KR101370257B1 - 광전자 반도체 소자 - Google Patents

광전자 반도체 소자 Download PDF

Info

Publication number
KR101370257B1
KR101370257B1 KR1020087028644A KR20087028644A KR101370257B1 KR 101370257 B1 KR101370257 B1 KR 101370257B1 KR 1020087028644 A KR1020087028644 A KR 1020087028644A KR 20087028644 A KR20087028644 A KR 20087028644A KR 101370257 B1 KR101370257 B1 KR 101370257B1
Authority
KR
South Korea
Prior art keywords
layer
semiconductor device
optoelectronic semiconductor
intermediate layer
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020087028644A
Other languages
English (en)
Korean (ko)
Other versions
KR20080112410A (ko
Inventor
크리스토프 에히흘러
스테픈 밀러
위 슈트라우쓰
보커 할레
매티아쓰 사바틸
Original Assignee
오스람 옵토 세미컨덕터스 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오스람 옵토 세미컨덕터스 게엠베하 filed Critical 오스람 옵토 세미컨덕터스 게엠베하
Publication of KR20080112410A publication Critical patent/KR20080112410A/ko
Application granted granted Critical
Publication of KR101370257B1 publication Critical patent/KR101370257B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/862Resonant cavity structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018Bonding of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/819Bodies characterised by their shape, e.g. curved or truncated substrates
    • H10H20/82Roughened surfaces, e.g. at the interface between epitaxial layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/835Reflective materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/882Scattering means

Landscapes

  • Led Devices (AREA)
  • Light Receiving Elements (AREA)
  • Semiconductor Lasers (AREA)
  • Photovoltaic Devices (AREA)
KR1020087028644A 2006-04-25 2007-04-25 광전자 반도체 소자 Expired - Fee Related KR101370257B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
DE102006019109 2006-04-25
DE102006019109.9 2006-04-25
DE102006030252.4 2006-06-30
DE102006030252 2006-06-30
DE102006061167.5 2006-12-22
DE102006061167A DE102006061167A1 (de) 2006-04-25 2006-12-22 Optoelektronisches Halbleiterbauelement
PCT/DE2007/000740 WO2007121739A2 (de) 2006-04-25 2007-04-25 Optoelektronisches halbleiterbauelement

Publications (2)

Publication Number Publication Date
KR20080112410A KR20080112410A (ko) 2008-12-24
KR101370257B1 true KR101370257B1 (ko) 2014-03-05

Family

ID=38461180

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087028644A Expired - Fee Related KR101370257B1 (ko) 2006-04-25 2007-04-25 광전자 반도체 소자

Country Status (8)

Country Link
US (1) US8093607B2 (enExample)
EP (1) EP2011161A2 (enExample)
JP (1) JP5623074B2 (enExample)
KR (1) KR101370257B1 (enExample)
CN (1) CN101443923B (enExample)
DE (1) DE102006061167A1 (enExample)
TW (1) TWI354381B (enExample)
WO (1) WO2007121739A2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006007293B4 (de) * 2006-01-31 2023-04-06 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zum Herstellen eines Quasi-Substratwafers und ein unter Verwendung eines solchen Quasi-Substratwafers hergestellter Halbleiterkörper
KR100872717B1 (ko) 2007-06-22 2008-12-05 엘지이노텍 주식회사 발광 소자 및 그 제조방법
US9461201B2 (en) 2007-11-14 2016-10-04 Cree, Inc. Light emitting diode dielectric mirror
US7915629B2 (en) 2008-12-08 2011-03-29 Cree, Inc. Composite high reflectivity layer
DE102008019268A1 (de) * 2008-02-29 2009-09-03 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements
US8692260B2 (en) 2008-09-26 2014-04-08 Soitec Method of forming a composite laser substrate
DE102009036621B4 (de) 2009-08-07 2023-12-21 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronisches Halbleiterbauteil
US9362459B2 (en) 2009-09-02 2016-06-07 United States Department Of Energy High reflectivity mirrors and method for making same
US9435493B2 (en) 2009-10-27 2016-09-06 Cree, Inc. Hybrid reflector system for lighting device
US9105824B2 (en) 2010-04-09 2015-08-11 Cree, Inc. High reflective board or substrate for LEDs
US9012938B2 (en) 2010-04-09 2015-04-21 Cree, Inc. High reflective substrate of light emitting devices with improved light output
US10243121B2 (en) 2011-06-24 2019-03-26 Cree, Inc. High voltage monolithic LED chip with improved reliability
US9728676B2 (en) 2011-06-24 2017-08-08 Cree, Inc. High voltage monolithic LED chip
TWI535077B (zh) 2012-05-24 2016-05-21 台達電子工業股份有限公司 發光單元及其發光模組
KR102091831B1 (ko) * 2013-01-08 2020-03-20 서울반도체 주식회사 발광 다이오드 및 그 제조방법
US10658546B2 (en) 2015-01-21 2020-05-19 Cree, Inc. High efficiency LEDs and methods of manufacturing
US10693038B2 (en) * 2017-11-22 2020-06-23 Epistar Corporation Semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6320206B1 (en) 1999-02-05 2001-11-20 Lumileds Lighting, U.S., Llc Light emitting devices having wafer bonded aluminum gallium indium nitride structures and mirror stacks
WO2005004231A1 (de) 2003-06-24 2005-01-13 Osram Opto Semiconductors Gmbh Verfahren zum herstellen von halbleiterchips

