KR101444508B1 - 광원 장치 - Google Patents

광원 장치 Download PDF

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Publication number
KR101444508B1
KR101444508B1 KR1020110071476A KR20110071476A KR101444508B1 KR 101444508 B1 KR101444508 B1 KR 101444508B1 KR 1020110071476 A KR1020110071476 A KR 1020110071476A KR 20110071476 A KR20110071476 A KR 20110071476A KR 101444508 B1 KR101444508 B1 KR 101444508B1
Authority
KR
South Korea
Prior art keywords
dichroic mirror
light source
light
led
led light
Prior art date
Application number
KR1020110071476A
Other languages
English (en)
Korean (ko)
Other versions
KR20120019367A (ko
Inventor
다케오 마츠시마
기요유키 가부키
Original Assignee
우시오덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 우시오덴키 가부시키가이샤 filed Critical 우시오덴키 가부시키가이샤
Publication of KR20120019367A publication Critical patent/KR20120019367A/ko
Application granted granted Critical
Publication of KR101444508B1 publication Critical patent/KR101444508B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Led Device Packages (AREA)
  • Projection Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
KR1020110071476A 2010-08-25 2011-07-19 광원 장치 KR101444508B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010188150A JP5648372B2 (ja) 2010-08-25 2010-08-25 光源装置
JPJP-P-2010-188150 2010-08-25

Publications (2)

Publication Number Publication Date
KR20120019367A KR20120019367A (ko) 2012-03-06
KR101444508B1 true KR101444508B1 (ko) 2014-09-24

Family

ID=45824726

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110071476A KR101444508B1 (ko) 2010-08-25 2011-07-19 광원 장치

Country Status (4)

Country Link
JP (1) JP5648372B2 (zh)
KR (1) KR101444508B1 (zh)
CN (1) CN102385162B (zh)
TW (1) TWI521162B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016073952A1 (en) * 2014-11-07 2016-05-12 Uvlrx Therapeutics, Inc. High efficiency optical combiner for multiple non-coherent light sources

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6199591B2 (ja) * 2013-04-12 2017-09-20 株式会社オーク製作所 光源装置および露光装置
CN106151999A (zh) * 2015-01-30 2016-11-23 欧帝尔光学镀膜有限公司 使用led或荧光粉转换光源的投射系统
NL2018317A (en) * 2016-03-03 2017-09-07 Asml Netherlands Bv Wavelength combining of multiple sources

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004335952A (ja) 2002-12-27 2004-11-25 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2005242364A (ja) 2004-02-27 2005-09-08 Lumileds Lighting Us Llc 整列したｌｅｄを有する照明システム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3015201B2 (ja) * 1992-05-06 2000-03-06 キヤノン株式会社 画像形成装置、投射型表示装置並びに光変調装置
JP2004335949A (ja) * 2002-11-29 2004-11-25 Nikon Corp 露光装置及び露光方法
TWI359282B (en) * 2007-10-09 2012-03-01 Coretronic Corp Projector
TWI375108B (en) * 2007-12-14 2012-10-21 Young Optics Inc Light projection apparatus and light-mixing module thereof
JP5077086B2 (ja) * 2008-06-13 2012-11-21 コニカミノルタアドバンストレイヤー株式会社 照明光学系および画像投影装置
CN101950083B (zh) * 2010-07-30 2012-07-04 广东威创视讯科技股份有限公司 用于投影仪的led照明光路

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004335952A (ja) 2002-12-27 2004-11-25 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2005242364A (ja) 2004-02-27 2005-09-08 Lumileds Lighting Us Llc 整列したｌｅｄを有する照明システム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016073952A1 (en) * 2014-11-07 2016-05-12 Uvlrx Therapeutics, Inc. High efficiency optical combiner for multiple non-coherent light sources

Also Published As

Publication number Publication date
JP5648372B2 (ja) 2015-01-07
TWI521162B (zh) 2016-02-11
CN102385162A (zh) 2012-03-21
KR20120019367A (ko) 2012-03-06
JP2012047872A (ja) 2012-03-08
TW201209321A (en) 2012-03-01
CN102385162B (zh) 2015-09-02

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