KR101427425B1 - 비구면을 정밀 고해상도로 측정하는 방법 - Google Patents

비구면을 정밀 고해상도로 측정하는 방법 Download PDF

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KR101427425B1
KR101427425B1 KR1020077020800A KR20077020800A KR101427425B1 KR 101427425 B1 KR101427425 B1 KR 101427425B1 KR 1020077020800 A KR1020077020800 A KR 1020077020800A KR 20077020800 A KR20077020800 A KR 20077020800A KR 101427425 B1 KR101427425 B1 KR 101427425B1
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South Korea
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gauge
wavefront
measurements
symmetry
test
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KR20070121663A (ko
Inventor
폴 이. 머피
드라기샤 밀라디노빅
그렉 더블유. 포브스
게리 엠. 데브리스
존 에프. 플라익
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퀘드 테크놀러지즈 인터내셔날, 인크.
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02063—Active error reduction, i.e. varying with time by particular alignment of focus position, e.g. dynamic focussing in optical coherence tomography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02085—Combining two or more images of different regions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
KR1020077020800A 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법 Expired - Lifetime KR101427425B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66838505P 2005-04-05 2005-04-05
US60/668,385 2005-04-05
PCT/US2006/012527 WO2006107985A2 (en) 2005-04-05 2006-04-05 Method for accurate high-resolution measurements of aspheric surfaces

Related Child Applications (3)

Application Number Title Priority Date Filing Date
KR1020137034715A Division KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034713A Division KR101459259B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137004413A Division KR101393171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

Publications (2)

Publication Number Publication Date
KR20070121663A KR20070121663A (ko) 2007-12-27
KR101427425B1 true KR101427425B1 (ko) 2014-08-08

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KR1020077020800A Expired - Lifetime KR101427425B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034713A Expired - Lifetime KR101459259B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034715A Expired - Lifetime KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137004413A Expired - Lifetime KR101393171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

Family Applications After (3)

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KR1020137034713A Expired - Lifetime KR101459259B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034715A Expired - Lifetime KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137004413A Expired - Lifetime KR101393171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

Country Status (6)

Country Link
US (1) US7433057B2 (https=)
EP (1) EP1869401B1 (https=)
JP (1) JP4917088B2 (https=)
KR (4) KR101427425B1 (https=)
CN (3) CN101268331B (https=)
WO (1) WO2006107985A2 (https=)

