KR101698235B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101698235B1
KR101698235B1 KR1020130158237A KR20130158237A KR101698235B1 KR 101698235 B1 KR101698235 B1 KR 101698235B1 KR 1020130158237 A KR1020130158237 A KR 1020130158237A KR 20130158237 A KR20130158237 A KR 20130158237A KR 101698235 B1 KR101698235 B1 KR 101698235B1
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South Korea
Prior art keywords
substrate
oxygen concentration
illuminance
light
optical system
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English (en)
Korean (ko)
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KR20140085320A (ko
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료 사사키
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Toxicology (AREA)
KR1020130158237A 2012-12-27 2013-12-18 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR101698235B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-284351 2012-12-27
JP2012284351A JP6099969B2 (ja) 2012-12-27 2012-12-27 露光装置及びデバイスの製造方法

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KR20140085320A KR20140085320A (ko) 2014-07-07
KR101698235B1 true KR101698235B1 (ko) 2017-01-19

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KR1020130158237A Expired - Fee Related KR101698235B1 (ko) 2012-12-27 2013-12-18 노광 장치 및 디바이스 제조 방법

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US (1) US9250541B2 (enExample)
JP (1) JP6099969B2 (enExample)
KR (1) KR101698235B1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6099969B2 (ja) * 2012-12-27 2017-03-22 キヤノン株式会社 露光装置及びデバイスの製造方法
JP6099970B2 (ja) 2012-12-27 2017-03-22 キヤノン株式会社 露光装置及びデバイスの製造方法
JP6495707B2 (ja) 2015-03-25 2019-04-03 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および基板処理装置
JP6543064B2 (ja) 2015-03-25 2019-07-10 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法
JP6811119B2 (ja) 2017-03-01 2021-01-13 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法
JP6985803B2 (ja) * 2017-03-01 2021-12-22 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法
JP6976884B2 (ja) * 2018-02-28 2021-12-08 キヤノン株式会社 露光装置、および物品の製造方法
JP7258028B2 (ja) * 2018-08-08 2023-04-14 ギガフォトン株式会社 リソグラフィシステムのメインテナンス管理方法、メインテナンス管理装置、及びコンピュータ可読媒体
JP7283893B2 (ja) * 2018-12-03 2023-05-30 株式会社エスケーエレクトロニクス フォトマスクの製造方法
JP7278836B2 (ja) * 2019-03-29 2023-05-22 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
JP7213761B2 (ja) * 2019-06-18 2023-01-27 キヤノン株式会社 露光装置、および物品製造方法
JP7512131B2 (ja) * 2020-08-27 2024-07-08 キヤノン株式会社 露光装置、及び物品の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0719058B2 (ja) 1984-08-21 1995-03-06 ソニー株式会社 パタ−ン形成方法及び露光装置
JPS61213814A (ja) * 1985-03-20 1986-09-22 Hitachi Ltd 投影露光装置
JPH01195445A (ja) 1988-01-29 1989-08-07 Matsushita Electric Ind Co Ltd レジストの露光方法
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置
JPH1187230A (ja) * 1997-09-01 1999-03-30 Canon Inc 露光装置およびデバイス製造方法
US6690450B2 (en) * 2000-01-31 2004-02-10 Nikon Corporation Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device
JP2003257822A (ja) * 2002-02-28 2003-09-12 Nikon Corp 光学装置及び露光装置
US20050175497A1 (en) * 2002-08-29 2005-08-11 Nikon Corporation Temperature control method and apparatus and exposure method and apparatus
KR100934830B1 (ko) * 2002-12-16 2009-12-31 엘지디스플레이 주식회사 플라스틱 기판을 사용한 액정표시장치의 제작방법 및 이에사용되는 플라스틱 기판 고정방법
JP2004281854A (ja) * 2003-03-18 2004-10-07 Canon Inc 露光装置
JP2005142185A (ja) * 2003-11-04 2005-06-02 Canon Inc 露光装置及びその環境制御方法
JP5448724B2 (ja) 2009-10-29 2014-03-19 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5936328B2 (ja) * 2010-10-22 2016-06-22 キヤノン株式会社 露光装置およびデバイス製造方法
JP6099969B2 (ja) * 2012-12-27 2017-03-22 キヤノン株式会社 露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
KR20140085320A (ko) 2014-07-07
JP6099969B2 (ja) 2017-03-22
US9250541B2 (en) 2016-02-02
JP2014126748A (ja) 2014-07-07
US20140185026A1 (en) 2014-07-03

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