the scanning orthogonal direction. -In this case, even if the aperture stop 8 on the exit side of the fly-eye lens 7 is not used to shield the unit lenses whose edges of the illumination area in most of the unit lenses 7a intersect, it is possible to obtain the effect of reducing uneven illumination. Furthermore, even in the case where the aperture stop 8 is not used (or in the case of the largest aperture), the effect of reducing uneven illumination can be obtained. Therefore, even if the relay lens 8 is a variable focal length optical system and the positions of most of the illumination areas IA are continuously changed, it is not necessary to continuously change the position of the aperture portion of the aperture stop 8 corresponding to these illumination areas IA. In addition, as shown in FIG. 8C, the shape of the four illuminated areas may be circular. From the standpoint of improving imaging performance, the shape of most of the illuminated area IA is oval as shown in Fig. 8a. For example, Fig. 8C is circular, which can make the light quantity distribution of the secondary light source on the exit side of the fly-eye lens 7 away from the light. Shaft, better. Exposure device in the step-and-scan method ’even if the edge direction of most illuminated areas is -32- This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 public love)

Order

線 M4758 五 、發明説明( 30 和掃描正交方向同方向,沿、 插曝光所積分,所以也可以:::向的照度不均勾也為掃 因此’就衍射光學元件5a〜51^ 該 身 的多數照明區域IA的形狀而+夂…、距光學系統6形成 角形狀。_況,若=對=:是如_所示的六 ^細方向,照明區域1A的邊緣斜交又,則可使在被I •亡的照度不均句減低。又,若設定成對於與單元透^ 二:描万向對應的方向’照明區域认的邊緣斜交又,目: '、、'區域的形狀不限於六角形狀,也可以是其他 狀 丄例如如圖輯示,照明區域IA的形狀也可以是矩形。另 、面即使…、明區域的开)狀為六角形狀或矩开[其邊缘 和與單元透鏡7a的掃描方向對應的方向平行時(例如-使圖 吣所示的各照明區域j a以其重心為中心旋轉3 〇。之類 時)’照度不均勻的減低效果也減少,不佳。 此外,以上 &lt; 例係以四極照明為前提而在複眼透鏡7的入 :面士形成四個照明區域IA,但上述原理亦可應用於八極 ’、、等多極照明。即’藉由使構成形成於複眼透鏡7入射面 j的夕極照明的各照明區域的邊緣方向對於與構成複眼透 ,兄7的夕數單元透鏡7a的掃描方向對應的方向傾斜,可使照 度分佈的均勻性提高。 以上’就變換成對於光軸Αχ偏心的多數光束的情況加以 說明’其次將就變換成具有圓形截面形狀的光束的情況加 以說明。這種情況,藉由主控制系統1 5控制旋轉驅動裝置 11而使轉換器4旋轉,將孔徑4m(參考圖3B)配置於光軸上, 丨X 297公釐) B7 五、發明說明(31 同時控制旋轉驅動裝置12而將孔徑5m(參考圖3A)配置於光 軸上。又,這種情況,換成配合變換孔徑光闌8的光束形狀 者’即有圓形形狀孔徑的孔徑光闌。 由於來自光源1的光束通過圓形孔徑4m及孔徑5m,所以 其截面形狀為圓形形狀。此外,由於是大致平行光軸,所 以透過可變焦距光學系統6,直徑也變化,但圓形截面形狀 卻幾乎不變化。圖9為顯示通過孔徑4m、5m的光束形成於 複眼透鏡7入射面的照-明區域一例之圖。如圖9所示,將孔 徑4m及孔徑5m配置於光軸αχ上時,在複眼透鏡7的入射面 上形成為略圓形光強度分佈的照明區域j A。又,在本實施 开y怨雖然舉只將孔徑4m、5m配置於光軸AX上時得到圓形 截面形狀光束的情況為例加以說明,但最好更設有轉換器 •形成多數直徑不同的孔徑或有多數變換成具有圓形截面 形狀的光束且衍射特性各個不同的衍射光學元件。 又’就本實施形態的衍射光學元件而言,例如可採用揭 示於美國專利第5,850,300號公報的衍射型均質 器(homogenizeI·)或揭示於特開 200l-l74615號(及與其對應 的由後藤於2000年4月14日申請美國的申請美國專利案第 〇9/549,720號)公報的衍射型光學積分器(〇ptical integrator)。此處,以美國專利第5,85〇,3〇〇號公報及申請美 國專利第09/549,72〇號為參考加以引用。 其次’就可變焦距光學系·統6的結構加以說明。圖丨〇 a、 圖10B為顯示可變焦距光學系統6具體結構的側面圖。圖 10A、圖10B所示的可變焦距光學系統6從轉換器5側依次包 -34- 本紙張·尺度適用中國國家標準(CNS) A4規格(210 X 297公董^ ---- 544758 A7 B7 五、發明説明( 32 含孔徑光闌ASI,凸平透鏡6a、兩凹透鏡补、兩凸透鏡心 及使凸向複眼透鏡7側的正彎月形透鏡(meniscus W 的四片光學構件。又,圖10A、圖1〇B中的面p顯示複眼透· 鏡的入射面。 其次,就可變焦距光學系統6的規格加以說明。以下所示 的表1為顯示可變焦距光學系統6一例的規格的表。表丨所示 的數值單位為毫米,小數點以下4位捨去顯示。以下的表i 為用射出波長248 nm雷射光的氟化氪準分子雷射作為光源 1時的實施例,從孔徑光闌ASI到複眼透鏡7的入射面p的長 度被設定在450 mm。此外,孔徑光闌ASI的直徑為3〇 mm ,最大入射角為4.5度。此外,各透鏡的玻璃材料為合成石 英,上述波長的折射率為150839。 - 在表1中’左‘的數字為從孔徑光闌A SI側起的透鏡面順 序’ r為透鏡面的曲率半徑,d為從該透鏡面到下一透鏡面 的間隔。此外,在表1中,為了容易配置各透鏡,顯示從該 透鏡面到下一透鏡面的玻璃材料。此外,表丨中的「像面」 顯示圖10A、圖10B中所示的複眼透鏡7的入射面p。 [表1] d 玻璃材料 10.0000 玻璃材料 9.0000 石英 d3 . 5.0000 石英 d5 面號碼 r 1 : 孔徑光闌 2 : 60.0000 3 : 0.0000 4 : -57.1000 5 : 63.0000 -35 - ^紙浪尺度適用中國國家標準(CNS)A4規格(2ΐ〇χ297公釐)Line M4758 V. Description of the invention (30 and the scanning orthogonal direction are in the same direction, and the exposure is integrated along and interpolated, so you can also :: the uneven illumination of the direction is also a sweep so 'just diffractive optical element 5a ~ 51 ^ This body The shape of most of the illuminated area IA is + 夂 ..., and it forms an angular shape from the optical system 6. If === is a six-thin direction as shown by _, and the edges of the illuminated area 1A are diagonally crossed, then Reduce the unevenness of the illuminance caused by I. If it is set to be oblique to the edge of the lighting area recognized in the direction corresponding to the unit ^ 2: the direction of the universal direction, the shape of the area: ',,' It is not limited to a hexagonal shape, but may be other shapes. For example, as shown in the illustration, the shape of the illumination area IA may be rectangular. In addition, the surface is even ... the shape of the bright area is hexagonal or rectangular [its edges and and When the directions corresponding to the scanning directions of the unit lenses 7a are parallel (for example, when each lighting area ja shown in FIG. 3 is rotated around its center of gravity as a center of 30 °, etc.), the effect of reducing the uneven illumination is also reduced, which is not good. In addition, the above example is based on the premise of quadrupole illumination and four illumination areas IA are formed at the entrance of the fly-eye lens 7. However, the above principle can also be applied to multi-pole illumination such as octapoles. That is, 'the illuminance can be adjusted by tilting the edge directions of the respective illumination regions constituting the evening pole illumination formed on the incident surface j of the fly-eye lens 7 to the directions corresponding to the scanning directions of the evening-number unit lens 7 a constituting the fly-eye lens 7. The uniformity of the distribution is improved. In the above, the description is made of the case of converting into a plurality of light beams which are decentered with respect to the optical axis Ax '. Next, the description is given of the case of converting into a light beam having a circular cross-sectional shape. In this case, the main control system 15 controls the rotary driving device 11 to rotate the converter 4, and the aperture 4m (refer to FIG. 3B) is arranged on the optical axis, X 297 mm) B7 V. Description of the invention (31 At the same time, the rotation drive device 12 is controlled to arrange the aperture 5m (refer to FIG. 3A) on the optical axis. In this case, the beam shape of the aperture stop 8 that is adapted to change the aperture stop 8 is the aperture stop having a circular aperture. Since the light beam from the light source 1 passes through a circular aperture 4m and an aperture 5m, its cross-sectional shape is circular. In addition, since it is approximately parallel to the optical axis, it passes through the variable focal length optical system 6 and the diameter also changes, but the circular shape The shape of the cross section remains almost unchanged. Fig. 9 is a diagram showing an example of a light-bright area formed on the incident surface of the fly-eye lens 7 by light beams having apertures of 4m and 5m. As shown in Fig. 9, the aperture 4m and the aperture 5m are arranged on the optical axis. In the case of αχ, an illumination area j A having a slightly circular light intensity distribution is formed on the incident surface of the fly-eye lens 7. In addition, in this embodiment, it is obtained when the apertures 4m and 5m are arranged on the optical axis AX. In the case of a circular cross-section beam, For example, it is better to provide a converter. • A diffractive optical element that forms a large number of apertures with different diameters or has a plurality of beams that are converted into a circular cross-sectional shape and has different diffraction characteristics. For the device, for example, a diffractive homogenizer disclosed in US Patent No. 5,850,300 (homogenize I ·) or disclosed in Japanese Patent Application Laid-Open No. 200l-74615 (and the corresponding Goto application for the US on April 14, 2000) US Patent Application No. 09 / 549,720) diffractive optical integrator (Optical Integrator). Here, US Patent No. 5,85,300 and US Patent No. 09/549, No. 72〇 is cited as a reference. Next, the structure of the varifocal optical system 6 will be described. Fig. 10a and 10B are side views showing the specific structure of the varifocal optical system 6. Figs. 10A and 10B The illustrated variable focal length optical system 6 is packaged in order from the converter 5 side -34- This paper · size applies to China National Standard (CNS) A4 specifications (210 X 297 male directors ^ ---- 544758 A7 B7 V. Description of the invention (32 Aperture diaphragm ASI, convex plano lens 6a, two concave lens complements, two convex lens centers, and a positive meniscus lens (four optical members of meniscus W) that are convex toward the fly-eye lens 7 side. Also, FIGS. 10A and 10B The plane p indicates the entrance surface of the compound eye lens. Next, the specifications of the variable focal length optical system 6 will be described. Table 1 shown below is a table showing the specifications of an example of the variable focal length optical system 6. Table 丨 shows The unit of the numerical value is millimeter, rounded down to 4 decimal places. The following table i is an example when using a fluorinated excimer laser emitting laser light with a wavelength of 248 nm as the light source 1, from the aperture diaphragm ASI to the compound eye The length of the incident surface p of the lens 7 is set at 450 mm. In addition, the aperture diaphragm ASI has a diameter of 30 mm and a maximum incident angle of 4.5 degrees. The glass material of each lens was synthetic quartz, and the refractive index of the above wavelength was 150839. -In Table 1, the number "left" is the order of the lens surface from the aperture stop A SI side "r is the curvature radius of the lens surface, and d is the interval from this lens surface to the next lens surface. In addition, in Table 1, in order to easily arrange each lens, glass materials from the lens surface to the next lens surface are shown. In addition, the "image plane" in Table 丨 shows the incident surface p of the fly-eye lens 7 shown in Figs. 10A and 10B. [Table 1] d Glass material 10.0000 Glass material 9.000 Quartz d3. 5.0000 Quartz d5 Surface number r 1: Aperture stop 2: 60.0000 3: 0.0000 4: -57.1000 5: 63.0000 -35-^ The paper wave scale is applicable to Chinese national standards ( CNS) A4 size (2ΐ〇χ297mm)

