KR101531143B1 - 전사 방법 및 열 나노임프린트 장치 - Google Patents

전사 방법 및 열 나노임프린트 장치 Download PDF

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Publication number
KR101531143B1
KR101531143B1 KR1020147029872A KR20147029872A KR101531143B1 KR 101531143 B1 KR101531143 B1 KR 101531143B1 KR 1020147029872 A KR1020147029872 A KR 1020147029872A KR 20147029872 A KR20147029872 A KR 20147029872A KR 101531143 B1 KR101531143 B1 KR 101531143B1
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KR
South Korea
Prior art keywords
film
processed
fine pattern
mask layer
pattern formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020147029872A
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English (en)
Korean (ko)
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KR20140144716A (ko
Inventor
나오키 호소미
준 고이케
후지토 야마구치
Original Assignee
아사히 가세이 이-매터리얼즈 가부시키가이샤
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Publication of KR20140144716A publication Critical patent/KR20140144716A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/08—Polymers of acrylic acid esters, e.g. PMA, i.e. polymethylacrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0005—Condition, form or state of moulded material or of the material to be shaped containing compounding ingredients
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24628—Nonplanar uniform thickness material

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
  • Drying Of Semiconductors (AREA)
KR1020147029872A 2012-05-08 2013-04-30 전사 방법 및 열 나노임프린트 장치 Expired - Fee Related KR101531143B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2012106937 2012-05-08
JPJP-P-2012-106937 2012-05-08
JP2012135005 2012-06-14
JPJP-P-2012-135005 2012-06-14
PCT/JP2013/062590 WO2013168634A1 (ja) 2012-05-08 2013-04-30 転写方法及び熱ナノインプリント装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020157007666A Division KR101881200B1 (ko) 2012-05-08 2013-04-30 전사 방법 및 열 나노임프린트 장치

Publications (2)

Publication Number Publication Date
KR20140144716A KR20140144716A (ko) 2014-12-19
KR101531143B1 true KR101531143B1 (ko) 2015-06-23

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Family Applications (2)

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KR1020157007666A Expired - Fee Related KR101881200B1 (ko) 2012-05-08 2013-04-30 전사 방법 및 열 나노임프린트 장치
KR1020147029872A Expired - Fee Related KR101531143B1 (ko) 2012-05-08 2013-04-30 전사 방법 및 열 나노임프린트 장치

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Country Status (9)

Country Link
US (1) US20150111005A1 (enExample)
EP (2) EP2848391B1 (enExample)
JP (2) JP5560377B2 (enExample)
KR (2) KR101881200B1 (enExample)
CN (2) CN104865792A (enExample)
IN (1) IN2014MN02313A (enExample)
MY (1) MY171653A (enExample)
TW (2) TWI598211B (enExample)
WO (1) WO2013168634A1 (enExample)

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JP6441036B2 (ja) * 2014-11-13 2018-12-19 旭化成株式会社 転写方法
TWI696108B (zh) * 2015-02-13 2020-06-11 日商半導體能源研究所股份有限公司 功能面板、功能模組、發光模組、顯示模組、位置資料輸入模組、發光裝置、照明設備、顯示裝置、資料處理裝置、功能面板的製造方法
JP6637243B2 (ja) * 2015-03-09 2020-01-29 デクセリアルズ株式会社 防曇防汚積層体、及びその製造方法、物品、及びその製造方法、並びに防汚方法
US10471646B2 (en) * 2015-05-19 2019-11-12 The University Of Massachusetts Methods and system for mass production, volume manufacturing of re-entrant structures
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TWI656965B (zh) * 2016-04-20 2019-04-21 奇景光電股份有限公司 壓印設備及壓印方法
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KR101816838B1 (ko) * 2016-07-08 2018-01-09 주식회사 기가레인 나노 임프린트용 레플리카 몰드, 그 제조방법 및 나노 임프린트용 레플리카 몰드 제조장치
TWI672212B (zh) * 2016-08-25 2019-09-21 國立成功大學 奈米壓印組合體及其壓印方法
KR102743032B1 (ko) * 2016-10-14 2024-12-17 삼성디스플레이 주식회사 임프린트용 가압 롤러 및 이를 이용한 임프린트 방법
JP6837352B2 (ja) * 2017-02-28 2021-03-03 芝浦機械株式会社 転写装置および転写方法
KR20180105433A (ko) * 2017-03-15 2018-09-28 주식회사 기가레인 임프린트 장치 및 임프린트 방법
US12242184B2 (en) * 2017-03-16 2025-03-04 Universite D'aix-Marseille Nanoimprint lithography process and patterned substrate obtainable therefrom
US11571841B2 (en) * 2017-05-08 2023-02-07 Ykk Corporation Plastic molded product
CN108987573B (zh) * 2017-06-05 2020-01-24 Tcl集团股份有限公司 量子点薄膜的转印方法
CN109808319B (zh) * 2017-11-20 2020-09-22 Tcl科技集团股份有限公司 一种印章及其制备方法与量子点转印方法
JP7104577B2 (ja) * 2018-07-06 2022-07-21 キヤノン株式会社 平坦化層形成装置、平坦化層の製造方法、および物品製造方法
JP7196820B2 (ja) * 2019-11-11 2022-12-27 豊田合成株式会社 ホットスタンプ装置
US20220339825A1 (en) * 2019-12-02 2022-10-27 Ev Group E. Thallner Gmbh Method and device for detaching a stamp
US11728199B2 (en) * 2019-12-23 2023-08-15 Asmpt Nexx, Inc. Substrate support features and method of application
TWI889807B (zh) * 2020-05-01 2025-07-11 日商東京威力科創股份有限公司 圖案形成方法及圖案形成系統
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Also Published As

Publication number Publication date
KR20140144716A (ko) 2014-12-19
CN104271332A (zh) 2015-01-07
JP5560377B2 (ja) 2014-07-23
US20150111005A1 (en) 2015-04-23
JPWO2013168634A1 (ja) 2016-01-07
CN104865792A (zh) 2015-08-26
JP2014187376A (ja) 2014-10-02
IN2014MN02313A (enExample) 2015-08-07
EP2979845A1 (en) 2016-02-03
EP2848391A1 (en) 2015-03-18
TW201505818A (zh) 2015-02-16
MY171653A (en) 2019-10-22
KR20150041161A (ko) 2015-04-15
WO2013168634A8 (ja) 2014-01-16
EP2848391B1 (en) 2018-09-19
CN104271332B (zh) 2016-04-13
TW201408469A (zh) 2014-03-01
JP6162640B2 (ja) 2017-07-12
KR101881200B1 (ko) 2018-07-24
WO2013168634A1 (ja) 2013-11-14
EP2848391A4 (en) 2015-04-29
TWI598211B (zh) 2017-09-11
TWI495558B (zh) 2015-08-11

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