KR101649106B1 - 정전기 렌즈 구조 - Google Patents

정전기 렌즈 구조 Download PDF

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Publication number
KR101649106B1
KR101649106B1 KR1020117009983A KR20117009983A KR101649106B1 KR 101649106 B1 KR101649106 B1 KR 101649106B1 KR 1020117009983 A KR1020117009983 A KR 1020117009983A KR 20117009983 A KR20117009983 A KR 20117009983A KR 101649106 B1 KR101649106 B1 KR 101649106B1
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KR
South Korea
Prior art keywords
conductive plate
electrostatic lens
insulating structure
insulating
plate
Prior art date
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KR1020117009983A
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English (en)
Korean (ko)
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KR20110081253A (ko
Inventor
스틴 윌렘 헤르만 캐렐 스틴브링크
요한 요스트 코닝
피터 벨트만
Original Assignee
마퍼 리쏘그라피 아이피 비.브이.
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Publication of KR20110081253A publication Critical patent/KR20110081253A/ko
Application granted granted Critical
Publication of KR101649106B1 publication Critical patent/KR101649106B1/ko
Assigned to 에이에스엠엘 네델란즈 비.브이. reassignment 에이에스엠엘 네델란즈 비.브이. 권리의 전부이전등록 Assignors: 마퍼 리쏘그라피 아이피 비.브이.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Shutters For Cameras (AREA)
KR1020117009983A 2008-10-01 2009-10-01 정전기 렌즈 구조 Active KR101649106B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10168208P 2008-10-01 2008-10-01
US61/101,682 2008-10-01

Publications (2)

Publication Number Publication Date
KR20110081253A KR20110081253A (ko) 2011-07-13
KR101649106B1 true KR101649106B1 (ko) 2016-08-19

Family

ID=41466906

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117009983A Active KR101649106B1 (ko) 2008-10-01 2009-10-01 정전기 렌즈 구조

Country Status (7)

Country Link
US (3) US8198602B2 (https=)
EP (1) EP2406810B1 (https=)
JP (1) JP5420670B2 (https=)
KR (1) KR101649106B1 (https=)
CN (1) CN102232237B (https=)
TW (1) TWI479530B (https=)
WO (1) WO2010037832A2 (https=)

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Also Published As

Publication number Publication date
CN102232237A (zh) 2011-11-02
WO2010037832A4 (en) 2010-08-12
US20170309438A1 (en) 2017-10-26
US20110216299A1 (en) 2011-09-08
TW201032258A (en) 2010-09-01
JP2012504843A (ja) 2012-02-23
WO2010037832A3 (en) 2010-06-10
KR20110081253A (ko) 2011-07-13
US8198602B2 (en) 2012-06-12
EP2406810B1 (en) 2014-09-17
USRE46452E1 (en) 2017-06-27
TWI479530B (zh) 2015-04-01
CN102232237B (zh) 2014-09-24
WO2010037832A2 (en) 2010-04-08
JP5420670B2 (ja) 2014-02-19
EP2406810A2 (en) 2012-01-18

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