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線 544758 A7 B7 五 6 : 652.4917 15.0000 石英 7 : -137.8161 d7 8 : -2394.6785 15.0000 石英 9 : -187.0000 d9 像面: 0.0000 0.0000 發明説明(33 圖10所示的可變焦距光學系統係在可變倍率比1.75倍之 下焦點距離可變地所構成,可變焦點距離時,使透鏡6b〜6c 在Y方向移動,可變透屬;6a和透鏡6b的間隔、透鏡6b和透鏡 6c的間隔、透鏡6c和透鏡6d的間隔及透鏡6d和複眼透鏡7的 入射面P的間隔。圖10A、圖10B顯示將可變焦距光學系統6 設定在分別不同的焦點距離時的孔徑光闌ASI和入射面P間 的各透鏡6a〜6d位置關係之例。在上述表1中,透鏡6_b、透 鏡6c、透鏡6d及和入射面P間的距離分別以d3、d5、d7、d9 表示,茲將焦點距離和這些距離d3、d5、d7、d9的關係顯 示於以下的表2。 [表2] 焦點距離 340 mm 425 mm 510 mm 595 mir d3 : 43.6691 46.7064 46.0065 46.1574 d5 : 82.5478 59.1430 34.0876 8.2351 d7 : 109.5967 199.8824 268.0768 317.8294 d9 : 160.1864 90.2681 47.1192 23.7781 在上述表2顯示為了將可變焦距光學系統6的焦點距離設 定在 340 mm、425 mm、510 mm、595 mm的透鏡 d3、d5、 d7及入射面P間的間隔d3、d5、d7、d9的一例。 -36- 本紙張尺度適用中國國家標準(CNS) A4規格(210 x 297公釐)Line 544758 A7 B7 56: 652.4917 15.0000 Quartz 7: -137.8161 d7 8: -2394.6785 15.0000 Quartz 9: -187.0000 d9 Image plane: 0.0000 0.0000 Description of the invention (33 The variable focal length optical system shown in Figure 10 is at a variable magnification The focal length is variably lower than 1.75 times. When the variable focal length is changed, the lenses 6b to 6c are moved in the Y direction to make the lens transparent. The distance between 6a and lens 6b, the distance between lens 6b and lens 6c, and the lens. The interval between 6c and lens 6d, and the interval between lens 6d and incident surface P of fly-eye lens 7. Figs. 10A and 10B show the aperture stop ASI and incident surface P when the variable focal length optical system 6 is set at different focal distances, respectively. An example of the positional relationship between each lens 6a to 6d. In the above Table 1, the distances between the lens 6_b, the lens 6c, the lens 6d, and the incident surface P are represented by d3, d5, d7, and d9, respectively. The relationship between these distances d3, d5, d7, and d9 is shown in Table 2 below. [Table 2] Focus distance 340 mm 425 mm 510 mm 595 mir d3: 43.6691 46.7064 46.0065 46.1574 d5: 82.5478 59.1430 34.0876 8.2351 d7: 109.5967 19 9.8824 268.0768 317.8294 d9: 160.1864 90.2681 47.1192 23.7781 It is shown in Table 2 above to set the focal distance of the varifocal optical system 6 between the lenses d3, d5, d7, and the incident surface P between the 340 mm, 425 mm, 510 mm, and 595 mm. An example of the interval d3, d5, d7, d9. -36- This paper size applies to China National Standard (CNS) A4 (210 x 297 mm)

544758 A7 _____B7 五、發明説明(34 ) 其次’沈可變焦距光學系統6的作用加以說明。本實施形 態的可變焦距光學系統6可適當調整焦點距離及焦點位置 。調整可變焦距光學系統6的焦點位置時,主控制系統” 使骚動裝置13動作/使透鏡6b〜6d的任何一個向光軸八又方 向移動。另一方面,調整可變焦距光學系統6的焦點距離時 ,使驅動裝置13動作而調整透鏡们、心、们及入射面p間的 間隔d3、d5、d7、d9。要加長焦點距離,主要是增大透鏡 6c和透鏡6d的間隔,反之要縮短焦點距離,主要是縮短透 鏡6c和透鏡6d的間隔。 圖11A、圖ΠΒ及圖12A、圖12(::為顯示利用驅動裝置13 调整可變焦距光學系統6的焦點距離或焦點位置時的在複 眼透4¾ 7入射面側的照射區域變化之圖。圖丨丨a顯示爲圓形 的最初照明區域ΙΑ!,圖1 1B顯示調整焦點距離或焦點位置 後的照明區域ΙΑ&quot;利用驅動裝置13調整可變焦距光學系統 6的焦點距離或焦點位置,將照明區域ΙΑι的大小變更成稍 大的照明區域1八2,可微調照明區域的大小。又,縮短可變 焦距光學系統6的焦點距離時,調整後的照明區域比最初的 照明區域IAi小。 圖12 A顯示為環帶狀的最初照明區域IA3,圖丨2B顯示調 整焦點距離後的照明區域IA4,圖12C顯示調整焦點位置後 的照明區域IA5。如比較圖丨2A和圖12B清楚得知,利用驅 動裝置13調整可變焦距光學、系統6的焦點距離,可變更成相 似擴大比較小的照明區域IAs的照明區域IA4。即,使環帶 照明内側直徑和外側直徑成比例,可適當變更全體的尺寸544758 A7 _____B7 V. Description of the invention (34) Secondly, the function of the varifocal optical system 6 will be described. The variable focal length optical system 6 of this embodiment can appropriately adjust the focal distance and the focal position. When adjusting the focal position of the varifocal optical system 6, the main control system "moves the agitation device 13 / moves any one of the lenses 6b to 6d toward the optical axis in eight directions. On the other hand, adjusts the varifocal optical system 6 When the focal distance of the lens is adjusted, the driving device 13 is operated to adjust the distances d3, d5, d7, and d9 between the lenses, the heart, the lenses, and the incident surface p. To increase the focal distance, it is mainly to increase the distance between the lens 6c and the lens 6d. Conversely, to shorten the focal distance, it is mainly to shorten the distance between the lens 6c and the lens 6d. Fig. 11A, Fig. IIB, and Fig. 12A, Fig. 12: Adjusting the focus distance or focus position of the variable focal length optical system 6 using the driving device 13 for display Figure 1 shows the change in the illuminated area at the entrance surface side of the compound eye 4¾ 7 at the time. Figure 丨 丨 a shows the initial illumination area IA! Which is circular, and Figure 1 1B shows the illumination area IA after adjusting the focus distance or focus position. The device 13 adjusts the focal distance or the focal position of the variable focal length optical system 6, and changes the size of the lighting area IA to a slightly larger lighting area 18 to 2 to fine-tune the size of the lighting area. Also, shortening the size of the lighting area When the focal length of the zoom optical system 6 is adjusted, the adjusted lighting area is smaller than the original lighting area IAi. Figure 12 A shows the initial lighting area IA3 in the shape of a ring, and Figure 丨 2B shows the lighting area IA4 after adjusting the focus distance. Fig. 12C shows the illumination area IA5 after adjusting the focus position. As can be clearly seen from comparing Figs. 2A and 12B, the drive device 13 can be used to adjust the focal length of the optical system and the focal distance of the system 6 to change to a similarly enlarged and smaller illumination area. The lighting area IA4 of the IAs. That is, the inside diameter and the outside diameter of the endless belt illumination are proportional, and the overall size can be appropriately changed.

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線 _____ -37- H張尺度研國國家標準(CNS) Μ規格(21〇Χ297公釐)Line _____ -37- H-scale research national standards (CNS) M specifications (21〇 × 297 mm)

發明説明 :如比較圖12A和圖12C清楚般地,利用驅動裝置13調整可 ,焦距光學系統1 2的焦點位置,可得到變更照明區域IA3的 % V比的照明區域IAs。即,可適當變更環帶照明内側和外- 側的間隔。 [弟—貫施形態] 其次,就本發明第二實施形態的照明光學裝置及本發明 第二實施形態的曝光裝置加以說明。圖13為顯示本發明第 一實施形態的照明光學裝置及本發明第二實施形態的曝光 裝置結構足圖。前述第一實施形態的照明光學裝置係下述 結構·將多數衍射光學元件4卜41設於轉換器4,同時將多 數衍射光學元件5a〜51設於轉換器5。而且,藉由控制轉換 器4、56¾旋轉角而交換配置於光軸Αχ上的衍射光挙元件 -38-Description of the invention: As is clear from comparison between FIG. 12A and FIG. 12C, the driving device 13 can be used to adjust the focus position of the focal length optical system 12 to obtain the illumination area IAs that changes the% V ratio of the illumination area IA3. That is, the interval between the inner side and the outer-side of the endless belt illumination can be appropriately changed. [Brother-Performance Form] Next, an illumination optical device according to a second embodiment of the present invention and an exposure apparatus according to the second embodiment of the present invention will be described. Fig. 13 is a schematic view showing the configuration of an illumination optical device according to a first embodiment of the present invention and an exposure apparatus according to a second embodiment of the present invention. The illumination optical device according to the first embodiment has the following structure. A plurality of diffractive optical elements 4b and 41 are provided in the converter 4, and a plurality of diffractive optical elements 5a to 51 are provided in the converter 5. Furthermore, the diffractive optical chirped element arranged on the optical axis AX is exchanged by controlling the rotation angles of the converters 4, 56 and -38-

