KR101367784B1 - 쿠션성을 가지는 그라비아판 및 그 제조방법 - Google Patents

쿠션성을 가지는 그라비아판 및 그 제조방법 Download PDF

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Publication number
KR101367784B1
KR101367784B1 KR1020097012973A KR20097012973A KR101367784B1 KR 101367784 B1 KR101367784 B1 KR 101367784B1 KR 1020097012973 A KR1020097012973 A KR 1020097012973A KR 20097012973 A KR20097012973 A KR 20097012973A KR 101367784 B1 KR101367784 B1 KR 101367784B1
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KR
South Korea
Prior art keywords
gravure
layer
photosensitive
silicon dioxide
photosensitive plate
Prior art date
Application number
KR1020097012973A
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English (en)
Korean (ko)
Other versions
KR20090129983A (ko
Inventor
츠토무 사토
타츠오 시게타
Original Assignee
가부시키가이샤 씽크. 라보라토리
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Publication of KR20090129983A publication Critical patent/KR20090129983A/ko
Application granted granted Critical
Publication of KR101367784B1 publication Critical patent/KR101367784B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Optical Filters (AREA)
KR1020097012973A 2007-04-18 2008-04-15 쿠션성을 가지는 그라비아판 및 그 제조방법 KR101367784B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2007-109692 2007-04-18
JP2007109692 2007-04-18
PCT/JP2008/057330 WO2008133105A1 (ja) 2007-04-18 2008-04-15 クッション性を有するグラビア版及びその製造方法

Publications (2)

Publication Number Publication Date
KR20090129983A KR20090129983A (ko) 2009-12-17
KR101367784B1 true KR101367784B1 (ko) 2014-02-26

Family

ID=39925563

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097012973A KR101367784B1 (ko) 2007-04-18 2008-04-15 쿠션성을 가지는 그라비아판 및 그 제조방법

Country Status (3)

Country Link
JP (1) JP5131707B2 (ja)
KR (1) KR101367784B1 (ja)
WO (1) WO2008133105A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5058733B2 (ja) * 2007-09-12 2012-10-24 ＡｚエレクトロニックマテリアルズＩｐ株式会社 ケイ素含有微細パターン形成用組成物を用いた微細パターン形成方法
US20120060999A1 (en) * 2010-02-23 2012-03-15 Yael Kowal-Blau Removable top blanket
JP2012137778A (ja) * 2012-03-19 2012-07-19 Az Electronic Materials Ip Ltd ケイ素含有微細パターン形成用組成物
CN102998900A (zh) * 2012-12-01 2013-03-27 刘华礼 一种超薄感光层感光版的制法
CN113832465B (zh) * 2021-09-01 2023-11-10 安徽亚泰包装科技股份有限公司 一种提升二次腐蚀压纹版压纹效果的腐蚀处理工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000199949A (ja) * 1998-12-30 2000-07-18 Think Laboratory Co Ltd クッション性を有するグラビア版の製造方法
WO2007013333A1 (ja) * 2005-07-25 2007-02-01 Think Laboratory Co., Ltd. グラビア製版ロール及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2007135900A1 (ja) * 2006-05-23 2009-10-01 株式会社シンク・ラボラトリー グラビア製版ロール及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000199949A (ja) * 1998-12-30 2000-07-18 Think Laboratory Co Ltd クッション性を有するグラビア版の製造方法
WO2007013333A1 (ja) * 2005-07-25 2007-02-01 Think Laboratory Co., Ltd. グラビア製版ロール及びその製造方法

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Publication number Publication date
JP5131707B2 (ja) 2013-01-30
WO2008133105A1 (ja) 2008-11-06
KR20090129983A (ko) 2009-12-17
JPWO2008133105A1 (ja) 2010-07-22

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