KR101301097B1 - 에칭 챔버의 슬러리 클리닝용 장치 및 방법 - Google Patents

에칭 챔버의 슬러리 클리닝용 장치 및 방법 Download PDF

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Publication number
KR101301097B1
KR101301097B1 KR1020060111696A KR20060111696A KR101301097B1 KR 101301097 B1 KR101301097 B1 KR 101301097B1 KR 1020060111696 A KR1020060111696 A KR 1020060111696A KR 20060111696 A KR20060111696 A KR 20060111696A KR 101301097 B1 KR101301097 B1 KR 101301097B1
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KR
South Korea
Prior art keywords
abrasive slurry
slurry
sprayed
abrasive
fluid
Prior art date
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Expired - Fee Related
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KR1020060111696A
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English (en)
Korean (ko)
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KR20070051707A (ko
Inventor
이안 마틴 데이비스
데이비드 피 라우베
Original Assignee
퀀텀 글로벌 테크놀로지스, 엘엘씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 퀀텀 글로벌 테크놀로지스, 엘엘씨 filed Critical 퀀텀 글로벌 테크놀로지스, 엘엘씨
Publication of KR20070051707A publication Critical patent/KR20070051707A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C5/00—Devices or accessories for generating abrasive blasts
    • B24C5/02—Blast guns, e.g. for generating high velocity abrasive fluid jets for cutting materials
    • B24C5/04—Nozzles therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00—Selection of abrasive materials or additives for abrasive blasts
    • B24C11/005—Selection of abrasive materials or additives for abrasive blasts of additives, e.g. anti-corrosive or disinfecting agents in solid, liquid or gaseous form
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00—Abrasive blasting machines or devices; Plants
    • B24C3/32—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks
    • B24C3/325—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks for internal surfaces, e.g. of tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C7/00—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
    • B24C7/0007—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier
    • B24C7/0038—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier the blasting medium being a gaseous stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Nozzles (AREA)
  • Coating By Spraying Or Casting (AREA)
KR1020060111696A 2005-11-14 2006-11-13 에칭 챔버의 슬러리 클리닝용 장치 및 방법 Expired - Fee Related KR101301097B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/272,844 2005-11-14
US11/272,844 US20070111642A1 (en) 2005-11-14 2005-11-14 Apparatus and methods for slurry cleaning of etch chambers

Publications (2)

Publication Number Publication Date
KR20070051707A KR20070051707A (ko) 2007-05-18
KR101301097B1 true KR101301097B1 (ko) 2013-08-27

Family

ID=37758692

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060111696A Expired - Fee Related KR101301097B1 (ko) 2005-11-14 2006-11-13 에칭 챔버의 슬러리 클리닝용 장치 및 방법

Country Status (10)