1 a 51即使可變焦距光學系統6的可變倍率比2 · 3以下,不 太寬廣,亦可實現各種照明條件。 圖13所示的本發明第二實施形態的照明光學裝置係取代 圖1中的轉換器4、5,透過可變焦距光學系統6供應光束給 複眼透鏡7,該光束係從收容於盒2〇的多數衍射光學元件 20a、20b、···中選擇需要的衍射光學元件而配置於光軸Αχ 上’藉此將截面形狀變換成希望的形狀。如圖丨3所示,設 有盒20 ··收容多數衍射光學元件2〇a、20b、···;搬運路21 :從盒20接到衍射光學元件2〇a、2〇b、…的任何一個而搬 運;及,支持構件22 ··接到.由搬運路21搬來的衍射光學元 2 件而支持。從盒2 〇中取出的衍射光學元件選擇係由主控制 系統1 5所控制。 A7 B7 五、發明説明(36 保藉错&gt;2 $ Ή ’上逑支持構件22相當於本發明所謂的 ^持:件:搬運路21相當於本發明所謂的驅動部。此外, 私ϋ以外、,包含盒20及主控制系統15在内,相當於本 二一响的汉疋部。盒2〇儲存衍射特性不同的多數衍射光 牛二a 2〇b、…。此盒20根據由主控制系統15所輸出 二制k號迗出儲存於盒2〇的衍射光學元件]^^、2扑、... 人^王…明條件對應的衍射光學元件,搬運路2 1使由盒 2〇所送出的衍射光學元件向照明光的光路搬運。通過搬運 路21的何射光學凡件被搬人支持構件22而在照明光的光轴 AX上被固定。 又,保持於支持構件22中的不用的衍射光學元件於交換 《際預先從光軸AX上被除去”即,在從盒2〇中搬出應使其 移動到光路上的新衍射光學元件之前,將應從光路上除去 的原來的衍射光學元件,即保持於支持構件Μ中的衍射光 學7C件透過搬運路21儲存於盒2〇中。此處,盒2〇可卸下, 可父換。這種情況,也可以形成下述結構:預先準備收容 的何射光學兀件20a、20b、…種類不同的多數盒,自動選 擇希望的盒而連接於搬運路21。 配 明 使用如以上的盒20時,複眼透鏡7上的強度分佈變化增加 。例如即使是同樣利用環帶形狀的衍射特性時,藉由組合 各種最大發散角和最小發散角,亦可進行各樣的環帶照明 。如此藉由增加複眼透鏡7上的強度分佈變化,多樣調整 置於複眼透鏡7射出側的環帶孔徑光闌形狀,細密調整照&quot; 的光瞳分佈時也不會浪費照明光量。又,以上係就環帶照 39- 本紙蒗尺度適用中國國家標準(CNS) Α4規格(210 X 297公愛) 544758 A7 B7 五、發明説明(37 ) 明的^泥加以說明,但對於圓形照明、四個眼孔形狀照明 的情況也有同樣的效果。 將衍射光學元件保持於光軸ΑΧ上的支持構件22是由玻· 璃罩(cover glass)23所對於周圍密封隔開的支持室。此支持 室最好先吹洗惰性氣體,例如氮、氦(He)氣等。這種情況 ,可保護衍射光學元件防止起因於在支持構件22外側產生 的氣體等的雜質附著,只藉由交換廉價的玻璃罩23,就可 恢復透過率劣化。此外,由於對於從支持構件22延長的搬 運路2 1自由裝卸盒2〇,所以不僅成為雜質模糊對策,而且 衍射光學元件20a、20b、…的維修容易。 再者,本實施形態的照明光學裝置具備和前述第一實施 形態同樣的可變焦距光學系統6,可變地構成利用位於光轴 AX上的衍射光學元件變換截面形狀的光束在ζχ+面的強 度分佈。本實施形態只在利用盒2〇、搬運路21及支 22可交換地構成配置於光軸Αχ上的衍射光學元件之點不 同,在設置各變換的光束截面形狀的種類變換特性不同的 多數衍射光學元件,以結構簡單的可變焦料學系統6微調 利用此衍射光學元件的任一元件變換截面形狀的光束的光 強度分佈之點和第一實施形態同樣。 此外,第二實施形態的照明光學裝置以折彎反射鏡3為振 動反射鏡。因此’構成如下:設有為了驅動折彎反射鏡3 的驅動裝置24,可使折f反射鏡3三維微動或使其在與光轴 AX垂直的-對軸周圍微量旋轉β χ,為了減低干擾雜訊, 在曝光時間中使折彎反射鏡3角度變化的驅動機構的圖示 -40-1 a 51 Even if the variable magnification optical system 6 has a variable magnification ratio of 2 · 3 or less, it is not too wide and can realize various lighting conditions. The illumination optical device according to the second embodiment of the present invention shown in FIG. 13 replaces the converters 4 and 5 in FIG. 1 and supplies a light beam to the fly-eye lens 7 through a variable focal length optical system 6, and the light beam is stored in a box 2. Among most of the diffractive optical elements 20a, 20b, ..., the required diffractive optical element is selected and arranged on the optical axis Ax, thereby converting the cross-sectional shape into a desired shape. As shown in Fig. 3, a box 20 is provided to house a plurality of diffractive optical elements 20a, 20b, ...; a transportation path 21: a box 20 is connected to the diffractive optical elements 20a, 20b, ... Either one is carried; and the support member 22 is received by the diffractive optical element 2 carried by the carrying path 21 and supported. The selection of the diffractive optical element taken out of the box 20 is controlled by the main control system 15. A7 B7 V. Description of the invention (36 Guaranteed borrowing error> 2 $ Ή 'The upper support member 22 is equivalent to the so-called holding device of the present invention: pieces: the conveying path 21 is equivalent to the so-called driving unit of the present invention. In addition, other than private The box 20 and the main control system 15 are equivalent to the Han Chinese Department of Benji. The box 20 stores most of the diffracted light beams with a different diffraction characteristic. The box 20 is based on the master. The output of the control system 15 outputs the number of diffractive optical elements stored in the box 20] ^^, 2 flutter, ... man ^ king ... different optical elements corresponding to the specified conditions, the transport path 2 1 uses the box 2 〇 The sent diffractive optical element is transported to the optical path of the illumination light. The optical element of the transport path 21 is transported to the support member 22 and fixed on the optical axis AX of the illumination light. It is held in the support member 22 The unused diffractive optical element is exchanged for "the previous removal from the optical axis AX", that is, before removing the new diffractive optical element that should be moved to the optical path from the box 20, the original diffractive optical element that should be removed from the optical path Diffractive optics, that is, diffractive optics 7C held in a support member M It is stored in the box 20 through the conveying path 21. Here, the box 20 can be detached and can be replaced by the parent. In this case, the following structure can also be formed: the optical elements 20a, 20b, ... Many boxes of different types are automatically selected as desired and connected to the conveyance path 21. It is clear that when the box 20 as described above is used, the intensity distribution of the fly-eye lens 7 increases. For example, even when the diffraction characteristics of the ring shape are also used By combining various maximum divergence angles and minimum divergence angles, various ring-shaped illuminations can also be performed. In this way, by increasing the intensity distribution change on the fly-eye lens 7, variously adjust the ring-shaped aperture light placed on the exit side of the fly-eye lens 7. The shape of the diaphragm and the pupil distribution of the photo "will be fine-tuned, and the amount of illumination light will not be wasted. Also, the above is a ring photo 39- The standard of this paper is Chinese National Standard (CNS) Α4 (210 X 297 public love) 544758 A7 B7 V. Explanation of the invention (37), but it also has the same effect for the case of circular illumination and four eyelet shape illumination. Support for holding the diffractive optical element on the optical axis AX The component 22 is a support chamber sealed by a cover glass 23 from the surroundings. The support chamber is preferably first purged with an inert gas such as nitrogen, helium (He) gas, etc. In this case, it can be protected. The diffractive optical element prevents the attachment of impurities caused by gas or the like generated outside the support member 22, and the deterioration of the transmittance can be restored only by exchanging an inexpensive glass cover 23. In addition, since the transport path 2 1 extended from the support member 22 The freely attachable and detachable box 20 is not only a countermeasure against blurring of impurities, but also facilitates maintenance of the diffractive optical elements 20a, 20b, .... Furthermore, the illumination optical device of this embodiment includes the same variable focal length optical system as the first embodiment. 6. The intensity distribution of the light beam whose cross-sectional shape is transformed by the diffractive optical element located on the optical axis AX on the ζ + plane is variably formed. This embodiment differs only in the point that the diffractive optical element arranged on the optical axis Ax is interchangeably formed by using the box 20, the conveying path 21, and the branch 22. Most types of diffraction having different conversion characteristics are provided in the types of beam cross-section shapes for each conversion. The optical element has the same structure as the first embodiment in the point that the light intensity distribution of the light beam whose cross-sectional shape is changed by any element of this diffractive optical element is fine-tuned by the variable-focus material system 6 having a simple structure. The illumination optical device of the second embodiment uses the bending mirror 3 as a vibration mirror. Therefore, the configuration is as follows: a driving device 24 for driving the bending mirror 3 is provided, which can make the folding mirror 3 three-dimensionally move or make it slightly rotate β χ around the axis perpendicular to the optical axis AX, in order to reduce interference Noise, diagram of driving mechanism that changes angle of bending mirror 3 during exposure time

544758 A7 B7 五、發明説明(38 省略,但和圖13中的驅動裝置24另外設置著。 本實施形態在主控制系統1 5的控制下驅動驅動裝置丨3, 使透鏡6a〜6d的至少一個ZX移動或ZX傾斜(Y軸與光軸Αχ 平行),可進行由配置於光軸AX上的衍射光學元件形成的 照明區域和複眼透鏡7入射面的對準。此外,本實施形態也 可以用驅動裝置24使折彎反射鏡3XY傾斜,進行照明區域 的對準。 藉由使如以上的驅動裝置13、24適當動作,可高精度調 整單像光罩R的單像光罩面或晶圓W的晶圓面的照明不均 勻和遠心(telecen)度。此處,所謂遠心度,意味著入射於 晶圓W等的照明光束的傾斜少,意味著晶圓貿曝光面等的 成像各向同性。照明不均勻或遠心度可利用包含於砬於複 眼透鏡7後段的聚光光學系統10的光學元件移動或傾斜加 以調整,但藉由和構成設於複眼透鏡7前段的可變焦距光學 系統6的透鏡6a〜6d微動組合,可更高精度的調整。 以上,就本發明第二實施形態加以說明,上述第二實施 形態係關於利用由盒20、搬運路21及支持構件22構成的機 構可X換地構成配置於光軸AX上的一個衍射光學元件的 情況的實施形態。然而,也可以將設有多數衍射光學元件 的轉換器(相當於圖1中的轉換器4或轉換器5)多數收容於 盒20内,可交換地構成轉換器。此結構的情況,配置於光 路上的轉換器具備的衍射光.學元件全部沒有需要的衍射特 性時,和設置具有其衍射特性的衍射光學元件的轉換器交 換。再者,上述第二實施形態係使衍射光學元件' 2〇b -41 - 本紙浪尺度適用中國國家標準(CNS) M規格(摩297公爱) 544758 A7 B7 五、發明説明(40 ) 換截面形狀的光束透過可變焦距光學系統3〇的透鏡3〇&amp;及 積鏡30b、30c變換ZX平面内的強度分佈後,透過透鏡3〇d 重疊地照明棒形積分器3丨的入射面。此處,之所以以透鏡-30d重疊地照明棒形積分器31的入射面,是為了實·質擴大形 成於棒形積分器3 1入射端附近的光源面(虛像)面積,緩和 照度分你不均勻。此外,棒形積分器3丨的射出相當於單像 光罩擔板(reticle blind),和單像光罩R在光學上成為共軛。 以上,就本發明第三實施形態加以說明,上述第三實施 形態和第一實施形態同樣,係舉使轉換器4、5旋轉而交換 配置於光軸AX上的衍射光學元件的情況為例加以說明。然 而’為了交換配置於光軸AX上的光學元件,也可以利用在 第二實施形態說明的由盒20、搬運路21及支持構件2_2構成 的機構可交換地構成。此外,也可以將設有多數衍射光學 元件轉換器多數收容於盒20内,可交換地構成轉換器本身。 [第一實施形態〜第三實施形態之變形例] 以上’就本發明第一實施形態〜第三實施形態的照明光學 裝置及曝光裝置加以說明。上述第一實施形態〜第三實施形 態係舉具備衍射光學元件4a〜41及衍射光學元件5a〜51作為 變換光學元件的情況為例加以說明。然而,本發明也可以 使用波陣面分割型積分器作為變換光學元件取代這些衍射 光學元件4a〜41及衍射光學元件5a〜51。此處,所謂波陣面 分割型積分器,包含複眼透鏡:將多數光學元件(折射(透 鏡)元件或衍射元件、反射鏡元件)積集成矩陣狀所構成; 或,微型透鏡陣列:在光透過性基板利用蝕刻等手法將多 -43- 本紙張尺度適用中國國家標準(CNS) A4規格(21〇 X 297公釐)544758 A7 B7 V. Description of the invention (38 is omitted, but it is separately provided with the driving device 24 in FIG. 13. In this embodiment, the driving device is driven under the control of the main control system 15 to make at least one of the lenses 6a to 6d. ZX movement or ZX tilt (Y axis is parallel to the optical axis AX), the illumination area formed by the diffractive optical element arranged on the optical axis AX and the incident surface of the fly-eye lens 7 can be aligned. In addition, this embodiment can also be used The driving device 24 tilts the bending mirror 3XY to align the illumination area. By appropriately operating the driving devices 13 and 24 as described above, the single image mask surface or wafer of the single image mask R can be adjusted with high accuracy. Illumination unevenness and telecentricity of the wafer surface of W. Here, the term "telecentricity" means that the tilt of the illumination beam incident on the wafer W and the like is small, which means that the imaging direction of the wafer exposure surface and the like Homogeneity. Illumination unevenness or telecentricity can be adjusted by moving or tilting the optical elements of the condensing optical system 10 contained in the rear section of the fly-eye lens 7, but by combining and constituting a variable-focus optical system provided in the front section of the fly-eye lens 7. The lens 6a to 6d of 6 can be adjusted in combination with fine adjustment, so that the second embodiment of the present invention will be described. The second embodiment is related to the use of the mechanism composed of the box 20, the conveying path 21, and the support member 22. An embodiment in which one diffractive optical element arranged on the optical axis AX can be replaced by X. However, a converter provided with a plurality of diffractive optical elements (equivalent to converter 4 or converter 5 in FIG. 1) may be used. Most are housed inside the box 20 and form a converter interchangeably. In the case of this structure, the diffracted light provided by the converter arranged on the optical path. When all the elements do not have the required diffraction characteristics, and diffractive optics with the diffraction characteristics are provided The converter of the element is exchanged. In addition, the second embodiment described above makes the diffractive optical element '20b-41-this paper conforms to the Chinese National Standard (CNS) M specification (Moses 297) 544758 A7 B7 V. Invention Explanation (40) The beam with a changed cross-section passes through the lens 30 and the integrators 30b and 30c to transform the intensity distribution in the ZX plane, and then passes through the lens 30 and overlaps. Illumination of the incident surface of the rod integrator 31. Here, the reason that the incident surface of the rod integrator 31 is illuminated with a lens -30d is formed near the entrance end of the rod integrator 31 in order to expand the quality and quality. The area of the light source surface (virtual image) eases the unevenness of the illumination. In addition, the output of the rod integrator 3 丨 is equivalent to a single image mask reticle blind, and the single image mask R is optically conjugated. The third embodiment of the present invention has been described above. The third embodiment is the same as the first embodiment, and the case where the converters 4 and 5 are rotated to exchange the diffractive optical elements arranged on the optical axis AX is taken as an example. Instructions. However, in order to exchange the optical elements arranged on the optical axis AX, the mechanism composed of the box 20, the conveying path 21, and the supporting member 2_2 described in the second embodiment may be interchangeably configured. In addition, a plurality of converters provided with a plurality of diffractive optical elements may be housed in the case 20, and the converter itself may be configured to be exchangeable. [Modifications of the first embodiment to the third embodiment] The foregoing description has been made of the illumination optical device and the exposure device according to the first to third embodiments of the present invention. The first to third embodiments described above are exemplified by a case where the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 are provided as conversion optical elements. However, in the present invention, it is also possible to replace the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 by using a wavefront division type integrator as a conversion optical element. Here, the so-called wavefront splitting type integrator includes a fly-eye lens: a structure in which a large number of optical elements (refractive (lens) elements, diffractive elements, and mirror elements) are integrated into a matrix; or, a micro lens array: where light is transmitted The substrate is multi-43 using etching and other methods. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (21 × 297 mm).

