KR101742715B1 - 2 챔버 가스 방전 레이저의 레이저 제어 방법 및 장치 - Google Patents

2 챔버 가스 방전 레이저의 레이저 제어 방법 및 장치 Download PDF

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Publication number
KR101742715B1
KR101742715B1 KR1020117010145A KR20117010145A KR101742715B1 KR 101742715 B1 KR101742715 B1 KR 101742715B1 KR 1020117010145 A KR1020117010145 A KR 1020117010145A KR 20117010145 A KR20117010145 A KR 20117010145A KR 101742715 B1 KR101742715 B1 KR 101742715B1
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KR
South Korea
Prior art keywords
energy
laser
control circuit
voltage input
dither
Prior art date
Application number
KR1020117010145A
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English (en)
Korean (ko)
Other versions
KR20110086020A (ko
Inventor
로버트 엔. 자크
Original Assignee
사이머 엘엘씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/255,385 external-priority patent/US7751453B2/en
Priority claimed from US12/255,347 external-priority patent/US7756171B2/en
Priority claimed from US12/255,367 external-priority patent/US7720120B2/en
Application filed by 사이머 엘엘씨 filed Critical 사이머 엘엘씨
Publication of KR20110086020A publication Critical patent/KR20110086020A/ko
Application granted granted Critical
Publication of KR101742715B1 publication Critical patent/KR101742715B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
KR1020117010145A 2008-10-21 2009-10-20 2 챔버 가스 방전 레이저의 레이저 제어 방법 및 장치 KR101742715B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US12/255,367 2008-10-21
US12/255,385 US7751453B2 (en) 2008-10-21 2008-10-21 Method and apparatus for laser control in a two chamber gas discharge laser
US12/255,385 2008-10-21
US12/255,347 US7756171B2 (en) 2008-10-21 2008-10-21 Method and apparatus for laser control in a two chamber gas discharge laser
US12/255,367 US7720120B2 (en) 2008-10-21 2008-10-21 Method and apparatus for laser control in a two chamber gas discharge laser
US12/255,347 2008-10-21
PCT/US2009/005694 WO2010047771A1 (fr) 2008-10-21 2009-10-20 Procédé et appareil pour commande laser dans un laser à décharge de gaz à deux chambres

Publications (2)

Publication Number Publication Date
KR20110086020A KR20110086020A (ko) 2011-07-27
KR101742715B1 true KR101742715B1 (ko) 2017-06-01

Family

ID=42119575

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117010145A KR101742715B1 (ko) 2008-10-21 2009-10-20 2 챔버 가스 방전 레이저의 레이저 제어 방법 및 장치

Country Status (5)

Country Link
EP (1) EP2351170A4 (fr)
JP (2) JP2012506634A (fr)
KR (1) KR101742715B1 (fr)
TW (1) TWI389409B (fr)
WO (1) WO2010047771A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI389409B (zh) * 2008-10-21 2013-03-11 Cymer Inc 用於兩腔室氣體放電雷射之雷射控制方法及裝置
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
US11081852B2 (en) * 2017-04-24 2021-08-03 Cymer, Llc Laser light energy and dose control using repetition rate based gain estimators
US10096969B1 (en) * 2017-09-14 2018-10-09 Cymer, Llc Method for dither free adaptive and robust dose control for photolithography
CN115224581B (zh) * 2021-04-15 2024-04-05 北京科益虹源光电技术有限公司 激光器的能量补偿方法及装置
CN113783100B (zh) * 2021-05-31 2023-04-11 北京科益虹源光电技术有限公司 激光器的能量补偿方法及装置

Citations (2)

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US20030234854A1 (en) * 2002-06-19 2003-12-25 Nikon Corporation Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method
US20060146900A1 (en) * 2001-08-29 2006-07-06 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing

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GB2293730B (en) * 1994-09-28 1998-08-05 Roke Manor Research Apparatus for use in equipment providing a digital radio link between a fixed and a mobile radio unit
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
DE69834925T2 (de) * 1997-10-10 2006-10-05 Cymer, Inc., San Diego Pulsenergiesteuerung für excimer-laser
US6154681A (en) * 1998-04-03 2000-11-28 Johnson Controls Technology Company Asynchronous distributed-object building automation system with support for synchronous object execution
US6693939B2 (en) * 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置
US6963595B2 (en) * 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
JP4393457B2 (ja) * 2002-07-31 2010-01-06 サイマー インコーポレイテッド ２室放電ガスレーザ用制御システム
US6999492B2 (en) * 2002-11-20 2006-02-14 Lambda Physik Ag Reduced-maintenance excimer laser with oil-free solid state pulser
JP2004288674A (ja) * 2003-03-19 2004-10-14 Fuji Xerox Co Ltd 面発光型半導体レーザおよびそれを用いた光通信システム
WO2005094205A2 (fr) * 2003-07-30 2005-10-13 Tcz Gmbh Systeme de traitement de surface a laser a gaz a haute stabilite et a tres haute energie
JP4229275B2 (ja) * 2003-10-20 2009-02-25 株式会社小松製作所 露光用２ステージＡｒＦエキシマレーザ装置
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
US7471708B2 (en) * 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
JP5202315B2 (ja) * 2005-08-09 2013-06-05 サイマー インコーポレイテッド 放電タイミングによる多室ガス放電レーザの帯域幅制御
TWI389409B (zh) * 2008-10-21 2013-03-11 Cymer Inc 用於兩腔室氣體放電雷射之雷射控制方法及裝置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060146900A1 (en) * 2001-08-29 2006-07-06 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US20030234854A1 (en) * 2002-06-19 2003-12-25 Nikon Corporation Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method

Also Published As

Publication number Publication date
TWI389409B (zh) 2013-03-11
EP2351170A4 (fr) 2013-04-10
TW201023462A (en) 2010-06-16
JP2012506634A (ja) 2012-03-15
KR20110086020A (ko) 2011-07-27
EP2351170A1 (fr) 2011-08-03
JP2015111718A (ja) 2015-06-18
WO2010047771A1 (fr) 2010-04-29

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