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK0507154T3 (da) * 1991-03-21 1996-06-10 Moeller Willy Ag Fremgangsmåde til bestemmelse af alkoholer og anvendelsen af en indretning til alkoholbestemmelse
FR2681472B1 (fr) * 1991-09-18 1993-10-29 Commissariat Energie Atomique Procede de fabrication de films minces de materiau semiconducteur.
DE19640594B4 (de) * 1996-10-01 2016-08-04 Osram Gmbh Bauelement
WO1998031055A1 (en) * 1997-01-09 1998-07-16 Nichia Chemical Industries, Ltd. Nitride semiconductor device
US6700692B2 (en) * 1997-04-02 2004-03-02 Gentex Corporation Electrochromic rearview mirror assembly incorporating a display/signal light
US6150239A (en) * 1997-05-31 2000-11-21 Max Planck Society Method for the transfer of thin layers monocrystalline material onto a desirable substrate
EP2169733B1 (de) 1997-09-29 2017-07-19 OSRAM Opto Semiconductors GmbH Halbleiterlichtquelle
JP3346735B2 (ja) * 1998-03-03 2002-11-18 日亜化学工業株式会社 窒化物半導体発光素子及びその製造方法
US7193246B1 (en) 1998-03-12 2007-03-20 Nichia Corporation Nitride semiconductor device
DE19814879A1 (de) * 1998-04-02 1999-10-07 Basf Ag Verfahren zur selektiven Flüssigphasenhydrierung von alpha,beta-ungesättigten Carbonylverbindungen
US6838705B1 (en) 1999-03-29 2005-01-04 Nichia Corporation Nitride semiconductor device
JP3719047B2 (ja) * 1999-06-07 2005-11-24 日亜化学工業株式会社 窒化物半導体素子
US6133589A (en) * 1999-06-08 2000-10-17 Lumileds Lighting, U.S., Llc AlGaInN-based LED having thick epitaxial layer for improved light extraction
JP2001119102A (ja) * 1999-10-15 2001-04-27 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体レーザダイオード
JP2001168385A (ja) * 1999-12-06 2001-06-22 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体素子及びiii族窒化物系化合物半導体発光素子
JP4032636B2 (ja) * 1999-12-13 2008-01-16 日亜化学工業株式会社 発光素子
CN1292494C (zh) * 2000-04-26 2006-12-27 奥斯兰姆奥普托半导体有限责任公司 发光半导体元件及其制造方法
DE10051465A1 (de) * 2000-10-17 2002-05-02 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterbauelements auf GaN-Basis
FR2809534B1 (fr) 2000-05-26 2005-01-14 Commissariat Energie Atomique Dispositif semiconducteur a injection electronique verticale et son procede de fabrication
US20020017652A1 (en) * 2000-08-08 2002-02-14 Stefan Illek Semiconductor chip for optoelectronics
JP4091261B2 (ja) 2000-10-31 2008-05-28 株式会社東芝 半導体発光素子及びその製造方法
EP2034530B1 (en) * 2001-06-15 2015-01-21 Cree, Inc. GaN based LED formed on a SiC substrate
EP1403932B1 (en) 2001-07-04 2012-09-05 Nichia Corporation Light emitting nitride semiconductor device
JP4967211B2 (ja) * 2001-09-26 2012-07-04 日本電気株式会社 光電気化学デバイス
MY139533A (en) 2001-11-05 2009-10-30 Nichia Corp Nitride semiconductor device
FR2834123B1 (fr) * 2001-12-21 2005-02-04 Soitec Silicon On Insulator Procede de report de couches minces semi-conductrices et procede d'obtention d'une plaquette donneuse pour un tel procede de report
ATE370264T1 (de) 2002-07-17 2007-09-15 Soitec Silicon On Insulator Verfahren zur herstellung von substraten, insbesondere für die optik, elektronik und optoelektronik
FR2842648B1 (fr) 2002-07-18 2005-01-14 Commissariat Energie Atomique Procede de transfert d'une couche mince electriquement active
JP4590820B2 (ja) * 2002-12-16 2010-12-01 富士ゼロックス株式会社 面発光型半導体レーザおよびその製造方法
TW578318B (en) * 2002-12-31 2004-03-01 United Epitaxy Co Ltd Light emitting diode and method of making the same
US7061065B2 (en) * 2003-03-31 2006-06-13 National Chung-Hsing University Light emitting diode and method for producing the same
TWI344706B (en) * 2003-06-04 2011-07-01 Myung Cheol Yoo Method of fabricating vertical structure compound semiconductor devices
US6979582B2 (en) * 2003-09-22 2005-12-27 National Chung-Hsing University Vertical-cavity surface emitting laser diode and method for producing the same
US7808011B2 (en) * 2004-03-19 2010-10-05 Koninklijke Philips Electronics N.V. Semiconductor light emitting devices including in-plane light emitting layers
WO2005104780A2 (en) * 2004-04-28 2005-11-10 Verticle, Inc Vertical structure semiconductor devices
US7825006B2 (en) * 2004-05-06 2010-11-02 Cree, Inc. Lift-off process for GaN films formed on SiC substrates and devices fabricated using the method
DE102004062290A1 (de) * 2004-12-23 2006-07-06 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterchips
WO2006116030A2 (en) 2005-04-21 2006-11-02 Aonex Technologies, Inc. Bonded intermediate substrate and method of making same
DE102005052357A1 (de) 2005-09-01 2007-03-15 Osram Opto Semiconductors Gmbh Verfahren zum lateralen Zertrennen eines Halbleiterwafers und optoelektronisches Bauelement
DE102005052358A1 (de) 2005-09-01 2007-03-15 Osram Opto Semiconductors Gmbh Verfahren zum lateralen Zertrennen eines Halbleiterwafers und optoelektronisches Bauelement
DE102006015788A1 (de) 2006-01-27 2007-09-13 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
DE102006007293B4 (de) * 2006-01-31 2023-04-06 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zum Herstellen eines Quasi-Substratwafers und ein unter Verwendung eines solchen Quasi-Substratwafers hergestellter Halbleiterkörper
TW200802544A (en) * 2006-04-25 2008-01-01 Osram Opto Semiconductors Gmbh Composite substrate and method for making the same
DE102007018307A1 (de) 2007-01-26 2008-07-31 Osram Opto Semiconductors Gmbh Halbleiterchip und Verfahren zur Herstellung eines Halbleiterchips

