KR101129715B1 - 진행중인 계측 작업을 동적으로 제어하는 방법 및 시스템 - Google Patents
진행중인 계측 작업을 동적으로 제어하는 방법 및 시스템 Download PDFInfo
- Publication number
- KR101129715B1 KR101129715B1 KR1020077008345A KR20077008345A KR101129715B1 KR 101129715 B1 KR101129715 B1 KR 101129715B1 KR 1020077008345 A KR1020077008345 A KR 1020077008345A KR 20077008345 A KR20077008345 A KR 20077008345A KR 101129715 B1 KR101129715 B1 KR 101129715B1
- Authority
- KR
- South Korea
- Prior art keywords
- metrology
- lot
- wafer
- lots
- tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32247—Real time scheduler
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32306—Rules to make scheduling decisions
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/80—Management or planning
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- General Factory Administration (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/958,834 US7296103B1 (en) | 2004-10-05 | 2004-10-05 | Method and system for dynamically selecting wafer lots for metrology processing |
| US10/958,834 | 2004-10-05 | ||
| PCT/US2005/022191 WO2006041542A2 (en) | 2004-10-05 | 2005-06-23 | Method and system for dynamically controlling metrology work in progress |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20070051939A KR20070051939A (ko) | 2007-05-18 |
| KR101129715B1 true KR101129715B1 (ko) | 2012-03-28 |
Family
ID=35311834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077008345A Expired - Fee Related KR101129715B1 (ko) | 2004-10-05 | 2005-06-23 | 진행중인 계측 작업을 동적으로 제어하는 방법 및 시스템 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7296103B1 (enExample) |
| EP (1) | EP1797486A2 (enExample) |
| JP (1) | JP2008523458A (enExample) |
| KR (1) | KR101129715B1 (enExample) |
| CN (1) | CN101036092B (enExample) |
| TW (1) | TWI374345B (enExample) |
| WO (1) | WO2006041542A2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7836168B1 (en) | 2002-06-04 | 2010-11-16 | Rockwell Automation Technologies, Inc. | System and methodology providing flexible and distributed processing in an industrial controller environment |
| US9235413B1 (en) * | 2005-08-03 | 2016-01-12 | National Semiconductor Corporation | Automated control of semiconductor wafer manufacturing based on electrical test results |
| JP4957226B2 (ja) * | 2005-12-15 | 2012-06-20 | 富士通セミコンダクター株式会社 | 製品製造に係る品質改善を支援する情報処理端末及び品質改善支援サーバ |
| TWI367402B (en) * | 2006-10-12 | 2012-07-01 | Tokyo Electron Ltd | Substrate measurement method, program, computer-readabel recording medium recorded with program, and substrate processing system |
| US7937177B2 (en) * | 2007-06-27 | 2011-05-03 | International Business Machines Corporation | Manufacturing work in process management system |
| US7668615B2 (en) * | 2007-10-02 | 2010-02-23 | GlobalFoundries, Inc. | Method and apparatus for randomizing dispatch order for single wafer processing |
| US8565910B2 (en) | 2011-02-04 | 2013-10-22 | International Business Machines Corporation | Manufacturing execution system (MES) including a wafer sampling engine (WSE) for a semiconductor manufacturing process |
| US9027035B2 (en) * | 2012-12-17 | 2015-05-05 | Itron, Inc. | Non real-time metrology data management |
| US10133263B1 (en) | 2014-08-18 | 2018-11-20 | Kla-Tencor Corporation | Process condition based dynamic defect inspection |
| CN105470156B (zh) * | 2014-09-09 | 2018-09-04 | 中芯国际集成电路制造(上海)有限公司 | 一种基于rtd的量测工艺 |
| US10295979B2 (en) * | 2015-09-15 | 2019-05-21 | Applied Materials, Inc. | Scheduling in manufacturing environments |
| US10763144B2 (en) * | 2018-03-01 | 2020-09-01 | Verity Instruments, Inc. | Adaptable-modular optical sensor based process control system, and method of operation thereof |
| US11887862B2 (en) * | 2021-09-14 | 2024-01-30 | Deca Technologies Usa, Inc. | Method for redistribution layer (RDL) repair by mitigating at least one defect with a custom RDL |
| US12362322B2 (en) | 2023-06-22 | 2025-07-15 | Deca Technologies Usa, Inc. | Method of making a fan-out semiconductor assembly with an intermediate carrier |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020193899A1 (en) | 2001-06-19 | 2002-12-19 | Applied Materials, Inc. | Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing |
Family Cites Families (56)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US5425839A (en) | 1992-05-14 | 1995-06-20 | Texas Instruments Incorporated | Method for rapidly etching material on a semiconductor device |
| US5770098A (en) | 1993-03-19 | 1998-06-23 | Tokyo Electron Kabushiki Kaisha | Etching process |
