KR101363202B1 - 마스크 얼라인먼트 광학 시스템 - Google Patents

마스크 얼라인먼트 광학 시스템 Download PDF

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Publication number
KR101363202B1
KR101363202B1 KR1020120118859A KR20120118859A KR101363202B1 KR 101363202 B1 KR101363202 B1 KR 101363202B1 KR 1020120118859 A KR1020120118859 A KR 1020120118859A KR 20120118859 A KR20120118859 A KR 20120118859A KR 101363202 B1 KR101363202 B1 KR 101363202B1
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KR
South Korea
Prior art keywords
mask
light guide
substrate
alignment
optical system
Prior art date
Application number
KR1020120118859A
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English (en)
Korean (ko)
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KR20130047601A (ko
Inventor
후사시게 마쯔모또
히로끼 가메야마
재훈 정
상우 이
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
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Publication of KR20130047601A publication Critical patent/KR20130047601A/ko
Application granted granted Critical
Publication of KR101363202B1 publication Critical patent/KR101363202B1/ko

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020120118859A 2011-10-28 2012-10-25 마스크 얼라인먼트 광학 시스템 KR101363202B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011236856A JP2013095930A (ja) 2011-10-28 2011-10-28 マスクアラインメント光学システム
JPJP-P-2011-236856 2011-10-28

Publications (2)

Publication Number Publication Date
KR20130047601A KR20130047601A (ko) 2013-05-08
KR101363202B1 true KR101363202B1 (ko) 2014-02-13

Family

ID=48201409

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120118859A KR101363202B1 (ko) 2011-10-28 2012-10-25 마스크 얼라인먼트 광학 시스템

Country Status (4)

Country Link
JP (1) JP2013095930A (ja)
KR (1) KR101363202B1 (ja)
CN (1) CN103088290A (ja)
TW (1) TWI444486B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102399575B1 (ko) 2014-09-26 2022-05-19 삼성디스플레이 주식회사 증착 위치 정밀도 검사장치 및 그것을 이용한 증착 위치 정밀도 검사방법
KR101866139B1 (ko) * 2017-08-25 2018-06-08 캐논 톡키 가부시키가이샤 얼라인먼트 방법, 얼라인먼트 장치, 이를 포함하는 진공증착방법 및 진공증착장치
KR20210033529A (ko) * 2018-08-07 2021-03-26 어플라이드 머티어리얼스, 인코포레이티드 재료 증착 장치, 진공 증착 시스템, 및 대면적 기판을 프로세싱하는 방법
CN112771198A (zh) * 2018-10-22 2021-05-07 应用材料公司 处理大面积基板的材料沉积设备、真空沉积系统和方法
CN111270200A (zh) * 2018-12-05 2020-06-12 合肥欣奕华智能机器有限公司 一种蒸镀设备及对位方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050097663A (ko) * 2004-04-02 2005-10-10 삼성전자주식회사 표시장치용 기판, 기판 노광 방법 및 노광 시스템
WO2007029829A1 (ja) 2005-09-09 2007-03-15 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
KR20080049491A (ko) * 2006-11-30 2008-06-04 엘지전자 주식회사 레이저 직접 묘화용 마스크 정렬장치 및 정렬방법, 그리고이를 이용한 평판표시장치 제조장치 및 제조방법
US20110143287A1 (en) 2009-09-14 2011-06-16 Nikon Corporation Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008293798A (ja) * 2007-05-24 2008-12-04 Toyota Industries Corp 有機ｅｌ素子の製造方法
JP2008300056A (ja) * 2007-05-29 2008-12-11 Shinko Electric Co Ltd マスクアライメント装置
JP5167103B2 (ja) * 2008-12-15 2013-03-21 株式会社日立ハイテクノロジーズ 成膜装置
TW201336140A (zh) * 2008-12-15 2013-09-01 Hitachi High Tech Corp 有機電激發光製造裝置及成膜裝置
JP5277059B2 (ja) * 2009-04-16 2013-08-28 株式会社日立ハイテクノロジーズ 成膜装置及び成膜システム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050097663A (ko) * 2004-04-02 2005-10-10 삼성전자주식회사 표시장치용 기판, 기판 노광 방법 및 노광 시스템
WO2007029829A1 (ja) 2005-09-09 2007-03-15 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
KR20080049491A (ko) * 2006-11-30 2008-06-04 엘지전자 주식회사 레이저 직접 묘화용 마스크 정렬장치 및 정렬방법, 그리고이를 이용한 평판표시장치 제조장치 및 제조방법
US20110143287A1 (en) 2009-09-14 2011-06-16 Nikon Corporation Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JP2013095930A (ja) 2013-05-20
KR20130047601A (ko) 2013-05-08
CN103088290A (zh) 2013-05-08
TW201323635A (zh) 2013-06-16
TWI444486B (zh) 2014-07-11

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