裝 訂Binding

線 544758 A7 B7 五、發明説明(41 ) 數微小透鏡面(反射面)設置成矩陣狀等。例如也可以使用 圖15所示的折射光學元件。Line 544758 A7 B7 V. Description of the invention (41) The number of micro lens surfaces (reflection surfaces) are arranged in a matrix. For example, a refractive optical element shown in Fig. 15 may be used.

圖1 5為顯tf取代衍射光學元件4a〜41或5a〜51、衍射光學元 件20a、20b…可使用的折射光學元件的透視圖。前述實施 形態係舉相位型衍射光學元件作為衍射光學元件4a〜4丨及 衍射光學元件5a〜51的情況為例加以說明,但也可以使用折 射光學元件40:具備將底面41a在與其軸平行的面切割成例 如六角形的稜鏡41。- ij ▲ 此處,之所以將稜鏡41的底面41a切割成六角形,是為了 如圖示,使稜鏡4 1的底面4 1 a密集排列。雖然將來自光源j 的光束入射於此底面41a,但如此所形成的稜鏡41的底面 4la卻是平面,所以不產生使入射的來自光源丨的光束折射 時改變折射角等缺陷。又,也可以設置遮光部:不切割成 圖15所不的形狀,而在例如圓錐棱鏡底面形成六角形開口 。這種情況,由於入射的光束中會產生無助於作為照明光 的光束,所以還是如圖1 5所示,密集進行排列者較佳。又 ,在圖1 5雖然使用圓錐稜鏡形成折射光學元件4〇,但可使 用三角錐棱鏡、四角錐棱鏡等錐形稜鏡。 此外,在上述第一實施形態及第三實施形態雖然舉使用 兩個轉換器4、5切換交換配置於光軸Αχ上的衍射光學元件 4a〜41及衍射光學元件5a〜51的結構為例加以說明,但配置於 光軸AX上的轉換器數為任意數即可。若使配置於光軸Αχ 的轉換器數增加,則可增加可配置於光軸Αχ上的衍射光學 元件種類,所以亦可更加簡化可變焦距光學系統6的結構。 -44 - 本紙張尺度適用中國國家標準(CNS) Α4規格(21〇 X 297公爱)---- A7 -一.———__ B7 五、發明説明(42 ) 以下,就在第一實施形態〜第 件的X換機構變形例加以說 形例,但使用哪個變形例, 統)内的設置空間適當選擇。 三實施形態說明的衍射光學元 明。又,雖然以下顯示多數變 可按照曝光裝置(照明光學系· 圖16為顯不何射光學元件的交換機構第一變形例的正面 圖圖1 6所不的變形例成4 了述機構:將沿著外周具備24 個衍射光予元件(和设於轉換器4、5的衍射光學元件總數同 數的何射光學凡件)的_轉換器5〇一個配置於光轴八乂上,藉 由利用不目示的旋轉驅動裝置(例如馬達)在旋轉轴C1周圍 驅動(旋轉)轉換器50,交換配置於光軸Αχ上的衍射光學元 件0 圖17為顯示衍射光學元件的交換機構第二變形例尚正面 圖及上面圖。圖17所示的變形例和前述第一實施形態及第 二實施形態的轉換器4、5同樣,具備分別具備j 2個衍射光 學兀件的兩個轉換器51a、51b。這些轉換器51a、51b為旋 轉驅動裝置52a、52b所分別驅動而在旋轉軸C2、C3周圍旋 轉。 轉換器51a、51b及旋轉驅動裝置52a、52b對於光軸AX並 排設置’以旋轉驅動裝置52a及轉換器5 1 a為一體且對於光 軸AX可進退地構成,以旋轉驅動裝置521)及轉換器51b為一 體且對於光軸AX可進退地構成。在圖1 7所示的機構,首先 將具備應配置於光軸AX上的衍射光學元件的轉換器配置 於光軸AX上,同時從光軸AX隱蔽他方轉換器,其次驅動(旋 轉)配置於光軸AX上的轉換器而將希望的衍射光學元件配 -45- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐)Fig. 15 is a perspective view of a refractive optical element that can be used instead of the diffractive optical elements 4a to 41 or 5a to 51, tf, and the diffractive optical elements 20a, 20b. In the foregoing embodiment, the case where the phase-type diffractive optical element is used as the diffractive optical element 4a to 4 丨 and the diffractive optical element 5a to 51 is described as an example, but the refractive optical element 40 may also be used: the bottom surface 41a is provided parallel to its axis. The face is cut into, for example, a hexagonal cymbal 41. -ij ▲ Here, the reason why the bottom surface 41a of 切割 41 is cut into hexagons is to make the bottom surface 4 1 a of 稜鏡 41 densely arranged as shown in the figure. Although the light beam from the light source j is incident on the bottom surface 41a, the bottom surface 4la of the 稜鏡 41 thus formed is flat, so that defects such as changing the refraction angle when refracting the incident light beam from the light source 丨 do not occur. It is also possible to provide a light-shielding portion: instead of cutting into a shape other than that shown in Fig. 15, a hexagonal opening is formed on the bottom surface of the conical prism, for example. In this case, as the incident light beam may generate a light beam which is not helpful as the illumination light, it is still preferable to arrange them densely as shown in FIG. 15. Although the refractive optical element 40 is formed using a conical ridge in FIG. 15, a conical ridge such as a triangular pyramid prism or a quadrangular pyramid prism can be used. In addition, in the above-mentioned first embodiment and the third embodiment, the configurations of the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 arranged on the optical axis Ax are switched by using two converters 4, 5 as examples. Although the number of converters arranged on the optical axis AX is arbitrary, it is sufficient. If the number of converters arranged on the optical axis Ax is increased, the number of types of diffractive optical elements that can be arranged on the optical axis Ax can be increased, so that the configuration of the variable focal length optical system 6 can be further simplified. -44-This paper size applies the Chinese National Standard (CNS) A4 specification (21〇X 297 public love) ---- A7-一 .————__ B7 V. Description of the invention (42) The following will be implemented in the first The modification example of the X-change mechanism of the form to the first case will be described, but the modification space to be used is appropriately selected. The diffractive optical element described in the third embodiment is clear. In addition, although most of the following shows that the exposure device (illumination optics system, Fig. 16 is a front view of the first modification of the exchange mechanism for displaying optical elements, the modification shown in Fig. 16 is shown in Fig. 16): There are 24 diffractive light pre-elements along the outer periphery (the same number of diffractive optical elements as the total number of diffractive optical elements provided in converters 4 and 5). _Converters 50 are arranged on the optical axis Hachi The converter 50 is driven (rotated) around the rotation axis C1 by an unseen rotation drive device (for example, a motor), and the diffractive optical element 0 arranged on the optical axis Ax is exchanged. FIG. 17 shows a second exchange mechanism of the diffractive optical element. The modified example is a front view and an upper view. The modified example shown in FIG. 17 is provided with two converters each having j two diffractive optical elements in the same manner as the converters 4 and 5 of the first and second embodiments. 51a, 51b. These converters 51a, 51b are driven by the rotation driving devices 52a, 52b and rotate around the rotation axes C2 and C3. The converters 51a, 51b and the rotation driving devices 52a, 52b are arranged side by side with respect to the optical axis AX 'to Rotary drive The moving device 52a and the converter 5 1 a are integrally formed and can be moved forward and backward with respect to the optical axis AX, and the rotation driving device 521) and the converter 51b are integrated and can be moved forward and backward with respect to the optical axis AX. In the mechanism shown in FIG. 17, a converter having a diffractive optical element to be arranged on the optical axis AX is first arranged on the optical axis AX, while other converters are hidden from the optical axis AX, and then driven (rotated) and arranged on The converter on the optical axis AX is used to match the desired diffractive optical element -45- This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm)

Order

線 544758 A7 ___B7 I、發明説明(43^ 置於光軸AX上。 圖1 8為顯示衍射光學元件的交換機構第三變形例的正面 圖及上面圖。此第三變形例如圖丨8所示,係使分別具備12 個衍射光學元件的兩個轉換器53a、53b對面配置.。由於對 面配置轉換器53a、53b,所以驅動各個的旋轉驅動裝置54a 、54b在同勒上互相反相配置。形成這種配置時,由於正面 方向(沿著光軸AX的方向)的設置面積只是一個轉換器分的 面積即可,所以與光軸AX正交的面内的設置面積受到限制 時,最好形成圖1 8所示的配置。 圖1 9為顯示衍射光學元件的交換機構第四變形例的正面 圖及上面圖。圖1 9所示的變形例和圖1 8同樣,使轉換器53a 、53b對面配置,但為了驅動轉換器53a的旋轉驅動裝·置54a 配置不同。如圖19所示,在轉換器53a的旋轉軸設置傘齒輪 55,同時在旋轉驅動裝置54 a的旋轉軸設置傘齒輪56,即使 旋轉驅動裝置54a的旋轉軸和轉換器53a形成大致90度的角 度’也利用旋轉驅動裝置54a可旋轉地構成轉換器53a。又 ,圖19所示之例只使旋轉驅動裝置54a的配置不同,但若必 要’則也可以配置成只使旋轉驅動裝置54b的配置不同或使 旋轉驅動裝置54a、54b雙方的配置不同(轉換器53a、54a的 旋轉軸和旋轉驅動裝置54a、54b的旋轉軸大致正交)。 圖20為_示衍射光學元件的交換機構第五變形例的正面 圖。圖2 0所示的變形例係如‘利用傳送帶搬運多數衍射光學 元件60般地所構成。即,在旋轉滾筒57和旋轉滾筒58之間 橋接傳送帶59’在此傳送帶59設有多數衍射光學元件6〇, -46- 本紙浪尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) ---- 裝 訂Line 544758 A7 ___B7 I. Description of the invention (43 ^ is placed on the optical axis AX. FIG. 18 is a front view and a top view showing a third modification of the exchange mechanism of the diffractive optical element. This third modification is shown in FIG. 8 The two converters 53a and 53b each having 12 diffractive optical elements are arranged opposite to each other. Since the converters 53a and 53b are arranged opposite to each other, each of the rotary driving devices 54a and 54b is arranged opposite to each other on Tongle. In this configuration, since the installation area in the front direction (direction along the optical axis AX) is only the area of one converter, it is best to limit the installation area in the plane orthogonal to the optical axis AX. The arrangement shown in Fig. 18 is formed. Fig. 19 is a front view and a top view showing a fourth modification of the exchange mechanism of the diffractive optical element. The modification shown in Fig. 19 is the same as that of Fig. 18, and the converter 53a, 53b is arranged opposite, but the rotation drive device 54a is configured differently to drive the converter 53a. As shown in FIG. 19, a bevel gear 55 is provided on the rotation shaft of the converter 53a, and an umbrella is provided on the rotation shaft of the rotation drive device 54a. Gear 56, The rotation axis of the rotary drive device 54a and the converter 53a are formed at an angle of approximately 90 degrees. The converter 53a is also rotatably constituted by the rotary drive device 54a. In the example shown in FIG. 19, only the arrangement of the rotary drive device 54a is different. , But if necessary ', it may be arranged so that only the arrangement of the rotation driving device 54b is different or the arrangement of both the rotation driving devices 54a and 54b is different (the rotation axes of the converters 53a and 54a and the rotation axes of the rotation driving devices 54a and 54b (Approximately orthogonal). Fig. 20 is a front view showing a fifth modification example of the diffractive optical element exchange mechanism. The modification example shown in Fig. 20 is structured as' the majority of diffractive optical elements 60 are conveyed by a conveyor belt. That is, A conveyor belt 59 'is bridged between the rotating drum 57 and the rotating drum 58. Here, the conveyor belt 59 is provided with most diffractive optical elements 60, -46- The standard of this paper is Chinese National Standard (CNS) A4 (210 X 297 mm)- --- Staple