| US5586039A (en) | 1993-03-29 | 1996-12-17 | Texas Instruments Incorporated | Computer-aided manufacturing support method and system for specifying relationships and dependencies between process type components |
| US5402367A (en) | 1993-07-19 | 1995-03-28 | Texas Instruments, Incorporated | Apparatus and method for model based process control |
| US5526293A (en) | 1993-12-17 | 1996-06-11 | Texas Instruments Inc. | System and method for controlling semiconductor wafer processing |
| US5657252A (en) | 1995-09-29 | 1997-08-12 | Motorola, Inc. | Dynamically configurable equipment integration architecture |
| JP3699776B2 (ja) | 1996-04-02 | 2005-09-28 | 株式会社日立製作所 | 電子部品の製造方法 |
| US5822218A (en) | 1996-08-27 | 1998-10-13 | Clemson University | Systems, methods and computer program products for prediction of defect-related failures in integrated circuits |
| US5982920A (en) | 1997-01-08 | 1999-11-09 | Lockheed Martin Energy Research Corp. Oak Ridge National Laboratory | Automated defect spatial signature analysis for semiconductor manufacturing process |
| US5896294A (en) | 1997-03-11 | 1999-04-20 | Advanced Micro Devices, Inc. | Method and apparatus for inspecting manufactured products for defects in response to in-situ monitoring |
| US5976740A (en) * | 1997-08-28 | 1999-11-02 | International Business Machines Corporation | Process for controlling exposure dose or focus parameters using tone reversing pattern |
| US5999003A (en) | 1997-12-12 | 1999-12-07 | Advanced Micro Devices, Inc. | Intelligent usage of first pass defect data for improved statistical accuracy of wafer level classification |
| JP3055516B2 (ja) | 1997-12-25 | 2000-06-26 | 日本電気株式会社 | 半導体集積回路の検査解析装置及びその方法並びにその制御プログラムを記録した記録媒体 |
| US6403385B1 (en) | 1998-01-27 | 2002-06-11 | Advanced Micro Devices, Inc. | Method of inspecting a semiconductor wafer for defects |
| US6408219B2 (en) | 1998-05-11 | 2002-06-18 | Applied Materials, Inc. | FAB yield enhancement system |
| US6263255B1 (en) | 1998-05-18 | 2001-07-17 | Advanced Micro Devices, Inc. | Advanced process control for semiconductor manufacturing |
| US6171174B1 (en) * | 1998-06-26 | 2001-01-09 | Advanced Micro Devices | System and method for controlling a multi-arm polishing tool |
| IL125337A0 (en) | 1998-07-14 | 1999-03-12 | Nova Measuring Instr Ltd | Method and apparatus for lithography monitoring and process control |
| US6136712A (en) | 1998-09-30 | 2000-10-24 | Lam Research Corporation | Method and apparatus for improving accuracy of plasma etching process |
| US6281962B1 (en) | 1998-12-17 | 2001-08-28 | Tokyo Electron Limited | Processing apparatus for coating substrate with resist and developing exposed resist including inspection equipment for inspecting substrate and processing method thereof |
| US20020158197A1 (en) * | 1999-01-12 | 2002-10-31 | Applied Materials, Inc | AFM-based lithography metrology tool |
| US6662076B1 (en) * | 1999-02-10 | 2003-12-09 | Advanced Micro Devices, Inc. | Management of move requests from a factory system to an automated material handling system |
| US6298470B1 (en) | 1999-04-15 | 2001-10-02 | Micron Technology, Inc. | Method for efficient manufacturing of integrated circuits |
| US6303395B1 (en) | 1999-06-01 | 2001-10-16 | Applied Materials, Inc. | Semiconductor processing techniques |
| CN1239969C (zh) * | 1999-06-22 | 2006-02-01 | 布鲁克斯自动化公司 | 用于微电子学器件生产的逐次运行控制器 |
| US6421574B1 (en) | 1999-09-23 | 2002-07-16 | Advanced Micro Devices, Inc. | Automatic defect classification system based variable sampling plan |
| US6248602B1 (en) | 1999-11-01 | 2001-06-19 | Amd, Inc. | Method and apparatus for automated rework within run-to-run control semiconductor manufacturing |
| US6469518B1 (en) | 2000-01-07 | 2002-10-22 | Advanced Micro Devices, Inc. | Method and apparatus for determining measurement frequency based on hardware age and usage |
| US6477432B1 (en) | 2000-01-11 | 2002-11-05 | Taiwan Semiconductor Manufacturing Company | Statistical in-process quality control sampling based on product stability through a systematic operation system and method |
| US6337217B1 (en) | 2000-02-14 | 2002-01-08 | Advanced Micro Devices, Inc. | Method and apparatus for improved focus in optical processing |
| US6245581B1 (en) | 2000-04-19 | 2001-06-12 | Advanced Micro Devices, Inc. | Method and apparatus for control of critical dimension using feedback etch control |
| WO2002004887A1 (en) * | 2000-07-08 | 2002-01-17 | Semitool, Inc. | Methods and apparatus for processing microelectronic workpieces using metrology |
