KR101405552B1 - 레지스트 조성물 - Google Patents

레지스트 조성물 Download PDF

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Publication number
KR101405552B1
KR101405552B1 KR1020080005151A KR20080005151A KR101405552B1 KR 101405552 B1 KR101405552 B1 KR 101405552B1 KR 1020080005151 A KR1020080005151 A KR 1020080005151A KR 20080005151 A KR20080005151 A KR 20080005151A KR 101405552 B1 KR101405552 B1 KR 101405552B1
Authority
KR
South Korea
Prior art keywords
acid
acid ester
ester
group
carboxylic acid
Prior art date
Application number
KR1020080005151A
Other languages
English (en)
Korean (ko)
Other versions
KR20080068565A (ko
Inventor
아끼라 호리구찌
야스유끼 아까이
도루 가따야마
Original Assignee
가부시끼가이샤 다이셀
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 가부시끼가이샤 다이셀 filed Critical 가부시끼가이샤 다이셀
Publication of KR20080068565A publication Critical patent/KR20080068565A/ko
Application granted granted Critical
Publication of KR101405552B1 publication Critical patent/KR101405552B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080005151A 2007-01-18 2008-01-17 레지스트 조성물 KR101405552B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007009258A JP5148882B2 (ja) 2007-01-18 2007-01-18 レジスト組成物
JPJP-P-2007-00009258 2007-01-18

Publications (2)

Publication Number Publication Date
KR20080068565A KR20080068565A (ko) 2008-07-23
KR101405552B1 true KR101405552B1 (ko) 2014-06-10

Family

ID=39703116

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080005151A KR101405552B1 (ko) 2007-01-18 2008-01-17 레지스트 조성물

Country Status (4)

Country Link
JP (1) JP5148882B2 (ja)
KR (1) KR101405552B1 (ja)
CN (1) CN101482698B (ja)
TW (1) TWI417652B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2774071A1 (en) * 2009-09-15 2011-03-24 Ube Industries, Ltd. Nonaqueous electrolyte solution and electrochemical element using same
KR101737567B1 (ko) * 2010-11-19 2017-05-18 주식회사 동진쎄미켐 포토레지스트 조성물
JP6420634B2 (ja) * 2014-03-26 2018-11-07 株式会社Adeka レジスト組成物、カラーレジスト組成物及び該組成物を用いたカラーフィルタ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05204158A (ja) * 1992-01-29 1993-08-13 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3291872B2 (ja) * 1993-10-28 2002-06-17 ジェイエスアール株式会社 化学増幅型感放射線性樹脂組成物
JP3948506B2 (ja) * 1999-11-11 2007-07-25 富士フイルム株式会社 ポジ型フォトレジスト組成物
JP2002014470A (ja) * 2000-06-28 2002-01-18 Fuji Photo Film Co Ltd 電子線又はｘ線用ネガ型レジスト組成物
JP4000903B2 (ja) * 2002-05-16 2007-10-31 住友化学株式会社 感放射線性樹脂組成物
CN100576076C (zh) * 2002-12-26 2009-12-30 东京应化工业株式会社 正性抗蚀剂组合物和形成抗蚀剂图案的方法
TW200510926A (en) * 2003-07-08 2005-03-16 Showa Denko Kk Photoresist composition
JP2005195964A (ja) * 2004-01-08 2005-07-21 Fuji Photo Film Co Ltd 水分散型光重合性樹脂組成物及びそれを用いたドライフィルムレジスト
JP4365235B2 (ja) * 2004-02-20 2009-11-18 富士フイルム株式会社 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05204158A (ja) * 1992-01-29 1993-08-13 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物

Also Published As

Publication number Publication date
TW200844654A (en) 2008-11-16
JP5148882B2 (ja) 2013-02-20
JP2008176046A (ja) 2008-07-31
KR20080068565A (ko) 2008-07-23
CN101482698B (zh) 2012-07-04
TWI417652B (zh) 2013-12-01
CN101482698A (zh) 2009-07-15

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