KR101494414B1 - 반도체패키지, 반도체패키지유닛 및 반도체패키지 제조방법 - Google Patents
반도체패키지, 반도체패키지유닛 및 반도체패키지 제조방법 Download PDFInfo
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- KR101494414B1 KR101494414B1 KR20130030322A KR20130030322A KR101494414B1 KR 101494414 B1 KR101494414 B1 KR 101494414B1 KR 20130030322 A KR20130030322 A KR 20130030322A KR 20130030322 A KR20130030322 A KR 20130030322A KR 101494414 B1 KR101494414 B1 KR 101494414B1
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- semiconductor chip
- semiconductor
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- external terminal
- rewiring pattern
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130030322A KR101494414B1 (ko) | 2013-03-21 | 2013-03-21 | 반도체패키지, 반도체패키지유닛 및 반도체패키지 제조방법 |
TW103103431A TWI518874B (zh) | 2013-03-21 | 2014-01-29 | 半導體封裝、半導體封裝單元以及半導體封裝製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR20130030322A KR101494414B1 (ko) | 2013-03-21 | 2013-03-21 | 반도체패키지, 반도체패키지유닛 및 반도체패키지 제조방법 |
Publications (2)
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KR20140115597A KR20140115597A (ko) | 2014-10-01 |
KR101494414B1 true KR101494414B1 (ko) | 2015-02-17 |
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KR20130030322A KR101494414B1 (ko) | 2013-03-21 | 2013-03-21 | 반도체패키지, 반도체패키지유닛 및 반도체패키지 제조방법 |
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TW (1) | TWI518874B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US10347613B1 (en) | 2017-12-22 | 2019-07-09 | Samsung Electro-Mechanics Co., Ltd. | Fan-out semiconductor package |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6537815B2 (ja) * | 2014-12-11 | 2019-07-03 | 株式会社ジェイデバイス | 半導体パッケージ及びその製造方法 |
JP6637769B2 (ja) * | 2015-03-05 | 2020-01-29 | エイブリック株式会社 | 樹脂封止型半導体装置およびその製造方法 |
KR101872619B1 (ko) * | 2016-11-17 | 2018-06-28 | 삼성전기주식회사 | 팬-아웃 반도체 패키지 |
KR102318329B1 (ko) * | 2019-11-20 | 2021-10-28 | 주식회사 에스에프에이반도체 | 반도체 패키지의 제조방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US20080136004A1 (en) * | 2006-12-08 | 2008-06-12 | Advanced Chip Engineering Technology Inc. | Multi-chip package structure and method of forming the same |
US20090166886A1 (en) * | 2007-12-27 | 2009-07-02 | Kim Youngjoon | Mountable integrated circuit package system with intra-stack encapsulation |
US20090289356A1 (en) * | 2008-05-23 | 2009-11-26 | Stats Chippac, Ltd. | Wirebondless Wafer Level Package with Plated Bumps and Interconnects |
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2013
- 2013-03-21 KR KR20130030322A patent/KR101494414B1/ko active IP Right Grant
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2014
- 2014-01-29 TW TW103103431A patent/TWI518874B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080136004A1 (en) * | 2006-12-08 | 2008-06-12 | Advanced Chip Engineering Technology Inc. | Multi-chip package structure and method of forming the same |
US20090166886A1 (en) * | 2007-12-27 | 2009-07-02 | Kim Youngjoon | Mountable integrated circuit package system with intra-stack encapsulation |
US20090289356A1 (en) * | 2008-05-23 | 2009-11-26 | Stats Chippac, Ltd. | Wirebondless Wafer Level Package with Plated Bumps and Interconnects |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10347613B1 (en) | 2017-12-22 | 2019-07-09 | Samsung Electro-Mechanics Co., Ltd. | Fan-out semiconductor package |
Also Published As
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TWI518874B (zh) | 2016-01-21 |
KR20140115597A (ko) | 2014-10-01 |
TW201445698A (zh) | 2014-12-01 |
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