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6320206B1 (en) 1999-02-05 2001-11-20 Lumileds Lighting, U.S., Llc Light emitting devices having wafer bonded aluminum gallium indium nitride structures and mirror stacks
WO2005004231A1 (de) 2003-06-24 2005-01-13 Osram Opto Semiconductors Gmbh Verfahren zum herstellen von halbleiterchips

Also Published As

Publication number Publication date
JP2009534859A (ja) 2009-09-24
TWI354381B (en) 2011-12-11
US20090309113A1 (en) 2009-12-17
TW200746479A (en) 2007-12-16
JP5623074B2 (ja) 2014-11-12
EP2011161A2 (de) 2009-01-07
WO2007121739A3 (de) 2008-03-13
CN101443923B (zh) 2010-12-08
US8093607B2 (en) 2012-01-10
CN101443923A (zh) 2009-05-27
WO2007121739A2 (de) 2007-11-01
KR20080112410A (ko) 2008-12-24
DE102006061167A1 (de) 2007-12-20

Similar Documents

Publication Publication Date Title
KR101370257B1 (ko) 광전자 반도체 소자
US8163575B2 (en) Grown photonic crystals in semiconductor light emitting devices
US8772805B2 (en) High efficiency light emitting diode and method for fabricating the same
CN1292494C (zh) 发光半导体元件及其制造方法
JP5727320B2 (ja) エピタキシャル層を有するAlGaInNベースLED
JP6419077B2 (ja) 波長変換発光デバイス
KR100992497B1 (ko) 발광 다이오드 및 그 제조 방법
KR101208871B1 (ko) 반사 본딩 패드를 갖는 발광 소자 및 반사 본딩 패드들을 갖는 발광 소자의 제조 방법
EP2595202B1 (en) Semiconductor light-emitting device and method for manufacturing semiconductor light-emitting device
CN1950957A (zh) 形成于碳化硅基板上的氮化镓膜的剥离方法及使用该方法制造的装置
US20100117109A1 (en) Light emitting element
JP2007538408A (ja) 第3族窒化物デバイスを製造する方法およびその方法を使用して製造されたデバイス
CN101645482A (zh) 氮化物半导体发光元件及其制造方法
CN100464438C (zh) 发光半导体元件的制造方法
EP2973755A1 (en) Method and apparatus for creating a porous reflective contact
KR20140144228A (ko) 실리콘 기판 상에서 성장하는 발광 장치
JP5523277B2 (ja) 発光半導体素子並びに発光性半導体素子の製造方法
JP2005347700A (ja) 発光素子およびその製造方法
KR101013621B1 (ko) 반도체 레이저 다이오드 및 그 제조 방법
TW201013993A (en) Optoelectronic semiconductor chip and method for its manufacture
JP2013207108A (ja) 発光ダイオード素子およびその製造方法

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20170216

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20190227

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20190227

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000