KR101478234B1 - 광촉매 피막의 제조방법 및 광촉매 피막 - Google Patents

광촉매 피막의 제조방법 및 광촉매 피막 Download PDF

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Publication number
KR101478234B1
KR101478234B1 KR1020137004396A KR20137004396A KR101478234B1 KR 101478234 B1 KR101478234 B1 KR 101478234B1 KR 1020137004396 A KR1020137004396 A KR 1020137004396A KR 20137004396 A KR20137004396 A KR 20137004396A KR 101478234 B1 KR101478234 B1 KR 101478234B1
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KR
South Korea
Prior art keywords
photocatalyst
slurry
water
coating film
titanium dioxide
Prior art date
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KR1020137004396A
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English (en)
Korean (ko)
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KR20130045911A (ko
Inventor
히사토 하라가
토모히코 히구치
히데아키 나가요시
히로시 요시나가
요헤이 우메다
타케시 야마사키
테루히사 오노
히로시 모리타
Original Assignee
후지코 가부시키가이샤
고쿠리츠 다이가쿠 호진 큐슈 코교 다이가쿠
코우에키 자이단호진 기타큐슈산교가쿠쥬쓰스이신키코
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Application filed by 후지코 가부시키가이샤, 고쿠리츠 다이가쿠 호진 큐슈 코교 다이가쿠, 코우에키 자이단호진 기타큐슈산교가쿠쥬쓰스이신키코 filed Critical 후지코 가부시키가이샤
Publication of KR20130045911A publication Critical patent/KR20130045911A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/24—Chromium, molybdenum or tungsten
    • B01J23/26—Chromium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74—Iron group metals
    • B01J23/745—Iron
    • B01J35/39—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/349—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of flames, plasmas or lasers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16—Antifouling paints; Underwater paints
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1258—Spray pyrolysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
    • C23C18/127—Preformed particles
KR1020137004396A 2010-08-20 2011-08-19 광촉매 피막의 제조방법 및 광촉매 피막 KR101478234B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010184988 2010-08-20
JPJP-P-2010-184988 2010-08-20
PCT/JP2011/068784 WO2012023612A1 (ja) 2010-08-20 2011-08-19 光触媒皮膜の製造方法及び光触媒皮膜

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KR20130045911A KR20130045911A (ko) 2013-05-06
KR101478234B1 true KR101478234B1 (ko) 2014-12-31

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Country Status (4)

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JP (1) JP5723883B2 (ja)
KR (1) KR101478234B1 (ja)
CN (1) CN103079703B (ja)
WO (1) WO2012023612A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6346947B2 (ja) * 2013-07-05 2018-06-20 日東電工株式会社 汚染物質を分解するためのフィルタエレメント、汚染物質を分解するためのシステムおよび該システムを使用する方法
CN104612369B (zh) * 2014-12-30 2017-05-03 南京信息工程大学 一种抗菌塑木地板的制备方法
JP6696838B2 (ja) * 2016-06-16 2020-05-20 株式会社フジコー 内装材及びその製造方法
CN113332978A (zh) * 2020-03-03 2021-09-03 夏普株式会社 光催化剂涂布剂及喷雾制品
JP7436992B2 (ja) * 2021-11-03 2024-02-22 アンデス電気株式会社 光触媒抗菌脱臭材料、その製造方法、抗菌脱臭材、および抗菌脱臭フィルター

Citations (2)

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Publication number Priority date Publication date Assignee Title
JPH11246787A (ja) * 1997-12-16 1999-09-14 Leben Utility Kk 建材用塗膜、並びに該塗膜を形成するための塗料組成物及び該塗膜の形成方法
JP2009066594A (ja) * 2007-08-17 2009-04-02 Kyushu Institute Of Technology 可視光応答型光触媒皮膜とその製造方法及びそれらを用いた殺菌方法並びに殺菌装置

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Publication number Priority date Publication date Assignee Title
WO1998012048A1 (en) * 1996-09-20 1998-03-26 Hitachi, Ltd. Thin photocatalytic film and articles provided with the same
ES2534892T3 (es) * 1998-07-30 2015-04-30 Toto Ltd. Procedimiento para producir material de alto rendimiento que tiene función fotocatalítica y dispositivo para el mismo
JP2000295955A (ja) * 1999-04-13 2000-10-24 Ryobi Ltd 釣り用容器
CN1235983C (zh) * 2003-04-28 2006-01-11 西安交通大学 一种纳米结构二氧化钛光催化涂层的制备方法
JP2006061886A (ja) * 2004-08-30 2006-03-09 Mitsui Eng & Shipbuild Co Ltd 活水化方法および装置
JP2008093630A (ja) * 2006-10-16 2008-04-24 Sumitomo Chemical Co Ltd 光触媒分散体の製造方法
JP2008194616A (ja) * 2007-02-13 2008-08-28 Fujikoo:Kk 光触媒機能皮膜およびそれを用いた水処理方法
JP2009078264A (ja) * 2007-09-03 2009-04-16 Tetsuto Nakajima 可視光応答型光触媒およびその製造方法
JP5498009B2 (ja) * 2008-10-30 2014-05-21 国立大学法人 東京大学 光触媒材料、有機物分解方法、内装部材、空気清浄装置、酸化剤製造装置
JP4884492B2 (ja) * 2009-03-13 2012-02-29 株式会社フジコー 光触媒機能皮膜の形成方法
JP5390630B2 (ja) * 2009-10-20 2014-01-15 株式会社フジコー フィルター及び空気清浄機

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11246787A (ja) * 1997-12-16 1999-09-14 Leben Utility Kk 建材用塗膜、並びに該塗膜を形成するための塗料組成物及び該塗膜の形成方法
JP2009066594A (ja) * 2007-08-17 2009-04-02 Kyushu Institute Of Technology 可視光応答型光触媒皮膜とその製造方法及びそれらを用いた殺菌方法並びに殺菌装置

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JPWO2012023612A1 (ja) 2013-10-28
CN103079703A (zh) 2013-05-01
JP5723883B2 (ja) 2015-05-27
KR20130045911A (ko) 2013-05-06
WO2012023612A1 (ja) 2012-02-23
CN103079703B (zh) 2015-12-16

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