KR101596063B1 - 현상 처리 장치 및 현상 처리 방법 - Google Patents

현상 처리 장치 및 현상 처리 방법 Download PDF

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Publication number
KR101596063B1
KR101596063B1 KR1020110014687A KR20110014687A KR101596063B1 KR 101596063 B1 KR101596063 B1 KR 101596063B1 KR 1020110014687 A KR1020110014687 A KR 1020110014687A KR 20110014687 A KR20110014687 A KR 20110014687A KR 101596063 B1 KR101596063 B1 KR 101596063B1
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KR
South Korea
Prior art keywords
substrate
liquid
suction
hole
liquid supply
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KR1020110014687A
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English (en)
Korean (ko)
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KR20110096493A (ko
Inventor
히데오 후나코시
미츠아키 마루야마
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도쿄엘렉트론가부시키가이샤
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Publication of KR20110096493A publication Critical patent/KR20110096493A/ko
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Publication of KR101596063B1 publication Critical patent/KR101596063B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020110014687A 2010-02-22 2011-02-18 현상 처리 장치 및 현상 처리 방법 KR101596063B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010036174 2010-02-22
JPJP-P-2010-036174 2010-02-22
JPJP-P-2011-016209 2011-01-28
JP2011016209A JP5457381B2 (ja) 2010-02-22 2011-01-28 現像処理装置及び現像処理方法

Publications (2)

Publication Number Publication Date
KR20110096493A KR20110096493A (ko) 2011-08-30
KR101596063B1 true KR101596063B1 (ko) 2016-02-19

Family

ID=44650282

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110014687A KR101596063B1 (ko) 2010-02-22 2011-02-18 현상 처리 장치 및 현상 처리 방법

Country Status (3)

Country Link
JP (1) JP5457381B2 (ja)
KR (1) KR101596063B1 (ja)
DE (1) DE102011011972A1 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005251908A (ja) 2004-03-03 2005-09-15 Tokyo Electron Ltd 現像処理装置
JP2006222460A (ja) 2006-05-10 2006-08-24 Tokyo Electron Ltd 液処理装置
JP2008177436A (ja) 2007-01-19 2008-07-31 Tokyo Electron Ltd 現像処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06342752A (ja) * 1993-05-31 1994-12-13 Sigma Merutetsuku Kk 角型基板の回転処理装置
JP2006013228A (ja) * 2004-06-28 2006-01-12 Toshiba Corp 基板処理方法及び基板処理装置
JP5355951B2 (ja) * 2008-07-24 2013-11-27 東京エレクトロン株式会社 液処理装置
JP2010036174A (ja) 2008-08-08 2010-02-18 Hitachi Ltd 淡水化装置、及び油濁水再利用システム

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005251908A (ja) 2004-03-03 2005-09-15 Tokyo Electron Ltd 現像処理装置
JP2006222460A (ja) 2006-05-10 2006-08-24 Tokyo Electron Ltd 液処理装置
JP2008177436A (ja) 2007-01-19 2008-07-31 Tokyo Electron Ltd 現像処理装置

Also Published As

Publication number Publication date
JP2011192969A (ja) 2011-09-29
JP5457381B2 (ja) 2014-04-02
DE102011011972A1 (de) 2011-10-06
KR20110096493A (ko) 2011-08-30

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