線 544758 A7 ---------- B7 五、發明説明(44 ) 藉由調整旋轉滾筒57、58的旋轉角,在光軸八又上配置希望 的衍射光學元件60。又,圖2〇所示之例係舉沿著衍射光學 7C件60的傳送帶59的移動路徑上且在旋轉滾筒57、58間的· 位置設定光軸AX的情況為例加以說明,但光軸Αχ可設定 於沿著衍射光學元件60的傳送帶59的移動路徑上的任意位 置。 ' 圖2 1為顯示衍射光學元件的交換機構第六變形例的正面 圖。此變形例係將各個具備六種衍射光學元件的四個子轉 換器62a〜62d安裝於母轉換器61。母轉換器61為不圖示的旋 轉驅動裝置所驅動,母轉換器61在旋轉軸C4周圍旋轉,就 配合母轉換器61的旋轉而子轉換器62a〜62d也在旋轉轴C4 的周圍旋轉。此外,子轉換器62a〜62d分別個別在旋轉軸 C5〜C8的周圍可旋轉地構成。 又’子轉換器62a〜62d若只是配置於光軸Αχ上時可控制 旋轉軸C5〜C8周圍的旋轉角即可,所以未必需要對於子轉 換器62a〜62d全部個別設置旋轉驅動裝置。因此,為了簡化 裝置結構,最好形成下述結構:例如在各子轉換器62a〜62d 外周形成螺紋槽,同時在光軸ΑΧ附近設置一個旋轉驅動裝 置。這種結構的情況,藉由旋轉母轉換器61將子轉換器的 任何一個配置於光軸ΑΧ上時,其子轉換器外周和設於光軸 ΑΧ附近的旋轉驅動裝置的旋轉軸觸接,將旋轉驅動裝置的 旋轉力傳到子轉換器而控制只是配置於光軸ΑΧ上的子轉 換器的旋轉角。 [第四實施形態] __ -47- 本紙浪尺度適用中國國家標準(CNS) Α4規格(210X 297公釐) 裝 訂Line 544758 A7 ---------- B7 V. Description of the invention (44) By adjusting the rotation angles of the rotating drums 57 and 58, the desired diffractive optical element 60 is arranged on the optical axis eight. The example shown in FIG. 20 is a case where the optical axis AX is set along the moving path of the conveyor 59 of the diffractive optical 7C 60 and the position between the rotating drums 57 and 58 is set as an example. Δχ can be set at an arbitrary position along the moving path of the conveyor 59 of the diffractive optical element 60. 'Fig. 21 is a front view showing a sixth modification of the exchange mechanism of the diffractive optical element. In this modification, four child converters 62a to 62d each having six types of diffractive optical elements are mounted on the mother converter 61. The mother converter 61 is driven by a rotation driving device (not shown). The mother converter 61 rotates around the rotation axis C4, and in accordance with the rotation of the mother converter 61, the child converters 62a to 62d also rotate around the rotation axis C4. The sub-converters 62a to 62d are each rotatably formed around the rotation axes C5 to C8. In addition, the sub-converters 62a to 62d only need to control the rotation angles around the rotation axes C5 to C8 when they are arranged on the optical axis Ax. Therefore, it is not necessary to separately provide a rotation driving device for each of the sub-converters 62a to 62d. Therefore, in order to simplify the structure of the device, it is preferable to form the following structure: for example, a screw groove is formed on the periphery of each of the sub-converters 62a to 62d, and a rotary drive device is provided near the optical axis AX. In the case of this structure, when any one of the sub-converters is arranged on the optical axis AX by the rotary mother converter 61, the outer periphery of the sub-converter is in contact with the rotation axis of a rotation driving device provided near the optical axis AX. The rotation force of the rotation driving device is transmitted to the sub-converter, and only the rotation angle of the sub-converter disposed on the optical axis AX is controlled. [Fourth embodiment] __ -47- The paper scale is applicable to China National Standard (CNS) A4 specification (210X 297 mm) binding

line

其次’就本發明第四實施形態的照明光學裝置及本發明 第四貫施形態的曝光裝置加以說明。在上述第一實施形態 及第一實施形態係舉下述情況為例加以說明:作為將入壯 光束變換成對於光軸AX偏心的多數光束(四極照明)的衍射 光學兀件,如圖8A〜圖8E所示,具備如形成於複眼透鏡7入 射面上的四個照明區域“配置於正方形頂點般地衍射入射 光的付射光學元件。 然而’根據轉印於-晶圓W的圖案形狀,由於稱為光接近 效應(OPE : Optical Proximity Effect)的現象,有時使用照 明區域IA配置於細長的長方形頂點的照明光比使用IA照明 區域配置於正方形頂點的照明光較佳。此處所謂光接近效 應,係總稱圖案尺寸細微化進展,解像尺寸就偏離自標尺 寸而成為異常線寬的現象,光阻圖案對於單像光罩圖案的 保真度劣化的現象,解像力的圖案種類相關性明顯化的現 象等。 圖22為顯示按照轉印於晶圓w的圖案形狀改變四極昭明 的照明區域IA配置之例之圖,現在思考如圖22所示,形成 於單像光罩R的圖案?1在某方向(在圖22附加符號。的方 向)為細長的圖案且以預定間距配置於與圖案”長度方向 正交的方向(在圖22附加符㈣的方向)的圖案的情況。四 極照明此圖案P1時,若使用照明區域IA配置於在附加符號 们的方向設定長度方向的長方形頂點的照明光,則將更接 近設計值的圖案轉印於晶圓Wjl。以下,在本說明書將照 明區域IA配置於細長的長方形頂點的四極照明,即第一方 ____ -48- 本紙張尺度通用中國國家標準(CNS) A4規格(i^_X297公愛3 544758 A7 B7 五、發明説明(46 向(在圖22附加符號dl的方向)的離光軸AX(基準光軸)的偏 心量和與第一方向正交的第二方向(在圖22附加符號d2的 方向)的離光軸AX的偏心量不同的四極照明稱為變形四極· 照明。 在本實施形態具備為了實現這種變形四極照明的衍射光 學元件作為變換光學元件。但是,如前述,為了防止透過 光量降低,限制構成可變焦距光學系統6的透鏡等片數及可 變倍率。因此,在本實施形態具備多種為了進行變形四極 照明的變換特性不同的衍射光學元件。又,本實施形態由 於為了進行變形四極照明的衍射光學元件以外的結構和前 述第一實施形態及第二實施形態是大致同樣的結構,所以 以進行變形四極照明的衍射光學元件的變換特性為中心加 以說明’其他結構的說明省略。 圖23〜圖25為說明本發明第四實施形態的照明光學系統 具備的衍射光學元件變換特性之圖。又,本實施形態的衍 射光學元件分類成包含與變換特性種類相對應的多數衍射 光學疋件的衍射光學元件群,在圖23〜圖25將包含於各衍射 光學元件群的衍射光學元件形成於複眼透鏡7入射面上的 照明區域顯示於不同的圖。 「此外,在圖23〜圖25中,附上符號K1的圓顯示最大口值卜 1」),附上符號K2的圓顯示「0.5」的σ值。此處所謂j =,係指孔徑光闌直徑/投影光學系統的光瞳直徑或照明光 子系、先的射出側數值孔徑/投影光學系統的入射側數值孔 技。四極照明等多極照明的情況,孔徑光閣直徑成為外接 適用中A4規格(2_Next, the illumination optical device according to the fourth embodiment of the present invention and the exposure apparatus according to the fourth embodiment of the present invention will be described. The above-mentioned first embodiment and the first embodiment are described by taking, as an example, the following cases: As a diffractive optical element that converts a strong beam into a majority beam (quadrupole illumination) decentered with respect to the optical axis AX, as shown in FIG. 8A to As shown in FIG. 8E, the four illumination areas formed on the incident surface of the fly-eye lens 7 are provided with a supplementary optical element that diffracts incident light like a vertex of a square. However, according to the shape of the pattern transferred to the wafer W, Due to a phenomenon called an optical proximity effect (OPE: Optical Proximity Effect), the illumination light arranged on the slender rectangular apex using the illumination area IA is better than the illumination light arranged on the apex of the square using the IA illumination area. The so-called light Proximity effect, which is the generalization of the miniaturization of the pattern size, the phenomenon that the resolution size deviates from the standard size and becomes an abnormal line width, the phenomenon that the photoresist pattern degrades the fidelity of the single image mask pattern, and the pattern type correlation of the resolution Significant phenomena, etc. Fig. 22 is a diagram showing an example of changing the arrangement of the four-pole illuminated area IA according to the pattern shape transferred to the wafer w. Thinking, as shown in FIG. 22, the pattern formed on the single-image mask R? 1 is a slender pattern in a certain direction (the direction in which a symbol is added in FIG. 22) and is arranged at a predetermined pitch in a direction orthogonal to the length direction of the pattern. In the case of the pattern of the direction (the direction in which the sign is attached in FIG. 22). In quadrupole illumination of this pattern P1, if the illumination area IA is used to illuminate the rectangular vertex whose length direction is set in the direction of the additional symbols, a pattern closer to the design value is transferred to the wafer Wjl. In the following, the illumination area IA is arranged in the quadrupole illumination of the slender rectangular apex in this specification, that is, the first party ____ -48- This paper size is in accordance with the Chinese National Standard (CNS) A4 specification (i ^ _X297 Public Love 3 544758 A7 B7 V. Description of the invention (46) (the direction with the symbol dl in FIG. 22), the eccentricity from the optical axis AX (the reference optical axis) and the second direction orthogonal to the first direction (the direction with the symbol d2 in FIG. 22) A quadrupole illumination having a different eccentricity from the optical axis AX is called a deformed quadrupole illumination. In this embodiment, a diffractive optical element for achieving such a deformed quadrupole illumination is provided as a conversion optical element. However, as described above, in order to prevent the amount of transmitted light The number of lenses and the like and the variable magnification constituting the varifocal optical system 6 are reduced and limited. Therefore, in this embodiment, a plurality of diffractive optical elements having different conversion characteristics for deformed quadrupole illumination are provided. In addition, this embodiment The structure other than the diffractive optical element of the modified quadrupole illumination is substantially the same as that of the first embodiment and the second embodiment described above. The conversion characteristics of the diffractive optical element of the quadrupole illumination are mainly described. The description of other structures is omitted. FIGS. 23 to 25 are diagrams illustrating the conversion characteristics of the diffractive optical element provided in the illumination optical system according to the fourth embodiment of the present invention. The diffractive optical element of this embodiment is classified into a diffractive optical element group including a plurality of diffractive optical elements corresponding to the type of conversion characteristic, and the diffractive optical element included in each diffractive optical element group is formed in a fly-eye lens in FIGS. 23 to 25. 7 The illuminated area on the incident surface is shown in a different graph. "In addition, in Figs. 23 to 25, the circle with the symbol K1 shows the maximum value 1"), and the circle with the symbol K2 shows "0.5". σ value. Here, j = refers to the aperture diaphragm diameter / the pupil diameter of the projection optical system or the illumination photon system, the first numerical aperture on the exit side / the numerical aperture technique on the incident side of the projection optical system. Multipole such as quadrupole illumination In the case of lighting, the diameter of the aperture lighthouse becomes A4 size (2_

Order

-49- 10&gt;&lt;297公釐)— 544758 A7 B7 五、發明説明(47 於形成於投影光學系統的光瞳的多極狀照明光束或多極狀 光源像的圓大小或直徑。 圖23顯示不改變X方向的對於光軸AX的偏心量而使σ值· 階段地變化的衍射光學元件群的變換特性。此衍射光學元 件群包含形成知、明Ei域IA11〜IA14的衍射光學元件、形成照 明區域IAn-IA24的衍射光學元件。又,照明區域IAu〜IAi4 、IAn〜IA24、1八3广1八34各個的直徑以最大σ的直徑為0時 ,為0· 1 5 0程度。藉由交換有這種變換特性的衍射光學元 件’可不使X方向的對於光轴ΑΧ的偏心量變化而使ζ方向的 對於光軸ΑΧ的照明區域偏心量增大,所以將例如圖22所示 的圖案Ρ 1轉印於晶圓W時,不會引起符號d 1方向的線寬變 化,可使附上符號d2的方向的線寬特意變化。 - 圖24顯示不改變X方向的對於光軸Αχ的偏心量和z方向 的對於光軸AX的偏心量之比而使σ值階段地變化的衍射 光學元件群的變換特性。包含形成照明區域ΙΑ4〗〜ια“的衍 射光學元件、形成照明區域IAS1〜IA54的衍射光學元件、形 成照明區域ΙΑό1〜ΙΑ“的衍射光學元件。又,各照明區域的 直徑和圖23所示的照明區域同樣,被設定在〇150程度。 藉由使用此衍射光學元件群交換衍射光學元件,例如2於 相似關係的各圖案可求出變形四極照明的最佳α值。 圖25顯π不改變cj值而使X方向及2方向的對於光軸 的偏心量變化的衍射光學元件群的變換特性。此衍射光學 元件群包含形成照明區域IA”〜IA74的衍射光學元件、形成 -50- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱)-49- 10 &gt; &lt; 297 mm) — 544758 A7 B7 V. Description of the invention (47 A circle size or diameter of a multipolar illumination light beam or a multipolar light source image formed on a pupil of a projection optical system. Figure 23 It shows the conversion characteristics of a diffractive optical element group that changes the σ value and stepwise without changing the eccentricity with respect to the optical axis AX in the X direction. This diffractive optical element group includes diffractive optical elements forming the Ei domains IA11 to IA14, The diffractive optical elements of the illumination areas IAn-IA24 are formed. When the diameter of each of the illumination areas IAu to IAi4, IAn to IA24, 183 to 1800 is 34, the diameter of the maximum σ is 0, which is about 0.150. By exchanging the diffractive optical element having such a conversion characteristic, the amount of decentering of the illumination area with respect to the optical axis AX in the ζ direction can be increased without changing the amount of decentering of the optical axis AX in the X direction, so for example, as shown in FIG. 22 When the pattern P 1 is transferred to the wafer W, the line width in the direction of the symbol d 1 does not change, and the line width in the direction with the symbol d 2 can be intentionally changed.-Figure 24 shows the optical axis without changing the X direction. The amount of eccentricity of Αχ and the deviation from the optical axis AX in the z direction Conversion characteristics of a diffractive optical element group in which the σ value is changed stepwise by the ratio of heart weights. It includes diffractive optical elements forming the illumination area IA4 to ˜α ”, diffractive optical elements forming the illumination area IAS1 to IA54, and forming the illumination area ΙΑό1 to IA "diffractive optical element. In addition, the diameter of each illumination area is set to about 0,150, as in the illumination area shown in Fig. 23. By using this diffractive optical element group, the diffractive optical element is exchanged, for example, 2 with a similar relationship. The optimal α value of the anamorphic quadrupole illumination can be obtained for each pattern. Fig. 25 shows the conversion characteristics of the diffractive optical element group in which the eccentricity of the optical axis in the X direction and the 2 direction is changed without changing the cj value. This diffractive optical element The group contains diffractive optical elements that form the illumination area IA "~ IA74, and form -50. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 public love)