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EP2286179B1 (en) * 2008-04-08 2021-05-19 QED Technologies International, Inc. Stitching of near-nulled subaperture measurements
JP5339934B2 (ja) * 2009-01-22 2013-11-13 キヤノン株式会社 光断層撮像装置および光断層撮像方法
WO2011032572A1 (en) 2009-09-18 2011-03-24 Carl Zeiss Smt Gmbh Method of measuring a shape of an optical surface and interferometric measuring device
GB2474893A (en) * 2009-10-30 2011-05-04 Taylor Hobson Ltd Surface measurement instrument and method
JP5597205B2 (ja) * 2009-11-19 2014-10-01 キヤノン株式会社 被検面の形状を計測する装置及び被検面の形状を算出するためのプログラム
EP2594896B1 (en) * 2010-07-15 2016-02-10 Canon Kabushiki Kaisha Method and apparatus for measuring shape of surface to be inspected, and method for manufacturing optical element
CN102155926A (zh) * 2011-03-09 2011-08-17 浙江大学 一种非球面顶点球曲率半径的测量系统及方法
TWI470184B (zh) * 2011-08-20 2015-01-21 Tonta Electro Optical Co Ltd 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法
GB2508219A (en) * 2012-11-26 2014-05-28 Taylor Hobson Ltd Analysing and machining an optical profile
US9212901B2 (en) * 2013-04-17 2015-12-15 Corning Incorporated Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface
CN103439090B (zh) * 2013-09-01 2015-11-18 中国科学院光电技术研究所 一种用于子孔径拼接检测的数据采样路径规划方法
US9435640B2 (en) 2013-12-04 2016-09-06 Zygo Corporation Interferometer and method for measuring non-rotationally symmetric surface topography having unequal curvatures in two perpendicular principal meridians
JP6306724B2 (ja) 2014-01-09 2018-04-04 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ 非球面およびその他の非平坦面のトポグラフィの測定
DE102014209040B4 (de) * 2014-05-13 2019-02-14 Carl Mahr Holding Gmbh Verfahren zur Kalibrierung eines Messgerätes
WO2016098469A1 (ja) * 2014-12-16 2016-06-23 富士フイルム株式会社 形状測定装置及び形状測定方法
JP6558975B2 (ja) * 2015-06-22 2019-08-14 キヤノン株式会社 形状計測方法、形状計測装置および形状計測プログラム
CN105423948B (zh) * 2015-12-14 2018-10-16 中国科学院长春光学精密机械与物理研究所 采用变形镜的拼接干涉检测非球面面形的装置
EP3190379A1 (de) 2016-01-08 2017-07-12 SwissOptic AG Interferometrisches stitching-verfahren
JP7027422B2 (ja) 2016-11-18 2022-03-01 ザイゴ コーポレーション 干渉計の光学性能を最適化するための方法及び装置
CN106768892A (zh) * 2016-12-28 2017-05-31 中国计量大学 基于哈特曼‑夏克波前传感器的自由曲面镜片波面拼接方法
CN109425313B (zh) * 2017-08-30 2022-12-13 上汽通用汽车有限公司 手持光泽仪定位装置及手持光泽仪套件
CN107796329B (zh) * 2017-09-29 2019-08-06 中国科学院长春光学精密机械与物理研究所 一种凸非球面反射镜面形检测装置及检测方法
WO2019147936A1 (en) 2018-01-26 2019-08-01 Vanderbilt University Systems and methods for non-destructive evaluation of optical material properties and surfaces
US11493751B2 (en) 2019-01-23 2022-11-08 Vanderbilt University Systems and methods for compact optical relay
CN109955148B (zh) * 2019-03-18 2023-09-22 中国工程物理研究院激光聚变研究中心 用于非球面光学元件中频波纹误差的在位检测装置及方法
CN109990983B (zh) * 2019-04-19 2020-12-11 北京理工大学 双边错位差动共焦超长焦距测量方法
CN111999042B (zh) * 2019-06-28 2022-06-28 苏州维纳仪器有限责任公司 检测光学系统任意波长透射波前的方法
CN110307963B (zh) * 2019-08-08 2020-11-03 苏州维纳仪器有限责任公司 检测透射式光学系统任意波长焦距的方法
CN111811429B (zh) * 2020-07-14 2021-04-20 北京理工大学 一种子孔径拼接干涉测量方法和装置
CN113916510B (zh) * 2021-11-23 2023-09-26 江苏北方湖光光电有限公司 基于伺服转动下的多光轴图像偏差校准方法
CN115597484B (zh) * 2022-09-26 2025-06-24 南京理工大学 一种基于多球随机的球面参考镜校正方法
CN117906913B (zh) * 2023-12-04 2024-11-15 武汉光谷航天三江激光产业技术研究院有限公司 一种高功率光学元件激光负载能力自动筛选装置及方法
CN117451324B (zh) * 2023-12-22 2024-02-27 中国科学院合肥物质科学研究院 用于大相对口径的二次凹曲面检测光路系统及设计方法

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Also Published As

Publication number Publication date
KR20070121663A (ko) 2007-12-27
KR20130037723A (ko) 2013-04-16
US7433057B2 (en) 2008-10-07
CN102353522B (zh) 2014-11-05
EP1869401B1 (en) 2016-02-03
JP4917088B2 (ja) 2012-04-18
KR20140008470A (ko) 2014-01-21
EP1869401A2 (en) 2007-12-26
CN102288390A (zh) 2011-12-21
CN101268331A (zh) 2008-09-17
KR20140008469A (ko) 2014-01-21
WO2006107985A3 (en) 2008-02-14
KR101459259B1 (ko) 2014-11-12
EP1869401A4 (en) 2013-03-20
JP2008534986A (ja) 2008-08-28
CN102288390B (zh) 2014-11-26
US20060221350A1 (en) 2006-10-05
CN102353522A (zh) 2012-02-15
CN101268331B (zh) 2012-02-22
KR101370171B1 (ko) 2014-03-04
KR101393171B1 (ko) 2014-05-08
WO2006107985A2 (en) 2006-10-12

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