CN103018202B - 一种集成电路缺陷的光学检测方法和装置 - Google Patents
一种集成电路缺陷的光学检测方法和装置 Download PDFInfo
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- CN103018202B CN103018202B CN201110283462.5A CN201110283462A CN103018202B CN 103018202 B CN103018202 B CN 103018202B CN 201110283462 A CN201110283462 A CN 201110283462A CN 103018202 B CN103018202 B CN 103018202B
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- 230000007547 defect Effects 0.000 title claims abstract description 165
- 238000001514 detection method Methods 0.000 title claims abstract description 49
- 230000003287 optical effect Effects 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 32
- 101100117236 Drosophila melanogaster speck gene Proteins 0.000 claims description 14
- 238000009826 distribution Methods 0.000 claims description 14
- 230000001105 regulatory effect Effects 0.000 claims description 10
- 238000003384 imaging method Methods 0.000 description 20
- 238000005516 engineering process Methods 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000011160 research Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
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- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- 231100000719 pollutant Toxicity 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/50—Optics for phase object visualisation
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
Claims (10)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110283462.5A CN103018202B (zh) | 2011-09-22 | 2011-09-22 | 一种集成电路缺陷的光学检测方法和装置 |
PCT/CN2012/077087 WO2013040918A1 (zh) | 2011-09-22 | 2012-06-18 | 一种集成电路缺陷的光学检测方法和装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110283462.5A CN103018202B (zh) | 2011-09-22 | 2011-09-22 | 一种集成电路缺陷的光学检测方法和装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103018202A CN103018202A (zh) | 2013-04-03 |
CN103018202B true CN103018202B (zh) | 2014-10-01 |
Family
ID=47913838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110283462.5A Active CN103018202B (zh) | 2011-09-22 | 2011-09-22 | 一种集成电路缺陷的光学检测方法和装置 |
Country Status (2)
Country | Link |
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CN (1) | CN103018202B (zh) |
WO (1) | WO2013040918A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103646895B (zh) * | 2013-11-29 | 2016-05-04 | 上海华力微电子有限公司 | 检测缺陷扫描程式灵敏度的方法 |
CN110501817B (zh) * | 2019-09-05 | 2021-07-13 | 上海理工大学 | 产生时空涡旋光场的方法及时空涡旋光场的检测方法 |
CN111103757A (zh) * | 2020-01-09 | 2020-05-05 | 中国科学院微电子研究所 | Euv掩模缺陷检测系统及方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5883714A (en) * | 1996-10-07 | 1999-03-16 | Phase Metrics | Method and apparatus for detecting defects on a disk using interferometric analysis on reflected light |
CN1662811A (zh) * | 2002-05-07 | 2005-08-31 | 应用材料股份有限公司 | 双光点相敏的检测 |
CN1838396A (zh) * | 2005-03-23 | 2006-09-27 | 株式会社东芝 | 基板检查方法、半导体器件的制造方法以及基板检查装置 |
AU2009202140A1 (en) * | 2009-05-29 | 2010-12-16 | Canon Kabushiki Kaisha | Spiral phase optical aberration measurements |
CN102089616A (zh) * | 2008-06-03 | 2011-06-08 | 焕·J·郑 | 干涉缺陷检测和分类 |
CN102192896A (zh) * | 2010-01-28 | 2011-09-21 | 松下电器产业株式会社 | 光干涉测量方法及光干涉测量装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3314440B2 (ja) * | 1993-02-26 | 2002-08-12 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JPH0755702A (ja) * | 1993-08-12 | 1995-03-03 | Hitachi Ltd | 結晶欠陥計測装置及びそれを用いた半導体製造装置 |
JPH07297248A (ja) * | 1994-04-20 | 1995-11-10 | Hitachi Ltd | 結晶欠陥計測装置および半導体装置の製造方法 |
JPH08304296A (ja) * | 1995-03-08 | 1996-11-22 | Hitachi Ltd | 異物等の欠陥検出方法およびそれを実行する装置 |
JPH08327557A (ja) * | 1995-06-02 | 1996-12-13 | Nikon Corp | 欠陥検査装置及び方法 |
WO2006072581A1 (en) * | 2005-01-10 | 2006-07-13 | Medizinische Universität Innsbruck | Spiral phase contrast imaging in microscopy |
JP4724833B2 (ja) * | 2006-02-27 | 2011-07-13 | 国立大学法人 東京大学 | 高解像検出装置及び方法 |
CN102116745A (zh) * | 2009-12-30 | 2011-07-06 | 上海允科自动化有限公司 | 一种ic元件检测系统 |
-
2011
- 2011-09-22 CN CN201110283462.5A patent/CN103018202B/zh active Active
-
2012
- 2012-06-18 WO PCT/CN2012/077087 patent/WO2013040918A1/zh active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5883714A (en) * | 1996-10-07 | 1999-03-16 | Phase Metrics | Method and apparatus for detecting defects on a disk using interferometric analysis on reflected light |
CN1662811A (zh) * | 2002-05-07 | 2005-08-31 | 应用材料股份有限公司 | 双光点相敏的检测 |
CN1838396A (zh) * | 2005-03-23 | 2006-09-27 | 株式会社东芝 | 基板检查方法、半导体器件的制造方法以及基板检查装置 |
CN102089616A (zh) * | 2008-06-03 | 2011-06-08 | 焕·J·郑 | 干涉缺陷检测和分类 |
AU2009202140A1 (en) * | 2009-05-29 | 2010-12-16 | Canon Kabushiki Kaisha | Spiral phase optical aberration measurements |
CN102192896A (zh) * | 2010-01-28 | 2011-09-21 | 松下电器产业株式会社 | 光干涉测量方法及光干涉测量装置 |
Non-Patent Citations (3)
Title |
---|
JP特开2007-225563A 2007.09.06 |
JP特开平7-297248A 1995.11.10 |
JP特开平7-55702A 1995.03.03 |
Also Published As
Publication number | Publication date |
---|---|
WO2013040918A1 (zh) | 2013-03-28 |
CN103018202A (zh) | 2013-04-03 |
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Owner name: SHENZHEN ZHONGKE FEICE TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: INST OF MICROELECTRONICS, C. A. S Effective date: 20150323 |
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Effective date of registration: 20150323 Address after: 518040, No. 3, 8 floor, south of the Five Ridges building, 3085 Shannon Road, Xiangmi Lake street, Shenzhen, Guangdong, Futian District Patentee after: Institute of Microelectronics of Chinese Academy of Sciences Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
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Address after: 518000 Guangdong city of Shenzhen province Longhua District, Dalang Street Wave Industrial Park Road No. 1 A District Office kohodo Plaza, room 1618 Patentee after: Institute of Microelectronics of Chinese Academy of Sciences Address before: 518040, No. 3, 8 floor, south of the Five Ridges building, 3085 Shannon Road, Xiangmi Lake street, Shenzhen, Guangdong, Futian District Patentee before: Institute of Microelectronics of Chinese Academy of Sciences |
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Address after: 518109 101, 201, 301, No.2, Shanghenglang fourth industrial zone, Tongsheng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province Patentee after: Shenzhen Zhongke feice Technology Co.,Ltd. Address before: Room 1618, area a, kaihaoda Plaza office, No.1, Dalang Industrial Park Road, Dalang street, Longhua District, Shenzhen, Guangdong 518000 Patentee before: Shenzhen Zhongke Flying Test Technology Co.,Ltd. |
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