線 544758 A7 ______— —_B7 五、發明説明(48 ) 照明區域ΙΑγΙΑ&quot;的衍射光學元件、形成照明區域 1八9广1八94的衍射光學元件,又,各照明區域的直徑和圖23 所π的照明區域同樣,被設定在〇·丨5必程度。若使用此衍_ 射光學元件群,則不使σ值變化而可使χ方向及2方向的對 於光軸ΑΧ的偏心量特意變化,所以例如按照圖22的附上符Line 544758 A7 ______ — —_B7 V. Description of the invention (48) Diffractive optical element of the illumination area ΙΑγΙΑ &quot;, a diffractive optical element forming the illumination area 189-91.894, and the diameter of each illumination area is as shown in Fig. 23 The lighting area is also set to a certain level of 0.5. If this diffractive optical element group is used, the eccentricity with respect to the optical axis AX in the χ direction and the 2 direction can be changed deliberately without changing the σ value.

號dl的方向的線寬和附上符號d2的方向的線寬,可控制各 個方向的線寬。 訂The line width in the direction of number dl and the direction in which the symbol d2 is attached can control the line width in each direction. Order

又,在圖23〜圖25為-了簡化圖示及簡化說明,說明了各衍 射光學元件群包含三個衍射光學元件的情況,但包含於一 個衍射光學元件群的衍射光學元件數為任意即可。此外, 形成於複眼透鏡7的照明區域直徑可考慮包含於衍射光學 元件群的衍射光學元件數及構成可變焦距光學系統·6的可 變倍率而適當設定。再者,在圖23〜圖25係舉階段(三階 ί又)切換照明區域的情況為例加以說明,但切換段數只要照 明光學系統内的衍射光學元件(轉換器)設置空間容許,就 增多較佳,最好可大致連續切換。此外,切換衍射光學元 件(交換配置於光軸ΑΧ上的衍射光學元件)的機構可使用在 前述第一實施形態、第二實施形態及這些的變形例說明的 機構。再者,也可以使用波陣面分割型積分器取代衍射光 學元件。 [第五實施形態] 圖26為_示本發明第五實施形態的照明光學裝置及具備 本發明第五實施形態的照明光學裝置的曝光裝置概略結構 之圖。圖1所示的本發明第一實施形態的照明光學裝置和圖 ______ -51 - 本紙張尺度適用中國國家樣準(CNS) Α4規格(210 X 297公釐) 544758 A7 -_____Β7____ 五、發明説明(49 ) 5所示的本發明第五實施形態的照明光學裝置不同之點係 下述之點:具備作為有預定固定倍率的固定倍率光學系統 的透筑70取代圖1中的可變焦距光學系統6。此透鏡7〇的倍· 率被設定在例如1倍〜2倍程度範圍的某值。 前述第一實施形態〜第四實施形態為了防止可變焦距光 學系統6的透過光量降低,具備多種作為將來自光源1的光 束變換成有預定形狀截面的光束的變換光學元件的衍射光 學元件’以取代減少構成可變焦距光學系統6的透鏡等片數 而限制可變倍率比。 本實施形態為了更加減低配置於透鏡等光軸Αχ上的光 學構件數,只設有一片透鏡70。在圖26雖然舉在折彎反射 鏡3的透鏡70之間具備圖3A及圖3B所示的衍射光學元件 4a〜4 1及衍射光學元件5a〜51的情況為例加以圖示,但因具 備倍率固定的透鏡70而最好具備更多變換特性不同的衍射 光學元件。特別是最好設置有使用圖23〜圖25說明的為了變 形四極照明的變換特性的衍射光學元件群。 以上’雖然就本發明的實施形態加以說明,但本發明不 受上述實施形態限制,在本發明的範圍内可自由變更。例 如在上述實施形態舉具備氟化氪準分子雷射(248 nm)作為 光源1的情況為例加以說明,但也可以具備超高壓水銀燈作 為光源1 ’以波長選擇遽波器6選擇成為必要的g線(43 6 nm)的光、h線(405 nm)及i線(365 nm)的光。此外,若更加 謀求波長的短波長化,則也可以具備氟化氬準分子雷 射(193 nm)、氟雷射(157 nm)作為光源1,使用由這些雷射 J ____-52- _ 本紙張尺度適种®國家標準(CNS)心見格(21Q X 297公爱) 一 -----23 to 25 are simplified illustrations and explanations, and each diffractive optical element group includes three diffractive optical element groups. However, the number of diffractive optical elements included in one diffractive optical element group is arbitrary. can. The diameter of the illumination area formed in the fly-eye lens 7 can be appropriately set in consideration of the number of diffractive optical elements included in the diffractive optical element group and the variable magnification constituting the variable focal length optical system · 6. In addition, the case where the illumination area is switched at the stage (third order) is illustrated in FIG. 23 to FIG. 25 as an example. However, as long as the number of diffractive optical elements (converters) in the illumination optical system is allowed by the installation space, It is better to increase, and it is better to switch continuously. In addition, as the mechanism for switching the diffractive optical element (the diffractive optical element arranged on the optical axis AX), the mechanism described in the first embodiment, the second embodiment, and these modifications can be used. Furthermore, a wavefront division type integrator may be used instead of the diffractive optical element. [Fifth Embodiment] Fig. 26 is a diagram showing a schematic configuration of an illumination optical device according to a fifth embodiment of the present invention and an exposure apparatus provided with the illumination optical device according to the fifth embodiment of the present invention. Illumination optical device and diagram of the first embodiment of the present invention shown in FIG. 1 ______ -51-This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 544758 A7 -_____ Β7 ____ 5. Description of the invention (49) The difference between the illumination optical device according to the fifth embodiment of the present invention shown in (5) is the following: a translucent structure 70 having a fixed magnification optical system having a predetermined fixed magnification is used instead of the variable focal length optical system in FIG. 1 System 6. The magnification and magnification of the lens 70 is set to a certain value ranging from, for example, 1 to 2 times. In order to prevent the amount of transmitted light of the variable focal length optical system 6 from being reduced, the first to fourth embodiments are provided with a plurality of diffractive optical elements, which are conversion optical elements that convert a light beam from the light source 1 into a light beam having a predetermined cross section. Instead of reducing the number of lenses and the like constituting the variable focal length optical system 6, the variable magnification ratio is limited. In this embodiment, in order to further reduce the number of optical members arranged on the optical axis Ax such as a lens, only one lens 70 is provided. Although FIG. 26 illustrates the case where the diffractive optical elements 4a to 41 and the diffractive optical elements 5a to 51 shown in FIGS. 3A and 3B are provided between the lenses 70 of the bending mirror 3, it is illustrated because It is preferable that the lens 70 having a fixed magnification be provided with more diffractive optical elements having different conversion characteristics. In particular, it is preferable to provide a diffractive optical element group for transforming the conversion characteristics of the quadrupole illumination described using FIG. 23 to FIG. 25. Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and can be freely modified within the scope of the present invention. For example, in the above-mentioned embodiment, a case where the erbium fluoride excimer laser (248 nm) is provided as the light source 1 is described as an example, but an ultra-high pressure mercury lamp may also be provided as the light source 1 ′ and it is necessary to select the wavelength selective oscillator 6 G-line (43 6 nm) light, h-line (405 nm) and i-line (365 nm) light. In addition, if a shorter wavelength is required, an argon fluoride excimer laser (193 nm) and a fluorine laser (157 nm) may be provided as the light source 1. These lasers J ____- 52- _ Paper Size Adaptation® National Standard (CNS) Mindfulness (21Q X 297 Public Love) One -----

Order

線 544758 A7 B7 五、發明説明(5〇 ) 所射出的雷射光。 又,使用200 nm以下的波長作為曝光光時,最好用下述 材料形成衍射光學元件4a〜41、5a〜51 :由螢石、摻入氟的石· 英玻璃、摻入氟及氫的石英玻璃、構造決定溫度1200 K° 以下且氫氧基濃度1000 ppm以上的石英玻璃、構造決定溫 度1200 K°以下且氫分子濃度1 X 1〇17分子/釐米3以上的石 英玻璃、構造決定溫度1200 Κ。以下且氯濃度50 ppm以下的 石英玻璃及構造決定—溫度1200 K。以下且氫分子濃度IX 1〇17分子/釐米3以上且氯濃度50 ppm以下的石英玻璃的群 中所選擇。 此處’關於構造決定溫度1200 K。以下且氫氧基濃度1000 ppm以上的石英玻璃,揭示於本案申請人的專利第27-7〇224 號公報,關於構造決定溫度1200 K。以下且氫分子濃度IX 10分子/釐米3以上的石英玻璃、構造決定溫度12〇〇 κ〇以 下且氯濃度50 ppm以下的石英玻璃及構造決定溫度12〇〇 K。以下且氫分子濃度} χ丨〇 17分子/釐米3以上且氯濃度5 〇 ppm以下的石英玻璃,揭示於本案申請人的專利第2们6 η 8 號公報。 在以上說明的第一〜第三實施形態係積集多數單元透鏡 而形成複眼透鏡7’但也可以以這些為微型複眼透鏡。所謂 微型複眼透鏡,係在光透過性基板利用姓刻等手法將多數 微小透鏡面設置成矩陣狀者·。關於形成多數光源像之點, 在複眼透鏡和微型透鏡障列之間實質上沒有機能上的差異 ’但在可極其縮小—個單元透鏡(微小透鏡面)的孔徑大小Line 544758 A7 B7 V. Description of the invention (50) Laser light emitted. When using a wavelength of 200 nm or less as the exposure light, it is preferable to form the diffractive optical elements 4a to 41 and 5a to 51 with the following materials: fluorite, fluorine-doped stone, glass, and fluorine-and-hydrogen-doped Quartz glass, structure-determined temperature of 1200 K ° or less and hydroxyl group concentration of 1000 ppm or more, structure-determined temperature of 1200 K ° or less and hydrogen molecule concentration of 1 X 1017 molecules / cm3 or more, structure-determined temperature 1200 K. Quartz glass with a chlorine concentration below 50 ppm and its structure are determined—temperature 1200 K. The following is selected from the group of quartz glass having a hydrogen molecule concentration of IX 107 molecules / cm3 or more and a chlorine concentration of 50 ppm or less. Here, the temperature of the structure is 1200 K. The following quartz glass having a hydroxyl group concentration of 1,000 ppm or more is disclosed in the applicant's patent publication No. 27-7〇224, and the structure-determining temperature is 1200 K. Quartz glass having a hydrogen molecule concentration of IX 10 molecules / cm3 or more and having a structure-determining temperature of 12,000 κ0 or less and a chlorine concentration of 50 ppm or less having a structure-determining temperature of 12,000 K. The following quartz glass with a hydrogen molecule concentration of χ 丨 17 molecules / cm 3 or more and a chlorine concentration of 50 ppm or less is disclosed in Patent No. 2 6 8 of the applicant of the present application. In the first to third embodiments described above, a plurality of unit lenses are assembled to form the fly-eye lens 7 '. However, these may be micro fly-eye lenses. The so-called miniature fly-eye lens is a light-transmitting substrate in which most of the micro lens surfaces are arranged in a matrix shape by means such as last name engraving. Regarding the point of forming most light source images, there is virtually no functional difference between fly-eye lenses and microlens barriers ’but the aperture size of a unit lens (microlens surface) can be extremely reduced.

