KR101330344B1 - 포토리소그래피용 시스템, 마스크 및 방법 - Google Patents

포토리소그래피용 시스템, 마스크 및 방법 Download PDF

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KR101330344B1
KR101330344B1 KR1020087008802A KR20087008802A KR101330344B1 KR 101330344 B1 KR101330344 B1 KR 101330344B1 KR 1020087008802 A KR1020087008802 A KR 1020087008802A KR 20087008802 A KR20087008802 A KR 20087008802A KR 101330344 B1 KR101330344 B1 KR 101330344B1
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South Korea
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mask
pattern
function
photomask
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KR20080070623A (ko
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다니엘 아브람스
덴핑 펭
스탠리 오셔
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루미네슨트 테크놀로지, 인크.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020087008802A 2005-09-13 2006-09-13 포토리소그래피용 시스템, 마스크 및 방법 Active KR101330344B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US77599105P 2005-09-13 2005-09-13
US60/775,991 2005-09-13
PCT/US2006/035985 WO2007033362A2 (en) 2005-09-13 2006-09-13 Systems, masks, and methods for photolithography

Publications (2)

Publication Number Publication Date
KR20080070623A KR20080070623A (ko) 2008-07-30
KR101330344B1 true KR101330344B1 (ko) 2013-11-15

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KR1020087008802A Active KR101330344B1 (ko) 2005-09-13 2006-09-13 포토리소그래피용 시스템, 마스크 및 방법

Country Status (7)

Country Link
US (1) US7707541B2 (enExample)
EP (1) EP1925020A4 (enExample)
JP (1) JP5405109B2 (enExample)
KR (1) KR101330344B1 (enExample)
CN (1) CN101297390B (enExample)
TW (1) TWI398721B (enExample)
WO (1) WO2007033362A2 (enExample)

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TWI398721B (zh) 2013-06-11
US7707541B2 (en) 2010-04-27
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