KR101556430B1 - 간섭 결함 검출 및 분류 - Google Patents
간섭 결함 검출 및 분류 Download PDFInfo
- Publication number
- KR101556430B1 KR101556430B1 KR1020117000031A KR20117000031A KR101556430B1 KR 101556430 B1 KR101556430 B1 KR 101556430B1 KR 1020117000031 A KR1020117000031 A KR 1020117000031A KR 20117000031 A KR20117000031 A KR 20117000031A KR 101556430 B1 KR101556430 B1 KR 101556430B1
- Authority
- KR
- South Korea
- Prior art keywords
- sample
- phase
- defect
- signal
- light
- Prior art date
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
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- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13072908P | 2008-06-03 | 2008-06-03 | |
US61/130,729 | 2008-06-03 | ||
US13561608P | 2008-07-22 | 2008-07-22 | |
US61/135,616 | 2008-07-22 | ||
US12/190,144 US7864334B2 (en) | 2008-06-03 | 2008-08-12 | Interferometric defect detection |
US12/190,144 | 2008-08-12 | ||
US18951008P | 2008-08-20 | 2008-08-20 | |
US18950908P | 2008-08-20 | 2008-08-20 | |
US18950808P | 2008-08-20 | 2008-08-20 | |
US61/189,509 | 2008-08-20 | ||
US61/189,508 | 2008-08-20 | ||
US61/189,510 | 2008-08-20 | ||
US21051309P | 2009-03-19 | 2009-03-19 | |
US61/210,513 | 2009-03-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20110031306A KR20110031306A (ko) | 2011-03-25 |
KR101556430B1 true KR101556430B1 (ko) | 2015-10-01 |
Family
ID=41398482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020117000031A KR101556430B1 (ko) | 2008-06-03 | 2009-06-02 | 간섭 결함 검출 및 분류 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2286175A4 (fr) |
JP (1) | JP5444334B2 (fr) |
KR (1) | KR101556430B1 (fr) |
CN (1) | CN102089616B (fr) |
WO (1) | WO2009149103A1 (fr) |
Families Citing this family (61)
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TWI421469B (zh) * | 2010-03-10 | 2014-01-01 | Ind Tech Res Inst | 表面量測裝置及其之量測方法及校正方法 |
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CN103635857B (zh) * | 2011-07-25 | 2017-12-15 | 西铁城时计株式会社 | 光学器件、投影机、制造方法 |
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US9503606B2 (en) | 2011-09-28 | 2016-11-22 | Semiconductor Components Industries, Llc | Time-delay-and-integrate image sensors having variable integration times |
WO2013172103A1 (fr) * | 2012-05-16 | 2013-11-21 | 株式会社 日立ハイテクノロジーズ | Dispositif de contrôle |
JP6025419B2 (ja) | 2012-06-27 | 2016-11-16 | 株式会社ニューフレアテクノロジー | 検査方法および検査装置 |
KR101354729B1 (ko) * | 2012-08-23 | 2014-01-27 | 앰코 테크놀로지 코리아 주식회사 | 반도체 디바이스의 오정렬 값 측정 방법 및 이것이 적용된 반도체 디바이스 |
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US9995850B2 (en) | 2013-06-06 | 2018-06-12 | Kla-Tencor Corporation | System, method and apparatus for polarization control |
US9189705B2 (en) * | 2013-08-08 | 2015-11-17 | JSMSW Technology LLC | Phase-controlled model-based overlay measurement systems and methods |
JP6316068B2 (ja) | 2014-03-31 | 2018-04-25 | 国立大学法人 東京大学 | 検査システムおよび検査方法 |
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JP6469833B2 (ja) * | 2014-07-14 | 2019-02-13 | ザイゴ コーポレーションZygo Corporation | スペクトルを用いた干渉計エンコーダ |
JP5843179B1 (ja) * | 2014-09-19 | 2016-01-13 | レーザーテック株式会社 | 検査装置、及び波面収差補正方法 |
CN104297744B (zh) * | 2014-10-16 | 2016-12-07 | 西安理工大学 | 偏振激光雷达的偏振标定与补偿装置及标定与补偿方法 |
WO2016084239A1 (fr) * | 2014-11-28 | 2016-06-02 | 株式会社東京精密 | Dispositif de mesure d'interférence à deux couleurs |
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US10234402B2 (en) * | 2017-01-05 | 2019-03-19 | Kla-Tencor Corporation | Systems and methods for defect material classification |
WO2018219639A1 (fr) * | 2017-06-02 | 2018-12-06 | Asml Netherlands B.V. | Appareil de mesure |
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WO2019239618A1 (fr) * | 2018-06-11 | 2019-12-19 | 株式会社島津製作所 | Procédé et dispositif de détection de défaut |
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US10816464B2 (en) * | 2019-01-23 | 2020-10-27 | Applied Materials, Inc. | Imaging reflectometer |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US7428057B2 (en) | 2005-01-20 | 2008-09-23 | Zygo Corporation | Interferometer for determining characteristics of an object surface, including processing and calibration |
US7864334B2 (en) | 2008-06-03 | 2011-01-04 | Jzw Llc | Interferometric defect detection |
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JP2005003689A (ja) * | 1994-10-07 | 2005-01-06 | Renesas Technology Corp | 被検査対象物上のパターンの欠陥検査方法及びその装置 |
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JPH09281051A (ja) * | 1996-04-17 | 1997-10-31 | Nikon Corp | 検査装置 |
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JP3881125B2 (ja) * | 1999-02-17 | 2007-02-14 | レーザーテック株式会社 | 段差測定装置並びにこの段差測定装置を用いたエッチングモニタ装置及びエッチング方法 |
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2009
- 2009-06-02 JP JP2011512587A patent/JP5444334B2/ja not_active Expired - Fee Related
- 2009-06-02 CN CN200980121352.XA patent/CN102089616B/zh not_active Expired - Fee Related
- 2009-06-02 KR KR1020117000031A patent/KR101556430B1/ko not_active IP Right Cessation
- 2009-06-02 WO PCT/US2009/045999 patent/WO2009149103A1/fr active Application Filing
- 2009-06-02 EP EP09759262.0A patent/EP2286175A4/fr not_active Withdrawn
Patent Citations (4)
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US7428057B2 (en) | 2005-01-20 | 2008-09-23 | Zygo Corporation | Interferometer for determining characteristics of an object surface, including processing and calibration |
US7446882B2 (en) | 2005-01-20 | 2008-11-04 | Zygo Corporation | Interferometer for determining characteristics of an object surface |
US7616323B2 (en) | 2005-01-20 | 2009-11-10 | Zygo Corporation | Interferometer with multiple modes of operation for determining characteristics of an object surface |
US7864334B2 (en) | 2008-06-03 | 2011-01-04 | Jzw Llc | Interferometric defect detection |
Also Published As
Publication number | Publication date |
---|---|
JP5444334B2 (ja) | 2014-03-19 |
CN102089616B (zh) | 2013-03-13 |
JP2011523711A (ja) | 2011-08-18 |
EP2286175A4 (fr) | 2017-04-12 |
KR20110031306A (ko) | 2011-03-25 |
CN102089616A (zh) | 2011-06-08 |
EP2286175A1 (fr) | 2011-02-23 |
WO2009149103A1 (fr) | 2009-12-10 |
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