KR101369935B1 - 저온 정화기를 사용하는 유체 정화 시스템 - Google Patents

저온 정화기를 사용하는 유체 정화 시스템 Download PDF

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Publication number
KR101369935B1
KR101369935B1 KR1020137008376A KR20137008376A KR101369935B1 KR 101369935 B1 KR101369935 B1 KR 101369935B1 KR 1020137008376 A KR1020137008376 A KR 1020137008376A KR 20137008376 A KR20137008376 A KR 20137008376A KR 101369935 B1 KR101369935 B1 KR 101369935B1
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South Korea
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temperature
purifier
matrix fluid
fluid
matrix
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Korean (ko)
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KR20130041380A (ko
Inventor
조셉 브이. 비닌스키
2세 로버트 토레스
버지니아 에이취. 홀딩
해럴드 스파이서
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매티슨 트라이-개스, 인크.
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/10—Capture or disposal of greenhouse gases of nitrous oxide (N2O)

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Drying Of Gases (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
KR1020137008376A 2004-10-25 2005-10-19 저온 정화기를 사용하는 유체 정화 시스템 Expired - Fee Related KR101369935B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US62187104P 2004-10-25 2004-10-25
US60/621,871 2004-10-25
US11/252,200 US7314506B2 (en) 2004-10-25 2005-10-17 Fluid purification system with low temperature purifier
US11/252,200 2005-10-17
PCT/US2005/038222 WO2006057748A2 (en) 2004-10-25 2005-10-19 Fluid purification system with low temperature purifier

Related Parent Applications (1)

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KR1020077011833A Division KR101369934B1 (ko) 2004-10-25 2005-10-19 저온 정화기를 사용하는 유체 정화 시스템

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KR20130041380A KR20130041380A (ko) 2013-04-24
KR101369935B1 true KR101369935B1 (ko) 2014-03-06

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KR1020137008376A Expired - Fee Related KR101369935B1 (ko) 2004-10-25 2005-10-19 저온 정화기를 사용하는 유체 정화 시스템

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Country Status (6)

Country Link
US (1) US7314506B2 (enExample)
EP (1) EP1817095A4 (enExample)
JP (1) JP2008517744A (enExample)
KR (2) KR101369934B1 (enExample)
TW (1) TWI411462B (enExample)
WO (1) WO2006057748A2 (enExample)

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US7981777B1 (en) 2007-02-22 2011-07-19 Novellus Systems, Inc. Methods of depositing stable and hermetic ashable hardmask films
US7915166B1 (en) 2007-02-22 2011-03-29 Novellus Systems, Inc. Diffusion barrier and etch stop films
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US20090060819A1 (en) * 2007-08-29 2009-03-05 Bill Jr Jon M Process for producing trichlorosilane
WO2009029794A1 (en) * 2007-08-29 2009-03-05 Dynamic Engineering, Inc. Process for producing trichlorosilane
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WO2009142663A1 (en) * 2008-05-21 2009-11-26 The Regents Of The University Of Colorado Ionic liquids and methods for using same
US20110014100A1 (en) * 2008-05-21 2011-01-20 Bara Jason E Carbon Sequestration Using Ionic Liquids
US7820556B2 (en) * 2008-06-04 2010-10-26 Novellus Systems, Inc. Method for purifying acetylene gas for use in semiconductor processes
US8435608B1 (en) * 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US8129577B2 (en) 2008-09-16 2012-03-06 Air Products And Chemicals, Inc. Process and system for providing acetylene
WO2010065880A2 (en) * 2008-12-05 2010-06-10 Matheson Tri-Gas, Inc. Acetylene process gas purification methods and systems
US7955990B2 (en) * 2008-12-12 2011-06-07 Novellus Systems, Inc. Method for improved thickness repeatability of PECVD deposited carbon films
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
DE102010061144A1 (de) * 2010-12-09 2012-06-14 Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh Kühlfalle
ITMI20120676A1 (it) * 2012-04-24 2013-10-25 Getters Spa Metodo e dispositivo rigenerabile di purificazione a temperatura ambiente per monossido di diazoto
SG195494A1 (en) 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
US10279959B2 (en) 2012-12-11 2019-05-07 Versum Materials Us, Llc Alkoxysilylamine compounds and applications thereof
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
JP6475943B2 (ja) * 2014-09-26 2019-02-27 大旺新洋株式会社 ガスの分離方法
CN104436992B (zh) * 2014-10-15 2016-08-17 北京氢璞创能科技有限公司 具有前置气体成份分离装置的变压吸附气体提纯器组件
JP6680611B2 (ja) * 2016-04-28 2020-04-15 大旺新洋株式会社 ガスの分離方法
JP7267197B2 (ja) * 2016-11-08 2023-05-01 マセソン トライ－ガス， インコーポレイテッド ヒドラジンから湿気を除去する方法及びヒドラジンを安定化及び乾燥させる方法
US11712653B2 (en) 2019-05-24 2023-08-01 Entegris, Inc. Methods and systems for adsorbing organometallic vapor
WO2020243342A1 (en) 2019-05-29 2020-12-03 Lam Research Corporation High selectivity, low stress, and low hydrogen diamond-like carbon hardmasks by high power pulsed low frequency rf
EP4022670A4 (en) 2019-08-30 2023-08-30 Lam Research Corporation High density, modulus, and hardness amorphous carbon films at low pressure
KR102302551B1 (ko) * 2019-11-21 2021-09-15 이시동 불산의 정제 방법
KR102845376B1 (ko) * 2022-03-08 2025-08-12 크라이오에이치앤아이(주) 배기 가스 처리 장치
CN114570186B (zh) * 2022-03-18 2023-05-12 南京曙光精细化工有限公司 一种含硫硅烷偶联剂生产尾气的环保处理方法
KR20240169462A (ko) 2023-05-24 2024-12-03 한국핵융합에너지연구원 극저온 배관 불순물 포집장치
CN120242666B (zh) * 2025-06-04 2025-08-05 福建德尔科技股份有限公司 一种三氟化磷纯化设备

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Also Published As

Publication number Publication date
KR101369934B1 (ko) 2014-03-06
EP1817095A2 (en) 2007-08-15
WO2006057748A2 (en) 2006-06-01
TW200624154A (en) 2006-07-16
US20060086247A1 (en) 2006-04-27
WO2006057748A3 (en) 2006-07-13
KR20130041380A (ko) 2013-04-24
JP2008517744A (ja) 2008-05-29
US7314506B2 (en) 2008-01-01
EP1817095A4 (en) 2009-08-12
KR20070084549A (ko) 2007-08-24
TWI411462B (zh) 2013-10-11
HK1111373A1 (zh) 2008-08-08

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