KR101478892B1 - 알카리 에칭액, 특히 텍스쳐 에칭액의 첨가제 및 그 생산 공정 - Google Patents

알카리 에칭액, 특히 텍스쳐 에칭액의 첨가제 및 그 생산 공정 Download PDF

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KR101478892B1
KR101478892B1 KR1020127028184A KR20127028184A KR101478892B1 KR 101478892 B1 KR101478892 B1 KR 101478892B1 KR 1020127028184 A KR1020127028184 A KR 1020127028184A KR 20127028184 A KR20127028184 A KR 20127028184A KR 101478892 B1 KR101478892 B1 KR 101478892B1
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South Korea
Prior art keywords
phase mixture
single phase
additive
etchant
mixture
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KR1020127028184A
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English (en)
Korean (ko)
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KR20130028730A (ko
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젠스 크루엠베르크
이호 멜닉
미카엘 미켈
미카엘 슈미트
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게페 졸라 게엠베하
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/02—Etching, surface-brightening or pickling compositions containing an alkali metal hydroxide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020127028184A 2010-04-30 2011-04-27 알카리 에칭액, 특히 텍스쳐 에칭액의 첨가제 및 그 생산 공정 KR101478892B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102010019079.9 2010-04-30
DE102010019079A DE102010019079A1 (de) 2010-04-30 2010-04-30 Additiv für alkalische Ätzlösungen, insbesondere für Texturätzlösungen, sowie Verfahren zu dessen Herstellung
PCT/IB2011/000900 WO2011135435A1 (en) 2010-04-30 2011-04-27 Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it

Publications (2)

Publication Number Publication Date
KR20130028730A KR20130028730A (ko) 2013-03-19
KR101478892B1 true KR101478892B1 (ko) 2015-01-05

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KR1020127028184A KR101478892B1 (ko) 2010-04-30 2011-04-27 알카리 에칭액, 특히 텍스쳐 에칭액의 첨가제 및 그 생산 공정

Country Status (7)

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EP (1) EP2470619A1 (zh)
JP (1) JP5632533B2 (zh)
KR (1) KR101478892B1 (zh)
CN (1) CN102695778B (zh)
DE (1) DE102010019079A1 (zh)
TW (1) TWI467054B (zh)
WO (1) WO2011135435A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102877135B (zh) * 2012-09-07 2015-11-25 湖州三峰能源科技有限公司 单晶硅片碱性环保型无醇制绒液的添加剂及其使用方法
TWI506122B (zh) * 2012-09-20 2015-11-01 財團法人工業技術研究院 一種半導體晶片之蝕刻組成物及蝕刻方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5035809A (en) * 1990-10-05 1991-07-30 Eastman Kodak Company Dichloromethane abatement
US20090280597A1 (en) 2008-03-25 2009-11-12 Kapila Wijekoon Surface cleaning and texturing process for crystalline solar cells

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998659A (en) 1974-01-28 1976-12-21 Texas Instruments Incorporated Solar cell with semiconductor particles and method of fabrication
US3909325A (en) * 1974-06-28 1975-09-30 Motorola Inc Polycrystalline etch
US5536439A (en) * 1995-03-13 1996-07-16 Gage Products Company Non-abrasive line cleaning composition
DE19811878C2 (de) * 1998-03-18 2002-09-19 Siemens Solar Gmbh Verfahren und Ätzlösung zum naßchemischen pyramidalen Texturätzen von Siliziumoberflächen
JP2002322578A (ja) * 2001-04-24 2002-11-08 Noritake Co Ltd アルミニウム薄膜のエッチング液およびアルミニウム薄膜パターン形成方法
DE102006051952A1 (de) * 2006-11-01 2008-05-08 Merck Patent Gmbh Partikelhaltige Ätzpasten für Siliziumoberflächen und -schichten
TW200908148A (en) * 2007-03-31 2009-02-16 Advanced Tech Materials Methods for stripping material for wafer reclamation
TW200842970A (en) * 2007-04-26 2008-11-01 Mallinckrodt Baker Inc Polysilicon planarization solution for planarizing low temperature poly-silicon thin filim panels
WO2009067475A1 (en) * 2007-11-19 2009-05-28 Applied Materials, Inc. Crystalline solar cell metallization methods
DE102008056086A1 (de) * 2008-11-06 2010-05-12 Gp Solar Gmbh Additiv für alkalische Ätzlösungen, insbesondere für Texturätzlösungen sowie Verfahren zu dessen Herstellung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5035809A (en) * 1990-10-05 1991-07-30 Eastman Kodak Company Dichloromethane abatement
US20090280597A1 (en) 2008-03-25 2009-11-12 Kapila Wijekoon Surface cleaning and texturing process for crystalline solar cells

Also Published As

Publication number Publication date
CN102695778A (zh) 2012-09-26
JP2013526050A (ja) 2013-06-20
TW201211313A (en) 2012-03-16
DE102010019079A1 (de) 2011-11-03
JP5632533B2 (ja) 2014-11-26
EP2470619A1 (en) 2012-07-04
CN102695778B (zh) 2015-10-21
WO2011135435A1 (en) 2011-11-03
KR20130028730A (ko) 2013-03-19
TWI467054B (zh) 2015-01-01

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