KR101446619B1 - 현상액의 농도 조절 방법과 제조 장치 및 현상액 - Google Patents

현상액의 농도 조절 방법과 제조 장치 및 현상액 Download PDF

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Publication number
KR101446619B1
KR101446619B1 KR1020097007043A KR20097007043A KR101446619B1 KR 101446619 B1 KR101446619 B1 KR 101446619B1 KR 1020097007043 A KR1020097007043 A KR 1020097007043A KR 20097007043 A KR20097007043 A KR 20097007043A KR 101446619 B1 KR101446619 B1 KR 101446619B1
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South Korea
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concentration
developer
alkali
carbonate
developing
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KR1020097007043A
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English (en)
Korean (ko)
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KR20090094217A (ko
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노리히로 타카사키
켄지 스기모토
료타 타나하시
요시후미 반도
아츠코 노야
카츠토 타니구치
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미츠비시 가가쿠 엔지니어링 가부시키가이샤
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Publication of KR20090094217A publication Critical patent/KR20090094217A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020097007043A 2006-11-30 2007-11-29 현상액의 농도 조절 방법과 제조 장치 및 현상액 KR101446619B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2006-322814 2006-11-30
JP2006322814 2006-11-30
JP2007106188 2007-04-13
JPJP-P-2007-106188 2007-04-13
PCT/JP2007/001319 WO2008065755A1 (fr) 2006-11-30 2007-11-29 Procédé de régulation d'une concentration de solution de développement, appareil de préparation de la solution de développement et solution de développement

Publications (2)

Publication Number Publication Date
KR20090094217A KR20090094217A (ko) 2009-09-04
KR101446619B1 true KR101446619B1 (ko) 2014-10-01

Family

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KR1020097007043A KR101446619B1 (ko) 2006-11-30 2007-11-29 현상액의 농도 조절 방법과 제조 장치 및 현상액

Country Status (5)

Country Link
JP (1) JP5604770B2 (zh)
KR (1) KR101446619B1 (zh)
CN (2) CN103852978B (zh)
TW (1) TWI453548B (zh)
WO (1) WO2008065755A1 (zh)

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* Cited by examiner, † Cited by third party
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JP5637676B2 (ja) * 2009-11-16 2014-12-10 石原ケミカル株式会社 現像液中のフォトレジスト溶解量の測定方法
KR101332191B1 (ko) * 2012-03-07 2013-11-22 (주)에스지이앤티 포토레지스트를 포함한 현상액의 농도 산출 방법 및 농도 조절 장치
KR101395019B1 (ko) * 2013-05-06 2014-05-14 (주)세미로드 현상액의 농도 측정 및 조절 장치
JP6370567B2 (ja) * 2014-03-13 2018-08-08 エイブリック株式会社 現像装置
CN104777724A (zh) * 2015-04-14 2015-07-15 广东成德电路股份有限公司 一种改性显影剂及其负载量量测方法
JP6505534B2 (ja) * 2015-07-22 2019-04-24 株式会社平間理化研究所 現像液の管理方法及び装置
JP6721157B2 (ja) 2015-07-22 2020-07-08 株式会社平間理化研究所 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6713658B2 (ja) * 2015-07-22 2020-06-24 株式会社平間理化研究所 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法
CN105116695B (zh) * 2015-10-15 2019-09-17 京东方科技集团股份有限公司 显影装置及光刻设备
KR101864674B1 (ko) * 2016-02-17 2018-06-05 한양대학교 산학협력단 외부자극응답성 연성 나노입자를 이용한 패턴화된 나노구조체 및 이의 제조방법
CN106200281B (zh) * 2016-09-09 2019-11-22 武汉华星光电技术有限公司 一种图像显影过程中显影液浓度调配方法
CN106444304B (zh) * 2016-11-18 2019-08-23 昆山国显光电有限公司 显影装置以及显影液活性度的补偿方法
JP2018120900A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液管理装置
JP2018120893A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の成分濃度測定装置、及び現像液管理装置
JP6712415B2 (ja) 2017-01-23 2020-06-24 株式会社平間理化研究所 現像液管理装置
JP2018120897A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置
JP6736087B2 (ja) 2017-01-23 2020-08-05 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置
JP6763608B2 (ja) 2017-01-23 2020-09-30 株式会社平間理化研究所 現像液の二酸化炭素濃度表示装置、及び現像液管理装置
JP2018120898A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120895A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120901A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
KR102115858B1 (ko) * 2017-04-17 2020-05-27 조명국 현상액 재생 장치 및 방법
WO2019208837A1 (ko) * 2018-04-23 2019-10-31 Cho Myung Kook 현상액 재생 장치 및 방법
CN109923415B (zh) * 2019-01-24 2021-06-22 香港应用科技研究院有限公司 用于确定溶液中物质浓度的系统和方法
US11340205B2 (en) 2019-01-24 2022-05-24 Hong Kong Applied Science And Technology Research Institute Co., Ltd. Systems and methods for determining concentrations of materials in solutions
CN109632571A (zh) * 2019-01-29 2019-04-16 深圳市华星光电半导体显示技术有限公司 显影液浓度测量装置及方法

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JP2004101999A (ja) 2002-09-11 2004-04-02 Mitsubishi Chemical Engineering Corp 現像液のリサイクル供給装置
JP2005070351A (ja) 2003-08-22 2005-03-17 Nagase & Co Ltd 現像液供給方法及び装置
JP2005164396A (ja) 2003-12-02 2005-06-23 Fuji Kogyo Kk 洗浄液濃度測定装置

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JP4026376B2 (ja) * 2002-02-27 2007-12-26 三菱化学エンジニアリング株式会社 現像液の供給装置
US7062202B2 (en) * 2002-09-25 2006-06-13 Seiko Epson Corporation Image forming apparatus and method using liquid development under an image forming condition in which an adhesion amount of toner is substantially saturated
JP3894104B2 (ja) * 2002-11-15 2007-03-14 東京エレクトロン株式会社 現像方法及び現像装置及び現像液再生装置
JP2005249818A (ja) * 2004-03-01 2005-09-15 Nishimura Yasuji フォトレジスト用現像液管理方法、管理装置
JP2006189646A (ja) * 2005-01-06 2006-07-20 Nagase & Co Ltd レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2004101999A (ja) 2002-09-11 2004-04-02 Mitsubishi Chemical Engineering Corp 現像液のリサイクル供給装置
JP2005070351A (ja) 2003-08-22 2005-03-17 Nagase & Co Ltd 現像液供給方法及び装置
JP2005164396A (ja) 2003-12-02 2005-06-23 Fuji Kogyo Kk 洗浄液濃度測定装置

Also Published As

Publication number Publication date
JP2008283162A (ja) 2008-11-20
CN103852978B (zh) 2019-03-22
TWI453548B (zh) 2014-09-21
CN103852978A (zh) 2014-06-11
KR20090094217A (ko) 2009-09-04
CN101563654A (zh) 2009-10-21
WO2008065755A1 (fr) 2008-06-05
TW200837513A (en) 2008-09-16
JP5604770B2 (ja) 2014-10-15

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