-装 訂-Binding

線 -53- M4758Line -53- M4758

p可大幅削減製造成本,可使光軸方向的厚度變成非常薄 寺(點,微型複眼透鏡較為有利。 此夕卜,在上诚筮一 ^ . 币一〜弟三實施形態係將多數單元透鏡積集· 成二維矩p車狀而形成複眼透鏡7,但也可以以這些為圓筒型 複眼透鏡:·具備沿著預定第一方向排列的第一柱面透鏡陣 列(cyhndncal lens array)和沿著與該第一方向正交的第二 方向排列的第一柱面透鏡陣列。此處,也可以是以下結構 心〃又置第一及第二柱面透鏡陣列或在這些第一及第二 柱面透鏡陣列對後側具備沿著第一方向排列的第三柱面透 叙P車=和沿著第二方向排列的第四柱面透鏡陣列。又,第 =及第四柱面透鏡陣列也可以一體設置。此外,也可以在 光,過f生基板上使用餘刻等手法形成第一及第二(和第三 及第四)柱面透叙陣列。這種情況,可十分縮小各柱面透鏡 陣列的間距或使光軸方向的厚度變成非常薄和大幅 造成本。 、此外,、在前述第一實施形態及第二實施形態係使用複眼 ,竞作為光予積分器,但取代其,也可以採取下述實施形 d使用有四角柱、穴角柱等多角柱狀或圓柱狀裡面反射 面的棒型積分器。 此外在上述第一及第二實施形態係將為了決定單像光 罩R照明範®的單像光罩#板RB配置於單像光罩r的上面 附近,但也可以是下述結構…·在此單像光罩擋板RB和單像 光罩R之間設置中繼光學系統,使單像光罩擋板RB的附近 位置和單像光罩R在光學上成為共軛。 -54- 本紙張尺度適用中國國家標準格(挪297公爱)p can significantly reduce manufacturing costs, and can make the thickness in the optical axis direction very thin (points, miniature fly-eye lenses are more advantageous. In addition, in the upper Makoto ^. Coins 1 to 3 implementations of the system will be the most unit lens Collection · The fly-eye lens 7 is formed in a two-dimensional moment p shape, but these may be cylindrical fly-eye lenses: · A first cylindrical lens array (cyhndncal lens array) and The first cylindrical lens array is arranged along a second direction orthogonal to the first direction. Here, the first and second cylindrical lens arrays may be arranged in the following structure or the first and second The two cylindrical lens array includes a third cylindrical lens array arranged along the first direction and a fourth cylindrical lens array arranged along the second direction on the rear side. The third and fourth cylindrical lenses are arranged along the second direction. The array can also be integrated. In addition, the first and second (and third and fourth) cylindrical transparence arrays can also be formed on the light and bio-substrates using methods such as cutting. This situation can be greatly reduced. Pitch of each cylindrical lens array or direction of optical axis The thickness has become very thin and greatly caused the cost. In addition, in the aforementioned first embodiment and the second embodiment, the compound eye is used as a light pre-integrator, but instead of this, the following embodiment d may be used. A rod-shaped integrator with a polygonal column or a cylindrical inner reflecting surface such as a corner column or a corner column. In addition, in the first and second embodiments described above, the single image mask # 板 RB for determining the single image mask R Illumination Fan® It is arranged near the upper surface of the single-image mask r, but it may have the following structure ... A relay optical system is provided between the single-image mask baffle RB and the single-image mask R to make the single-image mask b The vicinity of RB and the single-image reticle R are optically conjugated. -54- This paper size applies the Chinese National Standard (No.297 Public Love)

544758 A7544758 A7

.裝 訂 m #; 五Binding m #; five

在圖2 8中的圖案形成製程S2〇,執行所謂光學微影製程: 使用本只;ye形怨的曝光裝置將光罩的圖案轉印曝光於感光 f生基板(塗佈光阻的玻璃基板等)。藉由此光學微影製程,· 在感光性基板上形成包含多數電極等的預定圖案^其後, 被曝光的基板藉由經過顯影製程、#刻製程、單像光罩剥 離製程等各製程,在基板上形成預定圖案,轉移到下一濾 色器形成製程S22。 〜 其’入,在濾色器形成製程S22 ,形成將與r(紅)、G(綠)、 B(藍)對應的三個點組多數排列成矩陣狀或將R、G、B的三 條條紋濾色器組多數排列於水平掃描線方向的濾色器。然 後,在濾色器形成製程S22後執行單元組合製程S24。在單 元組合製程S24,使用在圖案形成製程S2〇得到的有預定圖 气丁 4 案的基板及在濾色器形成製程S22得到的濾色器等組合液 晶面板(液晶單元)。 在單元組合製程S24,例如將液晶注入在圖案形成製程 S20得到的有預定圖案的基板和在濾色器形成製程s22得到 的濾色器之間,製造液晶面板(液晶單元)。其後,在組件 組合製程S26,安裝使被組合的液晶面板(液晶單元)顯示動 作進行的電路、背面光等各零件而使其完成作為液晶顯示 元件。根據上述液晶顯示元件之製造方法,可產能良好地 得到有極細微的電路圖案的液晶顯示元件。 -56- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐)In the pattern forming process S20 in FIG. 28, a so-called optical lithography process is performed: using the present; ye-shaped exposure device, the pattern of the photomask is transferred and exposed on a photosensitive substrate (a glass substrate coated with a photoresist) Wait). By this optical lithography process, a predetermined pattern including a plurality of electrodes and the like is formed on a photosensitive substrate ^, and then the exposed substrate is subjected to various processes such as a development process, a # engraving process, and a single-image mask peeling process. A predetermined pattern is formed on the substrate, and it is transferred to the next color filter forming process S22. ~ In the process, a color filter forming process S22 is formed, and the three dot groups corresponding to r (red), G (green), and B (blue) are mostly arranged in a matrix or three of R, G, and B are formed. The streak color filter group is mostly arranged in a horizontal scanning line direction. Then, the unit combination process S24 is performed after the color filter formation process S22. In the unit combination process S24, a combination liquid crystal panel (liquid crystal cell) such as a substrate having a predetermined pattern obtained in the pattern forming process S20 and a color filter obtained in the color filter forming process S22 is used. In the cell combination process S24, for example, liquid crystal is injected between a substrate having a predetermined pattern obtained in the pattern forming process S20 and a color filter obtained in the color filter forming process s22 to manufacture a liquid crystal panel (liquid crystal cell). After that, in the module assembly process S26, components such as a circuit and a backlight for performing display operation of the combined liquid crystal panel (liquid crystal cell) are installed to complete the device as a liquid crystal display element. According to the above-mentioned method for manufacturing a liquid crystal display element, a liquid crystal display element having an extremely fine circuit pattern can be obtained with good productivity. -56- This paper size applies to China National Standard (CNS) A4 (210X 297mm)

Claims (1)

