KR101191073B1 - 스퍼터원 및 스퍼터 장치 - Google Patents

스퍼터원 및 스퍼터 장치 Download PDF

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Publication number
KR101191073B1
KR101191073B1 KR1020060023887A KR20060023887A KR101191073B1 KR 101191073 B1 KR101191073 B1 KR 101191073B1 KR 1020060023887 A KR1020060023887 A KR 1020060023887A KR 20060023887 A KR20060023887 A KR 20060023887A KR 101191073 B1 KR101191073 B1 KR 101191073B1
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KR
South Korea
Prior art keywords
disposed
magnetic force
sputter
sputtering
particles
Prior art date
Application number
KR1020060023887A
Other languages
English (en)
Korean (ko)
Other versions
KR20060101292A (ko
Inventor
도시오 네기시
마사히로 이토
Original Assignee
가부시키가이샤 알박
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Publication date
Application filed by 가부시키가이샤 알박 filed Critical 가부시키가이샤 알박
Publication of KR20060101292A publication Critical patent/KR20060101292A/ko
Application granted granted Critical
Publication of KR101191073B1 publication Critical patent/KR101191073B1/ko

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    • AHUMAN NECESSITIES
    • A63SPORTS; GAMES; AMUSEMENTS
    • A63FCARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F13/00Video games, i.e. games using an electronically generated display having two or more dimensions
    • A63F13/30Interconnection arrangements between game servers and game devices; Interconnection arrangements between game devices; Interconnection arrangements between game servers
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q20/00Payment architectures, schemes or protocols
    • G06Q20/08Payment architectures
    • G06Q20/18Payment architectures involving self-service terminals [SST], vending machines, kiosks or multimedia terminals
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07FCOIN-FREED OR LIKE APPARATUS
    • G07F17/00Coin-freed apparatus for hiring articles; Coin-freed facilities or services
    • G07F17/32Coin-freed apparatus for hiring articles; Coin-freed facilities or services for games, toys, sports, or amusements
    • G07F17/3244Payment aspects of a gaming system, e.g. payment schemes, setting payout ratio, bonus or consolation prizes

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  • Engineering & Computer Science (AREA)
  • Business, Economics & Management (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Accounting & Taxation (AREA)
  • Finance (AREA)
  • Strategic Management (AREA)
  • General Business, Economics & Management (AREA)
  • Theoretical Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
KR1020060023887A 2005-03-17 2006-03-15 스퍼터원 및 스퍼터 장치 KR101191073B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00076677 2005-03-17
JP2005076677A JP4531599B2 (ja) 2005-03-17 2005-03-17 スパッタ源、スパッタ装置

Publications (2)

Publication Number Publication Date
KR20060101292A KR20060101292A (ko) 2006-09-22
KR101191073B1 true KR101191073B1 (ko) 2012-10-15

Family

ID=37002180

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060023887A KR101191073B1 (ko) 2005-03-17 2006-03-15 스퍼터원 및 스퍼터 장치

Country Status (4)

Country Link
JP (1) JP4531599B2 (ja)
KR (1) KR101191073B1 (ja)
CN (1) CN1834285B (ja)
TW (1) TWI390068B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101363880B1 (ko) * 2011-12-15 2014-02-18 주식회사 테스 스퍼터링 장치
GB201713385D0 (en) * 2017-08-21 2017-10-04 Gencoa Ltd Ion-enhanced deposition
CN110128029A (zh) * 2019-05-08 2019-08-16 江西沃格光电股份有限公司 多色膜的制备方法及显示面板
CN110306161B (zh) * 2019-07-01 2021-11-12 北京北方华创微电子装备有限公司 半导体加工腔室及半导体加工设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0285365A (ja) * 1988-09-19 1990-03-26 Toyobo Co Ltd スパッタリング方法および装置
CN1033100C (zh) * 1993-06-22 1996-10-23 电子科技大学 对称磁体磁控溅射源
JPH111770A (ja) * 1997-06-06 1999-01-06 Anelva Corp スパッタリング装置及びスパッタリング方法
JP2000080470A (ja) * 1998-09-03 2000-03-21 Ulvac Japan Ltd 偏向器を有するスパッタリング装置
JP3686540B2 (ja) * 1998-12-22 2005-08-24 株式会社ルネサステクノロジ 電子デバイスの製造方法
US6183614B1 (en) * 1999-02-12 2001-02-06 Applied Materials, Inc. Rotating sputter magnetron assembly
JP2000313958A (ja) * 1999-04-28 2000-11-14 Canon Inc 薄膜形成装置及び薄膜形成方法
WO2006070633A1 (ja) * 2004-12-28 2006-07-06 Ulvac, Inc. スパッタ源、スパッタ装置、薄膜の製造方法

Also Published As

Publication number Publication date
TWI390068B (zh) 2013-03-21
TW200706677A (en) 2007-02-16
JP2006257498A (ja) 2006-09-28
CN1834285B (zh) 2010-10-06
CN1834285A (zh) 2006-09-20
KR20060101292A (ko) 2006-09-22
JP4531599B2 (ja) 2010-08-25

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