KR101191073B1 - 스퍼터원 및 스퍼터 장치 - Google Patents
스퍼터원 및 스퍼터 장치 Download PDFInfo
- Publication number
- KR101191073B1 KR101191073B1 KR1020060023887A KR20060023887A KR101191073B1 KR 101191073 B1 KR101191073 B1 KR 101191073B1 KR 1020060023887 A KR1020060023887 A KR 1020060023887A KR 20060023887 A KR20060023887 A KR 20060023887A KR 101191073 B1 KR101191073 B1 KR 101191073B1
- Authority
- KR
- South Korea
- Prior art keywords
- disposed
- magnetic force
- sputter
- sputtering
- particles
- Prior art date
Links
Images
Classifications
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- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
- A63F13/00—Video games, i.e. games using an electronically generated display having two or more dimensions
- A63F13/30—Interconnection arrangements between game servers and game devices; Interconnection arrangements between game devices; Interconnection arrangements between game servers
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q20/00—Payment architectures, schemes or protocols
- G06Q20/08—Payment architectures
- G06Q20/18—Payment architectures involving self-service terminals [SST], vending machines, kiosks or multimedia terminals
-
- G—PHYSICS
- G07—CHECKING-DEVICES
- G07F—COIN-FREED OR LIKE APPARATUS
- G07F17/00—Coin-freed apparatus for hiring articles; Coin-freed facilities or services
- G07F17/32—Coin-freed apparatus for hiring articles; Coin-freed facilities or services for games, toys, sports, or amusements
- G07F17/3244—Payment aspects of a gaming system, e.g. payment schemes, setting payout ratio, bonus or consolation prizes
Landscapes
- Engineering & Computer Science (AREA)
- Business, Economics & Management (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Multimedia (AREA)
- Accounting & Taxation (AREA)
- Finance (AREA)
- Strategic Management (AREA)
- General Business, Economics & Management (AREA)
- Theoretical Computer Science (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00076677 | 2005-03-17 | ||
JP2005076677A JP4531599B2 (ja) | 2005-03-17 | 2005-03-17 | スパッタ源、スパッタ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060101292A KR20060101292A (ko) | 2006-09-22 |
KR101191073B1 true KR101191073B1 (ko) | 2012-10-15 |
Family
ID=37002180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060023887A KR101191073B1 (ko) | 2005-03-17 | 2006-03-15 | 스퍼터원 및 스퍼터 장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4531599B2 (ja) |
KR (1) | KR101191073B1 (ja) |
CN (1) | CN1834285B (ja) |
TW (1) | TWI390068B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101363880B1 (ko) * | 2011-12-15 | 2014-02-18 | 주식회사 테스 | 스퍼터링 장치 |
GB201713385D0 (en) * | 2017-08-21 | 2017-10-04 | Gencoa Ltd | Ion-enhanced deposition |
CN110128029A (zh) * | 2019-05-08 | 2019-08-16 | 江西沃格光电股份有限公司 | 多色膜的制备方法及显示面板 |
CN110306161B (zh) * | 2019-07-01 | 2021-11-12 | 北京北方华创微电子装备有限公司 | 半导体加工腔室及半导体加工设备 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0285365A (ja) * | 1988-09-19 | 1990-03-26 | Toyobo Co Ltd | スパッタリング方法および装置 |
CN1033100C (zh) * | 1993-06-22 | 1996-10-23 | 电子科技大学 | 对称磁体磁控溅射源 |
JPH111770A (ja) * | 1997-06-06 | 1999-01-06 | Anelva Corp | スパッタリング装置及びスパッタリング方法 |
JP2000080470A (ja) * | 1998-09-03 | 2000-03-21 | Ulvac Japan Ltd | 偏向器を有するスパッタリング装置 |
JP3686540B2 (ja) * | 1998-12-22 | 2005-08-24 | 株式会社ルネサステクノロジ | 電子デバイスの製造方法 |
US6183614B1 (en) * | 1999-02-12 | 2001-02-06 | Applied Materials, Inc. | Rotating sputter magnetron assembly |
JP2000313958A (ja) * | 1999-04-28 | 2000-11-14 | Canon Inc | 薄膜形成装置及び薄膜形成方法 |
WO2006070633A1 (ja) * | 2004-12-28 | 2006-07-06 | Ulvac, Inc. | スパッタ源、スパッタ装置、薄膜の製造方法 |
-
2005
- 2005-03-17 JP JP2005076677A patent/JP4531599B2/ja active Active
-
2006
- 2006-03-13 TW TW095108460A patent/TWI390068B/zh active
- 2006-03-15 KR KR1020060023887A patent/KR101191073B1/ko active IP Right Grant
- 2006-03-17 CN CN2006100596710A patent/CN1834285B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
TWI390068B (zh) | 2013-03-21 |
TW200706677A (en) | 2007-02-16 |
JP2006257498A (ja) | 2006-09-28 |
CN1834285B (zh) | 2010-10-06 |
CN1834285A (zh) | 2006-09-20 |
KR20060101292A (ko) | 2006-09-22 |
JP4531599B2 (ja) | 2010-08-25 |
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