Country Link
US (1) US20070111642A1 (enExample)
EP (1) EP1785230B1 (enExample)
JP (1) JP5031329B2 (enExample)
KR (1) KR101301097B1 (enExample)
CN (1) CN1970230A (enExample)
AT (1) ATE464978T1 (enExample)
DE (1) DE602006013768D1 (enExample)
IL (1) IL178946A (enExample)
SG (1) SG132602A1 (enExample)
TW (1) TWI421935B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101091132B1 (ko) 2010-09-27 2011-12-09 (주)제이솔루션 질소가스 이젝터장치
US9815175B2 (en) * 2012-09-25 2017-11-14 G.D.O. Inc Abrasive entrainment waterjet cutting
US9744645B2 (en) * 2012-09-25 2017-08-29 G.D.O. Inc. Abrasive entrainment waterjet cutting
WO2014052407A1 (en) * 2012-09-25 2014-04-03 G.D.O. Inc. Underwater abrasive entrainment waterjet cutting
US9687953B2 (en) * 2014-06-27 2017-06-27 Applied Materials, Inc. Chamber components with polished internal apertures
US10010106B2 (en) * 2015-04-30 2018-07-03 Frito-Lay North America, Inc. Method and apparatus for removing a portion of a food product with an abrasive stream
CN105904330A (zh) * 2016-06-08 2016-08-31 重庆巨源不锈钢制品有限公司 自动抛光装置及其自动抛光方法
US10076821B2 (en) * 2016-08-15 2018-09-18 G.D.O. Inc Abrasive entrainment waterjet cutting
US10077966B2 (en) * 2016-08-15 2018-09-18 G.D.O. Inc. Abrasive entrainment waterjet cutting
CN109210374B (zh) * 2017-06-30 2021-06-08 北京北方华创微电子装备有限公司 进气管路及半导体加工设备
KR102577058B1 (ko) * 2021-04-30 2023-09-11 남근식 표면연마용 워터젯 가공장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020081663A (ko) * 2001-04-19 2002-10-30 가부시키가이샤 히타치세이사쿠쇼 반도체 집적 회로 장치의 제조 방법
JP2005108889A (ja) * 2003-09-26 2005-04-21 Kyocera Corp 半導体基板の製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2200587A (en) * 1937-02-25 1940-05-14 Hydroblast Corp Method and apparatus for sand blasting
US2369576A (en) * 1943-12-20 1945-02-13 Pangborn Corp Blast gun
US2372957A (en) * 1943-12-23 1945-04-03 Pangborn Corp Hydraulic sand feeder
GB1105984A (en) * 1966-02-24 1968-03-13 Abrasive Dev Improvements in and relating to abrasive guns
US4330968A (en) * 1980-05-02 1982-05-25 Fuji Seiki Machine Works, Ltd. Two-tank high water pressure wet blasting machine with separate supply reservoir for abrasive particles
US4776794A (en) * 1986-06-03 1988-10-11 Moshe Meller Cleaning instrument using premixed abrasive liquid
EP0332328B1 (en) * 1988-03-03 1992-09-16 Yoshino Seiki Inc. Mist-spouting type drilling device
US5575705A (en) * 1993-08-12 1996-11-19 Church & Dwight Co., Inc. Slurry blasting process
US5384990A (en) * 1993-08-12 1995-01-31 Church & Dwight Co., Inc. Water blasting process
WO1997034737A1 (fr) * 1996-03-18 1997-09-25 Honda Giken Kogyo Kabushiki Kaisha Procede et appareil assurant un important renforcement d'un element metallique
US6010546A (en) * 1997-07-24 2000-01-04 Asahi Glass Company, Ltd. Blasting medium and blasting method employing such medium
US5827114A (en) * 1996-09-25 1998-10-27 Church & Dwight Co., Inc. Slurry blasting process
ATE365443T1 (de) * 1998-04-24 2007-07-15 Matsushita Electric Industrial Co Ltd Verfahren zur herstellung eines keramischen mehrschichtigen substrats
US6224463B1 (en) * 1998-11-02 2001-05-01 J.C.J. Metal Processing, Incorporated Workpiece finishing system and method of operating same
JP2000343435A (ja) * 1999-03-29 2000-12-12 Asahi Glass Co Ltd ブラストメディア及びブラスト方法
FR2801689B1 (fr) * 1999-11-29 2001-12-28 Air Liquide Robinet detendeur avec dispositif de reglage de la basse pression et comportant un systeme d'arret d'urgence
US6554909B1 (en) * 2001-11-08 2003-04-29 Saint-Gobain Ceramics & Plastics, Inc. Process for cleaning components using cleaning media
US20040202980A1 (en) * 2003-04-14 2004-10-14 Policicchio Piero A. Dental prophylaxis and air appliance

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020081663A (ko) * 2001-04-19 2002-10-30 가부시키가이샤 히타치세이사쿠쇼 반도체 집적 회로 장치의 제조 방법
JP2005108889A (ja) * 2003-09-26 2005-04-21 Kyocera Corp 半導体基板の製造方法

Also Published As

Publication number Publication date
DE602006013768D1 (de) 2010-06-02
IL178946A0 (en) 2007-03-08
TWI421935B (zh) 2014-01-01
TW200725733A (en) 2007-07-01
SG132602A1 (en) 2007-06-28
EP1785230B1 (en) 2010-04-21
EP1785230A3 (en) 2007-07-18
KR20070051707A (ko) 2007-05-18
JP5031329B2 (ja) 2012-09-19
ATE464978T1 (de) 2010-05-15
EP1785230A2 (en) 2007-05-16
US20070111642A1 (en) 2007-05-17
JP2007173785A (ja) 2007-07-05
CN1970230A (zh) 2007-05-30
IL178946A (en) 2012-10-31

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