KR101391225B1 - 비표시부 차광 패턴 형성용 감광성 수지 조성물 - Google Patents

비표시부 차광 패턴 형성용 감광성 수지 조성물 Download PDF

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Publication number
KR101391225B1
KR101391225B1 KR1020130106811A KR20130106811A KR101391225B1 KR 101391225 B1 KR101391225 B1 KR 101391225B1 KR 1020130106811 A KR1020130106811 A KR 1020130106811A KR 20130106811 A KR20130106811 A KR 20130106811A KR 101391225 B1 KR101391225 B1 KR 101391225B1
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KR
South Korea
Prior art keywords
resin composition
photosensitive resin
acrylate
shielding pattern
meth
Prior art date
Application number
KR1020130106811A
Other languages
English (en)
Korean (ko)
Inventor
장원영
전지민
조승현
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020130106811A priority Critical patent/KR101391225B1/ko
Application granted granted Critical
Publication of KR101391225B1 publication Critical patent/KR101391225B1/ko
Priority to TW103129514A priority patent/TWI563340B/zh
Priority to JP2014177497A priority patent/JP5996591B2/ja
Priority to CN201410453350.3A priority patent/CN104423156B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020130106811A 2013-09-05 2013-09-05 비표시부 차광 패턴 형성용 감광성 수지 조성물 KR101391225B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020130106811A KR101391225B1 (ko) 2013-09-05 2013-09-05 비표시부 차광 패턴 형성용 감광성 수지 조성물
TW103129514A TWI563340B (en) 2013-09-05 2014-08-27 Photo-sensitive resin composition for forming non-display part light-shielding pattern
JP2014177497A JP5996591B2 (ja) 2013-09-05 2014-09-01 非表示部遮光パターン形成用感光性樹脂組成物
CN201410453350.3A CN104423156B (zh) 2013-09-05 2014-09-05 非显示部遮光图案形成用感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020130106811A KR101391225B1 (ko) 2013-09-05 2013-09-05 비표시부 차광 패턴 형성용 감광성 수지 조성물

Publications (1)

Publication Number Publication Date
KR101391225B1 true KR101391225B1 (ko) 2014-05-07

Family

ID=50893013

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130106811A KR101391225B1 (ko) 2013-09-05 2013-09-05 비표시부 차광 패턴 형성용 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP5996591B2 (zh)
KR (1) KR101391225B1 (zh)
CN (1) CN104423156B (zh)
TW (1) TWI563340B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104423156A (zh) * 2013-09-05 2015-03-18 东友精细化工有限公司 非显示部遮光图案形成用感光性树脂组合物
KR20180035369A (ko) * 2016-09-29 2018-04-06 동우 화인켐 주식회사 비표시부의 패턴 형성용 조성물 및 이를 이용하는 커버 윈도우 기판

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102067857B1 (ko) 2016-04-08 2020-01-17 주식회사 엘지화학 잉크젯 프린팅을 이용한 베젤 패턴의 형성 방법
CN109003542A (zh) * 2018-07-19 2018-12-14 武汉华星光电半导体显示技术有限公司 显示面板及显示装置
KR20220108667A (ko) * 2021-01-27 2022-08-03 삼성에스디아이 주식회사 광학 적층체 및 이를 포함하는 광학표시장치

Citations (2)

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JP2011194799A (ja) 2010-03-23 2011-10-06 Toppan Printing Co Ltd ベゼル加飾物
US20120256878A1 (en) 2009-12-24 2012-10-11 Nissha Printing Co., Ltd. Capacitive touch sensor, electronic device, and method of manufacturing transparent conductive-film laminate

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JP2001174989A (ja) * 1999-12-17 2001-06-29 Fuji Photo Film Co Ltd 感光性転写シート
JP2008037719A (ja) * 2006-08-09 2008-02-21 Sumitomo Chemical Co Ltd 感光性ペースト
CN101523289A (zh) * 2006-10-03 2009-09-02 西巴控股有限公司 包含苯甲酰甲酸酯型光引发剂的可光固化组合物
JP2008115261A (ja) * 2006-11-02 2008-05-22 Fujifilm Corp 塗料組成物
DE102009010952A1 (de) * 2009-02-27 2010-09-09 Schott Ag Beschichtung für den Anzeigebereich von Glas- oder Glaskeramik-Scheiben, Verfahren zur Herstellung einer solchen Beschichtung und deren Verwendung
WO2011040083A1 (ja) * 2009-09-29 2011-04-07 富士フイルム株式会社 着色感光性樹脂組成物、カラーフィルター、および液晶表示装置
JP5516089B2 (ja) * 2010-06-01 2014-06-11 王子ホールディングス株式会社 導電性シート、タッチパネル用導電性積層体、及びタッチパネル
JP2012043120A (ja) * 2010-08-18 2012-03-01 Shin Etsu Polymer Co Ltd 電子機器用タッチパッド
JP5793908B2 (ja) * 2011-03-25 2015-10-14 凸版印刷株式会社 加飾フィルム及び加飾成形品
US8851649B2 (en) * 2011-05-13 2014-10-07 Eckart Gmbh UV ink jet printing ink composition
JP2012242928A (ja) * 2011-05-17 2012-12-10 Toppan Printing Co Ltd 加飾透明保護基板一体型タッチパネル
KR101474802B1 (ko) * 2011-12-30 2014-12-22 제일모직 주식회사 열가소성 수지 조성물
JP6016051B2 (ja) * 2012-01-25 2016-10-26 大日本印刷株式会社 表示装置用前面保護板、及び表示装置
KR101452314B1 (ko) * 2013-08-26 2014-10-22 동우 화인켐 주식회사 윈도우 기판 및 이를 구비하는 터치 스크린 패널
KR101391225B1 (ko) * 2013-09-05 2014-05-07 동우 화인켐 주식회사 비표시부 차광 패턴 형성용 감광성 수지 조성물

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120256878A1 (en) 2009-12-24 2012-10-11 Nissha Printing Co., Ltd. Capacitive touch sensor, electronic device, and method of manufacturing transparent conductive-film laminate
JP2011194799A (ja) 2010-03-23 2011-10-06 Toppan Printing Co Ltd ベゼル加飾物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104423156A (zh) * 2013-09-05 2015-03-18 东友精细化工有限公司 非显示部遮光图案形成用感光性树脂组合物
CN104423156B (zh) * 2013-09-05 2019-04-26 东友精细化工有限公司 非显示部遮光图案形成用感光性树脂组合物
KR20180035369A (ko) * 2016-09-29 2018-04-06 동우 화인켐 주식회사 비표시부의 패턴 형성용 조성물 및 이를 이용하는 커버 윈도우 기판
KR102548202B1 (ko) 2016-09-29 2023-06-26 동우 화인켐 주식회사 비표시부의 패턴 형성용 조성물 및 이를 이용하는 커버 윈도우 기판

Also Published As

Publication number Publication date
CN104423156B (zh) 2019-04-26
JP2015052785A (ja) 2015-03-19
TW201510648A (zh) 2015-03-16
JP5996591B2 (ja) 2016-09-21
CN104423156A (zh) 2015-03-18
TWI563340B (en) 2016-12-21

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