| US6461878B1 (en) | 2000-07-12 | 2002-10-08 | Advanced Micro Devices, Inc. | Feedback control of strip time to reduce post strip critical dimension variation in a transistor gate electrode |
| US6442496B1 (en) | 2000-08-08 | 2002-08-27 | Advanced Micro Devices, Inc. | Method and apparatus for dynamic sampling of a production line |
| JP2002076087A (ja) | 2000-08-31 | 2002-03-15 | Mitsubishi Electric Corp | 抜き取り検査管理システム |
| US6746616B1 (en) * | 2001-03-27 | 2004-06-08 | Advanced Micro Devices, Inc. | Method and apparatus for providing etch uniformity using zoned temperature control |
| JP3909223B2 (ja) * | 2001-06-15 | 2007-04-25 | 株式会社デンソー | 電子デバイスの製造工程管理システム |
| US6444481B1 (en) * | 2001-07-02 | 2002-09-03 | Advanced Micro Devices, Inc. | Method and apparatus for controlling a plating process |
| US6842659B2 (en) | 2001-08-24 | 2005-01-11 | Applied Materials Inc. | Method and apparatus for providing intra-tool monitoring and control |
| US6708129B1 (en) * | 2001-12-13 | 2004-03-16 | Advanced Micro Devices, Inc. | Method and apparatus for wafer-to-wafer control with partial measurement data |
| US6821792B1 (en) | 2001-12-18 | 2004-11-23 | Advanced Micro Devices, Inc. | Method and apparatus for determining a sampling plan based on process and equipment state information |
| US6650955B1 (en) | 2001-12-18 | 2003-11-18 | Advanced Micro Devices, Inc. | Method and apparatus for determining a sampling plan based on process and equipment fingerprinting |
| CN1182572C (zh) * | 2002-04-03 | 2004-12-29 | 华邦电子股份有限公司 | 使用动态反馈计算工艺参数的研磨方法 |
| US6687561B1 (en) | 2002-04-03 | 2004-02-03 | Advanced Micro Devices, Inc. | Method and apparatus for determining a sampling plan based on defectivity |
| US7069103B1 (en) * | 2002-06-28 | 2006-06-27 | Advanced Micro Devices, Inc. | Controlling cumulative wafer effects |
| US7067333B1 (en) * | 2002-06-28 | 2006-06-27 | Advanced Micro Devices, Inc. | Method and apparatus for implementing competing control models |
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| US6810296B2 (en) * | 2002-09-25 | 2004-10-26 | Advanced Micro Devices, Inc. | Correlating an inline parameter to a device operation parameter |
| CN100407215C (zh) * | 2002-09-30 | 2008-07-30 | 东京毅力科创株式会社 | 用于监视和控制半导体生产过程的方法和装置 |
| DE10252613A1 (de) | 2002-11-12 | 2004-05-27 | Infineon Technologies Ag | Verfahren, Vorrichtung, computerlesbares Speichermedium und Computerprogramm-Element zum Überwachen eines Herstellungsprozesses |
| US6907369B1 (en) * | 2003-05-02 | 2005-06-14 | Advanced Micro Devices, Inc. | Method and apparatus for modifying design constraints based on observed performance |
| US20050021272A1 (en) * | 2003-07-07 | 2005-01-27 | Jenkins Naomi M. | Method and apparatus for performing metrology dispatching based upon fault detection |
| US6988045B2 (en) * | 2003-08-04 | 2006-01-17 | Advanced Micro Devices, Inc. | Dynamic metrology sampling methods, and system for performing same |
| US6999848B2 (en) * | 2003-12-19 | 2006-02-14 | Intel Corporation | Process control apparatus, systems, and methods |
| US7076321B2 (en) * | 2004-10-05 | 2006-07-11 | Advanced Micro Devices, Inc. | Method and system for dynamically adjusting metrology sampling based upon available metrology capacity |
| US20060178767A1 (en) * | 2005-02-04 | 2006-08-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Systems and methods for inspection control |
-
2004
- 2004-10-05 US US10/958,834 patent/US7296103B1/en not_active Expired - Fee Related
-
2005
- 2005-06-23 WO PCT/US2005/022191 patent/WO2006041542A2/en not_active Ceased
- 2005-06-23 CN CN2005800340498A patent/CN101036092B/zh not_active Expired - Fee Related
- 2005-06-23 EP EP05771492A patent/EP1797486A2/en not_active Withdrawn
- 2005-06-23 KR KR1020077008345A patent/KR101129715B1/ko not_active Expired - Fee Related
- 2005-06-23 JP JP2007535668A patent/JP2008523458A/ja active Pending
- 2005-09-14 TW TW094131591A patent/TWI374345B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020193899A1 (en) | 2001-06-19 | 2002-12-19 | Applied Materials, Inc. | Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101036092A (zh) | 2007-09-12 |
| TW200627105A (en) | 2006-08-01 |
| EP1797486A2 (en) | 2007-06-20 |
| US7296103B1 (en) | 2007-11-13 |
| CN101036092B (zh) | 2010-11-03 |
| JP2008523458A (ja) | 2008-07-03 |
| WO2006041542A3 (en) | 2006-06-01 |
| WO2006041542A2 (en) | 2006-04-20 |
| KR20070051939A (ko) | 2007-05-18 |
| TWI374345B (en) | 2012-10-11 |
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