KR101692065B1 - 미세패턴롤을 제조하는 방법 및 장치 - Google Patents

미세패턴롤을 제조하는 방법 및 장치 Download PDF

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Publication number
KR101692065B1
KR101692065B1 KR1020160070437A KR20160070437A KR101692065B1 KR 101692065 B1 KR101692065 B1 KR 101692065B1 KR 1020160070437 A KR1020160070437 A KR 1020160070437A KR 20160070437 A KR20160070437 A KR 20160070437A KR 101692065 B1 KR101692065 B1 KR 101692065B1
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KR
South Korea
Prior art keywords
roll
sheet
pattern
clithe
tension control
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KR1020160070437A
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English (en)
Korean (ko)
Inventor
권신
강동우
우규희
장윤석
이승현
이택민
Original Assignee
한국기계연구원
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Application filed by 한국기계연구원 filed Critical 한국기계연구원
Priority to KR1020160070437A priority Critical patent/KR101692065B1/ko
Application granted granted Critical
Publication of KR101692065B1 publication Critical patent/KR101692065B1/ko
Priority to PCT/KR2017/005579 priority patent/WO2017213370A1/fr

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/44—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
    • H01L21/447—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428 involving the application of pressure, e.g. thermo-compression bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93—Batch processes
    • H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/951—Supplying the plurality of semiconductor or solid-state bodies
    • H01L2224/95115—Supplying the plurality of semiconductor or solid-state bodies using a roll-to-roll transfer technique

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020160070437A 2016-06-07 2016-06-07 미세패턴롤을 제조하는 방법 및 장치 KR101692065B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020160070437A KR101692065B1 (ko) 2016-06-07 2016-06-07 미세패턴롤을 제조하는 방법 및 장치
PCT/KR2017/005579 WO2017213370A1 (fr) 2016-06-07 2017-05-29 Procédé de fabrication de rouleau à micromotif et dispositif de préparation de rouleau à micromotif associé

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160070437A KR101692065B1 (ko) 2016-06-07 2016-06-07 미세패턴롤을 제조하는 방법 및 장치

Publications (1)

Publication Number Publication Date
KR101692065B1 true KR101692065B1 (ko) 2017-01-03

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ID=57797058

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160070437A KR101692065B1 (ko) 2016-06-07 2016-06-07 미세패턴롤을 제조하는 방법 및 장치

Country Status (2)

Country Link
KR (1) KR101692065B1 (fr)
WO (1) WO2017213370A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200024565A (ko) * 2018-08-28 2020-03-09 건국대학교 산학협력단 롤투롤을 활용한 플렉시블 대면적 온도 센서 제작 시스템
KR20210000992A (ko) 2019-06-26 2021-01-07 한국기계연구원 실시간 장력제어를 이용한 미세패턴 롤 제작시스템, 및 이를 이용한 미세패턴 롤 제작방법
KR20210000991A (ko) 2019-06-26 2021-01-07 한국기계연구원 실시간 정렬이 가능한 미세패턴 롤 제작시스템, 및 이를 이용한 미세패턴 롤 제작방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100937211B1 (ko) * 2009-05-15 2010-01-20 한국기계연구원 롤 임프린트 장치
KR101024376B1 (ko) 2008-06-09 2011-03-23 한국기계연구원 미세 패턴 형성 방법
KR101037903B1 (ko) * 2010-12-09 2011-05-30 한국기계연구원 롤프린팅/롤임프린팅용 롤 제조방법
KR20130135198A (ko) * 2012-05-31 2013-12-10 주식회사 엘지화학 클리쉐 및 이를 포함하는 인쇄 장치
KR101408741B1 (ko) * 2013-04-30 2014-06-18 (주)새한나노텍 임프린트 장치

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101590102B1 (ko) * 2009-05-07 2016-01-29 삼성전자 주식회사 롤투롤 패터닝 장치 및 이를 갖춘 패터닝 시스템

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101024376B1 (ko) 2008-06-09 2011-03-23 한국기계연구원 미세 패턴 형성 방법
KR100937211B1 (ko) * 2009-05-15 2010-01-20 한국기계연구원 롤 임프린트 장치
KR101037903B1 (ko) * 2010-12-09 2011-05-30 한국기계연구원 롤프린팅/롤임프린팅용 롤 제조방법
KR20130135198A (ko) * 2012-05-31 2013-12-10 주식회사 엘지화학 클리쉐 및 이를 포함하는 인쇄 장치
KR101408741B1 (ko) * 2013-04-30 2014-06-18 (주)새한나노텍 임프린트 장치

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200024565A (ko) * 2018-08-28 2020-03-09 건국대학교 산학협력단 롤투롤을 활용한 플렉시블 대면적 온도 센서 제작 시스템
KR20210000992A (ko) 2019-06-26 2021-01-07 한국기계연구원 실시간 장력제어를 이용한 미세패턴 롤 제작시스템, 및 이를 이용한 미세패턴 롤 제작방법
KR20210000991A (ko) 2019-06-26 2021-01-07 한국기계연구원 실시간 정렬이 가능한 미세패턴 롤 제작시스템, 및 이를 이용한 미세패턴 롤 제작방법
KR102267473B1 (ko) * 2019-06-26 2021-06-22 한국기계연구원 실시간 장력제어를 이용한 미세패턴 롤 제작시스템, 및 이를 이용한 미세패턴 롤 제작방법
KR102384120B1 (ko) * 2019-06-26 2022-04-07 한국기계연구원 실시간 정렬이 가능한 미세패턴 롤 제작시스템, 및 이를 이용한 미세패턴 롤 제작방법

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Publication number Publication date
WO2017213370A1 (fr) 2017-12-14

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