TWI563340B - Photo-sensitive resin composition for forming non-display part light-shielding pattern - Google Patents

Photo-sensitive resin composition for forming non-display part light-shielding pattern

Info

Publication number
TWI563340B
TWI563340B TW103129514A TW103129514A TWI563340B TW I563340 B TWI563340 B TW I563340B TW 103129514 A TW103129514 A TW 103129514A TW 103129514 A TW103129514 A TW 103129514A TW I563340 B TWI563340 B TW I563340B
Authority
TW
Taiwan
Prior art keywords
photo
resin composition
display part
sensitive resin
shielding pattern
Prior art date
Application number
TW103129514A
Other languages
Chinese (zh)
Other versions
TW201510648A (en
Inventor
Won-Young Chang
Ji Min Chun
Seung Hyun Cho
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201510648A publication Critical patent/TW201510648A/en
Application granted granted Critical
Publication of TWI563340B publication Critical patent/TWI563340B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Human Computer Interaction (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW103129514A 2013-09-05 2014-08-27 Photo-sensitive resin composition for forming non-display part light-shielding pattern TWI563340B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020130106811A KR101391225B1 (en) 2013-09-05 2013-09-05 Photo-sensitive resin composition for forming non-diplay part light-shielding pattern

Publications (2)

Publication Number Publication Date
TW201510648A TW201510648A (en) 2015-03-16
TWI563340B true TWI563340B (en) 2016-12-21

Family

ID=50893013

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103129514A TWI563340B (en) 2013-09-05 2014-08-27 Photo-sensitive resin composition for forming non-display part light-shielding pattern

Country Status (4)

Country Link
JP (1) JP5996591B2 (en)
KR (1) KR101391225B1 (en)
CN (1) CN104423156B (en)
TW (1) TWI563340B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101391225B1 (en) * 2013-09-05 2014-05-07 동우 화인켐 주식회사 Photo-sensitive resin composition for forming non-diplay part light-shielding pattern
KR102067857B1 (en) * 2016-04-08 2020-01-17 주식회사 엘지화학 A method for forming a bezel pattern using inkjet printing
KR102548202B1 (en) * 2016-09-29 2023-06-26 동우 화인켐 주식회사 Composition for forming patterns of non-display part and Cover window substrate using the same
CN109003542A (en) * 2018-07-19 2018-12-14 武汉华星光电半导体显示技术有限公司 Display panel and display device
KR102705604B1 (en) * 2021-01-27 2024-09-10 삼성에스디아이 주식회사 Optical laminate and optical display apparatus comprising the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201111907A (en) * 2009-09-29 2011-04-01 Fujifilm Corp Colored photosensitive composition, color filter, and liquid crystal display device
US20130172468A1 (en) * 2011-12-30 2013-07-04 Cheil Industries Inc. Thermoplastic Resin Composition
TW201508452A (en) * 2013-08-26 2015-03-01 Dongwoo Fine Chem Co Ltd Window plate and touch screen panel comprising the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001174989A (en) * 1999-12-17 2001-06-29 Fuji Photo Film Co Ltd Photosensitive transfer sheet
JP2008037719A (en) * 2006-08-09 2008-02-21 Sumitomo Chemical Co Ltd Photosensitive paste
CN101523289A (en) * 2006-10-03 2009-09-02 西巴控股有限公司 Photocurable compositions containing benzoyl formic ether type photoinitiator
JP2008115261A (en) * 2006-11-02 2008-05-22 Fujifilm Corp Coating composition
DE102009010952A1 (en) * 2009-02-27 2010-09-09 Schott Ag Coating for the display area of glass or glass-ceramic panes, method for producing such a coating and its use
CN102714074B (en) 2009-12-24 2015-09-09 日本写真印刷株式会社 The manufacture method of electrostatic capacity type touch sensor, electronic equipment and nesa coating layered product
JP5585147B2 (en) 2010-03-23 2014-09-10 凸版印刷株式会社 Bezel decoration
JP5516089B2 (en) * 2010-06-01 2014-06-11 王子ホールディングス株式会社 Conductive sheet, conductive laminate for touch panel, and touch panel
JP2012043120A (en) * 2010-08-18 2012-03-01 Shin Etsu Polymer Co Ltd Touch pad for electronic apparatus
JP5793908B2 (en) * 2011-03-25 2015-10-14 凸版印刷株式会社 Decorative films and decorative molded products
US8851649B2 (en) * 2011-05-13 2014-10-07 Eckart Gmbh UV ink jet printing ink composition
JP2012242928A (en) * 2011-05-17 2012-12-10 Toppan Printing Co Ltd Touch panel integrating decorated transparent protective substrate
JP6016051B2 (en) * 2012-01-25 2016-10-26 大日本印刷株式会社 Front protective plate for display device and display device
KR101391225B1 (en) * 2013-09-05 2014-05-07 동우 화인켐 주식회사 Photo-sensitive resin composition for forming non-diplay part light-shielding pattern

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201111907A (en) * 2009-09-29 2011-04-01 Fujifilm Corp Colored photosensitive composition, color filter, and liquid crystal display device
US20130172468A1 (en) * 2011-12-30 2013-07-04 Cheil Industries Inc. Thermoplastic Resin Composition
TW201508452A (en) * 2013-08-26 2015-03-01 Dongwoo Fine Chem Co Ltd Window plate and touch screen panel comprising the same

Also Published As

Publication number Publication date
CN104423156B (en) 2019-04-26
KR101391225B1 (en) 2014-05-07
JP5996591B2 (en) 2016-09-21
CN104423156A (en) 2015-03-18
TW201510648A (en) 2015-03-16
JP2015052785A (en) 2015-03-19

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees