KR101293461B1 - 소결체 연마부가 구비된 공구 및 그 제조 방법 - Google Patents

소결체 연마부가 구비된 공구 및 그 제조 방법 Download PDF

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Publication number
KR101293461B1
KR101293461B1 KR1020087005076A KR20087005076A KR101293461B1 KR 101293461 B1 KR101293461 B1 KR 101293461B1 KR 1020087005076 A KR1020087005076 A KR 1020087005076A KR 20087005076 A KR20087005076 A KR 20087005076A KR 101293461 B1 KR101293461 B1 KR 101293461B1
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KR
South Korea
Prior art keywords
polishing
tool
abrasive
grinding
divided
Prior art date
Application number
KR1020087005076A
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English (en)
Korean (ko)
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KR20080037693A (ko
Inventor
이시즈카히로시
Original Assignee
이시즈카히로시
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Application filed by 이시즈카히로시 filed Critical 이시즈카히로시
Publication of KR20080037693A publication Critical patent/KR20080037693A/ko
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Publication of KR101293461B1 publication Critical patent/KR101293461B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/21—Circular sheet or circular blank
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y10T428/24579—Parallel ribs and/or grooves with particulate matter
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
KR1020087005076A 2005-08-25 2006-08-25 소결체 연마부가 구비된 공구 및 그 제조 방법 KR101293461B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2005243529 2005-08-25
JPJP-P-2005-00243529 2005-08-25
JP2006209236 2006-07-31
JPJP-P-2006-00209236 2006-07-31
PCT/JP2006/316737 WO2007023949A1 (ja) 2005-08-25 2006-08-25 焼結体研磨部を持つ工具およびその製造方法

Publications (2)

Publication Number Publication Date
KR20080037693A KR20080037693A (ko) 2008-04-30
KR101293461B1 true KR101293461B1 (ko) 2013-08-07

Family

ID=37771687

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087005076A KR101293461B1 (ko) 2005-08-25 2006-08-25 소결체 연마부가 구비된 공구 및 그 제조 방법

Country Status (12)

Country Link
US (1) US20090215366A1 (de)
EP (1) EP1944125B1 (de)
JP (1) JP5033630B2 (de)
KR (1) KR101293461B1 (de)
CN (2) CN101693353A (de)
AU (1) AU2006282293B2 (de)
BR (1) BRPI0615020A2 (de)
CA (1) CA2620407A1 (de)
IL (1) IL189314A (de)
RU (1) RU2430827C2 (de)
TW (1) TWI406736B (de)
WO (1) WO2007023949A1 (de)

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JP2009113133A (ja) * 2007-11-05 2009-05-28 Hiroshi Ishizuka Ｃｍｐパッド・コンディショナー
CA2797096C (en) * 2010-04-27 2018-07-10 3M Innovative Properties Company Ceramic shaped abrasive particles, methods of making the same, and abrasive articles containing the same
US20120171935A1 (en) * 2010-12-20 2012-07-05 Diamond Innovations, Inc. CMP PAD Conditioning Tool
JP5809880B2 (ja) * 2011-08-25 2015-11-11 新日鉄住金マテリアルズ株式会社 研磨布用ドレッサー
KR20170018102A (ko) * 2011-12-30 2017-02-15 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자 및 이의 형성방법
EP2879838B1 (de) * 2012-08-02 2023-09-13 3M Innovative Properties Company Schleifartikel mit formgenauen komponenten und herstellungsverfahren dafür
CN102862121B (zh) * 2012-09-17 2015-05-20 上海华力微电子有限公司 一种cmp研磨垫修整结构
ES2756849T3 (es) * 2013-08-07 2020-04-27 Reishauer Ag Herramienta rectificadora y procedimiento para su fabricación
WO2015029987A1 (ja) * 2013-08-26 2015-03-05 株式会社東京精密 ダイシングブレード
KR20160071416A (ko) * 2013-10-18 2016-06-21 쓰리엠 이노베이티브 프로퍼티즈 컴파니 코팅된 연마 용품 및 그의 제조 방법
KR102304574B1 (ko) * 2014-03-21 2021-09-27 엔테그리스, 아이엔씨. 세장형 절삭 에지를 갖는 화학 기계 평탄화 패드 컨디셔너
TWI609742B (zh) * 2015-04-20 2018-01-01 中國砂輪企業股份有限公司 研磨工具
CN108698202B (zh) * 2016-02-22 2021-06-04 联合材料公司 磨料工具
CN106078516B (zh) * 2016-06-21 2018-09-04 大连理工大学 一种cmp抛光垫修整器
EP3621771A1 (de) 2017-05-12 2020-03-18 3M Innovative Properties Company Vierflächige schleifpartikel in schleifartikeln
EP3713711A4 (de) * 2017-11-21 2021-08-18 3M Innovative Properties Company Beschichtete schleifscheibe und verfahren zur herstellung und verwendung davon
CN111372728B (zh) 2017-11-21 2022-08-09 3M创新有限公司 涂覆研磨盘及其制备和使用方法
JP6899490B2 (ja) 2017-11-21 2021-07-07 スリーエム イノベイティブ プロパティズ カンパニー 被覆研磨ディスク並びにその製造方法及び使用方法
KR102026250B1 (ko) * 2018-02-05 2019-09-27 에스케이실트론 주식회사 웨이퍼 연마 장치용 연마 패드 및 그의 제조방법
MX2020011232A (es) * 2018-04-27 2020-11-11 Sumitomo Electric Industries Granos abrasivos policristalinos y muela abrasiva que comprenden los mismos.
TWI735795B (zh) * 2018-08-24 2021-08-11 宋健民 拋光墊修整器及化學機械平坦化的方法
KR102440315B1 (ko) * 2020-05-11 2022-09-06 한국생산기술연구원 패턴구조를 갖는 화학기계적 연마용 패드 및 이의 제조방법
DK180350B1 (da) * 2019-09-18 2021-01-22 Flex Trim As Slibeelement til brug i roterende slibe- eller pudseværktøj
CN112677062B (zh) * 2019-10-18 2022-12-09 江苏韦尔博新材料科技有限公司 一种打磨钢材磨盘的专用磨粒地貌、其金刚石磨盘与制备方法

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JP2000190200A (ja) * 1998-12-25 2000-07-11 Mitsubishi Materials Silicon Corp 研磨布のシ―ズニング治具
JP2001088028A (ja) * 1999-09-17 2001-04-03 Koremura Toishi Seisakusho:Kk ロータリードレッサー
US6524523B1 (en) * 1999-11-16 2003-02-25 Asia Ic Mic-Process, Inc. Method for forming dresser of chemical mechanical polishing pad

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JPH1071559A (ja) * 1996-05-23 1998-03-17 Asahi Daiyamondo Kogyo Kk ドレッサ及びその製造方法
JP2000190200A (ja) * 1998-12-25 2000-07-11 Mitsubishi Materials Silicon Corp 研磨布のシ―ズニング治具
JP2001088028A (ja) * 1999-09-17 2001-04-03 Koremura Toishi Seisakusho:Kk ロータリードレッサー
US6524523B1 (en) * 1999-11-16 2003-02-25 Asia Ic Mic-Process, Inc. Method for forming dresser of chemical mechanical polishing pad

Also Published As

Publication number Publication date
EP1944125A1 (de) 2008-07-16
CN101247923A (zh) 2008-08-20
RU2008110905A (ru) 2009-09-27
WO2007023949A1 (ja) 2007-03-01
RU2430827C2 (ru) 2011-10-10
CN101247923B (zh) 2010-12-08
EP1944125A4 (de) 2009-12-16
CN101693353A (zh) 2010-04-14
AU2006282293A1 (en) 2007-03-01
EP1944125B1 (de) 2012-01-25
KR20080037693A (ko) 2008-04-30
JPWO2007023949A1 (ja) 2009-03-05
JP5033630B2 (ja) 2012-09-26
US20090215366A1 (en) 2009-08-27
BRPI0615020A2 (pt) 2009-08-04
AU2006282293B2 (en) 2011-06-23
TWI406736B (zh) 2013-09-01
TW200714416A (en) 2007-04-16
CA2620407A1 (en) 2007-03-01
IL189314A0 (en) 2008-06-05
IL189314A (en) 2013-01-31

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