D8 、申請專利範圍 1 · -種照明光學裝置,係照明被照射面,其特徵在於:包含 光源部:供應光束; 光束變換機構:將來自前述光源部的光束變換成預定· 截面形狀的光束;及, 可變倍率光學系統:為了變更以前述光束變換機構變 換的光束的光強度分佈,可變倍率比在2.3倍以下可變焦 點距離, 前述光束變換機構包含多數變換光學元件:各被變換 的光束截面形狀的種類變換特性不同;及,設定部:將 前述變換光學元件之一設定於光路内者。 2·如申請專利範圍第1項之照明光學裝置,其中更包含光 學積分器:配置於前述可變倍率光學系統和前述被-照射 面之.間,均勻照明前述被照射面;及, 3. 4. 聚光光學系統:配置於前述光學積分器和前述被照射 面之間,將來自前述光學積分器的光導入前述被照射面。 如申請專利範圍第2項之照明光學裝置,其中包含於前 述可變倍率光學系統的光學構件和包含於前述^光光 學系統的光學構件的總數為1 0以下。 如申請專利範圍第2項之照明光學裝置,其中前述可你 倍率光學系統包含至少一個有非球面的光學元件。又 如申請專利範圍第1項之照明光學裝置,其中前述光束 變換機構根據來自前述光.源部的光束,變換成且有圓形 :面形狀的光束,具有環帶截面形狀的光束或對於基準 光軸偏心的多數光束中的至少兩種光束。 -57- 5. 6·如申請專利範圍第5項之照明光學裝置,其中前述光束 走換機構作為根據來自前述光源部的光束變換成對於 前述基準光軸偏心的多數光束的變換光學元件,包含如 各光束與前述基準光軸正交的第一方向的偏心量和與 前述基準光軸及前述第一方向正交的第二方向的偏心 量不同般地變換的變換光學元件。 7·如申請專利範圍第6項之照明光學裝置,其中前述,光束 變換機構包含由多教變換光學元件構成的變換光學元 件群,該多數變換光學元件係為了不改變前述第一方向 的前述光束偏心量而階段地切換前述第二方向的前述 光束偏心量,將前述第二方向的變換特性設定成不同的 特性。 . 8. 如申請專利範圍第6項之照明光學裝置,其中前述光束 變換機構包含由多數變換光學元件構成的變換光學元 件群,該多數變換光學元件係在維持前述第—方向=前 述光束偏心量和前述第二方向的前述光束偏心量之比 的狀態下,為了階段地切換對於前述基準光軸的偏心量 ,將前述第一方向及前述第二方向的變換特性設定成不 同的特性。 9. 如申請專利範圍第6項之照明光學裝置,其中前述光束 變換機構包含由多數變換光學元件構成的變換光學元 件群’該多數變換光學元并係在維持前述光東對於;述 基準光軸的偏心量的狀態下,為了階段地切換前述第一 方向的偏心量及前述第二方向的偏心量,將前述第一方 -58-D8. Patent application scope 1-An illumination optical device for illuminating the illuminated surface, which is characterized in that it includes a light source unit: a supply beam; a beam conversion mechanism: converts the light beam from the light source unit into a beam having a predetermined cross-sectional shape; And, a variable magnification optical system: In order to change the light intensity distribution of a light beam converted by the light beam conversion mechanism, the variable magnification ratio is a variable focus distance of 2.3 times or less. The light beam conversion mechanism includes a plurality of conversion optical elements: The types of beam cross-sectional shapes have different conversion characteristics; and a setting unit: one of the conversion optical elements is set in an optical path. 2. The illumination optical device according to item 1 of the patent application scope, further comprising an optical integrator: arranged between the aforementioned variable magnification optical system and the aforementioned-irradiated surface to uniformly illuminate the aforementioned illuminated surface; and, 3. 4. Concentrating optical system: disposed between the optical integrator and the illuminated surface, and directing light from the optical integrator to the illuminated surface. For example, the total number of optical components included in the aforementioned variable magnification optical system and the optical components included in the aforementioned optical optical system is 10 or less. For example, the illumination optical device according to item 2 of the patent application, wherein the aforementioned magnification optical system includes at least one optical element having an aspherical surface. Another example is the illumination optical device of the scope of application for a patent, wherein the aforementioned beam conversion mechanism transforms a beam having a circular: plane shape according to the beam from the aforementioned light source source, a beam having a cross-sectional shape of a ring zone, or a reference At least two of the majority of the beams whose optical axis is eccentric. -57- 5. The illumination optical device according to item 5 of the patent application, wherein the light beam switching mechanism includes a conversion optical element that converts a light beam from the light source unit into a plurality of light beams that are eccentric to the reference optical axis. A conversion optical element that transforms the amount of decentering of each light beam in a first direction orthogonal to the reference optical axis and the amount of decentering in a second direction orthogonal to the reference optical axis and the first direction. 7. The illumination optical device according to item 6 of the patent application, wherein the beam conversion mechanism includes a conversion optical element group composed of multi-education conversion optical elements, and the majority of the conversion optical elements are in order not to change the light beam in the first direction. The amount of eccentricity is to switch the amount of eccentricity of the light beam in the second direction in stages, and the conversion characteristics in the second direction are set to different characteristics. 8. The illumination optical device according to item 6 of the application, wherein the aforementioned beam conversion mechanism includes a group of conversion optical elements composed of a plurality of conversion optical elements, and the majority of conversion optical elements maintain the aforementioned first direction = the aforementioned beam eccentricity In a state of a ratio with the amount of eccentricity of the light beam in the second direction, in order to switch the amount of eccentricity to the reference optical axis in stages, the conversion characteristics of the first direction and the second direction are set to different characteristics. 9. The illumination optical device according to item 6 of the patent application, wherein the aforementioned light beam conversion mechanism includes a group of conversion optical elements composed of a plurality of conversion optical elements, and the majority conversion optical element is maintained while maintaining the aforementioned optical axis; the reference optical axis In the state of the amount of eccentricity, in order to switch the amount of eccentricity in the first direction and the amount of eccentricity in the second direction in stages, the first party -58- C8 D8 申請專利範圍 W向及則述第二方向的變換特性設定成不同的特性。 申叫專利範圍第5項之照明光學裝置,其中前述設定 部包含保持構件:保持前述多數變換光學元件;及,驅 動部·使前述保持構件旋轉或移動。 1 L如申請專利範圍第i項之照明光學裝置,其中前述設定 部包含保持構件:保持前述多數變換光學元件;及,驅 動部:使前述保持構件旋轉或移動。 12·如申請專利範圍第i項之照明光學裝置,其中前述設定 部G;第保持構件:保持前述多數變換光學元件一部 分,第二保持構件:保持和前述多數變換光學元件前述 一部分不同的一部分;及,驅動部:使前述第一及第二 保持構件旋轉或移動。 · 1 3·如申請專利範圍第!項之照明光學裝置,其中以前述可 變倍率光學系統的可變倍率比為z時,滿足12$ζ^2或 1.2$ ZS 1.8 〇 14·-種照明光學裝置,係照明被照射面,其特徵在於:包含 光源部·供應光束; 光束變換機構:將來自前述光源部的光束變換成預定 截面形狀的光束;及, 可變倍率光學系統··為了變更以前述光束變換機構變 換的光束的光強度分佈,以5片以下的光學構件構成, 前述光束變換機構包含多數變換光學元件:各被變換 的光束截面形狀的種類變換特性不同;及,設定部:將 前述變換光學元件之一設定於光路内者。 · -59- 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公爱)C8 D8 Patent application scope The conversion characteristics of the W direction and the second direction are set to different characteristics. The illuminating optical device claimed in item 5 of the patent scope, wherein the setting portion includes a holding member that holds the plurality of conversion optical elements; and a driving portion that rotates or moves the holding member. 1 L The illumination optical device according to item i in the patent application range, wherein the setting section includes a holding member: holding the plurality of conversion optical elements; and a driving section: rotating or moving the holding member. 12. The illumination optical device according to item i of the application, wherein the setting portion G; the first holding member: holds a part of the majority of the conversion optical elements, and the second holding member: holds a part different from the foregoing part of the majority of the conversion optical elements; And, the driving unit: rotates or moves the first and second holding members. · 1 3 · If the scope of patent application is the first! Item of the illumination optical device, wherein when the variable magnification ratio of the aforementioned variable magnification optical system is z, 12 $ ζ ^ 2 or 1.2 $ ZS 1.8 〇14 · -type illumination optical device is used to illuminate the illuminated surface. It is characterized by including a light source unit and a supply beam; a beam conversion mechanism that converts the light beam from the light source unit into a light beam having a predetermined cross-sectional shape; and a variable magnification optical system. To change the light of the light beam converted by the light beam conversion mechanism The intensity distribution is made up of 5 or less optical members, and the beam conversion mechanism includes a plurality of conversion optical elements: each type of the beam cross-section shape to be converted has different conversion characteristics; and the setting unit: sets one of the conversion optical elements on an optical path Insider. · -59- This paper size applies to China National Standard (CNS) Α4 specification (210X297 public love) A B c D 544758 六、申請專利範圍 22. 如申請專利範圍第21項之照明光學裝置,其中前述光束 變換機構包含由多數變換光學元件構成的變換光學元 件群,該多數變換光學元件係為了不改變前述第一方向一 的前述光束偏心量而階段地切換前述第二方向的前述 光束偏心量,將前述第二方向的變換特性設定成不同的 特性。 23. 如申請專利範圍第21項之照明光學裝置,其中前述光束 變換機構包含由多袁變换光學元件構成的變換光學元 件群,該多數變換光學元件係在維持前述第一方向的前 述光束偏心量和前述第二方向的前述光束偏心量之比 的狀態下,為了階段地切換對於前述基準光軸的偏心量 ,將前述第一方向及前述第二方向的變換特性設走成不 同的特性。 24. 如申請專利範圍第21項之照明光學裝置,其中前述光束 變換機構包含由多數變換光學元件構成的變換光學元 件群,該多數變換光學元件係在維持前述光束對於前述 基準光軸的偏心量的狀態下,為了階段地切換前述第一 方向的偏心量及前述第二方向的偏心量,將前述第一方 向及前述第二方向的變換特性設定成不同的特性。 25. 如申請專利範圍第19項之照明光學裝置,其中前述設定 部包含保持構件:保持前述多數變換光學元件;及,驅 動部:使前述保持構件旋轉或移動。 26. 如申請專利範圍第14項之照明光學裝置,其中前述設定 部包含保持構件:保持前述多數變換光學元件;及,驅 -61 - 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐)AB c D 544758 6. Application scope of patent 22. For example, the illumination optical device of the scope of application for patent No. 21, wherein the aforementioned beam conversion mechanism includes a group of conversion optical elements composed of a plurality of conversion optical elements, and the majority of the conversion optical elements are not changed. The beam eccentricity in the first direction is switched stepwise to switch the beam eccentricity in the second direction, and the conversion characteristics in the second direction are set to different characteristics. 23. The illumination optical device according to item 21 of the patent application, wherein the light beam conversion mechanism includes a group of conversion optical elements composed of a multi-element conversion optical element, and the majority of the conversion optical elements maintain the light beam eccentricity in the first direction. In a state of a ratio of the amount and the beam eccentricity in the second direction, in order to gradually switch the amount of eccentricity to the reference optical axis, the conversion characteristics of the first direction and the second direction are set to different characteristics. 24. The illumination optical device according to claim 21, wherein the light beam conversion mechanism includes a group of conversion optical elements composed of a plurality of conversion optical elements, and the plurality of conversion optical elements maintain an eccentricity of the light beam with respect to the reference optical axis. In order to switch the amount of eccentricity in the first direction and the amount of eccentricity in the second direction in stages, the conversion characteristics of the first direction and the second direction are set to different characteristics. 25. The illumination optical device according to claim 19, wherein the setting portion includes a holding member that holds the plurality of conversion optical elements; and a driving portion that rotates or moves the holding member. 26. For the illumination optical device of the scope of application for patent No. 14, wherein the aforementioned setting section includes a holding member: to hold the majority of the aforementioned conversion optical elements; and drive -61-This paper size is applicable to China National Standard (CNS) A4 specifications (210X297) %) 前述保持構件旋轉或移動。 令明專利Ιέ園第14項之照明 邵包含第一保持構件··保 I裝置,其t前述設另 分;第二保持構件:保釦乂數變換光學元件一奇 行稱什保持和前逑多數變換光學分、十 —邵分不同的一部分,·及, 欠換光予兀件則4 保持構件旋轉或移動。 邵·使前述第一及第二 28·如申請專利範園第14項之照明光學 — 12二:變倍率比…,滿足[_或 29·—種照明光學裝置,係照明被照射面,其特徵在於:包含 光源部··供應光束;及, 光束變換機構:如在照明光瞳面成為對於基準光-轴偏 心的多數光束般地變換來自前述光源部的光束,前述光 束變換機構包含變換光學元件:如在沿著各光束與前述 基準光軸正交的第一方向的前述照明光瞳面的偏心量 和在沿著與前述基準光軸及前述第一方向正交的第二 方向的前述照明光瞳面的偏心量不同般地變換者。 3〇_如申請專利範圍第29項之照明光學裝置,其中前述光束 變換機構包含由多數變換光學元件構成的變換光學元 件群,該多數變換光學元件係為了不改變前述第一方向 的前述光束偏心量而階段地切換前述第二方向的前述 光束偏心量’將前述第二方向的變換特性設定成不同的 特性。 31·如申請專利範圍第29項之照明光學裝置,其中前述光束 -62- 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 544758 A8 B8 C8 D8 申請專利範圍 變換機構包含由多數變換光學元件構成的變換光學元 件群,該多數變換光學元件係在維持前述第一方向的前 述光束偏心量和前述第二方向的前述光束偏心量之比-的狀態下’為了階段地切換對於前述基準光軸的偏心量 ,將前述第一方向及前述第二方向的變換特性設定成不 同的特性。 32·如申請專利範圍第29項之照明光學裝置,其中前述光束 變換機構包含由多-數變換光學元件構成的變換光學元 件群,該多數變換光學元件係在維持前述光束對於前述 基準光軸的偏心量的狀態下·,為了階段地切換前述第一 方向的偏心量及前述第二方向的偏心量,將前述第一方 向及前述第二方向的變換特性設定成不同的特性: 33. 如申請專利範圍第29項之照明光學裝置,其中有配置於 前述光束變換機構和前述照明光瞳面之間的光學系統。 34. 如申請專利範圍第33項之照明光學裝置,其中前述光學 系統有預定的固定倍率。 35. 如申請專利範圍第33項之照明光學裝置,其中前述光學 系統有為了變更以前述光束變換機構變換的光束的2 強度分佈的可變倍率光學系統。 36. —種曝光裝置,其特徵在於:包含 照明光學裝置:申請專利範圍第丨至35項中任一項 載;及 投影光學系統:將形成於配置於前述被照射面的光罩 的圖案投影於感光性基板者。 -63-The aforementioned holding member rotates or moves. The lighting of item 14 of Lingming Patent I includes a first holding member. The holding device is divided into two parts; the second holding member: the holding buckle number conversion optical element is oddly held and the frontmost majority. Transform different parts of the optical component and the ten-sharp component, and, if the light-replacement element is under-replaced, keep the component rotating or moving. Shao made the aforementioned first and second 28. The lighting optics of Item 14 of the patent application park—12: Variable magnification ratio ..., which satisfies [_ or 29 · — a kind of lighting optical device, which illuminates the illuminated surface, which It is characterized in that it includes a light source unit and a supply beam; and a beam conversion mechanism that converts the light beam from the light source unit like a majority of light beams decentered from the reference light axis on the illumination pupil surface, and the light beam conversion mechanism includes conversion optics. Element: as described above, the eccentricity of the illumination pupil plane in a first direction orthogonal to the reference optical axis along each light beam and the foregoing in a second direction orthogonal to the reference optical axis and the first direction The amount of eccentricity of the illumination pupil plane changes differently. 30. The illumination optical device according to item 29 of the application, wherein the light beam conversion mechanism includes a group of conversion optical elements composed of a plurality of conversion optical elements, and the plurality of conversion optical elements are not to decenter the light beam in the first direction. The amount of decentering of the light beam in the second direction is switched step by step, and the conversion characteristics in the second direction are set to different characteristics. 31. If the illumination optical device according to item 29 of the patent application scope, wherein the aforementioned light beam -62- this paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 544758 A8 B8 C8 D8 A group of conversion optical elements constituted by a plurality of conversion optical elements, which are switched in stages while maintaining a ratio-of the beam eccentricity in the first direction and the beam eccentricity in the second direction. The eccentricity of the reference optical axis sets the conversion characteristics of the first direction and the second direction to different characteristics. 32. The illumination optical device according to item 29 of the application, wherein the light beam conversion mechanism includes a conversion optical element group composed of a multiple-number conversion optical element, and the majority of the conversion optical elements maintain the light beam with respect to the reference optical axis. In the state of the eccentricity amount, in order to switch the eccentricity amount in the first direction and the eccentricity amount in the second direction in stages, the conversion characteristics of the first direction and the second direction are set to different characteristics: 33. The illumination optical device according to item 29 of the patent includes an optical system disposed between the beam conversion mechanism and the illumination pupil surface. 34. The illumination optical device according to item 33 of the application, wherein the aforementioned optical system has a predetermined fixed magnification. 35. The illumination optical device according to item 33 of the patent application, wherein the optical system includes a variable magnification optical system for changing a 2 intensity distribution of a light beam converted by the light beam conversion mechanism. 36. An exposure device, comprising: an illumination optical device: any one of items No. 丨 to 35 of the scope of patent application; and a projection optical system: projecting a pattern formed on a photomask disposed on the illuminated surface For photosensitive substrates. -63- 544758 A B CD 六、申請專利範圍 37.-種微裝置之製造方法,其特徵在於:包含 曝光製程:使用申請專利範圍第36項所載之曝光裝置 使形成於前述光罩的圖案曝光於感光性基板;及, 顯影製程:使被曝光的前述感光性基板顯影者。 3 8.-種曝光方法,其特徵在於:包含 照明製程:使用申請專利範圍第1至35項中任一項所 載之照明光學裝置照明形成於配置於前述被照射面的 光罩的圖案;及,- 投影製程:使用投影光學系統將前述光罩的前述圖案 投影於感光性基板者。 -64- 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐)544758 AB CD VI. Patent application scope 37. A method for manufacturing a microdevice, characterized in that it includes an exposure process: the exposure device contained in item 36 of the patent application scope is used to expose the pattern formed on the aforementioned photomask to photosensitivity A substrate; and, a development process: developing the exposed photosensitive substrate. 3 8. An exposure method, characterized in that it includes an illumination process: using the illumination optical device contained in any of items 1 to 35 of the scope of patent application to illuminate the pattern formed on the photomask disposed on the illuminated surface; And,-a projection process: a person who projects the aforementioned pattern of the aforementioned photomask onto a photosensitive substrate using a projection optical system. -64- This paper size applies to China National Standard (CNS) A4 (210X297 mm)
TW091110014A 2001-05-23 2002-05-14 Lighting optical device, exposure system, and production method of micro device TW544758B (en)

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